公开(公告)号：US07560705B2

公开(公告)日：2009-07-14

申请号：US11840888

申请日：2007-08-17

申请人： Ari Eiriksson ,  Donovan Beckel ,  Robert Mitchell ,  Michel Pharand ,  Marvin LaFontaine ,  Ashwin Purohit ,  Steven Weed ,  Wayne Arseneault ,  Shantanu Pathak ,  Joseph Daniel Foley

发明人： Ari Eiriksson ,  Donovan Beckel ,  Robert Mitchell ,  Michel Pharand ,  Marvin LaFontaine ,  Ashwin Purohit ,  Steven Weed ,  Wayne Arseneault ,  Shantanu Pathak ,  Joseph Daniel Foley

IPC分类号： H01J37/317

CPC分类号： H01L21/6831 ,  H01L21/68764

摘要： An ion implantation apparatus, system, and method are provided for connecting and disconnecting a workpiece holder from a scan arm. A twist head is provided, wherein an electrostatic chuck is operable to be mounted, wherein one or more rotating and non-rotating members associated with one or more of the twist head and electrostatic chuck have one or more dynamic electrical and fluid rotary connections associated therewith. The electrostatic chuck is further operable to be removed from the twist head without disconnecting the one or more dynamic fluid seals.

摘要翻译： 提供离子注入装置，系统和方法用于将工件保持器与扫描臂连接和断开。 提供了一种扭转头，其中可操作地安装静电卡盘，其中与一个或多个扭转头和静电卡盘相关联的一个或多个旋转和非旋转构件具有与其相关联的一个或多个动态电动和流体旋转连接 。 静电卡盘还可操作以从扭转头移除而不断开一个或多个动态流体密封件。

公开(公告)号：US20080105836A1

公开(公告)日：2008-05-08

申请号：US11840888

申请日：2007-08-17

申请人： Ari Eiriksson ,  Donovan Beckel ,  Robert Mitchell ,  Michel Pharand ,  Marvin LaFontaine ,  Ashwin Purohit ,  Steven Weed ,  Wayne Arseneault ,  Shantanu Pathak ,  Joseph Foley

发明人： Ari Eiriksson ,  Donovan Beckel ,  Robert Mitchell ,  Michel Pharand ,  Marvin LaFontaine ,  Ashwin Purohit ,  Steven Weed ,  Wayne Arseneault ,  Shantanu Pathak ,  Joseph Foley

IPC分类号： H01J29/02

CPC分类号： H01L21/6831 ,  H01L21/68764

摘要： An ion implantation apparatus, system, and method are provided for connecting and disconnecting a workpiece holder from a scan arm. A twist head is provided, wherein an electrostatic chuck is operable to be mounted, wherein one or more rotating and non-rotating members associated with one or more of the twist head and electrostatic chuck have one or more dynamic electrical and fluid rotary connections associated therewith. The electrostatic chuck is further operable to be removed from the twist head without disconnecting the one or more dynamic fluid seals.

摘要翻译： 提供离子注入装置，系统和方法用于将工件保持器与扫描臂连接和断开。 提供了一种扭转头，其中可操作地安装静电卡盘，其中与一个或多个扭转头和静电卡盘相关联的一个或多个旋转和非旋转构件具有与其相关联的一个或多个动态电动和流体旋转连接 。 静电卡盘还可操作以从扭转头移除而不断开一个或多个动态流体密封件。

公开(公告)号：US07070661B2

公开(公告)日：2006-07-04

申请号：US10646249

申请日：2003-08-22

申请人： Ari Eiriksson ,  Richard Gueler ,  Michel Pharand

发明人： Ari Eiriksson ,  Richard Gueler ,  Michel Pharand

IPC分类号： H01L21/00 ,  C23C16/00

CPC分类号： H01L21/6838

摘要： A workpiece is supported on a gas cushion to reduce mechanical stresses on the workpiece during processing. A plenum having a workpiece support flange for receiving the workpiece is connected to a gas supply. When gas flows into the plenum and pressure increases sufficiently to lift the workpiece, the workpiece is lifted and the gas flows out of the plenum between the flange and the workpiece edge. The workpiece is thus supported above the flange by the gas during processing.

摘要翻译： 工件被支撑在气垫上，以减少加工过程中工件的机械应力。 具有用于接收工件的工件支撑凸缘的气室连接到气体供应。 当气体流入增压室并且压力增加到足以提升工件时，工件被提升，并且气体在凸缘和工件边缘之间流出增压室。 因此，工件在加工过程中被气体支撑在法兰上方。

公开(公告)号：US07100759B2

公开(公告)日：2006-09-05

申请号：US10914343

申请日：2004-08-09

申请人： Michel Pharand ,  Dennis Normandin ,  Ari Eiriksson

发明人： Michel Pharand ,  Dennis Normandin ,  Ari Eiriksson

IPC分类号： B65G35/00

CPC分类号： H01L21/68792

摘要： A vertical rapid thermal processing system includes a processing chamber and an elevator structure providing for vertical movement of a workpiece within the processing chamber. The elevator structure includes a workpiece support for supporting the workpiece and an elevator shaft coupled to the workpiece support and extending externally from the processing chamber. An end portion of the elevator shaft, external to the processing chamber, has a selected magnetic polarity. The elevator structure also includes moveable carriage coupled to the shaft to provide vertical movement of the workpiece within the processing chamber. The carriage includes a shaft support having the selected polarity. The shaft support is positioned adjacent the polarized end portion of the elevator shaft such that repulsive magnetic forces maintain a gap between the end portion of the elevator shaft and the shaft support as the shaft support and elevator shaft move vertically along a path of travel.

