公开(公告)号：US06790587B1

公开(公告)日：2004-09-14

申请号：US09959077

申请日：2001-10-17

申请人： Andrew Edward Feiring ,  Jerald Feldman ,  Frank Leonard Schadt, III

发明人： Andrew Edward Feiring ,  Jerald Feldman ,  Frank Leonard Schadt, III

IPC分类号： G03F7004

CPC分类号： C08F214/18 ,  C08F214/186 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0395 ,  Y10S430/108

摘要： Fluorinated polymers, photoresists and associated processes for microlithography are described. These polymers and photoresists are comprised of a fluoroalcohol functional group which simultaneously imparts high ultraviolet (UV) transparency and developability in basic media to these materials. The materials of this invention have high UV transparecy, particularly at short wavelengths, e.g., 157 nm, which makes them highly useful for lithography at these short wavelengths.

摘要翻译： 描述了用于微光刻的氟化聚合物，光致抗蚀剂和相关工艺。 这些聚合物和光致抗蚀剂由氟代醇官能团构成，其同时赋予这些材料在基本介质中高的紫外（UV）透明度和显影性。 本发明的材料具有高的UV透明度，特别是在短波长例如157nm，这使得它们在这些短波长下对于光刻非常有用。

公开(公告)号：US07217495B2

公开(公告)日：2007-05-15

申请号：US10888222

申请日：2004-07-09

申请人： Andrew Edward Feiring ,  Jerald Feldman ,  Frank Leonard Schadt, III

发明人： Andrew Edward Feiring ,  Jerald Feldman ,  Frank Leonard Schadt, III

IPC分类号： G03C1/73 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20 ,  G03F7/30

CPC分类号： C08F214/18 ,  C08F214/186 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0395 ,  Y10S430/108

摘要： Fluorinated polymers, photoresists and associated processes for microlithography are described. These polymers and photoresists are comprised of a fluoroalcohol functional group which simultaneously imparts high ultraviolet (UV) transparency and developability in basic media to these materials. The materials of this invention have high UV transparency, particularly at short wavelengths, e.g., 157 nm, which makes them highly useful for lithography at these short wavelengths.

摘要翻译： 描述了用于微光刻的氟化聚合物，光致抗蚀剂和相关工艺。 这些聚合物和光致抗蚀剂由氟代醇官能团构成，其同时赋予这些材料在基本介质中高的紫外（UV）透明度和显影性。 本发明的材料具有高的UV透明度，特别是在短波长例如157nm处，这使得它们在这些短波长下非常适用于光刻。

公开(公告)号：US07408013B2

公开(公告)日：2008-08-05

申请号：US10945124

申请日：2004-09-20

申请人： Andrew Edward Feiring ,  Michael Fryd ,  Frank Leonard Schadt, III

发明人： Andrew Edward Feiring ,  Michael Fryd ,  Frank Leonard Schadt, III

IPC分类号： C08F20/06 ,  C08F20/10

CPC分类号： C08F232/00 ,  C08F220/26 ,  C09D133/14 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0395 ,  G03F7/0397

摘要： The invention pertains to low polydispersity copolymers useful for photoimaging and photoresist compositions, and to the photoimaging processes which use these compositions. The low polydispersity copolymers of this invention are prepared using controlled radical polymerization (CRP) techniques, such as RAFT (reversible addition fragmentation chain transfer) polymerization.

摘要翻译： 本发明涉及用于光成像和光致抗蚀剂组合物的低分散性共聚物以及使用这些组合物的光成像方法。 使用例如RAFT（可逆加成断裂链转移）聚合的控制自由基聚合（CRP）技术制备本发明的低多分散性共聚物。

公开(公告)号：US06875555B1

公开(公告)日：2005-04-05

申请号：US10664303

申请日：2003-09-16

申请人： Andrew Edward Feiring ,  Viacheslav Alexandrovich Petrov ,  Frank Leonard Schadt, III

发明人： Andrew Edward Feiring ,  Viacheslav Alexandrovich Petrov ,  Frank Leonard Schadt, III

