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公开(公告)号：US20170219934A1
公开(公告)日：2017-08-03
申请号：US15412530
申请日：2017-01-23
Applicant: Applied Materials, Inc.
Inventor： David MARKLE , Thomas LAIDIG , Timothy N. THOMAS
CPC classification number: G03F7/70641 , G02B5/04 , G02B6/0008 , G02B6/0096 , G02B7/04 , G02B7/36 , G02B26/0833 , G02B27/0025 , G02F1/1303 , G03F7/7005 , G03F7/70075 , G03F7/70275
Abstract: Embodiments of the present disclosure generally relate to apparatuses and systems for performing photolithography processes. More particularly, compact apparatuses for projecting an image onto a substrate are provided. In one embodiment, an image projection apparatus includes a light pipe coupled to a first mounting plate, and a frustrated prism assembly, one or more digital micro-mirror devices, one or more beamsplitters, and one or more projection optics, which are coupled to a second mounting plate. The first and second mounting plates are coplanar, such that the image projection apparatus is compact and may be aligned in a system having a plurality of image projection apparatuses, each of which is easily removable and replaceable.
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公开(公告)号：US20180024441A1
公开(公告)日：2018-01-25
申请号：US15656054
申请日：2017-07-21
Applicant: Applied Materials, Inc.
Inventor： David MARKLE , Timothy N. THOMAS
CPC classification number: G03F7/70191 , G02B6/0005 , G02B6/04 , G02B6/102 , G03B21/008 , G03B21/208 , G03F7/70075
Abstract: Implementations disclosed herein generally relate to a light pipe, or kaleido, for homogenizing light such that the light is uniform once the light exits the light pipe. By reflecting the light inside the light pipe, light uniformity is increased. In one implementation, a light pipe for an image projection apparatus is provided. The light pipe comprises an elongated rectangular body having a refractive index that provides total internal reflection within the elongated rectangular body. The elongated rectangular body has an input face for accepting light into the elongated rectangular body. The input face disposed substantially orthogonal to a longitudinal axis of the elongated rectangular body. The elongated rectangular body has an output face for releasing light from the elongated rectangular body. The output face is disposed substantially orthogonal to the longitudinal axis. The elongated rectangular body has a twist along the longitudinal axis.
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Patent Agency Ranking
3.发明申请公开(公告)号：US20150053658A1
公开(公告)日：2015-02-26
申请号：US14480415
申请日：2014-09-08
Applicant: Applied Materials, Inc.
Inventor： Bruce E. ADAMS , Samuel C. HOWELLS , Dean JENNINGS , Jiping LI , Timothy N. THOMAS , Stephen MOFFATT
IPC: B23K26/06 , G02B27/09 , B23K26/073
CPC classification number: B23K26/073 , B23K26/0613 , B23K26/0622 , B23K26/067 , B23K26/0732 , B23K2103/56 , G02B27/0961
Abstract: The present invention generally relates to an optical system that is able to reliably deliver a uniform amount of energy across an anneal region contained on a surface of a substrate. The optical system is adapted to deliver, or project, a uniform amount of energy having a desired two-dimensional shape on a desired region on the surface of the substrate. Typically, the anneal regions may be square or rectangular in shape. Generally, the optical system and methods of the present invention are used to preferentially anneal one or more regions found within the anneal regions by delivering enough energy to cause the one or more regions to re-melt and solidify.
Abstract translation: 本发明一般涉及一种光学系统，其能够在包含在基板的表面上的退火区域上可靠地传递均匀的能量。 光学系统适于在衬底的表面上的期望区域上传送或投影具有期望的二维形状的均匀量的能量。 通常，退火区域可以是正方形或矩形形状。 通常，本发明的光学系统和方法用于通过递送足够的能量以使一个或多个区域再熔化和固化来优先退火在退火区域内发现的一个或多个区域。
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4.发明公开公开(公告)号：US20230221521A1
公开(公告)日：2023-07-13
申请号：US18020169
申请日：2021-09-10
Applicant: Applied Materials, Inc.