摘要翻译： 垂直快速热处理系统包括处理室和提供工件在处理室内的垂直移动的升降机结构。 电梯结构包括用于支撑工件的工件支撑件和联接到工件支撑件并从处理室外部延伸的升降机轴。 电梯井的在处理室外部的端部具有选定的磁极性。 电梯结构还包括联接到轴的可移动的托架，以提供工件在处理室内的垂直移动。 托架包括具有所选极性的轴支撑件。 轴支撑件邻近电梯井的极化端部定位，使得当轴支撑件和电梯井沿行进路径垂直移动时，排斥磁力在电梯井的端部和轴支撑件之间保持间隙。

公开(公告)号：US20060027440A1

公开(公告)日：2006-02-09

申请号：US10914343

申请日：2004-08-09

申请人： Michel Pharand ,  Dennis Normandin ,  Ari Eiriksson

发明人： Michel Pharand ,  Dennis Normandin ,  Ari Eiriksson

IPC分类号： B65G35/00

CPC分类号： H01L21/68792

摘要： A vertical rapid thermal processing system includes a processing chamber and an elevator structure providing for vertical movement of a workpiece within the processing chamber. The elevator structure includes a workpiece support for supporting the workpiece and an elevator shaft coupled to the workpiece support and extending externally from the processing chamber. An end portion of the elevator shaft, external to the processing chamber, has a selected magnetic polarity. The elevator structure also includes moveable carriage coupled to the shaft to provide vertical movement of the workpiece within the processing chamber. The carriage includes a shaft support having the selected polarity. The shaft support is positioned adjacent the polarized end portion of the elevator shaft such that repulsive magnetic forces maintain a gap between the end portion of the elevator shaft and the shaft support as the shaft support and elevator shaft move vertically along a path of travel.

公开(公告)号：US20050039685A1

公开(公告)日：2005-02-24

申请号：US10646249

申请日：2003-08-22

申请人： Ari Eiriksson ,  Richard Gueler ,  Michel Pharand

发明人： Ari Eiriksson ,  Richard Gueler ,  Michel Pharand

IPC分类号： H01L21/683 ,  C23C16/00

CPC分类号： H01L21/6838

摘要： A workpiece is supported on a gas cushion to reduce mechanical stresses on the workpiece during processing. A plenum having a workpiece support flange for receiving the workpiece is connected to a gas supply. When gas flows into the plenum and pressure increases sufficiently to lift the workpiece, the workpiece is lifted and the gas flows out of the plenum between the flange and the workpiece edge. The workpiece is thus supported above the flange by the gas during processing.

摘要翻译： 工件被支撑在气垫上，以减少加工过程中工件的机械应力。 具有用于接收工件的工件支撑凸缘的气室连接到气体供应。 当气体流入增压室并且压力增加到足以提升工件时，工件被提升，并且气体在凸缘和工件边缘之间流出增压室。 因此，工件在加工过程中被气体支撑在法兰上方。

公开(公告)号：US07026581B2

公开(公告)日：2006-04-11

申请号：US10646228

申请日：2003-08-22

申请人： Michel Pharand ,  Thomas L. Durant ,  Ari Eiriksson ,  Richard Gueler

发明人： Michel Pharand ,  Thomas L. Durant ,  Ari Eiriksson ,  Richard Gueler

IPC分类号： F27B5/14 ,  F27D11/00

CPC分类号： H01L21/67126 ,  H01L21/324 ,  H01L21/67748 ,  H01L21/67751

摘要： A wafer support position control mechanism selectively positions a semiconductor wafer along an axis of excursion within a process chamber. An elevator tube protrudes through an orifice in the chamber surface and is connected at a first distal end to the wafer support. A compliant, dynamic seal within the orifice engages the elevator tube to form a gas curtain within a gap between the seal and the elevator tube to seal the process chamber. A moveable carriage is connected to the elevator tube at a second distal end for moving the wafer support along the axis of excursion. Rigid mechanical structure couples the second distal end of the elevator tube to the moveable carriage.

