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    Evaporation supply apparatus for raw material and automatic pressure regulating device used therewith
    3.
    发明授权
    Evaporation supply apparatus for raw material and automatic pressure regulating device used therewith 有权
    用于原材料的蒸发供应装置和使用的自动压力调节装置

    公开(公告)号：US08047510B2

    公开(公告)日：2011-11-01

    申请号：US12306904

    申请日：2007-06-13

    申请人： Kaoru Hirata ,  Masaaki Nagase ,  Atsushi Hidaka ,  Atsushi Matsumoto ,  Ryousuke Dohi ,  Kouji Nishino ,  Nobukazu Ikeda

    发明人： Kaoru Hirata ,  Masaaki Nagase ,  Atsushi Hidaka ,  Atsushi Matsumoto ,  Ryousuke Dohi ,  Kouji Nishino ,  Nobukazu Ikeda

    IPC分类号： B01F3/04

    CPC分类号： C23C16/4481 ,  C23C16/52 ,  G05D16/2013 ,  Y10T137/7737

    摘要： An evaporation supply apparatus for raw material used in semiconductor manufacturing includes a source tank in which a raw material is pooled; a flow rate control device that supplies carrier gas at a regulated flow rate into the source tank; a primary piping path for feeding mixed gas G0, made up of raw material vapor G4 and carrier gas G1, an automatic pressure regulating device that regulates a control valve based on the detected values of the pressure and temperature of mixed gas G0 to regulate the cross-sectional area of the passage through which the mixed gas G0 is distributed so as to hold the pressure of the mixed gas G0 inside the source tank constant; and a constant-temperature heating unit for heating the source tank to a set temperature, in which mixed gas G0 is supplied to a process chamber while controlling the pressure inside the source tank.

    摘要翻译： 用于半导体制造的原料的蒸发供给装置包括：原料汇集在其中的源罐; 流量控制装置，其以规定的流量将载气供给到所述源罐; 用于供给由原料蒸气G4和载气G1组成的混合气体G0的主要管路，基于混合气体G0的压力和温度的检测值来调节控制阀的自动调压装置，以调节十字 混合气体G0通过其分配的通道的截面积，以将混合气体G0的压力保持在源箱内部恒定; 以及用于将源罐加热到设定温度的恒温加热单元，其中将混合气体G0供给到处理室，同时控制源罐内的压力。

    EVAPORATION SUPPLY APPARATUS FOR RAW MATERIAL AND AUTOMATIC PRESSURE REGULATING DEVICE USED THEREWITH
    4.
    发明申请
    EVAPORATION SUPPLY APPARATUS FOR RAW MATERIAL AND AUTOMATIC PRESSURE REGULATING DEVICE USED THEREWITH 有权
    用于原材料和自动压力调节装置的蒸发供应装置

    公开(公告)号：US20100012026A1

    公开(公告)日：2010-01-21

    申请号：US12306904

    申请日：2007-06-13

    申请人： Kaoru Hirata ,  Masaaki Nagase ,  Atsushi Hidaka ,  Atsushi Matsumoto ,  Ryousuke Dohi ,  Kouji Nishino ,  Nobukazu Ikeda

    发明人： Kaoru Hirata ,  Masaaki Nagase ,  Atsushi Hidaka ,  Atsushi Matsumoto ,  Ryousuke Dohi ,  Kouji Nishino ,  Nobukazu Ikeda

    IPC分类号： C23C16/52 ,  F16K17/38

    CPC分类号： C23C16/4481 ,  C23C16/52 ,  G05D16/2013 ,  Y10T137/7737

    摘要： An evaporation supply apparatus for raw material used in semiconductor manufacturing includes a source tank in which a raw material is pooled; a flow rate control device that supplies carrier gas at a regulated flow rate into the source tank; a primary piping path for feeding mixed gas G0, made up of raw material vapor G4 and carrier gas G1, an automatic pressure regulating device that regulates a control valve based on the detected values of the pressure and temperature of mixed gas G0 to regulate the cross-sectional area of the passage through which the mixed gas G0 is distributed so as to hold the pressure of the mixed gas G0 inside the source tank constant; and a constant-temperature heating unit for heating the source tank to a set temperature, in which mixed gas G0 is supplied to a process chamber while controlling the pressure inside the source tank.

    摘要翻译： 用于半导体制造的原料的蒸发供给装置包括：原料汇集在其中的源罐; 流量控制装置，其以规定的流量将载气供给到所述源罐; 用于供给由原料蒸气G4和载气G1组成的混合气体G0的主要管路，基于混合气体G0的压力和温度的检测值来调节控制阀的自动调压装置，以调节十字 混合气体G0通过其分配的通道的截面积，以将混合气体G0的压力保持在源箱内部恒定; 以及用于将源罐加热到设定温度的恒温加热单元，其中将混合气体G0供给到处理室，同时控制源罐内的压力。

    Piezoelectrically driven valve and piezoelectrically driven flow rate control device
    5.
    发明授权
    Piezoelectrically driven valve and piezoelectrically driven flow rate control device 有权
    压电阀和压电驱动流量控制装置

    公开(公告)号：US09163743B2

    公开(公告)日：2015-10-20

    申请号：US13505620

    申请日：2010-11-04

    申请人： Atsushi Hidaka ,  Kaoru Hirata ,  Masaaki Nagase ,  Nobukazu Ikeda ,  Ryousuke Dohi ,  Kouji Nishino

