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公开(公告)号：US4854691A
公开(公告)日：1989-08-08
申请号：US199716
申请日：1988-05-27
CPC分类号： A61B3/1225 , A61B3/1233
摘要： A laser beam scanning type eye fundus camera has a laser beam generator for generating a laser beam; an illuminating system for illuminating the fundus of an eye to be tested by scanning the laser beam generated by the laser beam generator on the eye fundus; a first and a second light receiving portions for receiving a reflecting light of the laser beam reflected by the eye fundus; a first light receiving system for guiding the reflecting light of the laser beam reflected by the eye fundus to the first light receiving portion; a second light receiving system for guiding a fluorescence excited at the eye fundus by the laser beam; and an electronic circuit for forming an eye fundus image on a monitor TV according to an output signal coming from the first and second light receiving portions.
摘要翻译： 激光束扫描型眼底照相机具有用于产生激光束的激光束发生器; 照明系统，用于通过将由激光束发生器产生的激光束扫描在眼底上来照射待测眼睛的眼底; 用于接收由眼底反射的激光束的反射光的第一和第二光接收部分; 第一光接收系统，用于将由眼底反射的激光束的反射光引导到第一光接收部分; 用于引导通过激光束在眼底激发的荧光的第二光接收系统; 以及电子电路，用于根据来自第一和第二光接收部分的输出信号在监视器TV上形成眼底图像。
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公开(公告)号：US4968130A
公开(公告)日：1990-11-06
申请号：US262640
申请日：1988-10-26
CPC分类号： A61B3/1225 , A61F9/008 , A61F9/00821 , A61B2017/00199 , A61B2018/2025 , A61B2018/207 , A61F2009/00863 , A61F2009/00897
摘要： A laser beam scanning type ophthalmological instrument has a first laser beam light source for emitting a first laser beam; a second laser beam light source for emitting a second laser beam of a different wavelength from that of the first laser beam; and a light receiving element for receiving a laser beam reflected by an eye fundus, and in which the eye fundus is scanned by the first and second laser beams in order to observe the eye fundus or in order that a view field, etc. can be inspected. The laser beam scanning type ophthalmological instrument is characterized in that the first and second laser beams emitted by the first and second laser beam light sources can independently be adjusted in light quantity.
摘要翻译： 激光束扫描型眼科仪具有用于发射第一激光束的第一激光束光源; 第二激光束光源，用于发射与第一激光束不同波长的第二激光束; 以及光接收元件，用于接收由眼底反射的激光束，并且其中眼底被第一和第二激光束扫描以观察眼底，或者为了使视野等能够 检查。 激光束扫描型眼科仪器的特征在于，由第一和第二激光束光源发射的第一和第二激光束可以独立地调节光量。
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公开(公告)号：US5088811A
公开(公告)日：1992-02-18
申请号：US682405
申请日：1991-04-08
申请人： Masayuki Hideshima , Shinji Wada , Akihiko Sekine
发明人： Masayuki Hideshima , Shinji Wada , Akihiko Sekine
CPC分类号： A61B3/1025
摘要： A laser beam scanning type eye fundus observing device has a scanning optical system for scanning and illuminating an eye fundus with a laser beam spot and an observation image of the eye fundus is built up in accordance with a reflecting light of the scanning laser beam from various portions of the eye fundus. The laser beam scanning type eye fundus observing device further has an output level regulator for automatically regulating an output level of an image signal in accordance with a light quantity information of the various portions of the eye fundus.
