公开(公告)号：US20210320020A1

公开(公告)日：2021-10-14

申请号：US17356900

申请日：2021-06-24

Applicant: ASM IP Holding B.V.

Inventor： Theodorus Oosterlaken ,  Chris de Ridder

IPC: H01L21/67 ,  B65G47/90 ,  F27D3/00 ,  F27D5/00 ,  F27D7/06 ,  H01L21/677

Abstract: The disclosure relates to substrate processing apparatus, with a first and second reactor, each reactor configured for processing a plurality of substrates; and, a substrate handling robot constructed and arranged to transfer substrates between a substrate cassette at a substrate transfer position and the first and second reactor. The apparatus is constructed and arranged with a maintenance area between the first and second reactors to allow maintenance of the reactors from the maintenance area to both the first and second reactor.

公开(公告)号：US11087997B2

公开(公告)日：2021-08-10

申请号：US16176517

申请日：2018-10-31

Applicant: ASM IP Holding B.V.

Inventor： Theodorus Oosterlaken ,  Chris de Ridder

IPC: H01L21/677 ,  H01L21/67 ,  B65G47/90 ,  F27D3/00 ,  F27D5/00 ,  F27D7/06

Abstract: The disclosure relates to substrate processing apparatus, with a first and second reactor, each reactor configured for processing a plurality of substrates; and, a substrate handling robot constructed and arranged to transfer substrates between a substrate cassette at a substrate transfer position and the first and second reactor. The apparatus is constructed and arranged with a maintenance area between the first and second reactors to allow maintenance of the reactors from the maintenance area to both the first and second reactor.

公开(公告)号：US10103040B1

公开(公告)日：2018-10-16

申请号：US15476035

申请日：2017-03-31

Applicant: ASM IP Holding B.V.

Inventor： Theodorus Oosterlaken ,  Chris de Ridder ,  Lucian Jdira

IPC: H01L21/67 ,  H01L21/268 ,  H01L21/324 ,  H01S5/42 ,  H01S5/042

Abstract: The invention relates to an apparatus for manufacturing a semiconductor device comprising a reaction chamber comprising a substrate holder for holding a substrate; and, a heater for heating the substrate. The heater may comprise a vertical cavity surface emitting laser constructed and arranged to emit a radiation beam to a substrate held by the substrate holder to heat the substrate.

公开(公告)号：US20180286711A1

公开(公告)日：2018-10-04

申请号：US15476035

申请日：2017-03-31

Applicant: ASM IP Holding B.V.

Inventor： Theodorus Oosterlaken ,  Chris de Ridder ,  Lucian Jdira

IPC: H01L21/67 ,  H01L21/268 ,  H01L21/324 ,  H01S5/42 ,  H01S5/042

Abstract: The invention relates to an apparatus for manufacturing a semiconductor device comprising a reaction chamber comprising a substrate holder for holding a substrate; and, a heater for heating the substrate. The heater may comprise a vertical cavity surface emitting laser constructed and arranged to emit a radiation beam to a substrate held by the substrate holder to heat the substrate.

公开(公告)号：US11735445B2

公开(公告)日：2023-08-22

申请号：US17356900

申请日：2021-06-24

Applicant: ASM IP Holding B.V.

Inventor： Theodorus Oosterlaken ,  Chris de Ridder

IPC: H01L21/677 ,  H01L21/67 ,  B65G47/90 ,  F27D3/00 ,  F27D5/00 ,  F27D7/06

CPC classification number: H01L21/67161 ,  B65G47/90 ,  F27D3/0084 ,  F27D5/0037 ,  F27D7/06 ,  H01L21/67017 ,  H01L21/67109 ,  H01L21/67126 ,  H01L21/67196 ,  H01L21/67742 ,  H01L21/67766 ,  B65G2201/0297 ,  H01L21/67769

Abstract: The disclosure relates to substrate processing apparatus, with a first and second reactor, each reactor configured for processing a plurality of substrates; and, a substrate handling robot constructed and arranged to transfer substrates between a substrate cassette at a substrate transfer position and the first and second reactor. The apparatus is constructed and arranged with a maintenance area between the first and second reactors to allow maintenance of the reactors from the maintenance area to both the first and second reactor.

公开(公告)号：US11230766B2

公开(公告)日：2022-01-25

申请号：US15940729

申请日：2018-03-29

Applicant: ASM IP Holding B.V.

