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公开(公告)号：US20110001254A1
公开(公告)日：2011-01-06
申请号：US12820492
申请日：2010-06-22
申请人： Yvonne Wendela Kruijt-Stegeman , Andre Bernardus Jeunink , Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Johan Frederik Dijksman , Carolus Johannes Catharina Schoormans , Adrianus Hendrik Koevoets , Catharinus De Schiffart , Sander Frederik Wuister
发明人： Yvonne Wendela Kruijt-Stegeman , Andre Bernardus Jeunink , Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Johan Frederik Dijksman , Carolus Johannes Catharina Schoormans , Adrianus Hendrik Koevoets , Catharinus De Schiffart , Sander Frederik Wuister
CPC分类号： G03F9/7042 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.
摘要翻译： 公开了一种压印光刻设备，其包括布置成保持压印模板的压印模板保持器和被配置为测量压印模板的尺寸和/或形状的变化的多个位置传感器，其中位置传感器与 印记模板 还公开了一种光刻方法，其包括使用压印模板将图案印刷到基板上，以及在将图案压印到基板上的同时测量压印模板的尺寸和/或形状的变化。
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公开(公告)号：US08529823B2
公开(公告)日：2013-09-10
申请号：US12891422
申请日：2010-09-27
申请人： Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Andre Bernardus Jeunink , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
发明人： Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Andre Bernardus Jeunink , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7003 , G03F9/7049 , G03F9/7076
摘要： A method of determining an offset between an imprint template and a substrate using an alignment grating on the imprint template and an alignment grating on the substrate is disclosed. The method includes bringing the imprint template alignment grating and the substrate alignment grating sufficiently close together such that they form a composite grating, directing an alignment radiation beam at the composite grating while modulating the relative position of the imprint template and the substrate, detecting the intensity of alignment radiation which is reflected from the composite grating, and determining the offset by analyzing modulation of the detected intensity.
摘要翻译： 公开了一种使用压印模板上的对准光栅和衬底上的对准光栅来确定压印模板和衬底之间的偏移的方法。 该方法包括使压印模板对准光栅和衬底对准光栅足够靠近在一起，使得它们形成复合光栅，将复合光栅的对准辐射束引导，同时调制压印模板和衬底的相对位置，检测强度 从复合光栅反射的对准辐射，并通过分析检测强度的调制来确定偏移。
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公开(公告)号：US20110226735A1
公开(公告)日：2011-09-22
申请号：US13051441
申请日：2011-03-18
申请人： Sander Frederik Wuister , Vadim Yevgenyevich Banine , Arie Jeffrey Den Boef , Yvonne Wendela Kruijt-Stegeman , Tatyana Viktorovna Rakhimova , Dmitriy Viktorovich Lopaev , Denis Alexandrovich Glushkov , Andrei Mikhailovich Yakunin , Roelof Koole
发明人： Sander Frederik Wuister , Vadim Yevgenyevich Banine , Arie Jeffrey Den Boef , Yvonne Wendela Kruijt-Stegeman , Tatyana Viktorovna Rakhimova , Dmitriy Viktorovich Lopaev , Denis Alexandrovich Glushkov , Andrei Mikhailovich Yakunin , Roelof Koole
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography method is disclosed that includes, after imprinting an imprint lithography template into a layer of imprintable medium to form a pattern in that imprintable medium and fixing that pattern to form a patterned layer of imprintable medium, adding etch resistant material (i.e. a hard mask) to a part of the patterned layer of imprintable medium to reduce a difference between an intended topography and an actual topography of that part of the patterned layer of imprintable medium.
摘要翻译： 公开了一种压印光刻方法，其包括在将压印光刻模板压印到可压印介质层中以在该可压印介质中形成图案并固定该图案以形成可压印介质的图案化层之后，添加耐蚀刻材料（即，硬 掩模）到可压印介质的图案化层的一部分，以减少所期望的形貌与可压印介质的图案化层的该部分的实际形貌之间的差异。
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公开(公告)号：US08454849B2
公开(公告)日：2013-06-04
申请号：US13051441
申请日：2011-03-18
申请人： Sander Frederik Wuister , Vadim Yevgenyevich Banine , Arie Jeffrey Den Boef , Yvonne Wendela Kruijt-Stegeman , Tatyana Viktorovna Rakhimova , Dmitriy Viktorovich Lopaev , Denis Alexandrovich Glushkov , Andrei Mikhailovich Yakunin , Roelof Koole
发明人： Sander Frederik Wuister , Vadim Yevgenyevich Banine , Arie Jeffrey Den Boef , Yvonne Wendela Kruijt-Stegeman , Tatyana Viktorovna Rakhimova , Dmitriy Viktorovich Lopaev , Denis Alexandrovich Glushkov , Andrei Mikhailovich Yakunin , Roelof Koole
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography method is disclosed that includes, after imprinting an imprint lithography template into a layer of imprintable medium to form a pattern in that imprintable medium and fixing that pattern to form a patterned layer of imprintable medium, adding etch resistant material (i.e. a hard mask) to a part of the patterned layer of imprintable medium to reduce a difference between an intended topography and an actual topography of that part of the patterned layer of imprintable medium.
