公开(公告)号：US20180254171A1

公开(公告)日：2018-09-06

申请号：US15449456

申请日：2017-03-03

Applicant: APPLIED MATERIALS, INC.

Inventor： WONSEOK LEE ,  KARTIK RAMASWAMY ,  Ankur AGARWAL ,  Haitao WANG

IPC: H01J37/32 ,  H01L21/3065 ,  H01L21/67 ,  H01L21/683

CPC classification number: H01J37/32165 ,  H01J37/32082 ,  H01J37/32091 ,  H01J37/32183 ,  H01J37/32577 ,  H01J37/32697 ,  H01J37/32935 ,  H01J2237/334 ,  H01L21/02274 ,  H01L21/3065 ,  H01L21/32136 ,  H01L21/67069 ,  H01L21/6831 ,  H01L21/6833

Abstract: Methods and apparatus for boosting ion energies are contemplated herein. In one embodiment, the methods and apparatus comprises a controller, a process chamber with a symmetrical plasma source configured to process a wafer, one or more very high frequency (VHF) sources, coupled to the process chamber, to generate plasma density and two or more frequency generators that generate low frequencies relative to the one or more VHF sources, coupled to a bottom electrode of the process chamber, the two or more low frequency generators configured to dissipate energy in the plasma sheath, wherein the controller controls the one or more VHF sources to generate a VHF signal and the two or more low frequency sources to generate two or more low frequency signals.

公开(公告)号：US20180190473A1

公开(公告)日：2018-07-05

申请号：US15909118

申请日：2018-03-01

Applicant: APPLIED MATERIALS, INC.

Inventor： JASON DELLA ROSA ,  HAMID NOORBAKHSH ,  VLADIMIR KNYAZIK ,  JISOO KIM ,  WONSEOK LEE ,  USAMA DADU

IPC: H01J37/32

CPC classification number: H01J37/3244 ,  H01J37/32807 ,  H01J37/3288

Abstract: Embodiments of showerheads having a detachable gas distribution plate are provided herein. In some embodiments, a showerhead for use in a semiconductor processing chamber may include a body having a first side and a second side opposing the first side; a gas distribution plate disposed proximate the second side of the body, wherein the gas distribution plate is formed from a material having an electrical resistivity between about 60 ohm-cm to 90 ohm-cm; a clamp disposed about a peripheral edge of the gas distribution plate to removably couple the gas distribution plate to the body; and a thermal gasket disposed in a gap between the body and gas distribution plate.

公开(公告)号：US20160005571A1

公开(公告)日：2016-01-07

申请号：US14729736

申请日：2015-06-03

Applicant: APPLIED MATERIALS, INC.

Inventor： JASON DELLA ROSA ,  HAMID NOORBAKHSH ,  VLADIMIR KNYAZIK ,  JISOO KIM ,  WONSEOK LEE ,  USAMA DADU

IPC: H01J37/32 ,  H01L21/67

CPC classification number: H01J37/3244 ,  H01J37/32807 ,  H01J37/3288

Abstract: Embodiments of showerheads having a detachable gas distribution plate are provided herein. In some embodiments, a showerhead for use in a semiconductor processing chamber may include a base having a first side and a second side opposing the first side; a gas distribution plate disposed proximate the second side of the base, wherein the gas distribution plate is formed from a material having an electrical resistivity between about 60 ohm-cm to 90 ohm-cm; a clamp disposed about a peripheral edge of the gas distribution plate to removably couple the gas distribution plate to the base; and a thermal gasket disposed in a gap between the base and gas distribution plate.

Abstract translation: 具有可拆卸气体分配板的喷头的实施例在此提供。 在一些实施例中，用于半导体处理室的喷头可以包括具有与第一侧相对的第一侧和第二侧的基部; 设置在所述基座的第二侧附近的气体分配板，其中所述气体分配板由具有约60ohm-cm至90ohm-cm之间的电阻率的材料形成; 围绕所述气体分配板的周缘设置的夹具，以将所述气体分配板可移除地联接到所述基座; 以及设置在基座和气体分配板之间的间隙中的热垫圈。