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1.发明授权公开(公告)号：US07261830B2
公开(公告)日：2007-08-28
申请号：US10687562
申请日：2003-10-16
IPC分类号： C23F1/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： The present invention comprises a method for applying a liquid, such as imprinting material, to a substrate that features use of an electromagnetic field to rapidly spread the liquid over a desired portion of the substrate, while confining the same to the desired region.
摘要翻译： 本发明包括用于将液体（例如压印材料）施加到特征为使用电磁场的衬底的方法，以将液体快速地扩散到衬底的期望部分上，同时将其限定在所需区域。
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2.发明授权公开(公告)号：US07635445B2
公开(公告)日：2009-12-22
申请号：US11108208
申请日：2005-04-18
申请人： Byung-Jin Choi , Anshuman Cherala , Yeong-jun Choi , Mario J. Meissl , Sidlgata V. Sreenivasan , Norman E. Schumaker , Xiaoming Lu , Ian M. McMackin , Daniel A. Babbs
发明人： Byung-Jin Choi , Anshuman Cherala , Yeong-jun Choi , Mario J. Meissl , Sidlgata V. Sreenivasan , Norman E. Schumaker , Xiaoming Lu , Ian M. McMackin , Daniel A. Babbs
IPC分类号： H01L21/31 , H01L21/469
CPC分类号： H01L21/6875 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/6838 , Y10S977/887
摘要： The present invention is directed towards a method of separating a mold, included in a template, from a layer disposed on a substrate, the method including, inter alia, applying a separation force to the template to separate the template from the layer; and facilitating localized deformation in the substrate to reduce the separation force required to achieve separation.
摘要翻译： 本发明涉及一种将包含在模板中的模具与设置在基板上的层分离的方法，该方法尤其包括向模板施加分离力以将模板与层分离; 并且促进基板中的局部变形以减小实现分离所需的分离力。
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公开(公告)号：US08968620B2
公开(公告)日：2015-03-03
申请号：US13095514
申请日：2011-04-27
申请人： Se-Hyuk Im , Mahadevan GanapathiSubramanian , Edward Brian Fletcher , Niyaz Khusnatdinov , Gerard M. Schmid , Mario Johannes Meissl , Anshuman Cherala , Frank Y. Xu , Byung-Jin Choi , Sidlgata V. Sreenivasan
发明人： Se-Hyuk Im , Mahadevan GanapathiSubramanian , Edward Brian Fletcher , Niyaz Khusnatdinov , Gerard M. Schmid , Mario Johannes Meissl , Anshuman Cherala , Frank Y. Xu , Byung-Jin Choi , Sidlgata V. Sreenivasan
CPC分类号： B29C59/02 , B29C45/76 , B29L2007/001 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10S977/877
摘要： Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.
摘要翻译： 通过选择模板和/或衬底厚度（Tt和/或Tb），模板和/或衬底背压（Pt和/或Pb）的控制来控制模板和衬底之间的横向应变和横向应变比（dt / db） ）和/或材料刚度的选择。
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公开(公告)号：US09778562B2
公开(公告)日：2017-10-03
申请号：US12275998
申请日：2008-11-21
申请人： Frank Y. Xu , Weijun Liu , Edward Brian Fletcher , Sidlgata V. Sreenivasan , Byung Jin Choi , Niyaz Khusnatdinov , Anshuman Cherala , Kosta S. Selinidis
发明人： Frank Y. Xu , Weijun Liu , Edward Brian Fletcher , Sidlgata V. Sreenivasan , Byung Jin Choi , Niyaz Khusnatdinov , Anshuman Cherala , Kosta S. Selinidis
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10T428/249978
摘要： An imprint lithography template or imprinting stack includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. A porosity of the porous material is at least about 10%. The porous template, the porous imprinting stack, or both may be used in an imprint lithography process to facilitate diffusion of gas trapped between the template and the imprinting stack into the template, the imprinting stack or both, such that polymerizable material between the imprinting stack and the template rapidly forms a substantially continuous layer between the imprinting stack and the template.
