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公开(公告)号：US20090059189A1
公开(公告)日：2009-03-05
申请号：US11994747
申请日：2006-06-19
CPC分类号： G03F1/62 , G03F7/70308 , G03F7/70341
摘要： A pellicle for use in microlithographic exposure apparatus (10) has, for an operating wavelength of the apparatus, a maximum transmittance for light rays (56) that obliquely impinge on the pellicle (34; 134; 234). This ensures smaller variations of the transmittance over a broad range of angles of incidence, as it occurs in very high numerical aperture projection lenses.
摘要翻译： 在微光刻曝光设备（10）中使用的防护薄膜组件对于设备的工作波长具有倾斜地撞击防护薄膜组件（34; 134; 234）上的光线（56）的最大透射率。 这确保了在宽的入射角范围内的透射率的变化较小，因为它在非常高的数值孔径投影透镜中出现。
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公开(公告)号：US20070242250A1
公开(公告)日：2007-10-18
申请号：US11765200
申请日：2007-06-19
CPC分类号： G02B1/02 , G02B1/08 , G02B5/3083 , G02B13/14 , G02B27/0043 , G02B27/286 , G03F7/70225 , G03F7/70241 , G03F7/70566 , G03F7/70958 , G03F7/70966
摘要： Objective, in particular a projection objective for a microlithography projection-exposure installation, with at least one fluoride crystal lens. A reduction in the detrimental influence of birefringence is achieved if this lens is a (100)-lens with a lens axis which is approximately perpendicular to the {100} crystallographic planes or to the crystallographic planes equivalent thereto of the fluoride crystal. In the case of objectives with at least two fluoride crystal lenses, it is favorable if the fluoride crystal lenses are arranged such that they are rotated with respect to one another. The lens axes of the fluoride crystal lenses may in this case point not only in the crystallographic direction but also in the crystallographic direction or in the crystallographic direction. A further reduction in the detrimental influence of birefringence is achieved by the simultaneous use of groups with (100)-lenses rotated with respect to one another and groups with (111)-lenses or (110)-lenses rotated with respect to one another. A further reduction in the detrimental influence of birefringence is obtained by covering an optical element with a compensation coating.
摘要翻译： 目的，特别是具有至少一种氟化物晶体透镜的微光刻投影曝光装置的投影物镜。 如果该透镜是具有近似垂直于{100}晶面的透镜轴或与氟化物晶体相当的结晶平面的透镜轴，则实现双折射的有害影响的减小。 在具有至少两个氟化物晶体透镜的物镜的情况下，如果将氟化物晶体透镜相对于彼此旋转布置是有利的。 在这种情况下，氟化物晶体透镜的透镜轴不仅在<100>晶体方向，而且在<111>晶体方向或<110>晶体方向。 双折射的有害影响的进一步减少是通过同时使用具有相对于彼此旋转的（100） - 相的组和具有相对于彼此旋转的（111） - 透镜或（110）相的组而实现的。 通过用补偿涂层覆盖光学元件来获得双折射的有害影响的进一步减少。
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公开(公告)号：US07239447B2
公开(公告)日：2007-07-03
申请号：US10931745
申请日：2004-09-01
IPC分类号： G02B5/30
CPC分类号： G02B1/02 , G02B1/08 , G02B5/3083 , G02B13/14 , G02B27/0043 , G02B27/286 , G03F7/70225 , G03F7/70241 , G03F7/70566 , G03F7/70958 , G03F7/70966
摘要： An objective, in particular a projection objective for a microlithography projection-exposure installation, with at least one fluoride crystal lens is disclosed. A reduction in the detrimental influence of birefringence is achieved if this lens is a (100)-lens with a lens axis which is approximately perpendicular to the {100} crystallographic planes or to the crystallographic planes equivalent thereto of the fluoride crystal. A further reduction in the detrimental influence of birefringence is obtained by covering an optical element with a compensation coating.
