LASER PATTERNING OF SILVER NANOWIRE - BASED TRANSPARENT ELECTRICALLY CONDUCTING COATINGS
    6.
    发明申请
    LASER PATTERNING OF SILVER NANOWIRE - BASED TRANSPARENT ELECTRICALLY CONDUCTING COATINGS 有权
    基于银纳米线的透明电导率涂层的激光图案

    公开(公告)号:US20140332254A1

    公开(公告)日:2014-11-13

    申请号:US14360413

    申请日:2012-12-10

    Abstract: A transparent electrical conductor (10; 20), comprising a transparent substrate (14; 201); a composite layer (18; 28) comprising an electrically conductive layer (12) disposed on at least a portion of a major surface of the transparent substrate (14; 201) and comprising a plurality of interconnecting metallic nanowires, and a polymeric overcoat layer (16) disposed on at least a portion of the electrically conductive layer (12); wherein a pattern in the composite layer includes an x-axis and a y-axis of an x-y plane of the composite layer and a z-axis into the x-y plane of the composite layer, and the pattern defines a plurality of electrically conductive regions (24, 24′) in the x-y plane of the composite layer (18; 28), wherein the electrically conductive regions (24, 24′) are separated from each other by electrically insulative traces (21), each of which defines a valley into the z-axis of the x-y plane of the composite layer (18; 28), the valley having a maximum depth (27) in a range from 50 nanometers to 100 nanometers relative to the x-y plane of the composite layer (18; 28), wherein the valley has a cross-sectional width (M1) in a range from 10 micrometers to 1000 micrometers, and wherein the valley further comprises a plurality of crevices (22) having a depth (23) in a range from 50 nanometers to 100 nanometers further into the z-axis of the x-y plane of the composite layer (18; 28). Methods for patternwise irradiating transparent electrodes (10; 20) to generate electrically insulating traces (21) are also described.

    Abstract translation: 一种透明电导体(10; 20),包括透明衬底(14; 201); 复合层(18; 28),包括设置在所述透明基板(14; 201)的主表面的至少一部分上并包括多个互连金属纳米线的导电层(12)和聚合物外涂层 16)布置在所述导电层(12)的至少一部分上; 其中所述复合层中的图案包括复合层的xy平面的x轴和y轴以及复合层的xy平面中的z轴,并且图案限定多个导电区域( 24,24')在复合层(18; 28)的xy平面中,其中导电区域(24,24')通过电绝缘迹线(21)彼此分离,每个线路限定了谷 复合层(18; 28)的xy平面的z轴,相对于复合层(18; 28)的xy平面,具有在50纳米至100纳米范围内的最大深度(27)的谷部分, ,其中所述谷具有在10微米至1000微米范围内的横截面宽度(M1),并且其中所述谷还包括具有在50纳米至100埃范围内的深度(23)的多个缝隙(22) 纳米进一步进入复合层(18; 28)的xy平面的z轴。 还描述了用于图案化地照射透明电极(10; 20)以产生电绝缘迹线(21)的方法。

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