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公开(公告)号：US20110260361A1
公开(公告)日：2011-10-27
申请号：US13095514
申请日：2011-04-27
申请人： Se-Hyuk Im , Mahadevan GanapathiSubramanian , Edward Brian Fletcher , Niyaz Khusnatdinov , Gerard M. Schmid , Mario Johannes Meissl , Anshuman Cherala , Frank Y. Xu , Byung-Jin Choi , Sidlgata V. Sreenivasan
发明人： Se-Hyuk Im , Mahadevan GanapathiSubramanian , Edward Brian Fletcher , Niyaz Khusnatdinov , Gerard M. Schmid , Mario Johannes Meissl , Anshuman Cherala , Frank Y. Xu , Byung-Jin Choi , Sidlgata V. Sreenivasan
CPC分类号： B29C59/02 , B29C45/76 , B29L2007/001 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10S977/877
摘要： Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.
摘要翻译： 通过选择模板和/或衬底厚度（Tt和/或Tb），模板和/或衬底背压（Pt和/或Pb）的控制来控制模板和衬底之间的横向应变和横向应变比（dt / db） ）和/或材料刚度的选择。
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6.发明申请METHOD FOR OBTAINING FORCE COMBINATIONS FOR TEMPLATE DEFORMATION USING NULLSPACE AND METHODS OPTIMIZATION TECHNIQUES 审中-公开使用空位获取模板变形的力组合的方法和方法优化技术公开(公告)号：US20100259745A1
公开(公告)日：2010-10-14
申请号：US12820542
申请日：2010-06-22
IPC分类号： G03B27/32
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/703 , G03F7/70633 , G03F7/70783 , G03F9/7003 , G03F9/7092
摘要： The present invention is directed towards a method for determining deformation parameters that a patterned device would undergo to minimize dimensional variations between a recorded pattern thereon and a reference pattern, the method including, inter alia, comparing spatial variation between features of the recorded pattern with respect to corresponding features of the reference pattern; and determining deformation forces to apply to the patterned device to attenuate the dimensional variations, with the forces having predetermined constraints, wherein a summation of a magnitude of the forces is substantially zero and a summation of moment of the forces is substantially zero.
摘要翻译： 本发明涉及一种用于确定图案化装置将经历以使其上的记录图案与参考图案之间的尺寸变化最小化的变形参数的方法，该方法尤其包括将记录图案的特征与相对于 参考图案的相应特征; 以及确定施加到所述图案化装置上的变形力以衰减所述尺寸变化，其中所述力具有预定的约束，其中所述力的大小的总和基本上为零，并且所述力的力矩的总和基本上为零。
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7.发明授权公开(公告)号：US07170589B2
公开(公告)日：2007-01-30
申请号：US11142839
申请日：2005-06-01
申请人： Anshuman Cherala , Byung-Jin Choi , Pawan K Nimmakayala , Mario J. Meissl , Sidlgata V. Sreenivasan
发明人： Anshuman Cherala , Byung-Jin Choi , Pawan K Nimmakayala , Mario J. Meissl , Sidlgata V. Sreenivasan
CPC分类号： G03F7/0002 , B82Y10/00
摘要： The present invention is directed toward a system to vary dimensions of a substrate, such as a template having a patterned mold. To that end, the system includes a substrate chuck adapted to position the substrate in a region; a pliant member; and an actuator sub-assembly elastically coupled to the substrate chuck through the pliant member. The actuator assembly includes a plurality of lever sub-assemblies, one of which includes a body lying in the region and spaced-apart from an opposing body associated with one of the remaining lever sub-assemblies of the plurality of lever sub-assemblies. One of the plurality of lever assemblies is adapted to vary a distance between the body and the opposing body. In this manner, compressive forces may be applied to the template to remove unwanted magnification or other distortions in the pattern on the mold. The pliant member is configured to attenuate a magnitude of resulting forces sensed by the substrate chuck generated in response to the compressive forces.
