公开(公告)号：US20150136325A1

公开(公告)日：2015-05-21

申请号：US14539914

申请日：2014-11-12

Applicant: Applied Materials, Inc.

Inventor： Zheng John YE ,  Ganesh BALASUBRAMANIAN ,  Thuy BRICHER ,  Jay D. PINSON, II ,  Hiroji HANAWA ,  Juan Carlos ROCHA-ALVAREZ ,  Kwangduk Douglas LEE ,  Martin Jay SEAMONS ,  Bok Hoen KIM ,  Sungwon HA

IPC: H01J37/32 ,  C23C16/513 ,  C23C16/509 ,  H01L21/67

Abstract: A system for modifying the uniformity pattern of a thin film deposited in a plasma processing chamber includes a single radio-frequency (RF) power source that is coupled to multiple points on the discharge electrode of the plasma processing chamber. Positioning of the multiple coupling points, a power distribution between the multiple coupling points, or a combination of both are selected to at least partially compensate for a consistent non-uniformity pattern of thin films produced by the chamber. The power distribution between the multiple coupling points may be produced by an appropriate RF phase difference between the RF power applied at each of the multiple coupling points.

Abstract translation: 用于修改沉积在等离子体处理室中的薄膜的均匀性图案的系统包括耦合到等离子体处理室的放电电极上的多个点的单个射频（RF）电源。 选择多个耦合点的定位，多个耦合点之间的功率分布或两者的组合以至少部分地补偿由腔室产生的薄膜的一致的不均匀图案。 多个耦合点之间的功率分布可以由在多个耦合点中的每个耦合点处施加的RF功率之间的适当的RF相位差产生。

公开(公告)号：US20170236693A1

公开(公告)日：2017-08-17

申请号：US15582282

申请日：2017-04-28

Applicant: Applied Materials, Inc.

Inventor： Satoru KOBAYASHI ,  Kirby HANE FLOYD ,  Hiroji HANAWA ,  Soonam PARK ,  Dmitry LUBOMIRSKY

IPC: H01J37/32 ,  H02K7/14

Abstract: A substrate support assembly includes a shaft assembly, a pedestal coupled to a portion of the shaft assembly, and a first rotary connector coupled to the shaft assembly, wherein the first rotary connector comprises a first coil member surrounding a rotatable shaft member that is electrically coupled to the shaft assembly, the first coil member being rotatable with the rotatable shaft, and a second coil member surrounding the first coil member, the second coil member being stationary relative to the first coil member, wherein the first coil member electrically couples with the second coil member when the rotating radio frequency applicator is energized and provides a radio frequency signal/power to the pedestal through the shaft assembly.

公开(公告)号：US20170162417A1

公开(公告)日：2017-06-08

申请号：US15370682

申请日：2016-12-06

Applicant: Applied Materials, Inc.

Inventor： Zheng John YE ,  Hiroji HANAWA ,  Juan Carlos ROCHA-ALVAREZ ,  Pramit MANNA ,  Michael Wenyoung TSIANG ,  Allen KO ,  Wenjiao WANG ,  Yongjing LIN ,  Prashant Kumar KULSHRESHTHA ,  Xinhai HAN ,  Bok Hoen KIM ,  Kwangduk Douglas LEE ,  Karthik Thimmavajjula NARASIMHA ,  Ziqing DUAN ,  Deenesh PADHI

IPC: H01L21/683 ,  C23C16/505 ,  C23C16/458

CPC classification number: H01L21/6833 ,  C23C16/4586 ,  C23C16/509 ,  H01J37/32091 ,  H01L21/02274 ,  H01L21/0262 ,  H01L21/28556

Abstract: Techniques are disclosed for methods and apparatuses of an electrostatic chuck suitable for operating at high operating temperatures. In one example, a substrate support assembly is provided. The substrate support assembly includes a substantially disk-shaped ceramic body having an upper surface, a cylindrical sidewall, and a lower surface. The upper surface is configured to support a substrate thereon for processing the substrate in a vacuum processing chamber. The cylindrical sidewall defines an outer diameter of the ceramic body. The lower surface is disposed opposite the upper surface. An electrode is disposed in the ceramic body. A circuit is electrically connected to the electrode. The circuit includes a DC chucking circuit, a first RF drive circuit, and a second RF dive circuit. The DC chucking circuit, the first RF drive circuit and the second RF drive circuit are electrically coupled with the electrode.

