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    Photoresists, polymers and processes for microlithography
    1.
    发明授权
    Photoresists, polymers and processes for microlithography 有权
    光刻胶，聚合物和微光刻工艺

    公开(公告)号：US06593058B1

    公开(公告)日：2003-07-15

    申请号：US09806096

    申请日：2001-03-23

    申请人： Andrew Edward Feiring ,  Jerald Feldman

    发明人： Andrew Edward Feiring ,  Jerald Feldman

    IPC分类号： G03C173

    CPC分类号： G03F7/0395 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/039 ,  G03F7/0397 ,  Y10S430/108 ,  Y10S430/111 ,  Y10S430/115

    摘要： Photoresists and associated processes for microlithography in the extreme, far, and near UV are disclosed. The photoresists in some embodiments comprise (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic and at least one ethylenically unsaturated compound contains at least one fluorine atom covalently attached to an ethylenically unsaturated carbon atom; and (b) at least one photoactive component. In other embodiments, the photoresist comprise a fluorine-containing copolymer comprising a repeat unit derived from at least one polycyclic ethylenically unsaturated compound having at least one atom or group selected from the group consisting of fluorine atom, perfluoroalkyl group, and perfluoroalkoxy group, characterized in that the at least one atom or group is covalently attached to a carbon atom which is contained within a ring structure and separated from each ethylenically unsaturated carbon atom of the ethylenically unsaturated compound by at least one coralently attached carbon atom. The photoresists have high transparency in the extreme/far UV as well as the near UV, high plasma etch resistance, and are useful for microlithography in the extreme, far, and near ultraviolet (UV) region, particularly at wavelengths ≦365 nm. Novel fluorine-containing copolymers are also disclosed.

    摘要翻译： 公开了在极端的，远的和近的紫外线下的微光刻的光致抗蚀剂和相关的工艺。 在一些实施方案中，光致抗蚀剂包含（a）包含衍生自至少一种烯键式不饱和化合物的重复单元的含氟共聚物，其特征在于至少一种烯属不饱和化合物是多环的，并且至少一种烯属不饱和化合物含有至少一个氟原子 共价连接到烯属不饱和碳原子上; 和（b）至少一种光活性组分。 在其它实施方案中，光致抗蚀剂包含含有共聚物的含氟共聚物，该共聚物包含衍生自至少一种具有至少一个选自氟原子，全氟烷基和全氟烷氧基的原子或基团的多环烯属不饱和化合物的重复单元，其特征在于 所述至少一个原子或基团共价连接到环结构中包含的碳原子，并且通过至少一个正确连接的碳原子与烯属不饱和化合物的每个烯属不饱和碳原子分离。 光致抗蚀剂在极端/远紫外线以及近紫外线，高等离子体蚀刻电阻方面具有高透明度，并且可用于极端，远紫外（UV）区域，特别是在波长<= 365nm处的微光刻。 还公开了新的含氟共聚物。

    Photoresists, polymers and processes for microlithography
    3.
    发明授权
    Photoresists, polymers and processes for microlithography 有权
    光刻胶，聚合物和微光刻工艺

    公开(公告)号：US07276323B2

    公开(公告)日：2007-10-02

    申请号：US10437760

    申请日：2003-05-14

    申请人： Andrew Edward Feiring ,  Jerald Feldman

    发明人： Andrew Edward Feiring ,  Jerald Feldman

    IPC分类号： G03C1/73 ,  G03F7/038 ,  G03F7/20 ,  G03F7/30 ,  G03F7/32

    CPC分类号： G03F7/0395 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/039 ,  G03F7/0397 ,  Y10S430/108 ,  Y10S430/111 ,  Y10S430/115

    摘要： Photoresists and associated processes for microlithography in the extreme, far, and near UV are disclosed. The photoresists in some embodiments comprise (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic and at least one ethylenically unsaturated compound contains at least one fluorine atom covalently attached to an ethylenically unsaturated carbon atom; and (b) at least one photoactive component. In other embodiments, the photoresists comprise a fluorine-containing copolymer comprising a repeat unit derived from at least one polycyclic ethylenically unsaturated compound having at least one atom or group selected from the group consisting of fluorine atom, perfluoroalkyl group, and perfluoroalkoxy group, characterized in that the at least one atom or group is covalently attached to a carbon atom which is contained within a ring structure and separated from each ethylenically unsaturated carbon atom of the ethylenically unsaturated compound by at least one covalently attached carbon atom. The photoresists have high transparency in the extreme/far UV as well as the near UV, high plasma etch resistance, and are useful for microlithography in the extreme, far, and near ultraviolet (UV) region, particularly at wavelengths ≦365 nm. Novel fluorine-containing copolymers are also disclosed.

