公开(公告)号：US20160133489A1

公开(公告)日：2016-05-12

申请号：US14589990

申请日：2015-01-05

Applicant: APPLIED MATERIALS, INC.

Inventor： Karthik JANAKIRAMAN ,  Abhijit Basu MALLICK ,  Hari K. PONNEKANTI ,  Mandyam SRIRAM ,  Alexandros T. DEMOS ,  Mukund SRINIVASAN ,  Juan Carlos ROCHA-ALVAREZ ,  Dale R. DUBOIS

IPC: H01L21/67 ,  C23C16/458 ,  H01L21/687 ,  C23C14/58 ,  C23C14/50 ,  B05C13/00 ,  C23C16/56

CPC classification number: H01L21/67207 ,  H01L21/67126 ,  H01L21/6719 ,  H01L21/67213 ,  H01L21/67709 ,  H01L21/6776

Abstract: An apparatus and method for processing a substrate in a processing system containing a deposition chamber, a treatment chamber, and an isolation region, separating the deposition chamber from the treatment is described herein. The deposition chamber deposits a film on a substrate. The treatment chamber receives the substrate from the deposition chamber and alters the film deposited in the deposition chamber with a film property altering device. Processing systems and methods are provided in accordance with the above embodiment and other embodiments.

Abstract translation: 本文描述了一种用于在包含沉积室，处理室和隔离区域的处理系统中处理衬底的装置和方法，将沉积室与处理分离。 沉积室在基板上沉积膜。 处理室从沉积室接收衬底并且利用膜性质改变装置改变沉积在沉积室中的膜。 根据上述实施例和其他实施例提供处理系统和方法。

公开(公告)号：US20170263484A1

公开(公告)日：2017-09-14

申请号：US15608472

申请日：2017-05-30

Applicant: Applied Materials, Inc.

Inventor： Xing LIN ,  Bozhi YANG ,  Jianhua ZHOU ,  Dale R. DUBOIS ,  Juan Carlos ROCHA-ALVAREZ ,  Ramprakash SANKARAKRISHNAN

IPC: H01L21/687 ,  C23C16/458 ,  C23C16/50 ,  H01L21/67

CPC classification number: H01L21/687 ,  C23C16/4586 ,  C23C16/50 ,  H01J37/32577 ,  H01J37/32724 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/68792

Abstract: A method and apparatus for a heated pedestal is provided. In one embodiment, the heated pedestal includes a body comprising a ceramic material, a plurality of heating elements encapsulated within the body, and one or more grooves formed in a surface of the body adjacent each of the plurality of heating elements, at least one side of the grooves being bounded by a ceramic plate.

公开(公告)号：US20190035665A1

公开(公告)日：2019-01-31

申请号：US16148639

申请日：2018-10-01

Applicant: Applied Materials, Inc.

Inventor： Xing LIN ,  Bozhi YANG ,  Jianhua ZHOU ,  Dale R. DUBOIS ,  Juan Carlos ROCHA-ALVAREZ ,  Ramprakash SANKARAKRISHNAN

IPC: H01L21/687 ,  H01L21/67 ,  C23C16/458 ,  H01J37/32 ,  C23C16/50

Abstract: A method and apparatus for a heated pedestal is provided. In one embodiment, the heated pedestal includes a body comprising a ceramic material, a plurality of heating elements encapsulated within the body, and one or more grooves formed in a surface of the body adjacent each of the plurality of heating elements, at least one side of the grooves being bounded by a ceramic plate.

公开(公告)号：US20160312359A1

公开(公告)日：2016-10-27

申请号：US15138209

申请日：2016-04-25

Applicant: Applied Materials, Inc.

Inventor： Dale R. DUBOIS ,  Kalyanjit GHOSH ,  Kien N. CHUC ,  Mayur G. KULKARNI ,  Sanjeev BALUJA ,  Yanjie WANG ,  Sungjin KIM

IPC: C23C16/455

CPC classification number: C23C16/4401 ,  H01J37/32477 ,  H01J37/32623 ,  H01J37/32651

Abstract: A process chamber is provided including a sidewall, a substrate support having an outer ledge, and a gas inlet beneath the substrate support. The process chamber further includes a first liner disposed around a bottom surface of the outer ledge of the substrate support. The first liner has an inner surface separated from the outer ledge of the substrate support by a first gap. The process chamber further includes a flow isolator ring having an inner bottom surface disposed on the outer ledge of the substrate support and an outer bottom surface extending outwardly relative to the inner bottom surface, the outer bottom surface overlying the first gap.

Abstract translation: 提供了一种处理室，其包括侧壁，具有外凸缘的基板支撑件和在基板支撑件下方的气体入口。 处理室还包括围绕衬底支撑件的外凸缘的底表面设置的第一衬套。 第一衬垫具有通过第一间隙与衬底支撑件的外凸缘分离的内表面。 处理室还包括流动隔离器环，其具有设置在基板支撑件的外凸缘上的内底表面和相对于内底表面向外延伸的外底表面，外底表面覆盖第一间隙。

公开(公告)号：US20160002779A1

公开(公告)日：2016-01-07

申请号：US14738610

申请日：2015-06-12

Applicant: Applied Materials, Inc.

Inventor： XING LIN ,  Bozhi YANG ,  Jianhua ZHOU ,  Dale R. DUBOIS ,  Juan Carlos ROCHA-ALVAREZ ,  Ramprakash SANKARAKRISHNAN

IPC: C23C16/458 ,  C23C16/50 ,  H01L21/687

CPC classification number: H01L21/687 ,  C23C16/4586 ,  C23C16/50 ,  H01J37/32577 ,  H01J37/32724 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/68792

Abstract: A method and apparatus for a heated pedestal is provided. In one embodiment, the heated pedestal includes a body comprising a ceramic material, a plurality of heating elements encapsulated within the body, and one or more grooves formed in a surface of the body adjacent each of the plurality of heating elements, at least one side of the grooves being bounded by a ceramic plate.

Abstract translation: 提供了一种用于加热基座的方法和装置。 在一个实施例中，被加热的基座包括一个主体，该主体包括陶瓷材料，多个加热元件封装在主体内，以及一个或多个凹槽，其形成在与该多个加热元件中的每一个相邻的本体的表面中，至少一个侧面 的凹槽由陶瓷板限定。