Inventor： Timothy N. THOMAS , Robert Jordan LEAR , Douglas E. HOLMGREN , Assaf KIDRON , Nigel SWEHLA
CPC classification number: G02B7/182 , F16B5/0258 , F16B5/0266 , G02B26/0833 , G03B21/008 , G03B21/16 , G03F7/70191
Abstract: Embodiments of the present disclosure relate to mount apparatuses for digital micromirror devices of digital lithography systems and methods of mounting the digital micromirror devices. The mount apparatuses described herein retain spatial light modulators, such as DMDs. The mount apparatus enables the flattening of the DMD by providing a force such that the pair of contact pads contact the DMD. The DMD is positioned in a mounting frame of the mount apparatus. Contact pads of the mounting frame are operable to apply pressure to the DMD.
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公开(公告)号：US20190139773A1
公开(公告)日：2019-05-09
申请号：US16200538
申请日：2018-11-26
Applicant: Applied Materials, Inc.
Inventor： Paul CAREY , Aaron Muir HUNTER , Dean JENNINGS , Abhilash J. MAYUR , Stephen MOFFATT , William SCHAFFER , Timothy N. THOMAS , Mark YAM
IPC: H01L21/265 , H01L21/268 , H01L29/66 , H01L29/06 , H01L21/324
Abstract: The present invention generally describes one ore more methods that are used to perform an annealing process on desired regions of a substrate. In one embodiment, an amount of energy is delivered to the surface of the substrate to preferentially melt certain desired regions of the substrate to remove unwanted damage created from prior processing steps (e.g., crystal damage from implant processes), more evenly distribute dopants in various regions of the substrate, and/or activate various regions of the substrate. The preferential melting processes will allow more uniform distribution of the dopants in the melted region, due to the increased diffusion rate and solubility of the dopant atoms in the molten region of the substrate. The creation of a melted region thus allows: 1) the dopant atoms to redistribute more uniformly, 2) defects created in prior processing steps to be removed, and 3) regions that have hyper-abrupt dopant concentrations to be formed.
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公开(公告)号：US20180017781A1
公开(公告)日：2018-01-18
申请号：US15639600
申请日：2017-06-30
Applicant: Applied Materials, Inc.
Inventor： David MARKLE , Thomas L. LAIDIG , Timothy N. THOMAS , Jang Fung CHEN
CPC classification number: G02B26/0833 , G02B5/04 , G02F1/1303 , G03F7/7015 , G03F7/70275
Abstract: The present disclosure generally relates to frustrated cube assemblies having a first prism having a first surface, a second surface, and a first hypotenuse, and a second prism having a third surface, a fourth surface, and a second hypotenuse. The first and second hypotenuses face one another and are separated by an air gap. The frustrated cube assembly may include a tilted mirror adjacent the second surface. The second surface may be a reflective diffraction grating. Light is reflected to a digital micromirror device (DMD) adjacent to the frustrated cube assembly at a normal incidence angle and through an image projection system along a single optical axis. The direction of light incident on the DMD is such that light reflected from an “on” mirror is directed along the normal to the DMD surface and at 45 degrees to the hypotenuses. The input and output light beams are parallel.
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公开(公告)号：US20140009829A1
公开(公告)日：2014-01-09
申请号：US14026681
申请日：2013-09-13
Applicant: Applied Materials, Inc.
Inventor： Dean JENNINGS , Timothy N. THOMAS , Stephen MOFFATT , Jiping LI , Bruce E. ADAMS , Samuel C. HOWELLS
CPC classification number: G02B27/283 , B23K26/0604 , B23K26/0613 , B23K26/0622 , B23K26/067 , G02B27/10 , G02B27/144 , G02B27/145 , G02B27/48 , H01L21/268 , H01L21/67115
Abstract: A method and apparatus for decorrelating coherent light from a light source, such as a pulsed laser, in both time and space in an effort to provide intense and uniform illumination are provided. For some embodiments employing a pulsed light source, the output pulse may be stretched relative to the input pulse width. The methods and apparatus described herein may be incorporated into any application where intense, uniform illumination is desired, such as pulsed laser annealing, welding, ablating, and wafer stepper illuminating.
Abstract translation: 提供了一种用于在时间和空间上从光源（例如脉冲激光）去除相干光的方法和装置，以提供强烈和均匀的照明。 对于采用脉冲光源的一些实施例，可以相对于输入脉冲宽度拉伸输出脉冲。 本文描述的方法和装置可以结合到需要强烈均匀照明的任何应用中，例如脉冲激光退火，焊接，烧蚀和晶片步进照明。
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