    摘要翻译： 公开了在极端的，远的和近的紫外线下的微光刻的光致抗蚀剂和相关的工艺。 在一些实施方案中，光致抗蚀剂包含（a）包含衍生自至少一种烯键式不饱和化合物的重复单元的含氟共聚物，其特征在于至少一种烯属不饱和化合物是多环的，并且至少一种烯属不饱和化合物含有至少一个氟原子 共价连接到烯键式不饱和碳原子上; 和（b）至少一种光活性组分。 在其它实施方案中，光致抗蚀剂包括含有共聚物的含氟共聚物，该共聚物包含衍生自至少一种具有至少一个选自氟原子，全氟烷基和全氟烷氧基的原子或基团的多环烯键式不饱和化合物的重复单元，其特征在于 所述至少一个原子或基团共价连接到环状结构中包含的碳原子，并且通过至少一个共价连接的碳原子与烯属不饱和化合物的每个烯属不饱和碳原子分离。 光致抗蚀剂在极端/远紫外线以及近紫外线，高等离子体蚀刻电阻方面具有高透明度，并且可用于极端，远紫外（UV）区域，特别是在波长<= 365nm处的微光刻。 还公开了新的含氟共聚物。

    Protected air-activated organotin catalysts for polyurethane synthesis and processes therefore
    6.
    发明授权
    Protected air-activated organotin catalysts for polyurethane synthesis and processes therefore 有权
    因此，用于聚氨酯合成和保护的空气活化有机锡催化剂

    公开(公告)号：US08026333B2

    公开(公告)日：2011-09-27

    申请号：US11639083

    申请日：2006-12-13

    申请人： Jerald Feldman ,  Stephan J. McLain ,  Robert John Barsotti ,  James William O'Neil

    发明人： Jerald Feldman ,  Stephan J. McLain ,  Robert John Barsotti ,  James William O'Neil

    IPC分类号： C08G18/24 ,  C08L75/04 ,  C09D175/04

    CPC分类号： C08G18/792 ,  C08G18/242 ,  C08G18/244 ,  C08G18/341 ,  C08G18/718 ,  H05K3/285

    摘要： This invention relates to a protected organotin-based catalyst system for polyurethane synthesis that is useful in coatings applications. The catalyst has a formula according to; R1aR2bR3cSn[CH(OX)R4]d, wherein R1, R2, and R3 are the same or different and represent an optionally substituted hydrocarbyl, aromatic, alkoxide, amide, halide or stannyl group, R4 represents an optionally substituted hydrocarbyl or optionally substituted aryl group. a, b, and c are independently 0, 1, 2, or 3; d is 1, 2 or 3; and a+b+c+d=4; and X is an acid-labile or moisture-labile protecting group. When a coating mixture comprising the catalyst is sprayed and/or applied to a substrate as a thin film in air, the catalyst is activated. For solvent-based refinish systems comprising hydroxyl and isocyanate species at high solids levels, the catalyst system therefore provides extended viscosity stability, i.e., pot life.

    摘要翻译： 本发明涉及用于聚氨酯合成的受保护的有机锡基催化剂体系，其可用于涂料应用。 催化剂具有下式： R1aR2bR3cSn [CH（OX）R4] d，其中R1，R2和R3相同或不同，表示任选取代的烃基，芳族，醇盐，酰胺，卤化物或甲锡烷基，R4表示任选取代的烃基或任选取代的芳基 组。 a，b和c独立地为0,1,2或3; d为1,2或3; 和a + b + c + d = 4; X是酸不稳定或潮湿不稳定的保护基。 当包含催化剂的涂料混合物在空气中作为薄膜喷涂和/或施加到基材上时，催化剂被活化。 对于含有高固体含量的羟基和异氰酸酯物质的基于溶剂的修补体系，催化剂体系因此提供了延长的粘度稳定性，即适用期。