公开(公告)号：US06746963B2

公开(公告)日：2004-06-08

申请号：US10136744

申请日：2002-04-30

申请人： Yasushi Fujii ,  Hiroyuki Iida ,  Isao Sato ,  Kazumasa Wakiya ,  Shigeru Yokoi

发明人： Yasushi Fujii ,  Hiroyuki Iida ,  Isao Sato ,  Kazumasa Wakiya ,  Shigeru Yokoi

IPC分类号： H01L21302

CPC分类号： H01L21/31116 ,  H01L21/316 ,  H01L21/76802

摘要： A method for processing a coating film includes the steps of forming a silica group coating film having a low dielectric constant on a substrate, conducting an etching process to the silica group coating film through a photoresist pattern, and processing the silica group coating film with plasma induced from helium gas. With this, it is possible to prevent the silica group coating film from being damaged when a wet stripping process is conducted to remove the photoresist pattern as a subsequent process, and to maintain the low dielectric constant of the coating film.

摘要翻译： 一种涂膜的处理方法，其特征在于，在基板上形成介电常数低的二氧化硅系涂膜，通过光致抗蚀剂图案对二氧化硅基涂膜进行蚀刻处理，并对该二氧化硅基涂膜进行等离子体处理 由氦气引起。 由此，当进行湿剥离处理以除去作为后续工艺的光致抗蚀剂图案时，可以防止二氧化硅基涂膜损坏，并且保持涂膜的低介电常数。

公开(公告)号：US07235500B2

公开(公告)日：2007-06-26

申请号：US11000735

申请日：2004-12-01

申请人： Yasushi Fujii ,  Tatsuhiko Shibuya ,  Isao Sato

发明人： Yasushi Fujii ,  Tatsuhiko Shibuya ,  Isao Sato

IPC分类号： H01L21/31 ,  H01L21/469

CPC分类号： H01L21/02118 ,  H01L21/316 ,  H01L21/76814

摘要： A material for forming a silica based film which enables the production of a silica based film with a reduced etching rate relative to hydrofluoric acid. This material includes a solid fraction containing a film forming component capable of generating a silica based film, an organic solvent, and water, and the water content of the material, as determined by gas chromatography measurement, is within a range from 0.1 to 50% by weight.

摘要翻译： 用于形成二氧化硅基膜的材料，其能够以相对于氢氟酸的蚀刻速率降低的方式制备二氧化硅基膜。 该材料包括含有能够产生二氧化硅基膜，有机溶剂和水的成膜组分的固体部分，并且通过气相色谱测量确定的材料的水含量在0.1至50％的范围内， 重量。

公开(公告)号：US20050136692A1

公开(公告)日：2005-06-23

申请号：US11000735

申请日：2004-12-01

申请人： Yasushi Fujii ,  Tatsuhiko Shibuya ,  Isao Sato

发明人： Yasushi Fujii ,  Tatsuhiko Shibuya ,  Isao Sato

IPC分类号： C09D183/04 ,  C08L83/04 ,  C08L83/12 ,  C09D5/25 ,  C09D183/02 ,  C09D183/05 ,  H01L21/316 ,  H01L21/768 ,  H01L21/31 ,  H01L21/469

CPC分类号： H01L21/02118 ,  H01L21/316 ,  H01L21/76814

摘要： A material for forming a silica based film which enables the production of a silica based film with a reduced etching rate relative to hydrofluoric acid. This material includes a solid fraction containing a film forming component capable of generating a silica based film, an organic solvent, and water, and the water content of the material, as determined by gas chromatography measurement, is within a range from 0.1 to 50% by weight.

