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公开(公告)号：US10401723B2
公开(公告)日：2019-09-03
申请号：US16300370
申请日：2017-05-30
Applicant: ASML Netherlands B.V.
Inventor： Pieter Cristiaan De Groot , Gerard Frans Jozef Schasfoort , Maksym Yuriiovych Sladkov , Manfred Petrus Johannes Maria Dikkers , Jozef Maria Finders , Pieter-Jan Van Zwol , Johannes Jacobus Matheus Baselmans , Stefan Michael Bruno Baumer , Laurentius Cornelius De Winter , Wouter Joep Engelen , Marcus Adrianus Van De Kerkhof , Robbert Jan Voogd
Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.
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公开(公告)号：US20170010542A1
公开(公告)日：2017-01-12
申请号：US15271947
申请日：2016-09-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Laurentius Cornelius De Winter , Jozef Maria Finders
IPC: G03F7/20
CPC classification number: G03F7/70641 , G03F7/70125 , G03F7/70308 , G03F7/70591 , G03F7/70891
Abstract: A method is described that includes illuminating a patterning device pattern with a radiation beam having a symmetric illumination mode, the patterning device pattern comprising a first pattern feature that substantially diffracts radiation of the radiation beam, and a second pattern feature that does not substantially diffract radiation of the radiation beam, introducing an asymmetry, relative to an optical axis, in the substantially diffracted radiation using a phase modulation element, illuminating a radiation beam receiving element with radiation emanating from the phase modulation element to form a receiving element pattern that is related to the patterning device pattern, the receiving element pattern having first and second receiving element pattern features related to the first and second pattern features respectively, and determining information at least indicative of a focal property from positional information regarding the relative positions of the first and second receiving element pattern features.
Abstract translation: 描述了一种方法，其包括用具有对称照明模式的辐射束照射图案形成装置图案，图案形成装置图案包括基本上衍射辐射束的辐射的第一图案特征，以及基本上不辐射辐射的第二图案特征 使用相位调制元件在基本上衍射的辐射中引入相对于光轴的不对称性，用相位调制元件发射的辐射照射辐射束接收元件，以形成与 图案形成装置图案，接收元件图案具有分别与第一和第二图案特征相关的第一和第二接收元件图案特征，以及根据关于第一和第二图案特征的相对位置的位置信息来确定至少指示焦点特性的信息 g元素图案特征。
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公开(公告)号：US11314174B2
公开(公告)日：2022-04-26
申请号：US16645672
申请日：2018-08-03
Applicant: ASML Netherlands B.V.
Inventor： Laurentius Cornelius De Winter , Roland Pieter Stolk , Frank Staals , Anton Bernhard Van Oosten , Paul Christiaan Hinnen , Marinus Jochemsen , Thomas Theeuwes , Eelco Van Setten
Abstract: Disclosed is a method of measuring focus performance of a lithographic apparatus, and corresponding patterning device and lithographic apparatus. The method comprises using the lithographic apparatus to print one or more first printed structures and second printed structures. The first printed structures are printed by illumination having a first non-telecentricity and the second printed structures being printed by illumination having a second non-telecentricity, different to said first non-telecentricity. A focus dependent parameter related to a focus-dependent positional shift between the first printed structures and the second printed structures on said substrate is measured and a measurement of focus performance based at least in part on the focus dependent parameter is derived therefrom.
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Patent Agency Ranking
公开(公告)号：US10732498B2
公开(公告)日：2020-08-04
申请号：US16502674
申请日：2019-07-03
Applicant: ASML Netherlands B.V.
Inventor： Pieter Cristiaan De Groot , Gerard Frans Jozef Schasfoort , Maksym Yuriiovych Sladkov , Manfred Petrus Johannes Maria Dikkers , Jozef Maria Finders , Pieter-Jan Van Zwol , Johannes Jacobus Matheus Baselmans , Stefan Michael Bruno Baumer , Laurentius Cornelius De Winter , Wouter Joep Engelen , Marcus Adrianus Van De Kerkhof , Robbert Jan Voogd
Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.
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公开(公告)号：US10331042B2
公开(公告)日：2019-06-25
申请号：US15271947
申请日：2016-09-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Laurentius Cornelius De Winter , Jozef Maria Finders
IPC: G03F7/20
Abstract: A method is described that includes illuminating a patterning device pattern with a radiation beam having a symmetric illumination mode, the patterning device pattern comprising a first pattern feature that substantially diffracts radiation of the radiation beam, and a second pattern feature that does not substantially diffract radiation of the radiation beam, introducing an asymmetry, relative to an optical axis, in the substantially diffracted radiation using a phase modulation element, illuminating a radiation beam receiving element with radiation emanating from the phase modulation element to form a receiving element pattern that is related to the patterning device pattern, the receiving element pattern having first and second receiving element pattern features related to the first and second pattern features respectively, and determining information at least indicative of a focal property from positional information regarding the relative positions of the first and second receiving element pattern features.
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公开(公告)号：US10139725B2
公开(公告)日：2018-11-27
申请号：US14775249
申请日：2014-03-04
Applicant: ASML Netherlands B.V.
Inventor： James Norman Wiley , Juan Diego Arias Espinoza , Derk Servatius Gertruda Brouns , Laurentius Cornelius De Winter , Florian Didier Albin Dhalluin , Pedro Julian Rizo Diago , Luigi Scaccabarozzi
Abstract: The present invention is concerned with an apparatus for shielding a reticle for EUV lithography. The apparatus comprises a pellicle, and at least one actuator in communication with the pellicle, the actuator being configured to induce, in use, movement of the pellicle with respect to a reticle.
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公开(公告)号：US12271008B2
公开(公告)日：2025-04-08
申请号：US17282559
申请日：2019-09-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrey Nikipelov , Marcus Adrianus Van De Kerkhof , Pieter-Jan Van Zwol , Laurentius Cornelius De Winter , Wouter Joep Engelen , Alexey Olegovich Polyakov
Abstract: A first diffusor configured to receive and transmit radiation has a plurality of layers, each layer arranged to change an angular distribution of EUV radiation passing through it differently. A second diffusor configured to receive and transmit radiation has a first layer and a second layer. The first layer is formed from a first material, the first layer including a nanostructure on at least one surface of the first layer. The second layer is formed from a second material adjacent to the at least one surface of the first layer such that the second layer also includes a nanostructure. The second material has a refractive index that is different to a refractive index of the first layer. The diffusors may be configured to receive and transmit EUV radiation.
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公开(公告)号：US10928735B2
公开(公告)日：2021-02-23
申请号：US16698868
申请日：2019-11-27
Applicant: ASML Netherlands B.V.
Abstract: A patterning device for use with a lithographic apparatus, the device comprising an absorber portion configured to absorb incident radiation and to reflect a portion of incident radiation, the absorber portion comprising a first layer and a second layer, the first layer of the absorber portion comprising a first material that is different from a second material of the second layer of the absorber portion; a reflector portion arranged beneath the absorber portion, the reflector portion being configured to reflect incident radiation; and a phase tune portion arranged between the reflector portion and the absorber portion, the phase tune portion being configured to induce a phase shift between the radiation reflected by the reflector portion and the portion of radiation reflected by the absorber portion such that the radiation reflected by the reflector portion destructively interferes with the portion of radiation reflected by the absorber portion.
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