Sample Processing Improvements For Microscopy

    公开(公告)号:US20200379234A1

    公开(公告)日:2020-12-03

    申请号:US16995271

    申请日:2020-08-17

    Abstract: Among other things, a first surface is configured to receive a sample and is to be used in a microscopy device. There is a second surface to be moved into a predefined position relative to the first surface to form a sample space that is between the first surface and the second surface and contains at least part of the sample. There is a mechanism configured to move the second surface from an initial position into the predefined position to form the sample space. When the sample is in place on the first surface, the motion of the second surface includes a trajectory that is not solely a linear motion of the second surface towards the first surface.

    Sample Processing Improvements For Microscopy
    2.
    发明申请
    Sample Processing Improvements For Microscopy 有权
    样品加工改进显微镜

    公开(公告)号:US20170075099A1

    公开(公告)日:2017-03-16

    申请号:US15360724

    申请日:2016-11-23

    Abstract: Among other things, a first surface is configured to receive a sample and is to be used in a microscopy device. There is a second surface to be moved into a predefined position relative to the first surface to form a sample space that is between the first surface and the second surface and contains at least part of the sample. There is a mechanism configured to move the second surface from an initial position into the predefined position to form the sample space. When the sample is in place on the first surface, the motion of the second surface includes a trajectory that is not solely a linear motion of the second surface towards the first surface.

    Abstract translation: 除其他之外,第一表面被配置为接收样品并且用于显微镜装置。 存在相对于第一表面移动到预定位置的第二表面以形成位于第一表面和第二表面之间并且包含至少部分样品的样品空间。 存在被配置为将第二表面从初始位置移动到预定位置以形成样本空间的机构。 当样品在第一表面上就位时,第二表面的运动包括不仅仅是第二表面朝向第一表面的线性运动的轨迹。

    Sample Processing Improvements For Microscopy

    公开(公告)号:US20220206282A1

    公开(公告)日:2022-06-30

    申请号:US17696704

    申请日:2022-03-16

    Abstract: Among other things, a first surface is configured to receive a sample and is to be used in a microscopy device. There is a second surface to be moved into a predefined position relative to the first surface to form a sample space that is between the first surface and the second surface and contains at least part of the sample. There is a mechanism configured to move the second surface from an initial position into the predefined position to form the sample space. When the sample is in place on the first surface, the motion of the second surface includes a trajectory that is not solely a linear motion of the second surface towards the first surface.

    Sample Processing Improvements For Microscopy

    公开(公告)号:US20190324258A1

    公开(公告)日:2019-10-24

    申请号:US16455482

    申请日:2019-06-27

    Abstract: Among other things, a first surface is configured to receive a sample and is to be used in a microscopy device. There is a second surface to be moved into a predefined position relative to the first surface to form a sample space that is between the first surface and the second surface and contains at least part of the sample. There is a mechanism configured to move the second surface from an initial position into the predefined position to form the sample space. When the sample is in place on the first surface, the motion of the second surface includes a trajectory that is not solely a linear motion of the second surface towards the first surface.

    Sample Processing Improvements For Microscopy

    公开(公告)号:US20190317309A1

    公开(公告)日:2019-10-17

    申请号:US16455539

    申请日:2019-06-27

    Abstract: Among other things, a first surface is configured to receive a sample and is to be used in a microscopy device. There is a second surface to be moved into a predefined position relative to the first surface to form a sample space that is between the first surface and the second surface and contains at least part of the sample. There is a mechanism configured to move the second surface from an initial position into the predefined position to form the sample space. When the sample is in place on the first surface, the motion of the second surface includes a trajectory that is not solely a linear motion of the second surface towards the first surface.

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