摘要翻译： 激光束扫描型眼底观察装置具有扫描光学系统，用于利用激光束点扫描和照射眼底，并且根据来自各种各样的扫描激光束的反射光来构建眼底的观察图像 部分眼底。 激光束扫描型眼底观察装置还具有输出电平调节器，用于根据眼底各部分的光量信息自动调节图像信号的输出电平。
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公开(公告)号：US20050213084A1
公开(公告)日：2005-09-29
申请号：US11083323
申请日：2005-03-18
IPC分类号： G01N21/88 , G01N21/956 , G03F1/84 , H01L21/027
CPC分类号： G01N21/956
摘要： A mask-defect inspection apparatus including a plurality of illumination optical systems (2) for illuminating different areas (14a, 14b) on a mask (4) on which a pattern (6) is formed, an objective lens (OL) disposed to face the mask, and at least a pair of detection optical systems (15, 16) each having a detection sensor (17, 19) to form an image of the pattern and for receiving illumination light from each of the different areas through the objective lens, each of the detection optical systems having a mechanism (13a, 13b) for adjusting an angle of an aperture.
摘要翻译： 一种掩模缺陷检查装置，包括：多个照明光学系统（2），用于照射在其上形成有图案（6）的掩模（4）上的不同区域（14a，14b），物镜（OL） 以及至少一对具有检测传感器（17,19）的检测光学系统（15,16），以形成图案的图像，并且用于通过该目标接收来自每个不同区域的照明光 每个检测光学系统具有用于调整光圈角度的机构（13a，13b）。
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5.发明授权Apparatus for measuring an intraocular length between anterior and posterior portions of an eye 失效用于测量眼睛的前部和后部之间的眼内长度的装置
公开(公告)号：US5347328A
公开(公告)日：1994-09-13
申请号：US872266
申请日：1992-04-21
申请人： Akihiko Sekine , Funio Ohtomo
发明人： Akihiko Sekine , Funio Ohtomo
CPC分类号： A61B3/1005 , G01B9/02004 , G01B9/0207 , G01B2290/60
摘要： An apparatus for measuring an eye axial length includes a measuring optical system for projecting laser beam onto an eye and making interference between light reflected by the cornea of the eye and light reflected by the retina of the eye. The measuring optical system includes beam splitting means for splitting the beams of light reflected by the cornea and the retina each into two each for different optical systems, a cornea reflected light receiving optical system for receiving the light reflected by the cornea, a retina reflected light receiving optical system for receiving the light reflected by the retina, and an interference light receiving optical system for reuniting each reflected light at the substantially identical wave front and receiving interference light.
摘要翻译： 用于测量眼睛轴向长度的装置包括用于将激光束投射到眼睛上并在由眼睛的角膜反射的光与由眼睛的视网膜反射的光之间的干涉的测量光学系统。 测量光学系统包括用于将由角膜和视网膜反射的光束分别分成用于不同光学系统的光束的光束分离装置，用于接收由角膜反射的光的角膜反射光接收光学系统，视网膜反射光 用于接收由视网膜反射的光的接收光学系统和用于使基本相同的波前的每个反射光重新接收并接收干涉光的干涉光接收光学系统。
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公开(公告)号：US07551273B2
公开(公告)日：2009-06-23
申请号：US12081852
申请日：2008-04-22
IPC分类号： G01N21/00
CPC分类号： G03F1/84 , G01N21/8806 , G01N21/9501 , G01N21/95607 , G01N2021/95676
摘要： The mask defect inspection apparatus including an illumination optical system for illuminating a mask on which a pattern is formed; an objective lens facing the mask; at least a pair of detection optical systems having a detection sensor for obtaining an image of the pattern, respectively, and which receive illumination light from illumination areas different from each other through the objective lens, respectively; and focusing changing means for changing a position of focusing between sites of the pattern in a film-thickness direction of the mask and the pattern images obtained by the detection sensors, such that the pattern images obtained by the detection sensors are changed corresponding to the film-thickness direction of the mask.