IPC分类号： C07C33/44 ,  C08F214/18 ,  C08F232/02 ,  G03C1/492 ,  G03F7/004 ,  G03F7/039

CPC分类号： G03F7/0046 ,  C07C33/44 ,  C08F232/02 ,  G03F7/0395

摘要： There is disclosed a composition comprising a mixture of endo- and exo-2-(bicyclo[2.2.1]hept-5-en-2-yl)-2,2-fluoroalkyl-ethan-2-ol which is rich in the exo isomer, preferably the endo/exo concentration ratio is no greater than 5/95. The composition is useful for forming a repeat unit of a polymer which polymer may further comprise additional repeat units derived-from tert-butyl acrylate, hydroxyadamantyl acrylate, protected or unprotected fluorinated-olefins, 2-methyl-2-adamantyl acrylate, 2-propenoic acid, 2-hydroxy-1,1,2-trimethylpropyl ester. Polymers of this invention are useful as the binder component of a photoresist composition for microlithography.

摘要翻译： 公开了一种组合物，其包含内 - 和外-2-（二环[2.2.1]庚-5-烯-2-基）-2,2-氟烷基 - 乙-2-醇的混合物，其富含 外异构体，优选内/外浓度比不大于5/95。 该组合物可用于形成聚合物的重复单元，该聚合物可以进一步包含衍生自丙烯酸叔丁酯，丙烯酸羟基金刚烷基酯，被保护或未保护的氟化烯烃，丙烯酸2-甲基-2-金刚烷基酯，2-丙烯酸 酸，2-羟基-1,1,2-三甲基丙酯。 本发明的聚合物可用作微光刻用光致抗蚀剂组合物的粘合剂组分。

公开(公告)号：US08048604B2

公开(公告)日：2011-11-01

申请号：US12909119

申请日：2010-10-21

申请人： Christopher P. Junk ,  Mark Andrew Harmer ,  Andrew Edward Feiring ,  Frank Leonard Schadt, III ,  Zoe Schnepp

发明人： Christopher P. Junk ,  Mark Andrew Harmer ,  Andrew Edward Feiring ,  Frank Leonard Schadt, III ,  Zoe Schnepp

IPC分类号： G03F7/00 ,  C07C309/02

CPC分类号： G03F7/0045 ,  C07C303/32 ,  C07C309/10 ,  C07C381/12 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397

摘要： Hydrofluoroalkanesulfonates of the general formula R—O—CXH—CX2—SO3M, where R is selected from the group consisting of alkyl groups, functionalized alkyl groups, and alkenyl groups; X is selected from the group consisting of hydrogen and fluorine with the proviso that at least one X is fluorine; and M is a cation, are made by reacting fluorovinyl ether with aqueous sulfite solution. Organic onium hydrofluoroalkanesulfonates are useful as ionic liquids and photoacid generators.

摘要翻译： 通式为R-O-CXH-CX2-SO3M的氢氟烷基磺酸盐，其中R选自烷基，官能化烷基和链烯基; X选自氢和氟，条件是至少一个X是氟; 并且M是阳离子，通过使氟乙烯基醚与亚硫酸盐水溶液反应而制成。 有机鎓氢氟烷基磺酸盐可用作离子液体和光酸产生剂。

公开(公告)号：US07834209B2

公开(公告)日：2010-11-16

申请号：US11447825

申请日：2006-06-06

申请人： Christopher P. Junk ,  Mark Andrew Harmer ,  Andrew Edward Feiring ,  Frank Leonard Schadt, III ,  Zoe Schnepp

发明人： Christopher P. Junk ,  Mark Andrew Harmer ,  Andrew Edward Feiring ,  Frank Leonard Schadt, III ,  Zoe Schnepp

IPC分类号： C07C309/02 ,  C07C315/00

CPC分类号： G03F7/0045 ,  C07C303/32 ,  C07C309/10 ,  C07C381/12 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397

摘要： Hydrofluoroalkanesulfonates of the general formula R—O—CXH—CX2—SO3M, where R is selected from the group consisting of alkyl groups, functionalized alkyl groups, and alkenyl groups; X is selected from the group consisting of hydrogen and fluorine with the proviso that at least one X is fluorine; and M is a cation, are made by reacting fluorovinyl ether with aqueous sulfite solution. Organic onium hydrofluoroalkanesulfonates are useful as ionic liquids and photoacid generators.

