SOLID PRECURSOR WEIGHT MONITORING SYSTEM, REACTOR SYSTEM, AND METHODS OF USING SAME

    公开(公告)号:US20240209505A1

    公开(公告)日:2024-06-27

    申请号:US18423969

    申请日:2024-01-26

    CPC classification number: C23C16/52 C23C16/45544

    Abstract: A precursor monitoring assembly for use in reactor systems to provide real-time and direct measurements of the availability of source materials from a source vessel. The assembly includes one or more force or load sensors, such as load cells, positioned between a bottom wall of an interior tray and an exterior wall (e.g., a base of a source vessel) and/or outside the source vessel. A signal conditioning element processes the output electrical signals from the sensors, then a controller processes the output signals from the signal conditioning components with a conversion factor, for example, to determine a current weight of source material stored in the source vessel. The controller uses this weight to calculate the amount of available source material or chemistry in the source vessel.

    REACTOR SYSTEM WITH SOURCE VESSEL WEIGHT MONITORING

    公开(公告)号:US20230234014A1

    公开(公告)日:2023-07-27

    申请号:US18100331

    申请日:2023-01-23

    CPC classification number: B01J19/004 B01J19/0046

    Abstract: A source vessel weight monitoring assembly for use in reactor systems to provide real-time and direct measurements of the availability of source or process materials from a source vessel. The assembly includes one or more force or load sensors, such as load cells, positioned between a bottom wall of the source vessel and a support element for the vessel (e.g., a base of a source vessel enclosure). The sensors are positioned to at least partially support the vessel, and a signal conditioning element processes the output electrical signals from the sensors, then a controller processes the output signals from the signal conditioning components with a conversion factor, for example, to determine a current weight of the source vessel and process material (e.g., solid, liquid, or gaseous precursor) stored therein. The controller uses this weight to calculate the amount of available process material or chemistry in the source vessel.

    TEMPERATURE CONTROL SYSTEM FOR LIQUID SOURCES

    公开(公告)号:US20230287565A1

    公开(公告)日:2023-09-14

    申请号:US18117514

    申请日:2023-03-06

    CPC classification number: C23C16/448 C23C16/52 H01L21/67248

    Abstract: A reactor system for use in semiconductor processing that makes use of a liquid source for deposition that needs to be maintained within a specific temperature control band or range. The reactor system includes a temperature control system that includes a heating and cooling apparatus for providing both heating and cooling of a vessel that stores the liquid source to maintain the liquid source within a desired temperature control band or range. In this manner, the heating and cooling apparatus may be used in a reactor system in which the vessel needs to be cooled, needs to be heated, or uses concurrent or alternating heating and cooling to provide enhanced control of the source temperature within a particular temperature control band.

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