摘要翻译： 用于形成二氧化硅基膜的材料，其能够以相对于氢氟酸的蚀刻速率降低的方式制备二氧化硅基膜。 该材料包括含有能够产生二氧化硅基膜，有机溶剂和水的成膜组分的固体部分，并且通过气相色谱测量确定的材料的水含量在0.1至50％的范围内， 重量。

公开(公告)号：US20090250855A1

公开(公告)日：2009-10-08

申请号：US12384719

申请日：2009-04-08

申请人： Yasushi Fujii ,  Takuma Hasegawa

发明人： Yasushi Fujii ,  Takuma Hasegawa

IPC分类号： H01L21/687 ,  B25B11/00

CPC分类号： H01L21/68742 ,  H01L21/67109 ,  H01L21/68735

摘要： A stage is provided on which is mounted a substrate that has a concavo-convex portion such as a circuit formed on the underside thereof. A channel 3 through which a coolant such as water flows is formed in a stage 1. An annular flange portion 4 is formed on the top surface of the stage 1. The inner side of the flange portion 4 forms a concave portion 5. The top surface of the flange portion 4 is provided with a smooth finish in order to mount a peripheral section of the underside of a substrate W thereon. Holes through which are passed three positioning pins 6 and lift pins 7 are provided in the flange portion 4 at regular intervals in the circumferential direction.

摘要翻译： 在其上设置有具有诸如形成在其下侧上的电路的凹凸部分的基板的台。 在阶段1中形成有诸如水的冷却剂流过的通道3.在台1的顶面上形成有环形凸缘部4.凸缘部4的内侧形成凹部5.顶部 凸缘部4的表面设置有光滑的光洁度，以便在其上安装衬底W的下侧的周边部分。 通过三个定位销6和提升销7的孔在圆周方向上以规则的间隔设置在凸缘部分4中。

公开(公告)号：US5369588A

公开(公告)日：1994-11-29

申请号：US926029

申请日：1992-08-07

申请人： Katsuro Hayami ,  Kazuhiro Yokouchi ,  Hirofumi Goto ,  Chisato Yoshida ,  Yasushi Fujii

发明人： Katsuro Hayami ,  Kazuhiro Yokouchi ,  Hirofumi Goto ,  Chisato Yoshida ,  Yasushi Fujii

IPC分类号： G01C21/00 ,  G01C21/34 ,  G08G1/09 ,  G08G1/0968 ,  G08G1/0969 ,  G06F15/50

CPC分类号： G08G1/096827 ,  G01C21/34 ,  G08G1/096838 ,  G08G1/096844 ,  G08G1/096866

摘要： A navigation system for a motor vehicle serves to guide the motor vehicle along an optimum route which includes bypass roads and side destinations desired by a driver but no road of high traffic congestion. When the motor vehicle deviates from the guidance route, an optimum route is again determined, starting from the current position of the motor vehicle. The navigation system includes a manipulating unit 1A for setting the desired bypass roads, side destinations and the final destination, a system controller 11 for setting the destination and the side destinations in terms of the coordinates on a map which are stored in a RAM unit together with information concerning the bypass roads and congested roads, a route extracting unit 6A for extracting an optimum route from a plurality of routes searched by a route search unit 5A on the basis of data read out from the RAM unit 14 and a route guidance controller for determining a distance deviation between the optimum route and the current position of the motor vehicle determined by a current position determining unit 7A. When the distance deviation exceeds a predetermined value, the system controller 11 commands the route search unit 5A and the optimum route extracting unit 6A to start again a new optimum route determining operation.

摘要翻译： 用于机动车辆的导航系统用于引导机动车辆沿着包括旁路和旁路目的地的目的地路线的最佳路线，但没有高交通拥堵的道路。 当机动车偏离引导路线时，从机动车辆的当前位置起，再次确定最佳路线。 导航系统包括用于设置所需旁路道路，侧目的地和最终目的地的操纵单元1A，用于根据存储在RAM单元中的地图上的坐标来设定目的地和侧目的地的系统控制器11 关于旁路和拥挤道路的信息，路线提取单元6A，其基于从RAM单元14读出的数据，从路线搜索单元5A搜索的多个路线中提取最佳路线;以及路线引导控制器， 确定由当前位置确定单元7A确定的最佳路线与机动车辆的当前位置之间的距离偏差。 当距离偏差超过预定值时，系统控制器11命令路径搜索单元5A和最佳路线提取单元6A再次开始新的最佳路线确定操作。