摘要翻译： 通式为R-O-CXH-CX2-SO3M的氢氟烷基磺酸盐，其中R选自烷基，官能化烷基和链烯基; X选自氢和氟，条件是至少一个X是氟; 并且M是阳离子，通过使氟乙烯基醚与亚硫酸盐水溶液反应而制成。 有机鎓氢氟烷基磺酸盐可用作离子液体和光酸产生剂。

公开(公告)号：US07507522B2

公开(公告)日：2009-03-24

申请号：US11578278

申请日：2005-05-17

申请人： Michael Karl Crawford ,  Hoang Vi Tran ,  Frank Leonard Schadt, III ,  Fredrick Claus Zumsteg, Jr. ,  Andrew Edward Feiring ,  Michael Fryd

发明人： Michael Karl Crawford ,  Hoang Vi Tran ,  Frank Leonard Schadt, III ,  Fredrick Claus Zumsteg, Jr. ,  Andrew Edward Feiring ,  Michael Fryd

IPC分类号： G03F7/004

CPC分类号： C08F214/18 ,  C07C33/44 ,  C07C43/1781 ,  C07C43/196 ,  C07C2602/42 ,  C07C2603/62 ,  C07C2603/86 ,  C08F214/26 ,  C08F220/18 ,  C08F220/26 ,  C08F232/08 ,  G03F7/0046 ,  G03F7/0395 ,  Y10S430/106 ,  Y10S430/108

摘要： The present invention relates to novel unsaturated polycyclic compounds containing two fluoroalcohol substitutents. This invention also relates to homopolymers and copolymers derived from such unsaturated polycyclic compounds. The copolymers are useful for photoimaging compositions and, in particular, photoresist compositions (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The polymers are especially useful in photoresist compositions having high UV transparency (particularly at short wavelengths, e.g., 157 nm) which are useful as base resins in resists and potentially in many other applications.

摘要翻译： 本发明涉及含有两个氟代醇取代基的新型不饱和多环化合物。 本发明还涉及衍生自这种不饱和多环化合物的均聚物和共聚物。 共聚物可用于光成像组合物，特别是用于制造半导体器件的成像的光致抗蚀剂组合物（正性和/或负性）。 聚合物特别适用于具有高UV透明度（特别是短波长，例如157nm）的光致抗蚀剂组合物，其可用作抗蚀剂中的基础树脂并且潜在地在许多其它应用中。

公开(公告)号：US07022457B2

公开(公告)日：2006-04-04

申请号：US10669492

申请日：2003-09-24

申请人： William Brown Farnham ,  Andrew Edward Feiring ,  Frank Leonard Schadt, III ,  Weiming Qiu

发明人： William Brown Farnham ,  Andrew Edward Feiring ,  Frank Leonard Schadt, III ,  Weiming Qiu

IPC分类号： G03C1/73 ,  G03C1/76 ,  G03F7/038 ,  G03F7/039 ,  G03F7/30

CPC分类号： G03F7/0395 ,  G03F7/0046 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111 ,  Y10S430/115

摘要： The present invention pertains to photoimaging and the use of photoresists (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The present invention also pertains to novel hydroxy ester-containing polymer compositions that are useful as base resins in resists and potentially in many other applications.

摘要翻译： 本发明涉及在制造半导体器件中的光成像和光致抗蚀剂（正性和/或负性）用于成像的用途。 本发明还涉及可用作抗蚀剂中的潜在的许多其它应用中的基础树脂的新型含羟基酯的聚合物组合物。

公开(公告)号：US06593058B1

公开(公告)日：2003-07-15

申请号：US09806096

申请日：2001-03-23

申请人： Andrew Edward Feiring ,  Jerald Feldman

发明人： Andrew Edward Feiring ,  Jerald Feldman

IPC分类号： G03C173

CPC分类号： G03F7/0395 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/039 ,  G03F7/0397 ,  Y10S430/108 ,  Y10S430/111 ,  Y10S430/115

摘要： Photoresists and associated processes for microlithography in the extreme, far, and near UV are disclosed. The photoresists in some embodiments comprise (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic and at least one ethylenically unsaturated compound contains at least one fluorine atom covalently attached to an ethylenically unsaturated carbon atom; and (b) at least one photoactive component. In other embodiments, the photoresist comprise a fluorine-containing copolymer comprising a repeat unit derived from at least one polycyclic ethylenically unsaturated compound having at least one atom or group selected from the group consisting of fluorine atom, perfluoroalkyl group, and perfluoroalkoxy group, characterized in that the at least one atom or group is covalently attached to a carbon atom which is contained within a ring structure and separated from each ethylenically unsaturated carbon atom of the ethylenically unsaturated compound by at least one coralently attached carbon atom. The photoresists have high transparency in the extreme/far UV as well as the near UV, high plasma etch resistance, and are useful for microlithography in the extreme, far, and near ultraviolet (UV) region, particularly at wavelengths ≦365 nm. Novel fluorine-containing copolymers are also disclosed.