Inventor： Dieter Pierreux ,  Cornelis Thaddeus Herbschleb ,  Werner Knaepen ,  Bert Jongbloed ,  Steven Van Aerde ,  Kelly Houben ,  Theodorus Oosterlaken ,  Chris de Ridder ,  Lucian Jdira

IPC: C23C16/458 ,  C23C16/56 ,  C23C16/455 ,  C23C16/48 ,  C23C16/50 ,  C23C16/44

Abstract: The invention relates to a substrate processing apparatus comprising a reaction chamber provided with a substrate rack for holding a plurality of substrates in the reaction chamber. The substrate rack may have a plurality of spaced apart substrate holding provisions configured to hold the plurality of substrates. The apparatus may have an illumination system constructed and arranged to irradiate radiation with a range from 100 to 500 nanometers onto a top surface of the substrates.

公开(公告)号：US20190301014A1

公开(公告)日：2019-10-03

申请号：US15940729

申请日：2018-03-29

Applicant: ASM IP Holding B.V.

Inventor： Dieter Pierreux ,  Cornelis Thaddeus Herbschleb ,  Werner Knaepen ,  Bert Jongbloed ,  Steven Van Aerde ,  Kelly Houben ,  Theodorus Oosterlaken ,  Chris de Ridder ,  Lucian Jdira

IPC: C23C16/458 ,  C23C16/56 ,  C23C16/50 ,  C23C16/48 ,  C23C16/455

Abstract: The invention relates to a substrate processing apparatus comprising a reaction chamber provided with a substrate rack for holding a plurality of substrates in the reaction chamber. The substrate rack may have a plurality of spaced apart substrate holding provisions configured to hold the plurality of substrates. The apparatus may have an illumination system constructed and arranged to irradiate radiation with a range from 100 to 500 nanometers onto a top surface of the substrates.

公开(公告)号：US12183602B2

公开(公告)日：2024-12-31

申请号：US18235467

申请日：2023-08-18

Applicant: ASM IP Holding B.V.

Inventor： Theodorus Oosterlaken ,  Chris de Ridder

IPC: H01L21/677 ,  B65G47/90 ,  F27D3/00 ,  F27D5/00 ,  F27D7/06 ,  H01L21/67

Abstract: The disclosure relates to substrate processing apparatus, with a first and second reactor, each reactor configured for processing a plurality of substrates; and, a substrate handling robot constructed and arranged to transfer substrates between a substrate cassette at a substrate transfer position and the first and second reactor. The apparatus is constructed and arranged with a maintenance area between the first and second reactors to allow maintenance of the reactors from the maintenance area to both the first and second reactor.

公开(公告)号：US20230395405A1

公开(公告)日：2023-12-07

申请号：US18235467

申请日：2023-08-18

Applicant: ASM IP Holding B.V.

Inventor： Theodorus Oosterlaken ,  Chris de Ridder

IPC: H01L21/67 ,  B65G47/90 ,  F27D3/00 ,  F27D5/00 ,  F27D7/06 ,  H01L21/677

CPC classification number: H01L21/67161 ,  B65G47/90 ,  F27D3/0084 ,  F27D5/0037 ,  F27D7/06 ,  H01L21/67017 ,  H01L21/67109 ,  H01L21/67126 ,  H01L21/67196 ,  H01L21/67742 ,  H01L21/67766 ,  B65G2201/0297 ,  H01L21/67769

Abstract: The disclosure relates to substrate processing apparatus, with a first and second reactor, each reactor configured for processing a plurality of substrates; and, a substrate handling robot constructed and arranged to transfer substrates between a substrate cassette at a substrate transfer position and the first and second reactor. The apparatus is constructed and arranged with a maintenance area between the first and second reactors to allow maintenance of the reactors from the maintenance area to both the first and second reactor.

公开(公告)号：US11049751B2

公开(公告)日：2021-06-29

申请号：US16132142

申请日：2018-09-14

Applicant: ASM IP Holding B.V.

Inventor： Chris de Ridder

IPC: H01L21/677 ,  G05B19/4097

Abstract: The invention relates to a cassette supply system to store and handle cassettes for substrates and a processing apparatus for processing substrates equipped with said system. The system having a cassette storage provided with base plate constructed and arranged to support cassettes. Also a cassette handler with an end effector with at least one protrusion to support and position the cassette on the end effector is provided to transfer cassettes to and from the base plate. The base plate may be provided with a substantially flat surface to support the cassettes.