公开(公告)号：US6074287A

公开(公告)日：2000-06-13

申请号：US834665

申请日：1997-04-11

申请人： Akira Miyaji ,  Takashi Arai ,  Takeshi Yagi

发明人： Akira Miyaji ,  Takashi Arai ,  Takeshi Yagi

IPC分类号： B24B37/20 ,  B24B49/12 ,  B24D7/12 ,  B24B7/22

CPC分类号： B24B37/205 ,  B24B49/12

摘要： Polishing laps and apparatus incorporating such polishing laps for polishing workpieces such as semiconductor wafers are disclosed. The polishing laps are made from a cured mixture of an epoxy resin and a filler material, and preferably have at least a portion that is transparent to light. The polishing lap is preferably mounted on rigid polishing wheel or the like with or without an intervening layer such as an elastic layer. Polishing apparatus incorporating the polishing lap preferably include a light source for directing a beam of light toward the transparent portion of the polishing lap to enable the light beam to reflect from the working surface of the workpiece as the workpiece is being polished by the polishing lap. The apparatus also preferably includes a light detector for detecting light reflected from the surface of the workpiece. Such light can provide information, as on the status of the working surface as polishing progresses and can provide an indication of when polishing has reached a desired end point.

摘要翻译： 公开了用于抛光工件如半导体晶片的抛光圈和装有这种抛光圈的装置。 抛光圈由环氧树脂和填充材料的固化混合物制成，并且优选具有至少一部分对光透明的部分。 抛光搭扣优选安装在具有或不具有中间层（例如弹性层）的刚性抛光轮等上。 结合了抛光搭扣的抛光装置优选地包括一个光源，用于将光束引导到抛光搭盘的透明部分，以使得当工件被抛光圈抛光时，光束能够从工件的工作表面反射。 该装置还优选地包括用于检测从工件的表面反射的光的光检测器。 这样的光可以提供关于作为抛光进行的工作表面的状态的信息，并且可以提供何时抛光已经达到期望的终点。

公开(公告)号：US5430303A

公开(公告)日：1995-07-04

申请号：US318520

申请日：1994-10-05

申请人： Yukako Matsumoto ,  Akira Miyaji

发明人： Yukako Matsumoto ,  Akira Miyaji

IPC分类号： G03F7/20 ,  H01K1/26 ,  H01J37/00

CPC分类号： G03F7/70916 ,  G03F7/2002

摘要： An exposure apparatus comprises a light source emitting light of the ultraviolet region; an illuminating system for introducing the light from the light source into a mask bearing a predetermined pattern; an exposure unit for forming the image of the mask pattern on a photosensitive substrate; a chamber accommodating the light source, the illuminating system and the exposure unit; and an impurity eliminating device for eliminating at least an organic impurity inducing a photochemical reaction with the light of the ultraviolet region.

摘要翻译： 曝光装置包括发射紫外线区域的光的光源; 用于将来自光源的光引入到具有预定图案的掩模中的照明系统; 曝光单元，用于在感光基板上形成掩模图案的图像; 容纳光源的腔室，照明系统和曝光单元; 以及用于消除至少一种诱导与紫外线区域的光的光化学反应的有机杂质的杂质消除装置。

公开(公告)号：US5559584A

公开(公告)日：1996-09-24

申请号：US380447

申请日：1995-01-30

申请人： Akira Miyaji ,  Masatoshi Ikeda

发明人： Akira Miyaji ,  Masatoshi Ikeda

IPC分类号： G03F7/20 ,  G03B27/34

CPC分类号： G03F7/70883 ,  G03F7/70058 ,  G03F7/70241 ,  G03F7/70741 ,  G03F7/70858 ,  G03F7/70866

摘要： An exposure apparatus is for illuminating a pattern on a mask by an illumination optical system to transfer the pattern on the mask onto a photosensitive substrate set on a stage through a projection optical system. The exposure apparatus comprises a first supply device for supplying an inert gas toward the photosensitive substrate substantially in parallel with the optical axis of the projection optical system in a space open to communicate with the atmosphere between the projection optical system and the photosensitive substrate, and a second supply device for supplying the inert gas to the space in a direction intersecting with the optical axis of the projection optical system so as to establish an inert gas atmosphere in the space together with the first supply device. The transfer is conducted in the inert gas atmosphere.