摘要翻译： 公开了在极端的，远的和近的紫外线下的微光刻的光致抗蚀剂和相关的工艺。 在一些实施方案中，光致抗蚀剂包含（a）包含衍生自至少一种烯键式不饱和化合物的重复单元的含氟共聚物，其特征在于至少一种烯属不饱和化合物是多环的，并且至少一种烯属不饱和化合物含有至少一个氟原子 共价连接到烯属不饱和碳原子上; 和（b）至少一种光活性组分。 在其它实施方案中，光致抗蚀剂包含含有共聚物的含氟共聚物，该共聚物包含衍生自至少一种具有至少一个选自氟原子，全氟烷基和全氟烷氧基的原子或基团的多环烯属不饱和化合物的重复单元，其特征在于 所述至少一个原子或基团共价连接到环结构中包含的碳原子，并且通过至少一个正确连接的碳原子与烯属不饱和化合物的每个烯属不饱和碳原子分离。 光致抗蚀剂在极端/远紫外线以及近紫外线，高等离子体蚀刻电阻方面具有高透明度，并且可用于极端，远紫外（UV）区域，特别是在波长<= 365nm处的微光刻。 还公开了新的含氟共聚物。

公开(公告)号：US07276323B2

公开(公告)日：2007-10-02

申请号：US10437760

申请日：2003-05-14

申请人： Andrew Edward Feiring ,  Jerald Feldman

发明人： Andrew Edward Feiring ,  Jerald Feldman

IPC分类号： G03C1/73 ,  G03F7/038 ,  G03F7/20 ,  G03F7/30 ,  G03F7/32

CPC分类号： G03F7/0395 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/039 ,  G03F7/0397 ,  Y10S430/108 ,  Y10S430/111 ,  Y10S430/115

摘要： Photoresists and associated processes for microlithography in the extreme, far, and near UV are disclosed. The photoresists in some embodiments comprise (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic and at least one ethylenically unsaturated compound contains at least one fluorine atom covalently attached to an ethylenically unsaturated carbon atom; and (b) at least one photoactive component. In other embodiments, the photoresists comprise a fluorine-containing copolymer comprising a repeat unit derived from at least one polycyclic ethylenically unsaturated compound having at least one atom or group selected from the group consisting of fluorine atom, perfluoroalkyl group, and perfluoroalkoxy group, characterized in that the at least one atom or group is covalently attached to a carbon atom which is contained within a ring structure and separated from each ethylenically unsaturated carbon atom of the ethylenically unsaturated compound by at least one covalently attached carbon atom. The photoresists have high transparency in the extreme/far UV as well as the near UV, high plasma etch resistance, and are useful for microlithography in the extreme, far, and near ultraviolet (UV) region, particularly at wavelengths ≦365 nm. Novel fluorine-containing copolymers are also disclosed.

摘要翻译： 公开了在极端的，远的和近的紫外线下的微光刻的光致抗蚀剂和相关的工艺。 在一些实施方案中，光致抗蚀剂包含（a）包含衍生自至少一种烯键式不饱和化合物的重复单元的含氟共聚物，其特征在于至少一种烯属不饱和化合物是多环的，并且至少一种烯属不饱和化合物含有至少一个氟原子 共价连接到烯键式不饱和碳原子上; 和（b）至少一种光活性组分。 在其它实施方案中，光致抗蚀剂包括含有共聚物的含氟共聚物，该共聚物包含衍生自至少一种具有至少一个选自氟原子，全氟烷基和全氟烷氧基的原子或基团的多环烯键式不饱和化合物的重复单元，其特征在于 所述至少一个原子或基团共价连接到环状结构中包含的碳原子，并且通过至少一个共价连接的碳原子与烯属不饱和化合物的每个烯属不饱和碳原子分离。 光致抗蚀剂在极端/远紫外线以及近紫外线，高等离子体蚀刻电阻方面具有高透明度，并且可用于极端，远紫外（UV）区域，特别是在波长<= 365nm处的微光刻。 还公开了新的含氟共聚物。