摘要翻译： 公开了具有至少一种氟化物晶体透镜的目的，特别是用于微光刻投影曝光装置的投影物镜。 如果该透镜是具有近似垂直于{100}晶面的透镜轴或与氟化物晶体相当的结晶平面的透镜轴，则实现双折射的有害影响的减小。 通过用补偿涂层覆盖光学元件来获得双折射的有害影响的进一步减少。
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公开(公告)号：US08339575B2
公开(公告)日：2012-12-25
申请号：US12206550
申请日：2008-09-08
CPC分类号： G03F7/70916 , G03F7/70308 , G03F7/70983
摘要： An objective and a method for operating an objective, in particular a projection objective or an illumination objective for microlithography for imaging a reticle onto a wafer, with a plurality of optical elements that are arranged along a ray path, wherein at least one optical element of a first kind (1) is provided, which is irradiated only partially by a ray bundle, wherein the one or more optical element(s) of the first kind are rotatably mounted or positionable about the optical axis or an axis parallel thereto, wherein, for each optical element of the first kind at least two mounting positions are provided, and wherein the rotation angle between the two mounting positions is defined by the surface (7) irradiated by the ray bundle such that, in the various mounting positions, the surfaces irradiated by the ray path do not overlap.
摘要翻译： 一种用于操作物镜的目的和方法，特别是具有沿着光线路径布置的多个光学元件的用于将光罩成像到晶片上的微光刻的投影物镜或照明物镜，其中至少一个光学元件 提供第一种（1），其仅部分地被射线束照射，其中第一类的一个或多个光学元件围绕光轴或平行于其的轴线可旋转地安装或定位，其中， 对于第一种的每个光学元件，提供至少两个安装位置，并且其中两个安装位置之间的旋转角度被由射线束照射的表面（7）限定，使得在各种安装位置，表面 由射线路径照射不重叠。
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公开(公告)号：US20050157401A1
公开(公告)日：2005-07-21
申请号：US10931745
申请日：2004-09-01
CPC分类号： G02B1/02 , G02B1/08 , G02B5/3083 , G02B13/14 , G02B27/0043 , G02B27/286 , G03F7/70225 , G03F7/70241 , G03F7/70566 , G03F7/70958 , G03F7/70966
摘要： Objective, in particular a projection objective for a microlithography projection-exposure installation, with at least one fluoride crystal lens. A reduction in the detrimental influence of birefringence is achieved if this lens is a (100)-lens with a lens axis which is approximately perpendicular to the {100} crystallographic planes or to the crystallographic planes equivalent thereto of the fluoride crystal. In the case of objectives with at least two fluoride crystal lenses, it is favorable if the fluoride crystal lenses are arranged such that they are rotated with respect to one another. The lens axes of the fluoride crystal lenses may in this case point not only in the crystallographic direction but also in the crystallographic direction or in the crystallographic direction. A further reduction in the detrimental influence of birefringence is achieved by the simultaneous use of groups with (100)-lenses rotated with respect to one another and groups with (111)-lenses or (110)-lenses rotated with respect to one another. A further reduction in the detrimental influence of birefringence is obtained by covering an optical element with a compensation coating.
摘要翻译： 目的，特别是具有至少一种氟化物晶体透镜的微光刻投影曝光装置的投影物镜。 如果该透镜是具有近似垂直于{100}晶面的透镜轴或与氟化物晶体相当的结晶平面的透镜轴，则实现双折射的有害影响的减小。 在具有至少两个氟化物晶体透镜的物镜的情况下，如果将氟化物晶体透镜相对于彼此旋转布置是有利的。 在这种情况下，氟化物晶体透镜的透镜轴不仅在<100>晶体方向，而且在<111>晶体方向或<110>晶体方向。 双折射的有害影响的进一步减少是通过同时使用具有相对于彼此旋转的（100） - 相的组和具有相对于彼此旋转的（111） - 透镜或（110）相的组而实现的。 通过用补偿涂层覆盖光学元件来获得双折射的有害影响的进一步减少。
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公开(公告)号：US20080291419A1
公开(公告)日：2008-11-27
申请号：US12187116
申请日：2008-08-06
申请人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Guenter Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Sigrid Scheible
发明人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Guenter Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Sigrid Scheible
CPC分类号： G03F7/70983 , G03F7/70341
摘要： In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.
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公开(公告)号：US20050225737A1
公开(公告)日：2005-10-13
申请号：US11015553
申请日：2004-12-20
申请人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Guenter Scheible
发明人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Guenter Scheible
CPC分类号： G03F7/70983 , G03F7/70341
摘要： In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.
