公开(公告)号：US20210223696A1

公开(公告)日：2021-07-22

申请号：US16334381

申请日：2017-08-23

申请人： ASML Netherlands B.V.

发明人： Satish ACHANTA ,  Wilhelmus Jacobus Johannes WELTERS ,  Abraham Alexander SOETHOUDT ,  Jelmer Mattheüs KAMMINGA ,  Christian LIEDECKE

IPC分类号： G03F7/16 ,  C23C16/458 ,  H01L21/67 ,  H01L21/687

摘要： A substrate, a substrate holder, a substrate coating apparatus, a method for coating the substrate and a method for removing the coating. A monomolecular layer is applied to the backside of the substrate or a clamp surface of the substrate holder. The friction force between the substrate backside and the substrate is small when the substrate does not experience full clamping force. After loading the substrate on the substrate holder full clamping force is exerted in order to fix the substrate. The clamping force causes local removal of the monomolecular layer, resulting in an increase of the friction force between the substrate and the substrate holder.

公开(公告)号：US20200183289A1

公开(公告)日：2020-06-11

申请号：US16690198

申请日：2019-11-21

申请人： ASML NETHERLANDS B.V.

发明人： Thomas POIESZ ,  Bert Dirk SCHOLTEN ,  Dirk Willem HARBERTS ,  Lucas Henricus Johannes STEVENS ,  Laura Maria FERNANDEZ DIAZ ,  Johannes Adrianus Cornelis Maria PIJNENBURG ,  Abraham Alexander SOETHOUDT ,  Wilhelmus Jacobus Johannes WELTERS ,  Jimmy Matheus Wilhelmus VAN DE WINKEL

IPC分类号： G03F7/20

摘要： A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.

公开(公告)号：US20200064183A1

公开(公告)日：2020-02-27

申请号：US16488259

申请日：2018-02-15

申请人： ASML NETHERLANDS B.V.

发明人： Joost André KLUGKIST ,  Vadim Yevgenyevich BANINE ,  Johan Franciscus Maria BECKERS ,  Madhusudhanan JAMBUNATHAN ,  Maxim Aleksandrovich NASALEVICH ,  Andrey NIKIPELOV ,  Roland Johannes Wilhelmus STAS ,  David Ferdinand VLES ,  Wilhelmus Jacobus Johannes WELTERS ,  Sandro WRICKE

IPC分类号： G01J1/42

摘要： A sensor mark including: a substrate having: a deep ultra violet (DUV) radiation absorbing layer including a first material which substantially absorbs DUV radiation; and a protecting layer including a second material, wherein: the DUV radiation absorbing layer has a through hole in it; the protecting layer is positioned, in plan, in the through hole and the protecting layer in the through hole has a patterned region having a plurality of through holes; and the second material is more noble than the first material.

公开(公告)号：US20160018744A1

公开(公告)日：2016-01-21

申请号：US14772721

申请日：2014-02-26

申请人： ASML NETHERLANDS B.V.

发明人： Raymond Wilhelmus Louis LAFARRE ,  Satish ACHANTA ,  Matteo FILIPPI ,  Yogesh KARADE ,  Antonius Johannes Maria NELLISSEN ,  Ronal VAN DER WILK ,  Hendrikus Christoffel Maria VAN DOREMALEN ,  Wilhelmus Jacobus Johannes WELTERS

IPC分类号： G03F7/20

CPC分类号： G03F7/70716 ,  G03F7/70708

摘要： A method of manufacturing an object holder for use in a lithographic apparatus, the object holder including one or more electrically functional components, the method including: using a composite structure including a carrier sheet different from a main body of the object holder and a layered structure including one or a plurality of layers and formed on the carrier sheet; connecting the composite structure to a surface of the main body such that the layered structure is between the carrier sheet and the surface of the main body; and removing the carrier sheet from the composite structure, leaving the layered structure connected to the main body.

摘要翻译： 一种制造用于光刻设备的物体保持器的方法，所述物体保持器包括一个或多个电功能部件，所述方法包括：使用包括与所述物体保持器的主体不同的载体片的复合结构和层状结构 包括一个或多个层并形成在载体片上; 将复合结构连接到主体的表面，使得层状结构位于载体片和主体的表面之间; 并从复合结构中移除载体片，使分层结构连接到主体。