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公开(公告)号：US06899989B2
公开(公告)日：2005-05-31
申请号：US09987916
申请日：2001-11-16
申请人： Aki Suzuki , Makoto Murata , Hiromichi Hara , Eiichi Kobayashi
发明人： Aki Suzuki , Makoto Murata , Hiromichi Hara , Eiichi Kobayashi
CPC分类号： G03F7/0392 , G03F7/0045 , Y10S430/106 , Y10S430/114 , Y10S430/115 , Y10S430/118 , Y10S430/122
摘要： A radiation-sensitive resin composition comprising (A) a photoacid generator such as 2,4,6-trimethylphenyldiphenylsulfonium 2,4-difluorobenzenesulfonate or 2,4,6-trimethylphenyldiphenylsulfonium 4-trifluoromethylbenzenesulfonate and (B) a resin having an acetal structure typified by a poly(p-hydroxystyrene) resin in which a part of hydrogen atoms of phenolic hydroxyl groups have been replaced by 1-ethoxyethyl groups, 1-ethoxyethyl groups and t-butoxycarbonyl groups, or 1-ethoxyethyl groups and t-butyl groups. The resin composition is sensitive to deep ultraviolet rays and charged particles such as electron beams, exhibits excellent resolution performance and pattern shape-forming capability, and suppresses a nano-edge roughness phenomenon to a minimal extent.
摘要翻译： 一种辐射敏感性树脂组合物，其包含（A）光酸产生剂如2,4,6-三甲基苯基二苯基锍2,4-二氟苯磺酸盐或2,4,6-三甲基苯基二苯基锍4-三氟甲基苯磺酸盐和（B）具有缩醛结构的树脂，以 一部分酚羟基的氢原子被1-乙氧基乙基，1-乙氧基乙基，叔丁氧基羰基或1-乙氧基乙基和叔丁基代替的聚（对 - 羟基苯乙烯）树脂。 树脂组合物对深紫外线和电子束等带电粒子敏感，显示出优异的分辨率性能和图案形状形成能力，并且在最小程度上抑制纳米边缘粗糙度现象。
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公开(公告)号：US07060414B2
公开(公告)日：2006-06-13
申请号：US11080400
申请日：2005-03-16
申请人： Aki Suzuki , Makoto Murata , Hiromichi Hara , Eiichi Kobayashi
发明人： Aki Suzuki , Makoto Murata , Hiromichi Hara , Eiichi Kobayashi
IPC分类号： G03F7/04
CPC分类号： G03F7/0392 , G03F7/0045 , Y10S430/106 , Y10S430/114 , Y10S430/115 , Y10S430/118 , Y10S430/122
摘要： A radiation-sensitive resin composition comprising (A) a photoacid generator such as 2,4,6-trimethylphenyldiphenylsulfonium 2,4-difluorobenzenesulfonate or 2,4,6-trimethylphenyldiphenylsulfonium 4-trifluoromethylbenzenesulfonate and (B) a resin having an acetal structure typified by a poly(p-hydroxystyrene) resin in which a part of hydrogen atoms of phenolic hydroxyl groups have been replaced by 1-ethoxyethyl groups, 1-ethoxyethyl groups and t-butoxycarbonyl groups, or 1-ethoxyethyl groups and t-butyl groups. The resin composition is sensitive to deep ultraviolet rays and charged particles such as electron beams, exhibits excellent resolution performance and pattern shape-forming capability, and suppresses a nano-edge roughness phenomenon to a minimal extent.
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公开(公告)号：US20050158657A1
公开(公告)日：2005-07-21
申请号：US11080400
申请日：2005-03-16
申请人： Aki Suzuki , Makoto Murata , Hiromichi Hara , Eiichi Kobayashi
发明人： Aki Suzuki , Makoto Murata , Hiromichi Hara , Eiichi Kobayashi
CPC分类号： G03F7/0392 , G03F7/0045 , Y10S430/106 , Y10S430/114 , Y10S430/115 , Y10S430/118 , Y10S430/122
摘要： A radiation-sensitive resin composition comprising (A) a photoacid generator such as 2,4,6-trimethylphenyldiphenylsulfonium 2,4-difluorobenzenesulfonate or 2,4,6-trimethylphenyldiphenylsulfonium 4-trifluoromethylbenzenesulfonate and (B) a resin having an acetal structure typified by a poly(p-hydroxystyrene) resin in which a part of hydrogen atoms of phenolic hydroxyl groups have been replaced by 1-ethoxyethyl groups, 1-ethoxyethyl groups and t-butoxycarbonyl groups, or 1-ethoxyethyl groups and t-butyl groups. The resin composition is sensitive to deep ultraviolet rays and charged particles such as electron beams, exhibits excellent resolution performance and pattern shape-forming capability, and suppresses a nano-edge roughness phenomenon to a minimal extent.
