A POSITIONING SYSTEM, A LITHOGRAPHIC APPARATUS, AN ABSOLUTE POSITION DETERMINATION METHOD, AND A DEVICE MANUFACTURING METHOD

    公开(公告)号:US20230408933A1

    公开(公告)日:2023-12-21

    申请号:US18037641

    申请日:2021-10-25

    CPC classification number: G03F7/706845 G01B9/02007

    Abstract: The invention provides a positioning system to determine an absolute position of a moveable target relative to a reference, comprising an interferometer system with a first light source to emit light at a fixed frequency and a second light source to emit light at at least two different frequencies. The positioning system is configured to determine, based on movement of the target, a phase difference curve associated with a first frequency of the second light source and a phase difference curve associated with a second frequency of the second light source as a function of a phase difference associated with the fixed frequency of the first light source and to determine a cross-point to determine the absolute position of the moveable target. The invention also relates to a lithographic apparatus and corresponding method.

    METHOD FOR CALIBRATION OF AN OPTICAL MEASUREMENT SYSTEM AND OPTICAL MEASUREMENT SYSTEM

    公开(公告)号:US20230168077A1

    公开(公告)日:2023-06-01

    申请号:US17920751

    申请日:2021-03-22

    CPC classification number: G01B9/02072 G01B9/02059 G01B9/02007 G03F7/70516

    Abstract: The invention provides a method for calibration of an optical measurement system, which may be a heterodyne interferometer system, wherein a first optical axis and a second optical axis have a different optical path length, the method comprises: ∘measuring a first measurement value along the first optical axis using a first measurement beam, ∘measuring a second measurement value along the second optical axis using a second measurement beam, ∘changing a wavelength of the first measurement beam and the second measurement beam, ∘measuring a further first measurement value along the first optical axis using the first measurement beam with changed wavelength, measuring a further second measurement value along the second optical axis using the second measurement beam with changed wavelength, ∘determining a cyclic error of the optical measurement system on the basis of the measured values, and ∘storing a corrective value based on the cyclic error.

    INTERFEROMETER SYSTEM AND LITHOGRAPHIC APPARATUS

    公开(公告)号:US20230332880A1

    公开(公告)日:2023-10-19

    申请号:US18027851

    申请日:2021-08-20

    CPC classification number: G01B9/02028 G01B9/02091 G01B2290/45

    Abstract: Interferometer system including a first detector for receiving a first measurement beam travelling to a reference surface; a second detector for receiving a second measurement beam travelling to the target surface; a reference variable delay path and/or measurement variable delay path and a delay path controller for adapting a delay length. A reference spectral coherence pulse occurs at the first detector, at a reference coherence arrangement and a measurement spectral coherence pulse at the second detector at a measurement coherence arrangement. A control unit receives a reference coherence signal from the first detector, and a measurement coherence signal from the second detector, and determines a zero-position of the target surface based on the reference coherence signal and the measurement coherence signal, and based on the reference coherence arrangement and the measurement coherence arrangement and/or a delay path difference between the reference coherence arrangement and the measurement coherence arrangement.

    STAGE SYSTEM AND LITHOGRAPHIC APPARATUS

    公开(公告)号:US20220137517A1

    公开(公告)日:2022-05-05

    申请号:US17434309

    申请日:2020-01-30

    Abstract: The invention provides a stage system comprising a stage (ST) which is movable in respect of a reference structure. One of the stage and the reference structure comprises a reflective surface (REFS). An optical position sensor (IF1) is arranged at the other one of the stage and the reference structure and is configured to determine a position of the reflective surface relative to the optical position sensor. An optical shape sensor (IF2) is configured to determine a shape of the reflective surface. The stage system further comprises a position measurement controller configured to derive a stage position of the stage from the position of the reflective surface relative to the optical position sensor and from the shape of the reflective surface as determined by the optical shape sensor.

    COMPACT DUAL PASS INTERFEROMETER FOR A PLANE MIRROR INTERFEROMETER

    公开(公告)号:US20240011762A1

    公开(公告)日:2024-01-11

    申请号:US18023482

    申请日:2021-07-20

    CPC classification number: G01B9/02018 G02B3/0087 G02B26/001

    Abstract: A compact dual pass interferometer for a plane mirror interferometer configured to receive an input radiation beam from a light source. An optical component has a partially reflective surface arranged to reflect a first portion of the input radiation beam to follow a first optical path directed towards an output terminal and further arranged to transmit a second portion of the input radiation beam to follow a second optical path, directed towards a first location on a reflective target surface and back to the partially reflective surface, then to a second location on the reflective target surface and back to the partially reflective surface, whereupon the second optical path is directed through the partially reflective surface to be recombined with the first optical path to provide a recombined optical path configured to provide an output radiation beam. The output terminal configured to deliver the output radiation beam to a detector.

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