公开(公告)号：US20110090495A1

公开(公告)日：2011-04-21

申请号：US12935786

申请日：2009-03-27

申请人： Anastasius Jacobus Anicetus Bruinsma ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Abraham Veefkind ,  Peter Gerhardus Wilhelmu Bussink ,  Egbert Anne Martijn Brouwer

发明人： Anastasius Jacobus Anicetus Bruinsma ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Abraham Veefkind ,  Peter Gerhardus Wilhelmu Bussink ,  Egbert Anne Martijn Brouwer

IPC分类号： G01N21/17

CPC分类号： G03F7/70916 ,  G01N21/94 ,  G03F7/70525 ,  G03F7/70566 ,  G03F7/70591 ,  G03F7/70808 ,  G03F7/7085 ,  G03F7/70941

摘要： A lithographic apparatus includes a vessel that encloses a component with a test surface to be probed for contamination control; and an optical probe configured to transmit and receive an optical probing beam. The vessel includes a first optical port configured to transfer the optical probing beam towards the test surface, and a second optical port configured to receive a reflected optical probing beam. The optical probe includes a light source configured to provide the optical probing beam, a polarization conditioner configured to provide a predefined polarization state to the probing beam, and a spectral analyzer. The polarization conditioner is preset to provide a minimal transmission for a minimal transmission wavelength, and the spectral analyzer is arranged to detect a wavelength shift of the minimal transmission wavelength in response to a polarization change due to the presence of contamination.

摘要翻译： 光刻设备包括：容器，其包围具有待探测以用于污染控制的测试表面的部件; 以及被配置为发送和接收光学探测光束的光学探针。 该容器包括被配置为将光学探测光束传送到测试表面的第一光学端口和被配置为接收反射光学探测光束的第二光学端口。 光探头包括被配置为提供光学探测光束的光源，被配置为向探测光束提供预定极化状态的偏振光学调节器和光谱分析器。 偏振调节器被预设为为最小传输波长提供最小的传输，并且频谱分析仪布置成响应于由于污染的存在而导致的偏振变化来检测最小传输波长的波长偏移。

公开(公告)号：US08547551B2

公开(公告)日：2013-10-01

申请号：US12935786

申请日：2009-03-27

申请人： Anastasius Jacobus Anicetus Bruinsma ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Abraham Veefkind ,  Peter Gerhardus Wihelmus Bussink ,  Egbert Anne Martijn Brouwer

发明人： Anastasius Jacobus Anicetus Bruinsma ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Abraham Veefkind ,  Peter Gerhardus Wihelmus Bussink ,  Egbert Anne Martijn Brouwer

IPC分类号： G01J4/00

CPC分类号： G03F7/70916 ,  G01N21/94 ,  G03F7/70525 ,  G03F7/70566 ,  G03F7/70591 ,  G03F7/70808 ,  G03F7/7085 ,  G03F7/70941

摘要： A lithographic apparatus includes a vessel that encloses a component with a test surface to be probed for contamination control; and an optical probe configured to transmit and receive an optical probing beam. The vessel includes a first optical port configured to transfer the optical probing beam towards the test surface, and a second optical port configured to receive a reflected optical probing beam. The optical probe includes a light source configured to provide the optical probing beam, a polarization conditioner configured to provide a predefined polarization state to the probing beam, and a spectral analyzer. The polarization conditioner is preset to provide a minimal transmission for a minimal transmission wavelength, and the spectral analyzer is arranged to detect a wavelength shift of the minimal transmission wavelength in response to a polarization change due to the presence of contamination.

摘要翻译： 光刻设备包括：容器，其包围具有待探测以用于污染控制的测试表面的部件; 以及被配置为发送和接收光学探测光束的光学探针。 该容器包括被配置为将光学探测光束传送到测试表面的第一光学端口和被配置为接收反射光学探测光束的第二光学端口。 光探头包括被配置为提供光学探测光束的光源，被配置为向探测光束提供预定极化状态的偏振光学调节器和光谱分析器。 偏振调节器被预设为为最小传输波长提供最小的传输，并且频谱分析仪布置成响应于由于污染的存在而导致的偏振变化来检测最小传输波长的波长偏移。

公开(公告)号：US07897110B2

公开(公告)日：2011-03-01

申请号：US11311623

申请日：2005-12-20

申请人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Ralph Kurt ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Peter Cornelis Zalm

发明人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Ralph Kurt ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Peter Cornelis Zalm

IPC分类号： G01N7/00

CPC分类号： G01N25/142 ,  G01N25/68 ,  Y10T436/25875

摘要： A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.

