公开(公告)号：US4130704A

公开(公告)日：1978-12-19

申请号：US784512

申请日：1977-04-04

申请人： Akihiko Shimizu ,  Atsushi Kita

发明人： Akihiko Shimizu ,  Atsushi Kita

IPC分类号： C08F2/28 ,  C08F36/18 ,  C08F136/18

CPC分类号： C08F36/18

摘要： A sulfur modified polychloroprene is produced in a process which comprises polymerizing chloroprene or a mixture of chloroprene and a comonomer in a neutral or acidic aqueous emulsion by using a cationic emulsifier in the presence of sulfur and a peroxide initiator, and then performing a peptization of the resulting sulfur modified polychloroprene latex by addition thereto of an alkaline aqueous solution in amounts sufficient to reduce the pH of the latex to alkaline conditions.

摘要翻译： 硫改性聚氯丁二烯的制造方法包括在硫酸和过氧化物引发剂的存在下，通过使用阳离子乳化剂在中性或酸性水性乳液中聚合氯丁二烯或氯丁二烯与共聚单体的混合物，然后进行胶溶 通过加入碱性水溶液得到的硫改性聚氯丁二烯胶乳的量足以将胶乳的pH降低至碱性条件。

公开(公告)号：US4076927A

公开(公告)日：1978-02-28

申请号：US601997

申请日：1975-08-05

申请人： Akihiko Shimizu ,  Atsushi Kita

发明人： Akihiko Shimizu ,  Atsushi Kita

IPC分类号： C08F2/00 ,  C08F2/22 ,  C08F6/00 ,  C08F36/00 ,  C08F36/18

CPC分类号： C08F36/18

摘要： A sulfur modified polychloroprene is produced in a process which comprises polymerizing chloroprene or a mixture of chloroprene and a comonomer in a neutral or acidic aqueous emulsion by using a cationic emulsifier in the presence of sulfur and a peroxide initiator, and then performing a peptization of the resulting sulfur modified polychloroprene latex by addition thereto of an alkaline aqueous solution in amounts sufficient to reduce the pH of the latex to alkaline conditions.

摘要翻译： 硫改性聚氯丁二烯的制造方法包括在硫酸和过氧化物引发剂的存在下，通过使用阳离子乳化剂在中性或酸性水性乳液中聚合氯丁二烯或氯丁二烯与共聚单体的混合物，然后进行胶溶 通过加入碱性水溶液得到的硫改性聚氯丁二烯胶乳的量足以将胶乳的pH降低至碱性条件。

公开(公告)号：US20120285382A1

公开(公告)日：2012-11-15

申请号：US13445037

申请日：2012-04-12

申请人： Akihiko Shimizu ,  Fumihiko Kimura ,  Takeshi Masuda

发明人： Akihiko Shimizu ,  Fumihiko Kimura ,  Takeshi Masuda

IPC分类号： C23C16/458

CPC分类号： C23C16/4584 ,  C30B25/12 ,  H01L21/6875 ,  H01L21/68785

摘要： A susceptor support shaft for an epitaxial growth apparatus capable of forming a high quality epitaxial film by suppressing in-plane resistance variation of the epitaxial film due to deflection of a susceptor, wherein the susceptor support shaft supports a susceptor at an underneath portion of the susceptor in an epitaxial growth apparatus. The susceptor support shaft includes a support column located substantially coaxial with a center of the susceptor; a plurality of arms extending radially from the support column to positions under a peripheral portion of the susceptor; an arm connecting member connecting tips of the arms next to each other; and support pins extending from the arm connecting member, thereby supporting the susceptor.