摘要翻译： 掩模缺陷检查装置包括用于照亮其上形成有图案的掩模的照明光学系统; 面对面罩的物镜; 至少一对检测光学系统，具有分别用于获得图案的图像的检测传感器，并分别通过物镜从彼此不同的照明区域接收照明光; 以及聚焦改变装置，用于改变在掩模的膜厚度方向上的图案的位置之间的聚焦位置和由检测传感器获得的图案图像，使得由检测传感器获得的图案图像相应地变化 面膜方向。
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公开(公告)号：US07522276B2
公开(公告)日：2009-04-21
申请号：US12033599
申请日：2008-02-19
申请人： Toru Tojo , Toshiyuki Watanabe , Ikunao Isomura , Akihiko Sekine
发明人： Toru Tojo , Toshiyuki Watanabe , Ikunao Isomura , Akihiko Sekine
IPC分类号： G01N21/00
CPC分类号： G01N21/956
摘要： A pattern inspection apparatus comprises an illumination optics applying a first inspection light on a predetermined wavelength to a surface opposite to a pattern formed surface of the substrate, and a second inspection light whose wavelength is equal to the wavelength of the first inspection light to the pattern formed surface, a detector independently detecting a transmitted light from the substrate by irradiation of the first inspection light and a reflected light from the substrate by irradiation of the second inspection light, and a space separation mechanism provided in the vicinity of an optical focal plane toward the pattern formed surface, and spatially separates an irradiation area of the first and second inspection lights such that the transmitted and reflected lights from the substrate are imaged in two discrete areas separated on the optical focal plane.
摘要翻译： 图案检查装置包括将预定波长的第一检查光施加到与基板的图案形成表面相对的表面的照明光学器件以及其波长等于第一检查光的波长与图案的第二检查光 形成表面，检测器，通过照射第一检查光和通过照射第二检查光的来自基板的反射光独立地检测来自基板的透射光;以及空间分离机构，设置在光学焦平面附近，朝向 图案形成表面，并且在空间上分离第一和第二检查光的照射区域，使得来自基板的透射和反射光成像在在光学焦平面上分离的两个离散区域中。
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公开(公告)号：US07348585B2
公开(公告)日：2008-03-25
申请号：US11135478
申请日：2005-05-24
申请人： Kazuhiro Miyakawa , Yoichiro Iwa , Akihiko Sekine
发明人： Kazuhiro Miyakawa , Yoichiro Iwa , Akihiko Sekine
IPC分类号： G01N21/86
CPC分类号： G01B11/306 , G01N21/9501
摘要： A surface inspection apparatus of the present invention includes an irradiation optical unit having a multibeam irradiation optical unit for converging and irradiating multiple beams upon a surface of an object to be inspected; a detector which has a light-condensing optical unit including light-sensitive elements for respectively receiving the multiple beams reflected by the surface of the inspecting object; and a processor which obtains a plane-coordinate-position of a position to be irradiated and detected at a reference height position based on a difference between light-receiving reference positions of each of the light-sensitive elements when assumed that the irradiated and detected position of the inspecting object is at the reference height position and actual light-receiving positions of each of the light-sensitive elements, according to a result of analysis and process of surface state information.
摘要翻译： 本发明的表面检查装置包括具有多光束照射光学单元的照射光学单元，用于会聚并照射被检测物体的表面上的多个光束; 具有聚光光学单元的检测器，所述聚光光学单元包括用于分别接收由检查对象的表面反射的多个光束的光敏元件; 以及处理器，其基于每个感光元件的光接收基准位置之间的差异，当假设被照射和检测位置时，获得要在基准高度位置处被照射和检测的位置的平面坐标位置 根据分析结果和表面状态信息的处理，检查对象的基准高度位置和每个感光元件的实际光接收位置。
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公开(公告)号：US08724870B2
公开(公告)日：2014-05-13
申请号：US13387007
申请日：2010-07-14
申请人： Akihiko Sekine , Nobusuke Obata , Katsuhiro Yamada
发明人： Akihiko Sekine , Nobusuke Obata , Katsuhiro Yamada
CPC分类号： A61B3/0025 , A61B3/0091 , A61B3/102 , A61B5/0066 , A61B5/6821 , G01B9/0203 , G01B9/02083 , G01B9/02091 , G01N21/4795
摘要： An ophthalmic observation apparatus 1 performs an OCT measurement of a fundus Ef to form an OCT image, performs an analytical processing on this OCT image, and outputs examination-results information including the analysis results. The ophthalmic observation apparatus 1 is capable of selectively executing a plurality of operation modes. The ophthalmic observation apparatus 1 preliminarily stores operation mode information 214, in which various operational details are associated with each operation mode. When one operation mode is designated, the ophthalmic observation apparatus 1 refers to the operation mode information 214 to identify the operational details associated with this operation mode, and controls an optical system, an image forming part 220, a three-dimensional image forming part 231, an analytic processor 232, a display 240, and/or a printer 300, etc. based on the identified operational details.
