公开(公告)号：US20150083042A1

公开(公告)日：2015-03-26

申请号：US14091057

申请日：2013-11-26

Applicant: Applied Materials, Inc.

Inventor： Satoru KOBAYASHI ,  Kirby Hane FLOYD ,  Hiroji HANAWA ,  Soonam PARK ,  Dmitry LUBOMIRSKY

IPC: H01L21/687

CPC classification number: H01J37/32697 ,  H01J37/32082 ,  H01J37/3211 ,  H01J37/32357 ,  H01J37/3244 ,  H01J37/32715 ,  H01J37/32724 ,  H01J2237/332 ,  H01J2237/334 ,  H01L21/68792 ,  H02K7/14

Abstract: A substrate support assembly includes a shaft assembly, a pedestal coupled to a portion of the shaft assembly, and a first rotary connector coupled to the shaft assembly, wherein the first rotary connector comprises a first coil member surrounding a rotatable shaft member that is electrically coupled to the shaft assembly, the first coil member being rotatable with the rotatable shaft, and a second coil member surrounding the first coil member, the second coil member being stationary relative to the first coil member, wherein the first coil member electrically couples with the second coil member when the rotating radio frequency applicator is energized and provides a radio frequency signal/power to the pedestal through the shaft assembly.

Abstract translation: 基板支撑组件包括轴组件，联接到轴组件的一部分的基座和联接到轴组件的第一旋转连接器，其中第一旋转连接器包括围绕可旋转轴构件的第一线圈构件，该第一线圈构件电耦合 所述第一线圈构件能够与所述可旋转轴一起旋转，所述第一线圈构件围绕所述第一线圈构件，所述第二线圈构件相对于所述第一线圈构件是固定的，其中所述第一线圈构件与所述第二线圈构件电耦合， 线圈构件，并且通过轴组件向基座提供射频信号/功率。

公开(公告)号：US20150262859A1

公开(公告)日：2015-09-17

申请号：US14632648

申请日：2015-02-26

Applicant: APPLIED MATERIALS, INC.

Inventor： Ganesh BALASUBRAMANIAN ,  Juan Carlos ROCHA-ALVAREZ ,  Ramprakash SANKARAKRISHNAN ,  Robert KIM ,  Dale R. DU BOIS ,  Kirby Hane FLOYD ,  Amit Kumar BANSAL ,  Tuan Anh NGUYEN

IPC: H01L21/687 ,  H01L21/02 ,  C23C16/458

CPC classification number: H01L21/02274 ,  C23C16/4584 ,  C23C16/4585 ,  C23C16/505 ,  C23C16/5096 ,  H01J37/32082 ,  H01J37/32568 ,  H01J37/32623 ,  H01J37/32715 ,  H01J37/32724 ,  H01J37/32743 ,  H01J2237/3321 ,  H01L21/67103 ,  H01L21/68735 ,  H01L21/68742 ,  H01L21/68764 ,  H01L21/68792

Abstract: A method and apparatus for processing a substrate are provided. The apparatus includes a pedestal and rotation member, both of which are moveably disposed within a processing chamber. The rotation member is adapted to rotate a substrate disposed in the chamber. The substrate may be supported by an edge ring during processing. The edge ring may selectively engage either the pedestal or the rotation member. In one embodiment, the edge ring engages the pedestal during a deposition process and the edge ring engages the rotation member during rotation of the substrate. The rotation of the substrate during processing may be discrete or continuous.

Abstract translation: 提供了一种用于处理衬底的方法和设备。 该装置包括基座和旋转构件，两者都可移动地设置在处理室内。 旋转构件适于旋转设置在腔室中的衬底。 衬底可以在加工过程中被边缘环支撑。 边缘环可以选择性地接合基座或旋转构件。 在一个实施例中，边缘环在沉积工艺期间接合基座，并且边缘环在基底旋转期间接合旋转构件。 处理过程中衬底的旋转可以是离散的或连续的。