公开(公告)号：US20040206375A1

公开(公告)日：2004-10-21

申请号：US10826492

申请日：2004-04-16

Applicant: Applied Materials, Inc.

Inventor： Henry Ho ,  Lily L. Pang ,  Anh N. Nguyen ,  Alexander N. Lerner

IPC: B08B003/02

CPC classification number: H01L21/68 ,  B08B3/02 ,  H01L21/67034 ,  H01L21/67051 ,  H01L21/6838

Abstract: A method and apparatus for cleaning the bevel of a semiconductor substrate. The apparatus generally includes a cell body having upstanding walls and a fluid drain basin, a rotatable vacuum chuck positioned centrally positioned in the fluid drain basin, and at least 3 substrate centering members positioned at equal radial increments around the rotatable vacuum chuck. The substrate centering members include a vertically oriented shaft having a longitudinal axis extending therethrough, a cap member positioned over an upper terminating end of the shaft, a raised central portion formed onto the cap member, the raised central portion having a maximum thickness at a location the coincides with the longitudinal axis, and a substrate centering post positioned on the cap member radially outward of the raised central portion, an upper terminating end of the substrate centering post extending from the cap member to a distance that exceeds the maximum thickness. The apparatus further includes a centering actuation mechanism in communication with the substrate centering posts, and a fluid dispensing arm pivotally connected to the cell body, the fluid dispensing arm being configured to dispense a processing fluid onto a first side of the substrate.

Abstract translation: 一种用于清洁半导体衬底的斜面的方法和设备。 该装置通常包括具有直立壁的细胞体和流体排放盆，位于流体排放盆中心定位的可旋转真空吸盘，以及围绕可旋转真空吸盘以相等的径向增量定位的至少3个基体定心构件。 基板定心构件包括垂直定向的轴，其具有延伸穿过其中的纵向轴线;盖构件，其定位在所述轴的上终端上方;凸起中心部分形成在所述盖构件上，所述凸起中心部分在位置处具有最大厚度 与纵向轴线重合，以及定位在凸起中心部分的径向外侧的盖构件上的基板定心柱，该基板定心柱的上终端从盖构件延伸至超过最大厚度的距离。 所述装置还包括与所述基板定心柱连通的定心致动机构，以及可枢转地连接到所述电池体的流体分配臂，所述流体分配臂构造成将处理流体分配到所述基板的第一侧上。

公开(公告)号：US20040016637A1

公开(公告)日：2004-01-29

申请号：US10616284

申请日：2003-07-08

Applicant: APPLIED MATERIALS, INC.

Inventor： Michael X. Yang ,  Ming Xi ,  Russell C. Ellwanger ,  Eric B. Britcher ,  Bernardo Donoso ,  Lily L. Pang ,  Svetlana Sherman ,  Henry Ho ,  Anh N. Nguyen ,  Alexander N. Lerner ,  Allen L. D'Ambra ,  Arulkumar Shanmugasundram ,  Tetsuya Ishikawa ,  Yevgeniy Rabinovich ,  Dmitry Lubomirsky ,  Yeuk-Fai Edwin Mok ,  Son T. Nguyen

IPC: C25D017/00

CPC classification number: H01L21/6719 ,  A23D7/00 ,  A23D7/005 ,  A23D7/01 ,  A23J7/00 ,  B08B3/02 ,  C25D7/123 ,  C25D17/001 ,  C25D17/002 ,  C25D17/02 ,  C25D21/02 ,  C25D21/08 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/67051 ,  H01L21/67109 ,  H01L21/6715 ,  H01L21/67196 ,  H01L21/6723 ,  H01L21/68 ,  H01L21/6838 ,  H01L21/68707

Abstract: Embodiments of the invention generally provide an electrochemical plating system. The plating system includes a substrate loading station positioned in communication with a mainframe processing platform, at least one substrate plating cell positioned on the mainframe, at least one substrate bevel cleaning cell positioned on the mainframe, and a stacked substrate annealing station positioned in communication with at least one of the mainframe and the loading station, each chamber in the stacked substrate annealing station having a heating plate, a cooling plate, and a substrate transfer robot therein.

Abstract translation: 本发明的实施方案通常提供电化学电镀系统。 电镀系统包括位于与主机处理平台连通的基板装载站，位于主机上的至少一个基板镀覆单元，位于主机上的至少一个基板斜面清洁单元，以及与 主机和加载站中的至少一个，层叠基板退火站中的每个室具有加热板，冷却板和基板传送机器人。

公开(公告)号：US20020187742A1

公开(公告)日：2002-12-12

申请号：US10144684

申请日：2002-05-13

Applicant: APPLIED MATERIALS, INC.

Inventor： Alexander N. Lerner ,  Harshad M. Borgaonkar

IPC: B08B015/02

CPC classification number: B08B15/02

Abstract: Methods and apparatus are provided for increasing the safety of a clogged or failed exhaust system. In accordance with a first embodiment, an apparatus is provided that includes (1) a tank adapted to contain a processing fluid; (2) an exhaust system coupled to the tank and adapted to exhaust a gas from the tank, the gas including a hazardous vapor of the processing fluid; (3) a sensor coupled to the exhaust system and adapted to detect a rate at which gas is exhausted from the tank; and (4) a fluid supply mechanism adapted to supply a diluting fluid to the tank so as to dilute the processing fluid contained by the tank if the rate at which gas is exhausted from the tank is less than a predetermined rate. Systems, methods and computer program products are provided in accordance with this and other embodiments.

Abstract translation: 提供了提高堵塞或故障排气系统安全性的方法和装置。 根据第一实施例，提供了一种装置，其包括：（1）适于容纳处理流体的罐; （2）排气系统，其耦合到所述罐并且适于从所述罐排出气体，所述气体包括所述处理流体的危险蒸汽; （3）耦合到排气系统并适于检测气体从罐排出的速率的传感器; 以及（4）如果从罐中排出气体的速率小于预定速率，则适于向罐提供稀释流体以便稀释由罐所容纳的处理流体的流体供应机构。 根据本实施例和其他实施例提供了系统，方法和计算机程序产品。