摘要翻译： 公开了一种压印光刻方法，其包括在将压印光刻模板压印到可压印介质层中以在该可压印介质中形成图案并固定该图案以形成可压印介质的图案化层之后，添加耐蚀刻材料（即，硬 掩模）到可压印介质的图案化层的一部分，以减少所期望的形貌与可压印介质的图案化层的该部分的实际形貌之间的差异。
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公开(公告)号：US20110008483A1
公开(公告)日：2011-01-13
申请号：US12821806
申请日：2010-06-23
申请人： Andre Bernardus Jeunink , Vadim Yevgenyevich Banine , Hans Butler , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Petrus Martinus Bernardus Vermeulen , Yvonne Wendela Kruijt-Stegeman
发明人： Andre Bernardus Jeunink , Vadim Yevgenyevich Banine , Hans Butler , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Petrus Martinus Bernardus Vermeulen , Yvonne Wendela Kruijt-Stegeman
IPC分类号： B29C59/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/00
摘要： An imprint lithography apparatus is disclosed that includes a structure located away from a substrate holder and extending across the substrate holder, and such that an imprint template arrangement is, in use, located between the structure and the substrate holder, wherein the structure has one or more arrays of lines or one or more encoders, and the substrate or substrate holder and the imprint template have a corresponding one or more encoders that face towards one or more of the one or more arrays of lines or one or more arrays of lines that face towards one or more of the one or more encoders, and the configuration determination arrangement is configured to determine a relative configuration between the substrate or substrate holder and the structure, and/or a relative configuration between the imprint template arrangement and the structure, and/or a relative configuration between the imprint template arrangement and the substrate or substrate holder.
摘要翻译： 公开了一种压印光刻设备，其包括远离衬底保持器并延伸穿过衬底保持器的结构，并且使得压印模板布置在使用中位于结构和衬底保持器之间，其中结构具有一个或 更多的线阵列或一个或多个编码器，并且衬底或衬底保持器和压印模板具有对应的一个或多个编码器，其面向一个或多个线阵列或一个或多个面阵列阵列 朝向一个或多个编码器中的一个或多个，并且配置确定装置被配置为确定衬底或衬底保持器与结构之间的相对配置，和/或压印模板布置和结构之间的相对配置，和/ 或压印模板布置和基板或基板保持器之间的相对配置。
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公开(公告)号：US08961801B2
公开(公告)日：2015-02-24
申请号：US12869381
申请日：2010-08-26
申请人： Sander Frederik Wuister , Vadim Yevgenyevich Banine , Johan Frederik Dijksman , Yvonne Wendela Kruijt-Stegeman , Jeroen Herman Lammers , Roelof Koole
发明人： Sander Frederik Wuister , Vadim Yevgenyevich Banine , Johan Frederik Dijksman , Yvonne Wendela Kruijt-Stegeman , Jeroen Herman Lammers , Roelof Koole
CPC分类号： B29C43/34 , B29C43/021 , B29C43/58 , B29C2043/025 , B29K2101/12 , B44C1/20 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： In an embodiment, there is provided an imprint lithography method that includes providing a first amount of imprintable medium on a first area of a substrate, the first amount of imprintable medium, when fixed, having a first etch rate; and providing a second amount of imprintable medium on a second, different area of the substrate, the second amount of imprintable medium, when fixed, having a second, different etch rate.
摘要翻译： 在一个实施例中，提供了压印光刻方法，其包括在衬底的第一区域上提供第一量的可压印介质，当固定时，第一量的可压印介质具有第一蚀刻速率; 以及在所述基板的第二不同区域上提供第二量的可压印介质，所述第二量的可压印介质在固定时具有第二不同的蚀刻速率。
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公开(公告)号：US20110049097A1
公开(公告)日：2011-03-03
申请号：US12869381
申请日：2010-08-26
申请人： Sander Frederik WUISTER , Vadim Yevgenyevich Banine , Johan Frederik Dijksman , Yvonne Wendela Kruijt-Stegeman , Jeroen Herman Lammers , Roelof Koole
发明人： Sander Frederik WUISTER , Vadim Yevgenyevich Banine , Johan Frederik Dijksman , Yvonne Wendela Kruijt-Stegeman , Jeroen Herman Lammers , Roelof Koole
IPC分类号： B44C1/22
CPC分类号： B29C43/34 , B29C43/021 , B29C43/58 , B29C2043/025 , B29K2101/12 , B44C1/20 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： In an embodiment, there is provided an imprint lithography method that includes providing a first amount of imprintable medium on a first area of a substrate, the first amount of imprintable medium, when fixed, having a first etch rate; and providing a second amount of imprintable medium on a second, different area of the substrate, the second amount of imprintable medium, when fixed, having a second, different etch rate.