摘要翻译： 晶片支撑位置控制机构选择性地将半导体晶片沿着处理室内的偏移轴定位。 电梯管通过腔室表面中的孔突出，并且在第一远端处连接到晶片支撑件。 孔内的柔性动态密封件接合电梯管，以在密封件和电梯管之间的间隙内形成气帘，以密封处理室。 可移动的托架在第二远端处连接到电梯管，用于沿着偏移轴线移动晶片支撑件。 刚性机械结构将电梯管的第二远端连接到可移动的托架上。

公开(公告)号：US20050042807A1

公开(公告)日：2005-02-24

申请号：US10646228

申请日：2003-08-22

申请人： Michel Pharand ,  Thomas Durant ,  Ari Eiriksson ,  Richard Gueler

发明人： Michel Pharand ,  Thomas Durant ,  Ari Eiriksson ,  Richard Gueler

IPC分类号： H01L21/00 ,  H01L21/324 ,  H01L21/677 ,  H01L21/335

CPC分类号： H01L21/67126 ,  H01L21/324 ,  H01L21/67748 ,  H01L21/67751

摘要： A wafer support position control mechanism selectively positions a semiconductor wafer along an axis of excursion within a process chamber. An elevator tube protrudes through an orifice in the chamber surface and is connected at a first distal end to the wafer support. A compliant, dynamic seal within the orifice engages the elevator tube to form a gas curtain within a gap between the seal and the elevator tube to seal the process chamber. A moveable carriage is connected to the elevator tube at a second distal end for moving the wafer support along the axis of excursion. Rigid mechanical structure couples the second distal end of the elevator tube to the moveable carriage.

摘要翻译： 晶片支撑位置控制机构选择性地将半导体晶片沿着处理室内的偏移轴定位。 电梯管通过腔室表面中的孔突出，并且在第一远端处连接到晶片支撑件。 孔内的柔性动态密封件接合电梯管，以在密封件和电梯管之间的间隙内形成气帘，以密封处理室。 可移动的托架在第二远端处连接到电梯管，用于沿着偏移轴线移动晶片支撑件。 刚性机械结构将电梯管的第二远端连接到可移动的托架上。

公开(公告)号：US20130032481A1

公开(公告)日：2013-02-07

申请号：US13197969

申请日：2011-08-04

申请人： Ari Eiriksson

发明人： Ari Eiriksson

IPC分类号： B01D57/02 ,  G21K5/08 ,  G01N1/44 ,  G01N27/447

CPC分类号： G01N27/44743

摘要： A sample processing apparatus includes a sample carrier receiving region configured to receive a sample carrier. The sample carrier includes at least one sample channel carrying at least one sample, at least one agent chamber carrying at least one agent to be moved to the at least one sample channel to facilitate processing of the at least one sample, and the at least one agent chamber includes at least one chamber cover covering at least one opening of the at least one agent chamber, inhibiting flow of the at least one agent from the at least one agent chamber to the at least one sample channel. The sample processing apparatus further includes a chamber opener configured to facilitate opening the at least one chamber cover. The sample processing apparatus further includes a fluid mover that moves the agent out of the at least one agent chamber after the at least one chamber cover is opened and into the at least one sample channel.

摘要翻译： 样品处理装置包括被配置为接收样品载体的样品载体接收区域。 样品载体包括至少一个样品通道，其携带至少一个样品，至少一个试剂室，其携带至少一种待移动至所述至少一个样品通道的试剂，以促进至少一种样品的处理，并且所述至少一种 代理室包括覆盖所述至少一个试剂室的至少一个开口的至少一个室盖，其阻止所述至少一个试剂从所述至少一个试剂室流到所述至少一个样品通道。 样品处理设备还包括构造成便于打开至少一个室盖的室开启器。 样品处理设备还包括流体移动器，其在所述至少一个室盖打开之后将所述试剂移出所述至少一个试剂室，并进入所述至少一个样品通道。

公开(公告)号：US07952851B2

公开(公告)日：2011-05-31

申请号：US12262399

申请日：2008-10-31

申请人： Marvin R. LaFontaine ,  Ari Eiriksson ,  Ashwin M. Purohit ,  William D. Lee

发明人： Marvin R. LaFontaine ,  Ari Eiriksson ,  Ashwin M. Purohit ,  William D. Lee

IPC分类号： H01L21/683

CPC分类号： H01L21/6831 ,  H01L21/68742

摘要： An electrostatic chuck and method for clamping and de-clamping a workpiece is provided. The ESC comprises a clamping plate having a clamping surface, and one or more electrodes. An electric potential applied to the one or more electrodes selectively clamps the workpiece to the clamping surface. An arc pin operably coupled to the clamping plate and a power source provides an arc for penetrating an insulating layer of the workpiece. The arc pin is selectively connected to an electrical ground, wherein upon removal of the insulative layer of the workpiece, the arc pin provides an electrical ground connection to the workpiece.

摘要翻译： 提供了用于夹紧和去夹紧工件的静电卡盘和方法。 ESC包括具有夹紧表面的夹板和一个或多个电极。 施加到一个或多个电极的电位选择性地将工件夹紧到夹紧表面。 可操作地联接到夹持板的电弧销和电源提供用于穿透工件的绝缘层的电弧。 弧形销被选择性地连接到电接地，其中在移除工件的绝缘层时，电弧销提供与工件的电接地连接。