摘要翻译： 曝光装置用于通过照明光学系统照射掩模上的图案，以通过投影光学系统将掩模上的图案转印到设置在舞台上的感光基板上。 曝光装置包括：第一供应装置，用于在与投影光学系统和感光基板之间的大气相通的空间中基本上与投影光学系统的光轴平行地向感光基板供应惰性气体;以及 第二供给装置，用于在与投影光学系统的光轴相交的方向上向空间供应惰性气体，以便与第一供应装置一起在该空间中建立惰性气体气氛。 转移在惰性气体气氛中进行。

公开(公告)号：US5471278A

公开(公告)日：1995-11-28

申请号：US154404

申请日：1993-11-19

申请人： Yukio Yasuda ,  Akiyasu Yamaguchi ,  Tatsushi Igarashi ,  Yasuo Oonishi ,  Kenzo Kai ,  Masanori Sugihara ,  Takashi Mori ,  Akira Miyaji

发明人： Yukio Yasuda ,  Akiyasu Yamaguchi ,  Tatsushi Igarashi ,  Yasuo Oonishi ,  Kenzo Kai ,  Masanori Sugihara ,  Takashi Mori ,  Akira Miyaji

IPC分类号： G03F7/20 ,  H01J61/16 ,  H01J61/18 ,  H01J61/86

CPC分类号： G03F7/70016 ,  H01J61/18 ,  H01J61/86

摘要： A cadmium/inert gas discharge lamp of the short arc type, which suppresses an unnecessary emission upstream and downstream of the necessary emission spectra in a wavelength range of 210 to 230 nm, achieves a high efficiency of the emission spectra in the range 210 to 230 nm and can be used in very satisfactory manner for industrial applications. Also, a highly efficient projection exposure device through the incorporation of a cadmium/rare gas discharge lamp of the short arc type having good emission spectrum characteristics in the wavelength range 210 to 230 nm, which can transmit in projecting manner fine image patterns with a large depth of focus. The cadmium/rare gas discharge lamp of the short arc type is arranged within a temperature-regulated quartz bulb, and is provided with a pair of adjacently facing electrodes, together with inert gas selected from xenon, krypton, argon, neon or mixtures of them. Metal cadmium with a pressure of 14 to 200 kPa is encapsulated in the tube in a stationary lighting operation. The lamp is operated in such a way that J/P, i.e. the ratio between a discharge current in a stationary lighting operation J (A) and a cadmium pressure in a stationary lighting operation P (kPa) is in a range 0.13 to 15. Also, a projection exposure device, which has the above-described discharge lamp and a power supply for carrying out the lighting operation of the discharge lamp under the above-described condtions.

摘要翻译： 短波型的镉/惰性气体放电灯在210〜230nm的波长范围内抑制必要的发射光谱的上游和下游的不必要的发光，实现了210〜230的发射光谱的高效率 nm，可以以非常满意的方式用于工业应用。 另外，通过并入具有210〜230nm的波长范围内的发射光谱特性良好的短弧型镉/稀有气体放电灯的高效投影曝光装置，能以突出的方式突出显示具有大的图像的精细图像图案 焦点深度。 短弧型的镉/稀有气体放电灯布置在温度调节的石英灯泡内，并且设置有一对相邻的电极以及选自氙气，氪气，氩气，氖气或它们的混合物的惰性气体 。 压力为14至200kPa的金属镉在静止照明操作中封装在管中。 灯的操作方式是J / P，即静止点亮操作J（A）中的放电电流与静止点亮操作P（k​​Pa）中的镉压力之比在0.13至15的范围内。 此外，具有上述放电灯的投影曝光装置和用于在上述条件下进行放电灯的点亮操作的电源。

公开(公告)号：US06458014B1

公开(公告)日：2002-10-01

申请号：US09846339

申请日：2001-05-02

申请人： Akira Ihsikawa ,  Tatsuya Senga ,  Akira Miyaji ,  Yoshijiro Ushio

发明人： Akira Ihsikawa ,  Tatsuya Senga ,  Akira Miyaji ,  Yoshijiro Ushio

IPC分类号： B24B4900

CPC分类号： B24B37/205 ,  B24B37/013 ,  B24B49/04 ,  B24B49/12

摘要： After a hole is formed in a polishing pad, a transparent window plate is inserted into the hole. Here, a gap is left between the upper surface of the transparent window plate and the outermost surface constituting the working surface of the polishing pad. During polishing, the polishing head holding the wafer applies a load to the polishing pad by means of a load-applying mechanism, so that the polishing pad and transparent window plate are compressed. In this case, the system is arranged so that the gap remains constant, and so that a dimension equal to or greater than a standard value is maintained. Since the upper surface of the transparent window plate is recessed from the upper surface of the polishing pad, there is no scratching of the surface of the transparent window plate during dressing. Accordingly, the polishing pad has a long useful life.

