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34 条记录 (耗时 0.019 秒)

    Photoresists, fluoropolymers and processes for 157 nm microlithography
    7.
    发明授权
    Photoresists, fluoropolymers and processes for 157 nm microlithography 失效
    光刻胶，含氟聚合物和157 nm微光刻法

    公开(公告)号：US07408011B2

    公开(公告)日：2008-08-05

    申请号：US10523492

    申请日：2003-08-08

    申请人： Andrew E. Feiring ,  Viacheslav Alexandrovich Petrov ,  Bruce Edmund Smart

    发明人： Andrew E. Feiring ,  Viacheslav Alexandrovich Petrov ,  Bruce Edmund Smart

    IPC分类号： C08F14/18

    CPC分类号： C08F214/26 ,  C08F214/18 ,  C08F232/08 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0395

    摘要： The invention provides a polymer having (a) at least one repeat unit derived from an ethylenically unsaturated compound having at least one fluorine atom covalently attached to an ethylenically unsaturated carbon atom; and (b) at least one repeat unit derived from an ethylenically unsaturated cyclic compound of structure: (I) wherein n is 0, 1, or 2; and R2 to R4 are independently H; C1-C10 alkyl or alkoxy, optionally substituted by halogen or ether oxygens; or C6-C20 aryl. These polymers can be used in making photoresist compositions and coated substrates.

    摘要翻译： 本发明提供了一种聚合物，其具有（a）至少一种衍生自具有至少一个与烯属不饱和碳原子共价连接的氟原子的烯属不饱和化合物的重复单元; 和（b）衍生自以下结构的烯属不饱和环状化合物的至少一个重复单元：（I）其中n为0,1或2; R 2和R 4独立地是H; C 1 -C 10烷基或烷氧基，任选被卤素或醚氧取代; 或C 6 -C 20芳基。 这些聚合物可用于制备光致抗蚀剂组合物和涂覆的基材。

    Protecting groups in polymers, photoresists and processes for microlithography
    9.
    发明授权
    Protecting groups in polymers, photoresists and processes for microlithography 失效
    聚合物，光致抗蚀剂和微光刻工艺中的保护基团

    公开(公告)号：US06899995B2

    公开(公告)日：2005-05-31

    申请号：US10398797

    申请日：2001-11-26

    申请人： Andrew E. Feiring ,  Viacheslav Alexandrovich Petrov ,  Frank L. Schadt, III

    发明人： Andrew E. Feiring ,  Viacheslav Alexandrovich Petrov ,  Frank L. Schadt, III

    IPC分类号： C08F216/16 ,  C08F224/00 ,  C08F232/04 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027 ,  G03F7/30

    CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0395

    摘要： The invention relates to a photoresist composition having a protecting group and a protected material incorporated in a cyclic chemical structure. In this invention a protected material has a cyclic ether group or cyclic ester group as a protecting group. A specific example of a cyclic ether group is an alkylene oxide, such as an oxetane group, substituted with one or more fluorinated alkyl groups. A specific example of a cyclic ester is a lactone which may be substituted with methyl groups. The photoresist composition further includes a photoactive component. The photoresist composition of this invention has a high transparency to ultraviolet radiation, particularly at short wavelengths such as (193) nm and (157) nm.

    摘要翻译： 本发明涉及一种具有保护基和掺入环状化学结构的保护材料的光致抗蚀剂组合物。 在本发明中，保护材料具有环状醚基或环状酯基作为保护基。 环醚基的具体实例是被一个或多个氟化烷基取代的环氧烷，例如氧杂环丁烷基。 环酯的具体实例是可被甲基取代的内酯。 光致抗蚀剂组合物还包括光活性组分。 本发明的光致抗蚀剂组合物对紫外线辐射具有高透明度，特别是在短波长（例如（193）nm和（157）nm）下。