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公开(公告)号：US20130320510A1
公开(公告)日：2013-12-05
申请号：US13959601
申请日：2013-08-05
CPC分类号： H01L23/564 , B81B3/0075 , B81B2207/115 , B81C1/00206 , B81C1/0038 , H01L21/02126 , H01L21/02164 , H01L21/02214 , H01L21/02271 , H01L21/02304 , H01L21/3127 , H01L21/3141 , H01L21/31604 , H01L21/31612 , H01L21/3162 , H01L23/29 , H01L2924/0002 , H01L2924/12044 , H01L2924/00
摘要： An article having a surface treated to provide a protective coating structure in accordance with the following method: vapor depositing a first layer on a substrate, wherein said first layer is a metal oxide adhesion layer selected from the group consisting of an oxide of a Group IIIA metal element, a Group IVB metal element, a Group VB metal element, and combinations thereof; vapor depositing a second layer upon said first layer, wherein said second layer includes a silicon-containing layer selected from the group consisting of silicon oxide, silicon nitride, and silicon oxynitride; and vapor depositing a third layer upon said second layer, wherein said third layer is a functional organic-comprising layer, wherein said functional organic-comprising layer is a SAM.
摘要翻译： 具有被处理以提供根据以下方法的保护涂层结构的表面的制品：在基底上气相沉积第一层，其中所述第一层是选自IIIA族的氧化物的金属氧化物粘附层 金属元素，IVB族金属元素，VB族金属元素及其组合; 在所述第一层上气相沉积第二层，其中所述第二层包括选自氧化硅，氮化硅和氮氧化硅的含硅层; 并且在所述第二层上气相沉积第三层，其中所述第三层是包含功能的有机物的层，其中所述含有功能的有机物层是SAM。
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公开(公告)号：US09972583B2
公开(公告)日：2018-05-15
申请号：US13959601
申请日：2013-08-05
IPC分类号： H01L23/00 , H01L21/02 , B81C1/00 , H01L23/29 , B81B3/00 , H01L21/312 , H01L21/314 , H01L21/316
CPC分类号： H01L23/564 , B81B3/0075 , B81B2207/115 , B81C1/00206 , B81C1/0038 , H01L21/02126 , H01L21/02164 , H01L21/02214 , H01L21/02271 , H01L21/02304 , H01L21/3127 , H01L21/3141 , H01L21/31604 , H01L21/31612 , H01L21/3162 , H01L23/29 , H01L2924/0002 , H01L2924/12044 , H01L2924/00
摘要： An article having a surface treated to provide a protective coating structure in accordance with the following method: vapor depositing a first layer on a substrate, wherein the first layer is a metal oxide adhesion layer selected from the group consisting of an oxide of a Group IIIA metal element, a Group IVB metal element, a Group VB metal element, and combinations thereof; vapor depositing a second layer upon the first layer, wherein the second layer includes a silicon-containing layer selected from the group consisting of silicon oxide, silicon nitride, and silicon oxynitride; and vapor depositing a third layer upon the second layer, wherein the third layer is a functional organic-comprising layer, wherein the functional organic-comprising layer is a SAM.
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3.发明申请公开(公告)号：US20150140215A1
公开(公告)日：2015-05-21
申请号：US14539172
申请日：2014-11-12
发明人： Boris Kobrin , Romuald Nowak , Jeffrey D. Chinn
IPC分类号： C09D1/00 , C23C16/455 , C23C16/40 , C08K3/04 , C08K3/22
CPC分类号： C09D1/00 , B81B3/0075 , C23C16/403 , C23C16/405 , C23C16/45525
摘要： The present invention is related to carbon-doped metal oxide films. A method of depositing a low friction metal oxide film on a substrate is provided, including: using an atomic layer deposition technique, wherein said metal oxide film is deposited using at least an organo-metallic precursor, and wherein said substrate is at a temperature of 150° C. or lower during deposition of said metal oxide film, whereby a carbon-doped metal oxide film is obtained. The carbon-doped metal oxide films provide a low coefficient of friction, for example ranging from about 0.05 to about 0.4. In addition, the carbon-doped metal oxide films provide anti-stiction properties, where the measured work of adhesion is less than 10 μJ/m2. In addition, the carbon-doped metal oxide films provide unexpectedly good water vapor transmission properties. The carbon content in the carbon-doped metal oxide films ranges from about 5 atomic % to about 20 atomic %.
摘要翻译： 本发明涉及碳掺杂金属氧化物膜。 提供了一种在衬底上沉积低摩擦金属氧化物膜的方法，包括：使用原子层沉积技术，其中使用至少一种有机金属前体沉积所述金属氧化物膜，并且其中所述衬底处于 在所述金属氧化物膜的沉积期间为150℃以下，由此获得碳掺杂的金属氧化物膜。 碳掺杂的金属氧化物膜提供低摩擦系数，例如约0.05至约0.4。 此外，掺杂碳的金属氧化物膜提供抗静电性能，其中所测量的粘附力小于10μJ/ m 2。 此外，掺杂碳的金属氧化物膜提供出乎意料的良好的水蒸汽透过性能。 碳掺杂的金属氧化物膜中的碳含量为约5原子％至约20原子％。
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公开(公告)号：US20170243837A9
公开(公告)日：2017-08-24
申请号：US13959601
申请日：2013-08-05
CPC分类号： H01L23/564 , B81B3/0075 , B81B2207/115 , B81C1/00206 , B81C1/0038 , H01L21/02126 , H01L21/02164 , H01L21/02214 , H01L21/02271 , H01L21/02304 , H01L21/3127 , H01L21/3141 , H01L21/31604 , H01L21/31612 , H01L21/3162 , H01L23/29 , H01L2924/0002 , H01L2924/12044 , H01L2924/00
摘要： An article having a surface treated to provide a protective coating structure in accordance with the following method: vapor depositing a first layer on a substrate, wherein said first layer is a metal oxide adhesion layer selected from the group consisting of an oxide of a Group IIIA metal element, a Group IVB metal element, a Group VB metal element, and combinations thereof; vapor depositing a second layer upon said first layer, wherein said second layer includes a silicon-containing layer selected from the group consisting of silicon oxide, silicon nitride, and silicon oxynitride; and vapor depositing a third layer upon said second layer, wherein said third layer is a functional organic-comprising layer, wherein said functional organic-comprising layer is a SAM.
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公开(公告)号：US20130320509A1
公开(公告)日：2013-12-05
申请号：US13959593
申请日：2013-08-05
CPC分类号： H01L23/564 , B81B3/0075 , B81B2207/115 , B81C1/00206 , B81C1/0038 , H01L21/02126 , H01L21/02164 , H01L21/02214 , H01L21/02271 , H01L21/02304 , H01L21/3127 , H01L21/3141 , H01L21/31604 , H01L21/31612 , H01L21/3162 , H01L23/29 , H01L2924/0002 , H01L2924/12044 , H01L2924/00
摘要： A moisture barrier coating for protecting a substrate from moisture, comprises an inorganic layer disposed over the substrate, the inorganic layer comprising an oxide or nitride of an element selected from the group consisting of silicon, aluminum, titanium, zirconium, hafnium and combinations thereof; and an organic silicon-containing layer disposed over the inorganic layer.
摘要翻译： 一种用于保护基底免受湿气侵害的防潮涂层，包括设置在该基底上的无机层，该无机层包括选自硅，铝，钛，锆，铪及其组合的元素的氧化物或氮化物; 以及设置在无机层上的有机含硅层。
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