摘要翻译： 在抛光垫中形成孔之后，将透明窗板插入孔中。 这里，在透明窗板的上表面和构成抛光垫的工作面的最外表面之间留有间隙。 在抛光期间，保持晶片的研磨头通过负载施加机构向抛光垫施加负载，使得抛光垫和透明窗板被压缩。 在这种情况下，系统被布置成使得间隙保持恒定，并且维持等于或大于标准值的尺寸。 由于透明窗板的上表面从抛光垫的上表面凹陷，因此在修整期间不会刮擦透明窗板的表面。 因此，抛光垫的使用寿命长。

公开(公告)号：US4256376A

公开(公告)日：1981-03-17

申请号：US51881

申请日：1979-06-25

申请人： Shunsuke Kobayashi ,  Akira Miyaji ,  Yoshio Nara

发明人： Shunsuke Kobayashi ,  Akira Miyaji ,  Yoshio Nara

IPC分类号： G09F9/30 ,  G02F1/1343 ,  G04G9/12 ,  G02F1/133

CPC分类号： G02F1/134327 ,  G04G9/12

摘要： An electro-optical display element for a multiplexing system has a first and a second electrode substrate opposed to each other and an electrically responsive optical member provided between the two electrode substrates. Each of the two electrode substrates has combinations of ten segments, which are, in order from above, first, second and third lateral segments juxtaposed, a longitudinal upper left segment, upper middle segment and upper right segment juxtaposed between the first segment and the second segment, and a longitudinal lower left segment, lower middle segment, lower right segment juxtaposed between the second and third segments and a point segment for displaying the decimal point. The first electrode substrate has a first, a second and a third signal terminal. The second electrode substrate has a first, a second and a third scanning terminal. The signal terminals and the scanning terminals are specifically connected.

摘要翻译： 用于多路复用系统的电光显示元件具有彼此相对的第一和第二电极基板和设置在两个电极基板之间的电响应光学部件。 两个电极基板中的每一个具有十个段的组合，其从上方依次排列并置第一，第二和第三横向段，纵向上部左段，上中间段和右上段，并列在第一段和第二段之间 段，以及在第二和第三段之间并置的纵向左下段，下中间段，右下段，以及用于显示小数点的点段。 第一电极基板具有第一，第二和第三信号端子。 第二电极基板具有第一，第二和第三扫描端子。 信号端子和扫描端子是专门连接的。

公开(公告)号：US08517408B2

公开(公告)日：2013-08-27

申请号：US13209985

申请日：2011-08-15

申请人： Akira Miyaji ,  Hideki Abe

发明人： Akira Miyaji ,  Hideki Abe

IPC分类号： B62H1/02

CPC分类号： B62H1/02

摘要： A side stand switch includes a case member having a fixed contact; and a rotor body having a moving contact that can come into contact with the fixed contact, mounted by tightening a securing bolt, and turned together with a side stand bar with respect to the case member. The rotor body has an engagement pin inserted therein and to be inserted into an engagement hole formed in the side stand bar. A width of the engagement pin in the turning direction of the rotor body is larger at a base portion inside the rotor body than at a tip portion protruding from the rotor body.

摘要翻译： 侧支架开关包括具有固定触点的壳体构件; 以及转子体，其具有能够与固定触点接触的移动触点，通过紧固固定螺栓安装，并且与侧支架相对于壳体构件一起转动。 转子体具有插入其中的接合销，并插入到形成在侧支架上的接合孔中。 转子体的转动方向上的接合销的宽度比转子体的突出部的前端部的转子体的基部大。

公开(公告)号：US5891806A

公开(公告)日：1999-04-06

申请号：US842897

申请日：1997-04-17

申请人： Masato Shibuya ,  Keiichiro Sakato ,  Akira Miyaji ,  Toshiyuki Namikawa ,  Takashi Mori

发明人： Masato Shibuya ,  Keiichiro Sakato ,  Akira Miyaji ,  Toshiyuki Namikawa ,  Takashi Mori

IPC分类号： G03F7/20 ,  H01L21/00

CPC分类号： G03F7/70091 ,  G03F7/702 ,  G03F7/7035 ,  G03F7/70358 ,  Y10S438/942

摘要： Apparatus and methods are disclosed for increasing the illuminance at a mask used for proximity-type microlithography and for achieving increases in throughput. A mask defining a pattern is illuminated by an illumination optical system. The pattern is transferred to a workpiece separated from the mask by a prescribed standoff. The mask and workpiece can be relatively moved in a scan direction. With respect to the illumination optical system, the workpiece-side numerical aperture in a first direction on the plane of the mask is different from the workpiece-side numerical aperture in a second direction, perpendicular to the first direction, on the plane of the mask. A reflective-type relay optical system can be included that comprises first and second spherical mirrors that do not produce chromatic aberrations.

