Synthesis of transparent conducting oxide coatings
    5.
    发明授权
    Synthesis of transparent conducting oxide coatings 有权
    透明导电氧化物涂层的合成

    公开(公告)号:US07709056B2

    公开(公告)日:2010-05-04

    申请号:US11804059

    申请日:2007-05-16

    IPC分类号: B05D1/00

    CPC分类号: C23C16/407 C23C16/45527

    摘要: A method and system for preparing a light transmitting and electrically conductive oxide film. The method and system includes providing an atomic layer deposition system, providing a first precursor selected from the group of cyclopentadienyl indium, tetrakis (dimethylamino) tin and mixtures thereof, inputting to the deposition system the first precursor for reaction for a first selected time, providing a purge gas for a selected time, providing a second precursor comprised of an oxidizer, and optionally inputting a second precursor into the deposition system for reaction and alternating for a predetermined number of cycles each of the first precursor, the purge gas and the second precursor to produce the oxide film.

    摘要翻译: 一种制备透光导电氧化膜的方法和系统。 该方法和系统包括提供原子层沉积系统,提供选自环戊二烯基铟,四(二甲基氨基)锡及其混合物的第一前体,向沉积系统输入第一前体进行反应第一选定时间,提供 提供选定时间的吹扫气体,提供由氧化剂组成的第二前体,以及任选地将第二前体输入到沉积系统中进行反应并交替预定数量的循环,每个循环中的每个第一前体,吹扫气体和第二前体 以产生氧化膜。

    MICRO-BALANCE SENSOR INTEGRATED WITH ATOMIC LAYER DEPOSITION CHAMBER
    8.
    发明申请
    MICRO-BALANCE SENSOR INTEGRATED WITH ATOMIC LAYER DEPOSITION CHAMBER 有权
    微平衡传感器与原子层沉积室集成

    公开(公告)号:US20140053779A1

    公开(公告)日:2014-02-27

    申请号:US13591498

    申请日:2012-08-22

    IPC分类号: C23C16/44 C23C16/50

    CPC分类号: C23C16/45525 C23C16/52

    摘要: The invention is directed to QCM measurements in monitoring ALD processes. Previously, significant barriers remain in the ALD processes and accurate execution. To turn this exclusively dedicated in situ technique into a routine characterization method, an integral QCM fixture was developed. This new design is easily implemented on a variety of ALD tools, allows rapid sample exchange, prevents backside deposition, and minimizes both the footprint and flow disturbance. Unlike previous QCM designs, the fast thermal equilibration enables tasks such as temperature-dependent studies and ex situ sample exchange, further highlighting the feasibility of this QCM design for day-to-day use. Finally, the in situ mapping of thin film growth rates across the ALD reactor was demonstrated in a popular commercial tool operating in both continuous and quasi-static ALD modes.

    摘要翻译: 本发明涉及在监测ALD过程中的QCM测量。 此前,ALD流程仍然存在重大障碍,准确执行。 将这种专门的原位技术转化为常规表征方法,开发了一个完整的QCM夹具。 这种新设计可以在各种ALD工具上轻松实现,允许快速进行样品交换,防止背面沉积,并最大限度地减少占地面积和流量扰动。 与以前的QCM设计不同,快速热平衡使得诸如温度依赖性研究和非原位样品交换等任务进一步凸显了该QCM设计的日常使用的可行性。 最后,在连续和准静态ALD模式下工作的流行商业工具中,证明了ALD反应器中薄膜生长速率的原位测绘。