摘要翻译： 本发明涉及一种改变基底的尺寸的系统，例如具有图案化模具的模板。 为此，系统包括适于将衬底定位在区域中的衬底卡盘; 柔顺的会员 以及致动器子组件，其通过柔性构件弹性地联接到基板卡盘。 所述致动器组件包括多个杠杆子组件，其中一个杆子组件包括位于所述区域中并与与所述多个杠杆子组件中的剩余杠杆子组件之一相关联的相对主体间隔开的主体。 多个杠杆组件中的一个适于改变主体和相对主体之间的距离。 以这种方式，可以对模板施加压缩力以去除模具上的图案中的不期望的放大或其它变形。 柔性构件被构造成衰减由响应于压缩力产生的基板卡盘感测的结果力的大小。
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公开(公告)号：US20090140458A1
公开(公告)日：2009-06-04
申请号：US12275998
申请日：2008-11-21
申请人： Frank Y. Xu , Weijun Liu , Edward Brian Fletcher , Sidlgata V. Sreenivasan , Byung Jin Choi , Niyaz Khusnatdinov , Anshuman Cherala , Kosta S. Selinidis
发明人： Frank Y. Xu , Weijun Liu , Edward Brian Fletcher , Sidlgata V. Sreenivasan , Byung Jin Choi , Niyaz Khusnatdinov , Anshuman Cherala , Kosta S. Selinidis
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10T428/249978
摘要： An imprint lithography template or imprinting stack includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. A porosity of the porous material is at least about 10%. The porous template, the porous imprinting stack, or both may be used in an imprint lithography process to facilitate diffusion of gas trapped between the template and the imprinting stack into the template, the imprinting stack or both, such that polymerizable material between the imprinting stack and the template rapidly forms a substantially continuous layer between the imprinting stack and the template.
摘要翻译： 压印光刻模板或压印叠层包括限定平均孔径至少约0.4nm的多个孔的多孔材料。 多孔材料的孔隙率至少约为10％。 多孔模板，多孔印迹叠层或两者可用于压印光刻工艺，以便于将模板和压印叠层之间的气体扩散到模板，压印叠层或两者中，使得压印叠层之间的可聚合材料 并且模板在压印堆栈和模板之间快速形成基本上连续的层。
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9.发明授权System and method for improvement of alignment and overlay for microlithography 有权用于微光刻的对准和覆盖的改进的系统和方法公开(公告)号：US07535549B2
公开(公告)日：2009-05-19
申请号：US11143076
申请日：2005-06-02
CPC分类号： G03F7/70783 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/703 , G03F7/70633 , G03F9/7003 , G03F9/7092
摘要： The present invention provides a method for determining the forces to be applied to a substrate in order to deform the same and correct for overlay misalignment.
摘要翻译： 本发明提供了一种用于确定施加到基底上的力以使其变形并且对于重叠失准进行校正的方法。
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10.发明授权公开(公告)号：US07323130B2
公开(公告)日：2008-01-29
申请号：US10735110
申请日：2003-12-12
CPC分类号： B82Y10/00 , B29C59/02 , B82Y40/00 , G03F7/0002 , G03F9/00
摘要： The present invention is directed to a method of controlling dimensional relations between an original pattern present in a mold and a recorded pattern formed in a layer of a substrate. In this manner, the size of the recorded pattern may appear to be magnified and/or reduced, when compared to the original pattern. To that end, the method comprises defining a region on the layer in which to produce the recorded pattern. The substrate is bent to produce a contoured surface in the region. Dimensional variations in the original pattern are produced by bending the mold, defining a varied pattern. The contoured surface and the mold are provided to have similar radii of curvatures. The varied pattern is then recorded in the layer. These and other embodiments of the present invention are discussed more fully below.
摘要翻译： 本发明涉及一种控制存在于模具中的原始图案与形成在基底层中的记录图案之间的尺寸关系的方法。 以这种方式，与原始图案相比，记录图案的尺寸可能看起来被放大和/或缩小。 为此，该方法包括定义在其上产生记录图案的层上的区域。 该基底被弯曲以在该区域中产生轮廓表面。 通过弯曲模具产生原始图案的尺寸变化，限定了不同的图案。 轮廓表面和模具被提供以具有相似的曲率半径。 然后将不同的图案记录在图层中。 下面将更全面地讨论本发明的这些和其它实施例。
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