摘要翻译： 一种用于检测光刻设备的内部空间中的至少一种污染物质的系统，包括：被配置为与所述内部空间接触的至少一个监测表面;被配置为将所述监测表面的温度控制在至少 一个检测温度，以及至少一个检测器，被配置为检测所述至少一种污染物质到所述监测表面上的冷凝。

公开(公告)号：US08445873B2

公开(公告)日：2013-05-21

申请号：US13478446

申请日：2012-05-23

申请人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Ralph Kurt ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Peter Cornelis Zalm

发明人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Ralph Kurt ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Peter Cornelis Zalm

IPC分类号： G21G5/00

CPC分类号： G01N25/142 ,  G01N25/68 ,  Y10T436/25875

摘要： A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.

摘要翻译： 一种用于检测光刻设备的内部空间中的至少一种污染物质的系统，包括：被配置为与所述内部空间接触的至少一个监测表面;被配置为将所述监测表面的温度控制在至少 一个检测温度，以及至少一个检测器，被配置为检测所述至少一种污染物质到所述监测表面上的冷凝。

公开(公告)号：US20110037960A1

公开(公告)日：2011-02-17

申请号：US12989045

申请日：2009-04-16

申请人： Luigi Scaccabarozzi ,  Vladimir Vitalevich Ivanov ,  Konstantin Nikolaevich Koshelev ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Pavel Stanislavoich Antsiferov ,  Vladimir Mihailovitch Krivtsun ,  Leonid Alexandrovich Dorokhin ,  Maarten Van Kampen

发明人： Luigi Scaccabarozzi ,  Vladimir Vitalevich Ivanov ,  Konstantin Nikolaevich Koshelev ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Pavel Stanislavoich Antsiferov ,  Vladimir Mihailovitch Krivtsun ,  Leonid Alexandrovich Dorokhin ,  Maarten Van Kampen

IPC分类号： G03B27/52

CPC分类号： G03F7/70925

摘要： A lithographic apparatus includes an illumination system configured to condition a beam of radiation, and a support structure configured to support a patterning device. The patterning device is configured to impart a pattern to the beam of radiation. The apparatus includes a patterning device cleaning system configured to provide an electrostatic force to contaminant particles that are on the patterning device and that are electrically charged by the beam of radiation, in order to remove the contaminant particles from the patterning device.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统和被配置为支撑图案形成装置的支撑结构。 图案形成装置被配置为向辐射束施加图案。 该装置包括图案形成装置清洁系统，该图案形成装置清洁系统被配置为向图案形成装置上的污染物颗粒提供静电力，并且由辐射束对其进行带电，以便从图案形成装置移除污染物颗粒。

公开(公告)号：US07405417B2

公开(公告)日：2008-07-29

申请号：US11311624

申请日：2005-12-20

申请人： Lucas Henricus Johannes Stevens ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Bastiaan Theodoor Wolschrijn

发明人： Lucas Henricus Johannes Stevens ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Bastiaan Theodoor Wolschrijn

IPC分类号： G01J3/10 ,  G01N21/88 ,  G03B27/72

CPC分类号： G01N21/9501 ,  G01N21/94 ,  G03F7/70916

摘要： A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a first radiation beam onto a target portion of a substrate, and at least one monitoring device for detecting contamination in a interior space. The monitoring device includes at least one dummy element having at least one contamination receiving surface. In an aspect of the invention, there is provided at least one dummy element which does not take part in transferring a radiation beam onto a target portion of a substrate, wherein it is monitored whether a contamination receiving surface of the dummy element has been contaminated.

摘要翻译： 公开了一种光刻设备。 该装置包括被配置为将第一辐射束投射到基板的目标部分上的投影系统，以及用于检测内部空间中的污染的至少一个监视装置。 监测装置包括至少一个具有至少一个污染物接收表面的虚拟元件。 在本发明的一个方面中，提供了至少一个虚拟元件，其不参与将辐射束传送到基板的目标部分上，其中监视虚设元件的污染物接收表面是否已被污染。

公开(公告)号：US08217347B2

公开(公告)日：2012-07-10

申请号：US13021226

申请日：2011-02-04

申请人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Ralph Kurt ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Peter Cornelis Zalm

发明人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Ralph Kurt ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Peter Cornelis Zalm

IPC分类号： G01N23/00

CPC分类号： G01N25/142 ,  G01N25/68 ,  Y10T436/25875

摘要： A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.