摘要翻译： 眼科观察装置1进行眼底Ef的OCT测量以形成OCT图像，对该OCT图像进行分析处理，并输出包含分析结果的检查结果信息。 眼科观察装置1能够选择性地执行多种操作模式。 眼科观察装置1预先存储各种操作细节与每个操作模式相关联的操作模式信息214。 当指定了一个操作模式时，眼科观察装置1参考操作模式信息214来识别与该操作模式相关的操作细节，并且控制光学系统，图像形成部220，三维图像形成部231 ，分析处理器232，显示器240和/或打印机300等。
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10.发明授权
公开(公告)号：US5812259A
公开(公告)日：1998-09-22
申请号：US748898
申请日：1996-11-15
申请人： Hisakazu Yoshino , Akihiko Sekine , Toru Tojo , Mitsuo Tabata
发明人： Hisakazu Yoshino , Akihiko Sekine , Toru Tojo , Mitsuo Tabata
IPC分类号： G01N21/956 , G03F1/26 , G03F1/32 , G03F1/84 , G01N2/00
CPC分类号： G03F1/26 , G01N21/956 , G03F1/84 , G03F1/32
摘要： A photomask defect inspection method is provided by which defects of pin holes with the diameter equal to or less than 0.35 .mu.m can be detected with certainty. According to the inspection method, a pattern whose image is projected onto an imaging position by the use of illumination light (P1) for exposure consists of light transmitting portions (41) formed on a glass base (2) and light intercepting portions (42) which transmit part of the illumination light (P1) in such a way that a phase of the part of the illumination light (P1) passing through the light intercepting portions (42) is delayed with respect to a phase of the illumination light (P1) passing through the light transmitting portions (41). Slight defects in the photomask pattern are detected on the basis of a signal obtained by illuminating the pattern with inspection light having an inspection wavelength in which the transmittance (T) of the light intercepting portions (42) is defined in the following formula on the basis of a signal detection limit (Thr). When the signal detection limit (Thr) of an inspection circuit is calculated on the supposition that a signal level of the inspection light passing through the light transmitting portions (41) is equal to 1, the relational expression is T.gtoreq.(Thr-0.01).sup.1/1,8.
摘要翻译： 提供一种光掩模缺陷检查方法，可以确定地检测直径等于或小于0.35μm的销孔的缺陷。 根据检查方法，通过使用用于曝光的照明光（P1）将图像投影到成像位置的图案由形成在玻璃基座（2）和遮光部分（42）上的透光部分（41）组成， 其以照明光（P1）的相位延迟照明光（P1）的通过遮光部（42）的一部分的相位的方式透射部分照明光（P1） 穿过透光部分（41）。 基于通过用具有检测波长的检查光照射图案获得的信号来检测光掩模图案中的轻微缺陷，其中遮光部分（42）的透射率（T）在下列公式中被定义： 的信号检测限（Thr）。 当考虑通过透光部（41）的检查光的信号电平等于1来计算检查电路的信号检测限（Thr）时，关系式为T> / =（Thr- 0.01）1 / 1.8。
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