公开(公告)号：US20160049323A1

公开(公告)日：2016-02-18

申请号：US14824229

申请日：2015-08-12

Applicant: Applied Materials, Inc.

Inventor： Zheng John YE ,  Jay D. PINSON, II ,  Hiroji HANAWA ,  Jianhua ZHOU ,  Xing LIN ,  Ren-Guan DUAN ,  Kwangduk Douglas LEE ,  Bok Hoen KIM ,  Swayambhu P. BEHERA ,  Sungwon HA ,  Ganesh BALASUBRAMANIAN ,  Juan Carlos ROCHA- ALVAREZ ,  Prashant Kumar KULSHRESHTHA ,  Jason K. FOSTER ,  Mukund SRINIVASAN ,  Uwe P. HALLER ,  Hari K. PONNEKANTI

IPC: H01L21/683 ,  H02N13/00

CPC classification number: H01L21/6833 ,  H01L21/68757 ,  H02N13/00

Abstract: Embodiments of the present disclosure provide an electrostatic chuck for maintaining a flatness of a substrate being processed in a plasma reactor at high temperatures. In one embodiment, the electrostatic chuck comprises a chuck body coupled to a support stem, the chuck body having a substrate supporting surface, and the chuck body has a volume resistivity value of about 1×107 ohm-cm to about 1×1015 ohm-cm in a temperature of about 250° C. to about 700° C., and an electrode embedded in the body, the electrode is coupled to a power supply. In one example, the chuck body is composed of an aluminum nitride material which has been observed to be able to optimize chucking performance around 600° C. or above during a deposition or etch process, or any other process that employ both high operating temperature and substrate clamping features.

Abstract translation: 本公开的实施例提供了一种静电卡盘，用于在高温下维持在等离子体反应器中正在加工的基板的平坦度。 在一个实施例中，静电卡盘包括联接到支撑杆的卡盘体，卡盘主体具有基底支撑表面，卡盘体的体积电阻率值约为1×107ohm-cm至约1×1015ohm- 在约250℃至约700℃的温度下，以及嵌入在本体中的电极，电极耦合到电源。 在一个实例中，卡盘主体由氮化铝材料组成，已经被观察到能够在沉积或蚀刻过程期间优化约600℃或更高的夹持性能，或任何其他使用高工作温度和 基板夹紧功能。

公开(公告)号：US20150083042A1

公开(公告)日：2015-03-26

申请号：US14091057

申请日：2013-11-26

Applicant: Applied Materials, Inc.

Inventor： Satoru KOBAYASHI ,  Kirby Hane FLOYD ,  Hiroji HANAWA ,  Soonam PARK ,  Dmitry LUBOMIRSKY

IPC: H01L21/687

CPC classification number: H01J37/32697 ,  H01J37/32082 ,  H01J37/3211 ,  H01J37/32357 ,  H01J37/3244 ,  H01J37/32715 ,  H01J37/32724 ,  H01J2237/332 ,  H01J2237/334 ,  H01L21/68792 ,  H02K7/14

Abstract: A substrate support assembly includes a shaft assembly, a pedestal coupled to a portion of the shaft assembly, and a first rotary connector coupled to the shaft assembly, wherein the first rotary connector comprises a first coil member surrounding a rotatable shaft member that is electrically coupled to the shaft assembly, the first coil member being rotatable with the rotatable shaft, and a second coil member surrounding the first coil member, the second coil member being stationary relative to the first coil member, wherein the first coil member electrically couples with the second coil member when the rotating radio frequency applicator is energized and provides a radio frequency signal/power to the pedestal through the shaft assembly.

Abstract translation: 基板支撑组件包括轴组件，联接到轴组件的一部分的基座和联接到轴组件的第一旋转连接器，其中第一旋转连接器包括围绕可旋转轴构件的第一线圈构件，该第一线圈构件电耦合 所述第一线圈构件能够与所述可旋转轴一起旋转，所述第一线圈构件围绕所述第一线圈构件，所述第二线圈构件相对于所述第一线圈构件是固定的，其中所述第一线圈构件与所述第二线圈构件电耦合， 线圈构件，并且通过轴组件向基座提供射频信号/功率。