公开(公告)号：US5213665A

公开(公告)日：1993-05-25

申请号：US717834

申请日：1991-04-08

申请人： Noboru Sugishima ,  Noriaki Ikeda ,  Yasushi Fujii ,  Akira Inoue

发明人： Noboru Sugishima ,  Noriaki Ikeda ,  Yasushi Fujii ,  Akira Inoue

IPC分类号： C07C221/00 ,  C07C225/34 ,  C25B3/04

CPC分类号： C25B3/04 ,  C07C221/00 ,  C07C225/34

摘要： A process for producing 1-aminoanthraquinones represented by formula (C) ##STR1## wherein R.sup.1 and R.sup.2, independently from each other, denote one type selected from a hydrogen atom, an alkyl group having 1 to 4 carbon atoms and a halogen atom,which comprises converting 5-nitro-1,4,4a,9a-tetrahydroanthraquinones represented by formula (A) ##STR2## wherein R.sup.1 and R.sup.2 are as defined above, into 1-hydroxylaminoanthraquinones represented by formula (B) ##STR3## wherein R.sup.1 and R.sup.2 are as defined above, in the presence of a basic compound, and electrolytically reducing the resulting 1-hydroxylaminoanthraquinones in the presence of a basic compound.

摘要翻译： 制备由式（C）表示的1-氨基蒽醌的方法（C）其中R 1和R 2彼此独立地表示选自氢原子，具有1至4个碳原子的烷基和卤素 其包括将由式（A）表示的5-硝基-1,4,4a，9a-四氢蒽醌（A）（其中R 1和R 2如上定义）转化成由式（B）表示的1-羟基氨基蒽醌中 （B）其中R 1和R 2如上定义，在碱性化合物的存在下，在碱性化合物的存在下电解还原所得的1-羟基氨基蒽醌。

公开(公告)号：US10094024B2

公开(公告)日：2018-10-09

申请号：US14127315

申请日：2012-05-31

申请人： Yasushi Fujii ,  Tatsuhiro Mitake ,  Atsushi Matsushita

发明人： Yasushi Fujii ,  Tatsuhiro Mitake ,  Atsushi Matsushita

IPC分类号： C23C16/50 ,  H01L21/02 ,  H01L21/683 ,  C23C16/26 ,  C23C16/505

摘要： A method for forming a release layer which lies between a substrate and a supporting member and has a property that changes when the release layer absorbs light coming through the supporting member, by carrying out plasma CVD with a high-frequency power that is set so as to be higher than a power at which a mode jump occurs.

公开(公告)号：US20130220554A1

公开(公告)日：2013-08-29

申请号：US13880802

申请日：2011-08-25

申请人： Yoshihiro Inao ,  Yasushi Fujii ,  Atsushi Matsushita ,  Koki Tamura ,  Atsushi Kubo

发明人： Yoshihiro Inao ,  Yasushi Fujii ,  Atsushi Matsushita ,  Koki Tamura ,  Atsushi Kubo

IPC分类号： H01L21/78 ,  H01L23/00

CPC分类号： H01L21/7813 ,  B32B7/06 ,  C03C17/3452 ,  H01L21/6835 ,  H01L23/562 ,  H01L2221/68318 ,  H01L2221/68327 ,  H01L2221/6834 ,  H01L2221/68381 ,  H01L2924/0002 ,  Y10T156/1158 ,  H01L2924/00

摘要： A laminate including a supporting member which is light transmissive; a supported substrate supported by the supporting member; an adhesive layer provided on a surface of the supported substrate which surface faces toward the supporting member; and a release layer which is made of a fluorocarbon and is provided between the supporting member and the supported substrate, the release layer having a property that changes when it absorbs light coming through the supporting member.