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公开(公告)号：US5629135A
公开(公告)日：1997-05-13
申请号：US590677
申请日：1996-01-29
申请人： Eiichi Kobayashi , Makoto Murata , Toshiyuki Ota , Akira Tsuji
发明人： Eiichi Kobayashi , Makoto Murata , Toshiyuki Ota , Akira Tsuji
CPC分类号： G03F7/039 , G03F7/0048 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： Positive-tone and negative-tone chemically amplified resist compositions comprising: (a-1) a blocked resin, (a-2) a combination of an alkali-soluble resin and a dissolution controlling agents, or (a-3) a combination of an alkali-soluble resin and a crosslinking agent, (b) a photoacid generator, and (c) specific kinds of solvents. The both positive-tone and negative-tone resist compositions exhibits superior sensitivity, high resolution capability, and excellent storage stability, and can be excellently applied especially to large sized substrates by spincoating for producing excellently shaped patterns by irradiation. The compositions can be used with advantage as a chemically amplified resist for the manufacture of semiconductor devices or integrated circuits (ICs).
摘要翻译： 正色调和负色度化学放大抗蚀剂组合物，其包含：（a-1）封端树脂，（a-2）碱溶性树脂和溶解控制剂的组合，或（a-3） 碱溶性树脂和交联剂，（b）光致酸发生剂，和（c）特定种类的溶剂。 正色调和负色调抗蚀剂组合物显示出优异的灵敏度，高分辨能力和优异的储存稳定性，并且可以通过旋涂来优异地应用于大尺寸基材，以通过照射制造出优异的图案。 组合物可以有利地用作制造半导体器件或集成电路（IC）的化学放大抗蚀剂。
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公开(公告)号：US5580695A
公开(公告)日：1996-12-03
申请号：US339289
申请日：1994-11-10
申请人： Makoto Murata , Takao Miura , Yoshiji Yumoto , Toshiyuki Ota , Eiichi Kobayashi
发明人： Makoto Murata , Takao Miura , Yoshiji Yumoto , Toshiyuki Ota , Eiichi Kobayashi
CPC分类号： G03F7/0045 , Y10S430/118 , Y10S430/121
摘要： A chemically amplified resist comprising an alkali-soluble resin or a resin having at least one acid-dissociable group which is alkali-insoluble or -sprairingly soluble but becomes alkali-soluble upon dissociation of said acid dissociable group due to an acid; a radiation-sensitive, acid-generating agent; and an optional component in which resist, the radiation-sensitive, acid-generating agent generates an acid upon irradiation with a radiation in the irradiated portion and the solubility of the resin component and optional component in a developing solution is varied in the irradiated portion by a chemical reaction caused by the catalytic action of the acid, whereby a pattern is formed, characterized in that a compound having a nitrogen-containing basic group is contained in the resist. Said resist is superior in developability, pattern form, resolution, focus tolerance and yield of residual film thickness, has good process stability, and can be suitably used even in irradiation with, in particular, a radiation having a wavelength equal to or smaller than far ultraviolet rays, for example, an excimer laser or the like.
摘要翻译： 一种化学放大抗蚀剂，其包含碱溶性树脂或具有至少一种酸解离基团的树脂，所述酸解离基团是由于酸而导致的所述酸解离基团的解离时为碱不溶性或易溶性但是变得碱溶性的; 辐射敏感的酸产生剂; 以及任选的组分，其中抗辐射敏感的酸产生剂在照射部分中的辐射照射时产生酸，并且树脂组分和任选组分在显影溶液中的溶解度在照射部分中变化 由酸的催化作用引起的化学反应，由此形成图案，其特征在于在抗蚀剂中含有具有含氮碱性基团的化合物。 所述抗蚀剂的显影性，图案形式，分辨率，聚焦容限和残留膜厚度的产率优异，具有良好的工艺稳定性，并且可以适用于特别是具有等于或小于远的波长的辐射 紫外线，例如准分子激光等。
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公开(公告)号：US6114086A
公开(公告)日：2000-09-05
申请号：US288848
申请日：1999-04-09
申请人： Eiichi Kobayashi , Makoto Murata , Toshiyuki Ota , Akira Tsuji
发明人： Eiichi Kobayashi , Makoto Murata , Toshiyuki Ota , Akira Tsuji
CPC分类号： G03F7/039 , G03F7/0048 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： Positive-tone and negative-tone chemically amplified resist compositions comprising: (a-1) a blocked resin, (a-2) a combination of an alkali-soluble resin and a dissolution controlling agents, or (a-3) a combination of an alkali-soluble resin and a crosslinking agent, (b) a photoacid generator, and (c) specific kinds of solvents. The both positive-tone and negative-tone resist compositions exhibits superior sensitivity, high resolution capability, and excellent storage stability, and can be excellently applied especially to large sized substrates by spincoating for producing excellently shaped patterns by irradiation. The compositions can be used with advantage as a chemically amplified resist for the manufacture of semiconductor devices or integrated circuits (ICs).
