METHOD OF CELL CULTURE AND METHOD OF TREATMENT COMPRISING A vEPO PROTEIN VARIANT
    2.
    发明申请
    METHOD OF CELL CULTURE AND METHOD OF TREATMENT COMPRISING A vEPO PROTEIN VARIANT 有权
    细胞培养方法和包含VEPO蛋白变体的处理方法

    公开(公告)号:US20110300114A1

    公开(公告)日:2011-12-08

    申请号:US12514773

    申请日:2007-11-12

    Abstract: In one aspect the present invention is concerned with a method of cell culture, comprising the steps of (i) obtaining a stem or progenitor cell sample, (ii) culturing the stem or progenitor cell sample in media and under closed conditions appropriate to cause proliferation or differentiation of the stem or progenitor cells, wherein the media comprises a vEPO protein variant, (iii) purifying the stem or progenitor cells ex vivo. The invention relates to a method of increasing the number and survival of stem and progenitor cells in vitro and in vivo using a vEPO protein variant. The invention also relates to improved differentiation of stem and progenitor cells in vitro and in vivo using a vEPO protein variant.

    Abstract translation: 一方面,本发明涉及细胞培养的方法,其包括以下步骤:(i)获得干细胞或祖细胞样品,(ii)培养干细胞或祖细胞样品在培养基中并在适于引起扩散的封闭条件下 或分化干细胞或祖细胞,其中培养基包含vEPO蛋白质变体,(iii)离体纯化干细胞或祖细胞。 本发明涉及使用vEPO蛋白质变体在体外和体内增加干细胞和祖细胞的数量和存活率的方法。 本发明还涉及使用vEPO蛋白质变体在体外和体内改进干细胞和祖细胞的分化。

    Method for automatic offset caculation for deposition of an aligned metal pattern onto selective emitter pattern and subsequent monitoring of alignment
    9.
    发明申请
    Method for automatic offset caculation for deposition of an aligned metal pattern onto selective emitter pattern and subsequent monitoring of alignment 失效
    用于自动偏移计算的方法,用于将对准的金属图案沉积到选择性发射器图案上并随后监测对准

    公开(公告)号:US20130040421A1

    公开(公告)日:2013-02-14

    申请号:US13358131

    申请日:2012-01-25

    Applicant: Andreas Meisel

    Inventor: Andreas Meisel

    Abstract: A method for calculating an offset value for aligned deposition of a second pattern onto a first pattern, comprising steps of: (a) loading a substrate with the first pattern on a surface of the substrate into a pattern recognition device at an original position inside the pattern recognition device; (b) determining a coordinate of a prescribed point of the first pattern by the pattern recognition device; (c) superimposing the second pattern onto the first pattern on the surface of the substrate; (d) bringing back the substrate with the first pattern and the second pattern into the original position inside the pattern recognition device; (e) determining a coordinate of a prescribed point of the second pattern by the pattern recognition device; wherein the prescribed point of the first pattern corresponds to the prescribed point of the second pattern; and (f) calculating the offset value between the first pattern and the second pattern.

    Abstract translation: 一种用于计算用于将第二图案对准沉积到第一图案上的偏移值的方法,包括以下步骤:(a)将基板的表面上的第一图案的基板加载到图案识别装置内部的原始位置 图案识别装置; (b)通过图案识别装置确定第一图案的规定点的坐标; (c)将第二图案叠加在基板的表面上的第一图案上; (d)将具有第一图案和第二图案的基板返回到图案识别装置内部的原始位置; (e)通过图案识别装置确定第二图案的规定点的坐标; 其中所述第一图案的规定点对应于所述第二图案的规定点; 和(f)计算第一图案和第二图案之间的偏移值。

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