摘要翻译： 一种用于检测光刻设备的内部空间中的至少一种污染物质的系统，包括：被配置为与所述内部空间接触的至少一个监测表面;被配置为将所述监测表面的温度控制在至少 一个检测温度，以及至少一个检测器，被配置为检测所述至少一种污染物质到所述监测表面上的冷凝。

公开(公告)号：US07800079B2

公开(公告)日：2010-09-21

申请号：US10740829

申请日：2003-12-22

申请人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Yurii Victorvitch Sidelnikov ,  Marcel Mathijs Theodore Marie Dierichs ,  Marius Ravensbergen

发明人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Yurii Victorvitch Sidelnikov ,  Marcel Mathijs Theodore Marie Dierichs ,  Marius Ravensbergen

IPC分类号： G21G5/00

CPC分类号： G03F7/70916 ,  G03F7/7085

摘要： An assembly for detection of at least one of radiation flux and contamination on an optical component includes a detector configured to receive at least one of the radiation flux and contamination, and when the assembly is in use, to generate a detector signal correlated to at least one of the radiation flux and contamination on the component. A meter is configured to measure the detector signal. The detector includes at least one wire.

摘要翻译： 用于检测光学部件上的辐射通量和污染物中的至少一种的组件包括被配置为接收辐射通量和污染物中的至少一种的检测器，并且当使用该组件时，生成与至少相关的检测器信号 辐射通量和部件污染之一。 仪表被配置为测量检测器信号。 检测器包括至少一根线。

公开(公告)号：US07167232B2

公开(公告)日：2007-01-23

申请号：US10747613

申请日：2003-12-30

申请人： Vadim Yevgenyevich Banine ,  Johannes Peterus Henricus De Kuster ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans ,  Lucas Henricus Johannes Stevens

发明人： Vadim Yevgenyevich Banine ,  Johannes Peterus Henricus De Kuster ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans ,  Lucas Henricus Johannes Stevens

IPC分类号： G03B27/42

CPC分类号： G03F7/70908 ,  G03F7/70916

摘要： A lithographic apparatus is disclosed. The lithographic apparatus includes a radiation source that produces EUV radiation, an illumination system that provides a beam of the EUV radiation produced by the radiation source, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The radiation source includes a debris-mitigation system that mitigates debris particles which are formed during production of EUV radiation. The debris-mitigation system is configured to provide additional particles for interacting with the debris particles.

摘要翻译： 公开了一种光刻设备。 光刻设备包括产生EUV辐射的辐射源，提供由辐射源产生的EUV辐射束的照明系统和支持图案形成结构的支撑结构。 图案形成结构被配置为在其横截面中赋予辐射束图案。 该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。 辐射源包括减轻在生成EUV辐射期间形成的碎片颗粒的碎片减轻系统。 碎片减轻系统被配置为提供用于与碎屑颗粒相互作用的附加颗粒。

公开(公告)号：US07095479B2

公开(公告)日：2006-08-22

申请号：US10738981

申请日：2003-12-19

申请人： Lucas Henricus Johannes Stevens ,  Martinus Hendrikus Antonius Leenders ,  Hans Meiling ,  Johannes Hubertus Josephina Moors

发明人： Lucas Henricus Johannes Stevens ,  Martinus Hendrikus Antonius Leenders ,  Hans Meiling ,  Johannes Hubertus Josephina Moors

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70925 ,  B08B7/0035

摘要： A lithographic projection apparatus is disclosed. The apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, a plurality of optical elements that form part of at least one of the radiation system, the patterning structure, and the projection system; and a cleaning device. The cleaning device includes at least one cleaning beam of radiation, and a gas. The cleaning device is configured to clean an individual optical element or a subset of the plurality of optical elements.

摘要翻译： 公开了一种光刻投影装置。 该装置包括提供辐射束的辐射系统和支撑图形结构的支撑结构。 图形结构被配置为根据期望的图案对辐射束进行图案化。 该装置还包括支撑基板的基板支撑件，将图案化的光束投影到基板的目标部分上的投影系统，形成辐射系统，图案形成结构和至少一个的一部分的多个光学元件 投影系统; 和清洁装置。 清洁装置包括至少一个清洁的辐射束和气体。 清洁装置被配置为清洁单个光学元件或多个光学元件的子集。