摘要翻译： 公开了用于增加用于接近型微光刻的掩模的照度和用于实现生产量增加的装置和方法。 定义图案的掩模由照明光学系统照亮。 将图案转移到与掩模分开的工件中，以规定的间距。 掩模和工件可以沿扫描方向相对移动。 相对于照明光学系统，在掩模的平面上的第一方向上的工件侧数值孔径在垂直于第一方向的第二方向上与工件侧数值孔径不同于掩模的平面 。 可以包括反射型中继光学系统，其包括不产生色差的第一和第二球面镜。

公开(公告)号：US4820899A

公开(公告)日：1989-04-11

申请号：US161944

申请日：1988-02-29

申请人： Ikuo Hikima ,  Akira Miyaji ,  Saburo Kamiya ,  Akikazu Tanimoto

发明人： Ikuo Hikima ,  Akira Miyaji ,  Saburo Kamiya ,  Akikazu Tanimoto

IPC分类号： B23K26/067 ,  H01R43/02 ,  B23K26/00

CPC分类号： B23K26/0673 ,  B23K26/067 ,  H01R43/0221

摘要： A laser working system comprises supplying means for supplying a laser beam, a working unit which includes a stage for supporting a workpiece and means for exposing the workpiece to the laser beam, and a room unit which includes wall means for surrounding the working unit and accomodates the working unit to spatially isolate it from outside of the wall means. The supplying means is arranged outside the room unit and includes first and second laser units each for generating the laser beam.The laser working system further comprises beam guiding means which creates first light path for optically communicating the first laser unit with the working unit through the wall means, and second light path for optically communicating the second laser unit with the working unit through the wall means, respectively.

摘要翻译： 一种激光加工系统，包括用于供应激光束的供给装置，包括用于支撑工件的台和用于将工件暴露于激光束的装置的工作单元，以及包括用于围绕工作单元并适应 工作单元将其与墙壁外部空间隔离。 供给装置设置在房间单元的外部，并且包括用于产生激光束的第一和第二激光单元。 所述激光加工系统还包括光束引导装置，所述光束引导装置产生用于通过所述壁装置将所述第一激光单元与所述工作单元光学连通的第一光路，以及用于通过所述壁装置将所述第二激光单元与所述作业单元光学连通的第二光路， 分别。

公开(公告)号：US4420773A

公开(公告)日：1983-12-13

申请号：US275403

申请日：1981-06-18

申请人： Kenji Toyoda ,  Takao Watanabe ,  Hideya Inoue ,  Atsumi Kasuya ,  Yutaka Ichihara ,  Akira Miyaji

发明人： Kenji Toyoda ,  Takao Watanabe ,  Hideya Inoue ,  Atsumi Kasuya ,  Yutaka Ichihara ,  Akira Miyaji

IPC分类号： G11B27/024 ,  G11B31/00 ,  G11C19/28 ,  H04N1/21 ,  H04N5/225 ,  H04N5/76

CPC分类号： H04N1/00129 ,  G11B27/024 ,  G11B31/006 ,  G11C19/287 ,  H04N1/2112 ,  H04N1/2158 ,  H04N1/217 ,  H04N5/2251 ,  H04N2101/00 ,  H04N2201/0055 ,  H04N2201/0086 ,  Y10S358/906

摘要： An electronic photographic camera includes an imaging optical system operable to be focused to an object to be photographed, a solid state imaging sensing device including a plurality of light-receiving elements disposed in the imaging plane of the imaging optical system and capable of producing a charge corresponding to the quantity of incident light and accumulating the charge therein, first transfer means having a first output terminal and adapted to transfer the charge accumulated in each of the elements separately to the first output terminal, and second transfer means having a second output terminal and adapted to transfer the charges produced in some or all of the elements collectively to the second output terminal, and metering means for measuring the brightness of the object from the charge transferred by the second transfer means.

摘要翻译： 电子照相机包括可操作以聚焦到待拍摄物体的成像光学系统，固态成像感测装置，其包括设置在成像光学系统的成像平面中的多个光接收元件，并且能够产生电荷 对应于入射光量并累积其中的电荷，第一传送装置具有第一输出端子，适于将累积在每个元件中的电荷分别传送到第一输出端子，第二传送装置具有第二输出端子和 适于将一些或所有元件中产生的电荷集中地传送到第二输出端子;以及计量装置，用于根据由第二传送装置传送的电荷测量物体的亮度。