公开(公告)号：US09645510B2

公开(公告)日：2017-05-09

申请号：US14787738

申请日：2014-04-16

Applicant: ASML Netherlands B.V.

Inventor： Wilhelmus Patrick Elisabeth Maria Op 'T Root ,  Adrianus Leonardus Gertrudus Bommer ,  Robert De Jong ,  Frank Everts ,  Herman Philip Godfried ,  Roland Pieter Stolk ,  Paul Van Der Veen

IPC: G03B27/42 ,  G03F7/20 ,  H01S3/104 ,  H01S3/0975 ,  H01S3/225

CPC classification number: G03F7/70558 ,  G03F7/70025 ,  G03F7/70516 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/225

Abstract: A method of selecting a periodic modulation to be applied to a variable of a radiation source, wherein the source delivers radiation for projection onto a substrate and wherein there is relative motion between the substrate and the radiation at a scan speed, the method including: for a set of system parameters and for a position on the substrate, calculating a quantity, the quantity being a measure of the contribution to an energy dose delivered to the position that arises from the modulation being applied to the variable of the source, wherein the contribution to the energy dose is calculated as a convolution of: a profile of radiation, and a contribution to an irradiance of radiation delivered by the source; and selecting a modulation frequency at which the quantity for the set of system parameters and the position on the substrate satisfies a certain criteria.

公开(公告)号：US20150109599A1

公开(公告)日：2015-04-23

申请号：US14403114

申请日：2013-05-17

Applicant: ASML Netherlands B.V.

Inventor： Adrianus Hendrik Koevoets ,  Sjoerd Nicolaas Lambertus Donders ,  Menno Fien ,  Antonius Franciscus Johannes De Groot ,  Christiaan Alexander Hoogendam ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Martijn Houben ,  Raymond Wilhelmus Louis Laffarre ,  Jan Steven Christiaan Westerlaken ,  Jim Vincent Overkamp ,  Maarten Van Beijnum ,  Robert De Jong

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70733

Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.

Abstract translation: 用于光刻设备的支撑设备具有物体保持器和物体保持器径向外侧的提取体。 对象持有者被配置为支持对象。 提取体包括提取开口，其构造成从支撑装置的顶表面提取流体。 提取体与物体保持器间隔开，使得提取体基本上与物体保持器分离。 提取体包括突出部，其被构造为使得其围绕物体保持器并且使得在使用中一层液体保持在突出部上并与支撑在物体保持器上的物体接触。

公开(公告)号：US20200142317A1

公开(公告)日：2020-05-07

申请号：US16722397

申请日：2019-12-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Andre Bernardus JEUNINK ,  Robert De Jong ,  Martinus Hendrikus Antonius Leenders ,  Evelyn Wallis Pacitti ,  Thomas Poiesz ,  Frank Pieter Albert Van Den Berkmortel

IPC: G03F7/20

Abstract: A support apparatus configured to support an object, the support apparatus includes a support body including an object holder to hold an object; an opening in the support body adjacent to an edge of the object holder; a channel in fluid communication with the opening via each of a plurality of passageways in the support body; and a passageway liner mounted in at least one of the plurality of passageways, the passageway liner being thermally insulating to substantially thermally decouple the support body from fluid in the at least one of the plurality of passageways.