摘要翻译： 正色调和负色度化学放大抗蚀剂组合物，其包含：（a-1）封端树脂，（a-2）碱溶性树脂和溶解控制剂的组合，或（a-3） 碱溶性树脂和交联剂，（b）光致酸发生剂，和（c）特定种类的溶剂。 正色调和负色调抗蚀剂组合物显示出优异的灵敏度，高分辨能力和优异的储存稳定性，并且可以通过旋涂来优异地应用于大尺寸基材，以通过照射制造出优异的图案。 组合物可以有利地用作制造半导体器件或集成电路（IC）的化学放大抗蚀剂。
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公开(公告)号：US5916729A
公开(公告)日：1999-06-29
申请号：US799566
申请日：1997-02-12
申请人： Eiichi Kobayashi , Makoto Murata , Toshiyuki Ota , Akira Tsuji
发明人： Eiichi Kobayashi , Makoto Murata , Toshiyuki Ota , Akira Tsuji
CPC分类号： G03F7/039 , G03F7/0048 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： Positive-tone and negative-tone chemically amplified resist compositions comprising: (a-1) a blocked resin, (a-2) a combination of an alkali-soluble resin and a dissolution controlling agents, or (a-3) a combination of an alkali-soluble resin and a crosslinking agent, (b) a photoacid generator, and (c) specific kinds of solvents. The both positive-tone and negative-tone resist compositions exhibits superior sensitivity, high resolution capability, and excellent storage stability, and can be excellently applied especially to large sized substrates by spincoating for producing excellently shaped patterns by irradiation. The compositions can be used with advantage as a chemically amplified resist for the manufacture of semiconductor devices or integrated circuits (ICs).
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公开(公告)号：US09172135B2
公开(公告)日：2015-10-27
申请号：US13415567
申请日：2012-03-08
CPC分类号： H01Q1/38 , H01Q9/0407 , H01Q19/005 , H01Q19/28 , H01Q21/08
摘要： This disclosure provides a horizontal radiation antenna including a grounded conductor plate on the back surface of a multilayer substrate, a radiation element to which a microstrip line is connected on a front surface of the multilayer substrate, and a passive element on an end portion side of the multilayer substrate compared with the radiation element. An intermediate grounded conductor plate is provided within the multilayer substrate between insulation layers and faces the microstrip line. The intermediate grounded conductor plate defines a notch portion whose end portion side is open. The intermediate grounded conductor surrounds the radiation element and the passive element in the notch portion. The intermediate grounded conductor is electrically connected to the grounded conductor plate.
摘要翻译： 本公开内容提供了一种水平辐射天线，包括在多层基板的背面上的接地导体板，在多层基板的前表面上连接有微带线的辐射元件和在多层基板的前表面上的无源元件 多层基板与辐射元件相比较。 中间接地导体板设置在绝缘层之间的多层基板内并面向微带线。 中间接地导体板限定其端部侧开口的切口部分。 中间接地导体围绕辐射元件和凹口部分中的无源元件。 中间接地导体与接地导体板电连接。
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9.发明授权公开(公告)号：US08778516B2
公开(公告)日：2014-07-15
申请号：US13402249
申请日：2012-02-22
摘要： A production method of a base plate for a disk drive made by aluminum die casting which can reduce scattering of particles and minimizes particle contamination is provided. The production method of a base plate for a disk drive includes a forming step for forming a base member by aluminum die casting, a coating step for coating the base member with a resin film, a machining step for removing a part of the resin film and a surface layer of the base member in order to expose the aluminum surface, a pretreatment step for immersing the base member with the exposed aluminum surface in a pretreatment solution containing no fluoride, and a metal film forming step for coating the exposed aluminum surface with a metal film.
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公开(公告)号：US20100164823A1
公开(公告)日：2010-07-01
申请号：US12723334
申请日：2010-03-12
申请人： Hiroyuki Kubo , Hiromitsu Ito , Kuniaki Yosui , Eiichi Kobayashi
发明人： Hiroyuki Kubo , Hiromitsu Ito , Kuniaki Yosui , Eiichi Kobayashi
IPC分类号： H01Q7/08
CPC分类号： H01Q7/08
摘要： A portable electronic device includes a circuit board and an antenna coil installed on the circuit board. The antenna coil includes a magnetic core and a coil wound at either side of an unwound portion. The winding direction of the coil is changed at either side of the unwound portion. When the length of the magnetic core is defined as X and the distance between two intersecting points at which a virtual line formed by projecting the central line of the magnetic core onto the circuit board intersects the outer periphery of the circuit board is defined as Y, the antenna coil satisfies Y≧X≧0.8Y.
摘要翻译： 便携式电子设备包括安装在电路板上的电路板和天线线圈。 天线线圈包括磁芯和缠绕在退绕部分两侧的线圈。 线圈的卷绕方向在解卷部分的任一侧改变。 当磁芯的长度被定义为X，并且通过将磁芯的中心线投影到电路板上而形成的虚拟线与电路板的外周相交的两个相交点之间的距离被定义为Y， 天线线圈满足Y≥X≥0.8Y。
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