摘要翻译： 一种用于外延生长装置的基座支撑轴，其能够通过抑制由于基座的挠曲而导致的外延膜的面内电阻变化而形成高质量的外延膜，其中，基座支撑轴支撑基座的下部的基座 在外延生长装置中。 基座支撑轴包括与基座的中心大致同轴的支撑柱; 从所述支撑柱径向延伸到所述基座的周边部分下方的多个臂; 臂连接构件，其彼此相邻地连接臂的尖端; 以及从臂连接构件延伸的支撑销，从而支撑基座。

公开(公告)号：US20070104067A1

公开(公告)日：2007-05-10

申请号：US11643690

申请日：2006-12-22

申请人： Yuichi Kadokawa ,  Akihiko Shimizu

发明人： Yuichi Kadokawa ,  Akihiko Shimizu

IPC分类号： G11B20/14 ,  G11B20/12

CPC分类号： G11B20/10037 ,  G11B7/0045 ,  G11B7/005 ,  G11B7/24088 ,  G11B11/10502 ,  G11B20/10009 ,  G11B20/1496

摘要： A data recording device comprises a block division unit dividing a sequence of user data blocks into first blocks and second blocks, a plurality of multi-level data generating units generating multi-level data blocks from the first blocks and the second block, a group data storage unit storing first and second groups of code data corresponding to one user data block, a plurality of averaging units each calculating an average of DC levels based on the multi-level data of one of the blocks, a level comparison unit comparing each of the DC level averages with a predetermined value; a revision data generating unit generating a revision data using a result of the comparison, a data selection unit selecting one of the first and second groups of code data, and an output storage unit storing the first blocks, the second blocks generated using the selected code data, and the revision data.

公开(公告)号：US07190653B2

公开(公告)日：2007-03-13

申请号：US10682523

申请日：2003-10-10

申请人： Akihiko Shimizu

发明人： Akihiko Shimizu

IPC分类号： G11B20/10

CPC分类号： G11B20/10037 ,  G11B7/0045 ,  G11B7/005 ,  G11B7/24088 ,  G11B11/10502 ,  G11B20/10009 ,  G11B20/1496

摘要： A data recording device comprises a block division unit dividing a sequence of user data blocks into first blocks and second blocks, a plurality of multi-level data generating units generating multi-level data blocks from the first blocks and the second block, a group data storage unit storing first and second groups of code data corresponding to one user data block, a plurality of averaging units each calculating an average of DC levels based on the multi-level data of one of the blocks, a level comparison unit comparing each of the DC level averages with a predetermined value; a revision data generating unit generating a revision data using a result of the comparison, a data selection unit selecting one of the first and second groups of code data, and an output storage unit storing the first blocks, the second blocks generated using the selected code data, and the revision data.

摘要翻译： 数据记录装置包括将用户数据块序列划分为第一块和第二块的块分割单元，从第一块和第二块生成多级数据块的多个多级数据生成单元，组数据 存储单元，存储对应于一个用户数据块的第一组和第二组代码数据;多个平均单元，其基于所述块中的一个的多级数据来计算DC级的平均值;级别比较单元， 直流电平平均值为预定值; 修正数据生成单元，使用比较结果生成修正数据;数据选择单元，选择第一组和第二组代码数据;以及存储第一块的输出存储单元，使用所选择的代码生成的第二块 数据和修订数据。

公开(公告)号：US6127100A

公开(公告)日：2000-10-03

申请号：US288101

申请日：1999-04-08

申请人： Akihiko Shimizu

发明人： Akihiko Shimizu

IPC分类号： G03F7/00 ,  G11B7/26

CPC分类号： G11B7/261 ,  G03F7/0017 ,  Y10S430/146

摘要： The invention relates to a method of manufacturing a stamper with a uniform groove having a width smaller that the beam diameter of the exposure light spot for use with the optical information recording medium. In the method of manufacturing the stamper for exposing and developing the photoresist layer on the glass base plate, a water-soluble resin layer having a film thickness equal to the depth of the groove formed on the surface of the stamper is provided between the glass base plate (master plate) and the photoresist layer. A micro-pattern is formed on the photoresist layer by way of exposing the master plate. The photoresist layer is used as a mask. A micro-pattern is formed on the lower layer (water-soluble resin layer), by etching the water-soluble resin layer. Thereafter, the photoresist layer is removed. In this way, the glass master plate has a micro-pattern formed thereon.