摘要翻译： 一种层压体，其包括透光性的支撑构件; 由支撑构件支撑的支撑基板; 所述粘合剂层设置在所述被支撑基板的表面朝向所述支撑部件的表面上; 以及由碳氟化合物制成并且设置在所述支撑构件和所述被支撑基板之间的剥离层，所述剥离层具有当吸收通过所述支撑构件的光时变化的性质。

公开(公告)号：US08475668B2

公开(公告)日：2013-07-02

申请号：US12902721

申请日：2010-10-12

申请人： Hiroshi Tanaka ,  Teruomi Minami ,  Yosuke Kawabuchi ,  Norihiro Ito ,  Fumihiro Kamimura ,  Takashi Yabuta ,  Kazuki Kosai ,  Takeshi Uno ,  Kenji Sekiguchi ,  Yasushi Fujii

发明人： Hiroshi Tanaka ,  Teruomi Minami ,  Yosuke Kawabuchi ,  Norihiro Ito ,  Fumihiro Kamimura ,  Takashi Yabuta ,  Kazuki Kosai ,  Takeshi Uno ,  Kenji Sekiguchi ,  Yasushi Fujii

IPC分类号： H01B13/00

CPC分类号： H01L21/02057 ,  H01L21/67051

摘要： Provided are a substrate liquid processing apparatus, a substrate liquid processing method, and a computer readable storage medium having a substrate liquid processing program stored therein that can prevent the occurrence of the electrostatic breakdown caused by the discharge of electric charges in a substrate. The substrate liquid processing apparatus processes a circuit-forming surface of the substrate with a chemical liquid. Furthermore, prior to processing the substrate with the chemical liquid, the substrate liquid processing apparatus performs an anti-static process for an surface opposite to the circuit-forming surface of the substrate by an anti-static liquid, thereby emitting the electric charges on the substrate.

摘要翻译： 提供一种基板液体处理装置，基板液体处理方法以及其中存储有基板液体处理程序的计算机可读存储介质，其可以防止由基板中的电荷放电引起的静电破坏的发生。 基板液体处理装置用化学液体处理基板的电路形成表面。 此外，在用化学液体处理基板之前，基板液体处理装置通过防静电液体对与基板的电路形成面相反的表面进行防静电处理，从而将电荷 基质。

公开(公告)号：US08336866B2

公开(公告)日：2012-12-25

申请号：US12384719

申请日：2009-04-08

申请人： Yasushi Fujii ,  Takuma Hasegawa

发明人： Yasushi Fujii ,  Takuma Hasegawa

IPC分类号： B25B1/00 ,  B25B1/02 ,  B25B1/10 ,  B25B5/00 ,  B25B1/24 ,  B24B5/16 ,  B23Q3/00 ,  H01L21/687

CPC分类号： H01L21/68742 ,  H01L21/67109 ,  H01L21/68735

摘要： A stage is provided on which is mounted a substrate that has a concavo-convex portion such as a circuit formed on the underside thereof. A channel 3 through which a coolant such as water flows is formed in a stage 1. An annular flange portion 4 is formed on the top surface of the stage 1. The inner side of the flange portion 4 forms a concave portion 5. The top surface of the flange portion 4 is provided with a smooth finish in order to mount a peripheral section of the underside of a substrate W thereon. Holes through which are passed three positioning pins 6 and lift pins 7 are provided in the flange portion 4 at regular intervals in the circumferential direction.

摘要翻译： 在其上设置有具有诸如形成在其下侧上的电路的凹凸部分的基板的台。 在阶段1中形成有诸如水的冷却剂流过的通道3.在台1的顶面上形成有环形凸缘部4.凸缘部4的内侧形成凹部5.顶部 凸缘部4的表面设置有光滑的光洁度，以便在其上安装衬底W的下侧的周边部分。 通过三个定位销6和提升销7的孔在圆周方向上以规则的间隔设置在凸缘部分4中。