摘要翻译： 在投影物镜中，借助于设置在光路中的投影物镜的最后一个光学元件与图像之间的浸没介质，将布置在投影物镜的物平面中的图案成像到投影物镜的像平面中 平面，最后一个光学元件具有透明基板和与基板相配合的保护层系统，用于与浸没介质接触，用于增加最后一个光学元件对浸入介质引起的劣化的电阻。
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8.发明授权公开(公告)号：US07738187B2
公开(公告)日：2010-06-15
申请号：US12134062
申请日：2008-06-05
IPC分类号： G02B13/14
CPC分类号： G02B21/33 , G03F7/70341 , G03F7/70958
摘要： An optical element (1) made of a material that is transparent to wavelengths in the UV region, which optical element (1) includes an oleophobic coating (6, 7) outside of its optically free diameter whose disperse component of the surface energy is preferably 25 mN/m or less, particularly preferably 20 mN/m or less, in particular 15 mN/m or less. In addition or as an alternative, the optical element (1) within its optically free diameter comprises an oleophilic coating (9b, 9c) that is transparent to wavelengths in the UV region, with the disperse component of the surface energy of this coating preferably being more than 25 mN/m, particularly preferably more than 30 mN/m, in particular more than 40 mN/m. The optical element may be provided in an arrangement in which it dips at least partially into an organic liquid.
摘要翻译： 一种光学元件（1），其由对UV区域中的波长透明的材料制成，该光学元件（1）包括其光学自由直径外的疏油涂层（6,7），其表面能的分散分量优选为 25mN / m以下，特别优选为20mN / m以下，特别优选为15mN / m以下。 另外或作为替代，光学元件（1）在其光学自由直径内包括对UV区域中的波长透明的亲油涂层（9b，9c），该涂层的表面能的分散组分优选为 超过25mN / m，特别优选大于30mN / m，特别是大于40mN / m。 光学元件可以以其至少部分地浸入有机液体的布置来设置。
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9.发明授权公开(公告)号：US08928980B2
公开(公告)日：2015-01-06
申请号：US13350719
申请日：2012-01-13
CPC分类号： G03F7/70958 , G03F7/70291
摘要： A micromirror arrangement (1) having: at least one micromirror (3) having a reflective surface (11) formed at a mirror substrate (2), and an antireflective coating (7) formed at the mirror substrate (2) outside the reflective surface (11). A reflective coating (8) is formed within the reflective surface (11) and has at least two layer subsystems, wherein the first layer subsystem has layers (8e, 8f) composed of a periodic sequence of alternate high and low refractive index layers composed of a nonmetallic material and is optimized with regard to the reflectivity in respect of a used wavelength of the micromirror arrangement, and wherein the second layer subsystem is optimized with regard to the reflectivity in respect of a measurement wavelength of the micromirror arrangement, said measurement wavelength deviating from the used wavelength.
摘要翻译： 一种微镜装置（1），具有：具有形成在反射镜基板（2）上的反射表面（11）的至少一个微反射镜（3）和形成在所述反射镜基板（2）的反射表面外侧的抗反射涂层 （11）。 反射涂层（8）形成在反射表面（11）内，并且具有至少两个层子系统，其中第一层子系统具有层（8e，8f），层（8e，8f）由周期性序列组成，交替的高低折射率层由 非金属材料，并且关于微镜装置的使用波长的反射率被优化，并且其中关于微镜装置的测量波长的反射率优化第二层子系统，所述测量波长偏离 从使用的波长。
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公开(公告)号：US08395753B2
公开(公告)日：2013-03-12
申请号：US12884485
申请日：2010-09-17
CPC分类号： G03F7/70083 , G03F7/70566
摘要： The disclosure relates to a microlithographic projection exposure apparatus, as well as related components and methods. In some embodiments, a microlithographic projection exposure apparatus includes an illumination system and a projection objective, where the illumination system can illuminate an object plane of the projection objective and the projection objective can produce the image of the object plane on an image plane. A polarization-dependent transmission can be produced in the illumination system such that, for at least one polarization distribution in respect of the light impinging on the object plane, a non-homogeneous intensity distribution in the object plane is obtained. The non-homogeneous intensity distribution can afford a homogeneous intensity distribution in the image plane by virtue of polarization-dependent transmission properties of the projection objective.
摘要翻译： 本公开涉及微光刻投影曝光装置，以及相关的部件和方法。 在一些实施例中，微光刻投影曝光装置包括照明系统和投影物镜，其中照明系统可照亮投影物镜的物平面，并且投影物镜可以在像平面上产生物平面的图像。 可以在照明系统中产生偏振相关的透射，使得对于相对于物体平面上的光的至少一个偏振分布，获得物平面中的非均匀强度分布。 非均匀强度分布可以通过投影物镜的偏振依赖透射特性在图像平面中提供均匀的强度分布。
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