Stage for substrate
    8.
    发明申请
    Stage for substrate 有权
    底物阶段

    公开(公告)号:US20090250855A1

    公开(公告)日:2009-10-08

    申请号:US12384719

    申请日:2009-04-08

    IPC分类号: H01L21/687 B25B11/00

    摘要: A stage is provided on which is mounted a substrate that has a concavo-convex portion such as a circuit formed on the underside thereof. A channel 3 through which a coolant such as water flows is formed in a stage 1. An annular flange portion 4 is formed on the top surface of the stage 1. The inner side of the flange portion 4 forms a concave portion 5. The top surface of the flange portion 4 is provided with a smooth finish in order to mount a peripheral section of the underside of a substrate W thereon. Holes through which are passed three positioning pins 6 and lift pins 7 are provided in the flange portion 4 at regular intervals in the circumferential direction.

    摘要翻译: 在其上设置有具有诸如形成在其下侧上的电路的凹凸部分的基板的台。 在阶段1中形成有诸如水的冷却剂流过的通道3.在台1的顶面上形成有环形凸缘部4.凸缘部4的内侧形成凹部5.顶部 凸缘部4的表面设置有光滑的光洁度,以便在其上安装衬底W的下侧的周边部分。 通过三个定位销6和提升销7的孔在圆周方向上以规则的间隔设置在凸缘部分4中。

    Method for processing coating film and method for manufacturing semiconductor element with use of the same method
    9.
    发明授权
    Method for processing coating film and method for manufacturing semiconductor element with use of the same method 有权
    使用相同方法处理涂膜的方法和半导体元件的制造方法

    公开(公告)号:US06746963B2

    公开(公告)日:2004-06-08

    申请号:US10136744

    申请日:2002-04-30

    IPC分类号: H01L21302

    摘要: A method for processing a coating film includes the steps of forming a silica group coating film having a low dielectric constant on a substrate, conducting an etching process to the silica group coating film through a photoresist pattern, and processing the silica group coating film with plasma induced from helium gas. With this, it is possible to prevent the silica group coating film from being damaged when a wet stripping process is conducted to remove the photoresist pattern as a subsequent process, and to maintain the low dielectric constant of the coating film.

    摘要翻译: 一种涂膜的处理方法,其特征在于,在基板上形成介电常数低的二氧化硅系涂膜,通过光致抗蚀剂图案对二氧化硅基涂膜进行蚀刻处理,并对该二氧化硅基涂膜进行等离子体处理 由氦气引起。 由此,当进行湿剥离处理以除去作为后续工艺的光致抗蚀剂图案时,可以防止二氧化硅基涂膜损坏,并且保持涂膜的低介电常数。

    Navigation system for motor vehicles
    10.
    发明授权
    Navigation system for motor vehicles 失效
    汽车导航系统

    公开(公告)号:US5369588A

    公开(公告)日:1994-11-29

    申请号:US926029

    申请日:1992-08-07

    摘要: A navigation system for a motor vehicle serves to guide the motor vehicle along an optimum route which includes bypass roads and side destinations desired by a driver but no road of high traffic congestion. When the motor vehicle deviates from the guidance route, an optimum route is again determined, starting from the current position of the motor vehicle. The navigation system includes a manipulating unit 1A for setting the desired bypass roads, side destinations and the final destination, a system controller 11 for setting the destination and the side destinations in terms of the coordinates on a map which are stored in a RAM unit together with information concerning the bypass roads and congested roads, a route extracting unit 6A for extracting an optimum route from a plurality of routes searched by a route search unit 5A on the basis of data read out from the RAM unit 14 and a route guidance controller for determining a distance deviation between the optimum route and the current position of the motor vehicle determined by a current position determining unit 7A. When the distance deviation exceeds a predetermined value, the system controller 11 commands the route search unit 5A and the optimum route extracting unit 6A to start again a new optimum route determining operation.

    摘要翻译: 用于机动车辆的导航系统用于引导机动车辆沿着包括旁路和旁路目的地的目的地路线的最佳路线,但没有高交通拥堵的道路。 当机动车偏离引导路线时,从机动车辆的当前位置起,再次确定最佳路线。 导航系统包括用于设置所需旁路道路,侧目的地和最终目的地的操纵单元1A,用于根据存储在RAM单元中的地图上的坐标来设定目的地和侧目的地的系统控制器11 关于旁路和拥挤道路的信息,路线提取单元6A,其基于从RAM单元14读出的数据,从路线搜索单元5A搜索的多个路线中提取最佳路线;以及路线引导控制器, 确定由当前位置确定单元7A确定的最佳路线与机动车辆的当前位置之间的距离偏差。 当距离偏差超过预定值时,系统控制器11命令路径搜索单元5A和最佳路线提取单元6A再次开始新的最佳路线确定操作。