摘要翻译： 在一个实施例中，提供了压印光刻方法，其包括在衬底的第一区域上提供第一量的可压印介质，当固定时，第一量的可压印介质具有第一蚀刻速率; 以及在所述基板的第二不同区域上提供第二量的可压印介质，所述第二量的可压印介质在固定时具有第二不同的蚀刻速率。
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公开(公告)号：US09116423B2
公开(公告)日：2015-08-25
申请号：US12821806
申请日：2010-06-23
申请人： Andre Bernardus Jeunink , Vadim Yevgenyevich Banine , Hans Butler , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Petrus Martinus Bernardus Vermeulen , Yvonne Wendela Kruijt-Stegeman
发明人： Andre Bernardus Jeunink , Vadim Yevgenyevich Banine , Hans Butler , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Petrus Martinus Bernardus Vermeulen , Yvonne Wendela Kruijt-Stegeman
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/00
摘要： An imprint lithography apparatus is disclosed that includes a structure located away from a substrate holder and extending across the substrate holder, and such that an imprint template arrangement is, in use, located between the structure and the substrate holder, wherein the structure has one or more arrays of lines or one or more encoders, and the substrate or substrate holder and the imprint template have a corresponding one or more encoders that face towards one or more of the one or more arrays of lines or one or more arrays of lines that face towards one or more of the one or more encoders, and the configuration determination arrangement is configured to determine a relative configuration between the substrate or substrate holder and the structure, and/or a relative configuration between the imprint template arrangement and the structure, and/or a relative configuration between the imprint template arrangement and the substrate or substrate holder.
摘要翻译： 公开了一种压印光刻设备，其包括远离衬底保持器并延伸穿过衬底保持器的结构，并且使得压印模板布置在使用中位于结构和衬底保持器之间，其中结构具有一个或 更多的线阵列或一个或多个编码器，并且衬底或衬底保持器和压印模板具有对应的一个或多个编码器，其面向一个或多个线阵列或一个或多个面阵列阵列 朝向一个或多个编码器中的一个或多个，并且配置确定装置被配置为确定衬底或衬底保持器与结构之间的相对配置，和/或压印模板布置与结构之间的相对配置，和/ 或压印模板布置和基板或基板保持器之间的相对配置。
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公开(公告)号：US08830455B2
公开(公告)日：2014-09-09
申请号：US12805808
申请日：2010-08-19
申请人： Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Sander Frederik Wuister , Luigi Scaccabarozzi
发明人： Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Sander Frederik Wuister , Luigi Scaccabarozzi
IPC分类号： G01N21/00
CPC分类号： G01N21/95623
摘要： In an aspect, an inspection method for detecting the presence or absence of a defect on an object, the object comprising a recess having a physical depth, is disclosed. The method includes directing radiation at the object, the radiation having a wavelength that is substantially equal to twice an optical depth of the recess, detecting radiation that is re-directed by the object or a defect on the object, and determining the presence or absence of a defect from the re-directed radiation.
摘要翻译： 在一方面，公开了一种用于检测物体上缺陷的存在或不存在的检查方法，该物体包括具有物理深度的凹部。 该方法包括在物体上引导辐射，辐射具有基本上等于凹部的光学深度的两倍的波长，检测由对象重新引导的辐射或物体上的缺陷，以及确定存在或不存在 来自重新导向的辐射的缺陷。
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公开(公告)号：US20110043795A1
公开(公告)日：2011-02-24
申请号：US12805808
申请日：2010-08-19
申请人： Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Sander Frederik Wuister , Luigi Scaccabarozzi
发明人： Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Sander Frederik Wuister , Luigi Scaccabarozzi
IPC分类号： G01N21/01
CPC分类号： G01N21/95623
摘要： In an aspect, an inspection method for detecting the presence or absence of a defect on an object, the object comprising a recess having a physical depth, is disclosed. The method includes directing radiation at the object, the radiation having a wavelength that is substantially equal to twice an optical depth of the recess, detecting radiation that is re-directed by the object or a defect on the object, and determining the presence or absence of a defect from the re-directed radiation.
摘要翻译： 在一方面，公开了一种用于检测物体上缺陷的存在或不存在的检查方法，该物体包括具有物理深度的凹部。 该方法包括在物体上引导辐射，辐射具有基本上等于凹部的光学深度的两倍的波长，检测由对象重新引导的辐射或物体上的缺陷，以及确定存在或不存在 来自重新导向的辐射的缺陷。
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