Abstract:
Thick (i.e., greater than two microns), fine-grained, low-stress tungsten MEMS structures are fabricated at low temperatures, particularly for so-called “MEMS last” fabrication processes (e.g., when MEMS structures are fabricated after electronic circuitry is fabricated). Means for very accurately etching structural details from the deposited tungsten layer and for strongly and stably anchoring the tungsten layer to an underlying substrate are disclosed. Also, means for removing a sacrificial layer underlying the mobile tungsten layer without damaging the tungsten or allowing it to be drawn down and stuck by surface tension is disclosed.
Abstract:
An inertial sensor includes driving piezoelectric transducers for enabling an oscillation of a resonator, sensing piezoelectric transducers for enabling a detection of a movement of the inertial sensor, and piezoelectric compensating elements substantially equidistantly among the driving and the sensing piezoelectric transducers, wherein the compensating elements and the resonator form corresponding capacitors having capacitive gaps, and wherein, during the oscillation of the resonator, changes in electrostatic charges stored in the capacitors are measured with the compensating elements and are modified so as to modify the oscillation of the resonator.
Abstract:
According to some aspects, there is provided a microelectromechanical systems (MEMS) device wherein one or more components of the MEMS device exhibit attenuated motion relative to one or more other moving components. The MEMS device may comprise a substrate; a proof mass coupled to the substrate and configured to move along a resonator axis; and a first shuttle coupled to the proof mass and comprising one of a drive structure configured to drive the proof mass along the resonator axis or a sense structure configured to move along a second axis substantially perpendicular to the resonator axis in response to motion of the proof mass along the resonator axis, wherein displacement of at least a first portion of the proof mass is attenuated relative to displacement of the first shuttle and/or a second portion of the proof mass.
Abstract:
Micromachined inertial devices are presented having multiple linearly-moving masses coupled together by couplers that move in a linear fashion when the coupled masses exhibit anti-phase motion. The couplers move in opposite directions of each other, such that one coupler on one side of the movable masses moves in a first linear direction and another coupler on the opposite side of the movable masses moves in a second linear direction opposite the first linear direction. The couplers ensure proper anti-phase motion of the masses.
Abstract:
A method of detecting motion provides a resonator having a mass, moves the mass in a translational mode, and actuates the mass in a given bulk mode. The mass moves in the translational and given bulk modes at substantially the same time and, accordingly, the resonator is configured to detect linear and rotational movement when moving and actuating the mass in the translational and given bulk modes. The method produces one or more movement signals representing the detected linear and rotational movement.
Abstract:
An inertial sensor includes driving piezoelectric transducers for enabling an oscillation of a resonator, sensing piezoelectric transducers for enabling a detection of a movement of the inertial sensor, and piezoelectric compensating elements substantially equidistantly among the driving and the sensing piezoelectric transducers, wherein the compensating elements and the resonator form corresponding capacitors having capacitive gaps, and wherein, during the oscillation of the resonator, changes in electrostatic charges stored in the capacitors are measured with the compensating elements and are modified so as to modify the oscillation of the resonator.
Abstract:
According to some aspects, there is provided a microelectromechanical systems (MEMS) device wherein one or more components of the MEMS device exhibit attenuated motion relative to one or more other moving components. The MEMS device may comprise a substrate; a proof mass coupled to the substrate and configured to move along a resonator axis; and a first shuttle coupled to the proof mass and comprising one of a drive structure configured to drive the proof mass along the resonator axis or a sense structure configured to move along a second axis substantially perpendicular to the resonator axis in response to motion of the proof mass along the resonator axis, wherein displacement of at least a first portion of the proof mass is attenuated relative to displacement of the first shuttle and/or a second portion of the proof mass.
Abstract:
Micromachined inertial devices are presented having multiple linearly-moving masses coupled together by couplers that move in a linear fashion when the coupled masses exhibit anti-phase motion. The couplers move in opposite directions of each other, such that one coupler on one side of the movable masses moves in a first linear direction and another coupler on the opposite side of the movable masses moves in a second linear direction opposite the first linear direction. The couplers ensure proper anti-phase motion of the masses.
Abstract:
Detecting and/or mitigating the presence of particle contaminants in a MEMS device involves including MEMS structures that in normal operation are robust against the presence of particles but which can be made sensitive to that presence during a test mode prior to use, e.g., by switching the impedance of sensitive structures between an exceptionally sensitive condition during test and a normal sensitivity during operation; surrounding sensitive nodes with guard elements that are at the same potential as those nodes during operation, thereby offering protection against bridging particles, but are at a very different potential during test and reveal the particles by their resulting leakage currents; extending the sensitive nodes to interdigitate with or otherwise extend adjacent to the guard structures, which neither contribute to nor detract from the device operation but cover otherwise open areas with detection means during test; and/or converting benign areas in which particles might become trapped undetectably by electric fields during test to field-free regions by extending otherwise non-functional conductive layers so that the particles can then be moved into detection locations by providing some mechanical disturbance.
Abstract:
According to some aspects, there is provided a microelectromechanical systems (MEMS) device wherein one or more components of the MEMS device exhibit attenuated motion relative to one or more other moving components. The MEMS device may comprise a substrate; a proof mass coupled to the substrate and configured to move along a resonator axis; and a first shuttle coupled to the proof mass and comprising one of a drive structure configured to drive the proof mass along the resonator axis or a sense structure configured to move along a second axis substantially perpendicular to the resonator axis in response to motion of the proof mass along the resonator axis, wherein displacement of at least a first portion of the proof mass is attenuated relative to displacement of the first shuttle and/or a second portion of the proof mass.