摘要翻译： 本发明涉及一种制造具有均匀凹槽的压模的方法，其宽度小于用于光学信息记录介质的曝光光斑的光束直径。 在制造用于在玻璃基板上曝光和显影光致抗蚀剂层的压模的方法中，在玻璃基底之间提供具有与形成在压模表面上的凹槽的深度相等的膜厚度的水溶性树脂层 板（主板）和光刻胶层。 通过暴露主板在光致抗蚀剂层上形成微图案。 光致抗蚀剂层用作掩模。 通过蚀刻水溶性树脂层，在下层（水溶性树脂层）上形成微图形。 此后，除去光致抗蚀剂层。 以这种方式，玻璃母版具有形成在其上的微图案。

公开(公告)号：US4603391A

公开(公告)日：1986-07-29

申请号：US545147

申请日：1983-10-25

申请人： Kiyoshi Inoue ,  Akihiko Shimizu

发明人： Kiyoshi Inoue ,  Akihiko Shimizu

IPC分类号： B23H7/02 ,  B23H1/02 ,  B23H7/04 ,  B23H7/06 ,  G05B19/4063 ,  G05B19/416

CPC分类号： G05B19/4063 ,  B23H7/065 ,  G05B19/4163 ,  G05B2219/42268

摘要： An NC-EDM machine is safeguarded against feed errors arising from both mechanical and erosive-machining effects. The disclosed safety arrangement includes two detecting circuit units. The first unit is arranged to respond to NC-furnished driving command signals for producing a first detection signal representative of a commanded relative displacement to be effected between the tool electrode and the workpiece along a programmed machining path in a given time period. The second detecting unit is arranged to respond to effective electrical discharges caused in the EDM gap to produce a second detection signal representative of an actual relative displacement effected between the tool electrode and the workpiece along the path in the given time period. A comparator is connected to the two detecting units for comparing the first and second detection signals to produce an output signal indicative of a deviation of the actual advancement from the commanded advance.

摘要翻译： NC-EDM机器可以防止机械和腐蚀加工效应引起的进给错误。 所公开的安全装置包括两个检测电路单元。 第一单元被布置为响应NC提供的驱动指令信号，以产生表示在给定时间段内沿着编程的加工路径在工具电极和工件之间进行的指令的相对位移的第一检测信号。 第二检测单元被布置成响应于在EDM间隙中引起的有效放电，以产生表示在给定时间段内沿着路径在工具电极和工件之间实现的实际相对位移的第二检测信号。 比较器连接到两个检测单元，用于比较第一和第二检测信号，以产生指示实际进位与指令提前的偏差的输出信号。

公开(公告)号：US4333000A

公开(公告)日：1982-06-01

申请号：US175009

申请日：1980-08-04

申请人： Akihiko Shimizu

发明人： Akihiko Shimizu

IPC分类号： B23H7/02 ,  B21C25/10 ,  B23H9/12 ,  B23P1/02

CPC分类号： B23H9/12

摘要： An apparatus for making a hollow extrusion die set consisting of male and female die member with their respective shaped male and female bearing surfaces spaced apart and in a predetermined mating relationship from solid male and hollow female die blanks (6,11), respectively, is provided comprising: a wire-cut EDM electrode head assembly (1) having a plurality of wire guide members (1c, 1d) for spanning and axially transporting a continuous wire electrode (3) in a fixed U form path including a predetermined stretch (3a) of the axially transported wire electrode (3) constituting an axially moving EDM wire-cutting edge for the male and female die blanks (6, 11); a first jig member (5) for securely and interchangeably mounting the male and female die blanks (6, 11) in a predetermined and fixed relative position thereon; a worktable (4) for securely mounting the first jig member (5) thereon and being displaceable relative to the wire-cut EDM electrode head assembly (1); and a second jig member (7) for securely mounting on the male die blank (6) when the latter is securely mounted on the first jig member (5) in the predetermined position for providing a reference surface to be engaged by the predetermined stretch (3a) of the axially transported wire electrode for machining the male and female die blanks in the fixed relative position.

摘要翻译： 一种用于制造中空挤出模具的装置，其分别由阳模和阴模与其相应形状的阳和母承载表面隔开并且与固体阳模和中空阴模坯（6,11）分开预定的配合关系。 提供包括：线切割EDM电极头组件（1），其具有多个线引导构件（1c，1d），用于跨越并轴向传送固定U形路径中的连续线电极（3），所述固定U形路径包括预定拉伸（3a ）构成用于阳模和阴模坯（6,11）的轴向移动的EDM线切割边缘的轴向传送的线电极（3）; 第一夹具构件（5），用于将雄模和母模毛坯（6,11）牢固且可互换地安装在预定和固定的相对位置上; 用于将第一夹具构件（5）牢固地安装在其上并相对于线切割EDM电极头组件（1）可移位的工作台（4）; 以及第二夹具构件（7），用于当所述第二夹具构件（7）在所述预定位置牢固地安装在所述第一夹具构件（5）上时，用于牢固地安装在所述阳模头坯件（6）上，以提供将被所述预定拉伸 轴向传送的线电极，用于在固定的相对位置上加工阳模和阴模坯。

公开(公告)号：US4252925A

公开(公告)日：1981-02-24

申请号：US18748

申请日：1979-03-08

申请人： Mitsutoshi Fukuda ,  Kazuo Tago ,  Akihiko Shimizu

发明人： Mitsutoshi Fukuda ,  Kazuo Tago ,  Akihiko Shimizu

IPC分类号： C08G65/00 ,  C08F2/00 ,  C08F2/04 ,  C08F4/46 ,  C08F4/50 ,  C08G65/02 ,  C08G65/12 ,  C08G75/08 ,  C08F4/48

CPC分类号： C08G65/12 ,  C08F4/46 ,  C08F4/50 ,  C08G75/08

摘要： An anionic polymerization is carried out by polymerizing a monomer for anionic polymerization in a solvent in the presence of a polymerization initiator after preparing a polymerization system by an operation (I) adding a solution of an organometallic compound in a polymerization system of a solvent or a combination of a solvent and an inert gas and an operation (II) removing excess of the unreacted organometallic compound, before charging the monomer and the polymerization initiator.

摘要翻译： 阴离子聚合通过在制备聚合体系之后在聚合引发剂存在下在溶剂中聚合用于阴离子聚合的单体进行阴离子聚合，操作（I）在溶剂的聚合体系中加入有机金属化合物的溶液或 溶剂和惰性气体的组合以及在将单体和聚合引发剂加料之前，除去过量的未反应的有机金属化合物的操作（II）。

公开(公告)号：US4136237A

公开(公告)日：1979-01-23

申请号：US824225

申请日：1977-08-12

申请人： Kenji Takahashi ,  Toru Seita ,  Shunichi Asami ,  Akihiko Shimizu

发明人： Kenji Takahashi ,  Toru Seita ,  Shunichi Asami ,  Akihiko Shimizu

IPC分类号： C08F259/00 ,  B01J47/12 ,  C08F259/08 ,  C08J5/22 ,  C25B13/08 ,  C25B13/00 ,  C08L31/02

CPC分类号： C08J5/2293 ,  C08F259/08 ,  C08K5/15 ,  C08J2327/18

摘要： A cation-exchange membrane is prepared by immersing a monomer having lactone ring and/or a lactonizable monomer with or without a crosslinking agent or a polymerization initiator, into a fluorinated polymer membrane having cation-exchangeable groups and polymerizing the monomer.