    发明人： Atsushi Hidaka ,  Kaoru Hirata ,  Masaaki Nagase ,  Nobukazu Ikeda ,  Ryousuke Dohi ,  Kouji Nishino

    IPC分类号： G05D7/06 ,  F16K31/00 ,  F16K7/14 ,  F16K25/00

    CPC分类号： F16K31/007 ,  F16K7/14 ,  F16K25/005 ,  G05D7/0629 ,  Y10T137/6416 ,  Y10T137/7759 ,  Y10T137/776 ,  Y10T137/7761

    摘要： A piezoelectrically driven valve and a piezoelectrically driven fluid control device are provided that may control a fluid even if the temperature of the fluid is higher than an operating temperature range of a piezoelectric actuator. The piezoelectrically driven valve includes a valve element for opening and closing a fluid passage, a piezoelectric actuator for driving the valve element by utilizing extension of a piezoelectric element, and a radiation spacer that lifts and supports the piezoelectric actuator away from the fluid passage, and radiates heat that is transferred from fluid flowing in the fluid passage to the piezoelectric actuator, and preferably further includes a support cylinder that houses and supports both of the piezoelectric actuator and the radiation spacer, wherein the support cylinder is made of a material with the same thermal expansion coefficient as that of the radiation spacer, at least at a portion for housing the radiation spacer.

    摘要翻译： 提供了一种压电驱动阀和压电驱动的流体控制装置，其可以控制流体，即使流体的温度高于压电致动器的工作温度范围。 压电驱动阀包括用于打开和关闭流体通道的阀元件，通过利用压电元件的延伸来驱动阀元件的压电致动器，以及将压电致动器提升和支撑远离流体通道的辐射间隔件，以及 辐射从在流体通道中流动的流体转移到压电致动器的热量，并且优选地还包括容纳和支撑压电致动器和辐射间隔物的支撑筒，其中支撑筒由具有相同材料的材料制成 至少在用于容纳辐射间隔物的部分处，与辐射间隔物的热膨胀系数相同。

    Piezoelectrically Driven Valve and Piezoelectrically Driven Flow Rate Control Device
    6.
    发明申请
    Piezoelectrically Driven Valve and Piezoelectrically Driven Flow Rate Control Device 有权
    压电驱动阀和压电驱动流量控制装置

    公开(公告)号：US20120273061A1

    公开(公告)日：2012-11-01

    申请号：US13505620

    申请日：2010-11-04

    申请人： Atsushi Hidaka ,  Kaoru Hirata ,  Masaaki Nagase ,  Nobukazu Ikeda ,  Ryousuke Dohi ,  Kouji Nishino

    发明人： Atsushi Hidaka ,  Kaoru Hirata ,  Masaaki Nagase ,  Nobukazu Ikeda ,  Ryousuke Dohi ,  Kouji Nishino

    IPC分类号： F16K49/00 ,  F16K31/02

    CPC分类号： F16K31/007 ,  F16K7/14 ,  F16K25/005 ,  G05D7/0629 ,  Y10T137/6416 ,  Y10T137/7759 ,  Y10T137/776 ,  Y10T137/7761

    摘要： A piezoelectrically driven valve and a piezoelectrically driven fluid control device are provided that may control a fluid even if the temperature of the fluid is higher than an operating temperature range of a piezoelectric actuator. The piezoelectrically driven valve includes a valve element for opening and closing a fluid passage, a piezoelectric actuator for driving the valve element by utilizing extension of a piezoelectric element, and a radiation spacer that lifts and supports the piezoelectric actuator away from the fluid passage, and radiates heat that is transferred from fluid flowing in the fluid passage to the piezoelectric actuator, and preferably further includes a support cylinder that houses and supports both of the piezoelectric actuator and the radiation spacer, wherein the support cylinder is made of a material with the same thermal expansion coefficient as that of the radiation spacer, at least at a portion for housing the radiation spacer.

    摘要翻译： 提供了一种压电驱动阀和压电驱动的流体控制装置，其可以控制流体，即使流体的温度高于压电致动器的工作温度范围。 压电驱动阀包括用于打开和关闭流体通道的阀元件，通过利用压电元件的延伸来驱动阀元件的压电致动器，以及将压电致动器提升和支撑远离流体通道的辐射间隔件，以及 辐射从在流体通道中流动的流体转移到压电致动器的热量，并且优选地还包括容纳和支撑压电致动器和辐射间隔物的支撑筒，其中支撑筒由具有相同材料的材料制成 至少在用于容纳辐射间隔物的部分处，与辐射间隔物的热膨胀系数相同。

    Pressure type flow rate control device
    7.
    发明授权
    Pressure type flow rate control device 有权
    压力式流量控制装置

    公开(公告)号：US09574917B2

    公开(公告)日：2017-02-21

    申请号：US13483328

    申请日：2012-05-30

    申请人： Atsushi Hidaka ,  Masaaki Nagase ,  Ryousuke Dohi ,  Nobukazu Ikeda ,  Kouji Nishino

    发明人： Atsushi Hidaka ,  Masaaki Nagase ,  Ryousuke Dohi ,  Nobukazu Ikeda ,  Kouji Nishino

    IPC分类号： G05D7/06 ,  G01F1/36 ,  G01F15/02

    CPC分类号： G01F1/363 ,  G01F15/024 ,  G05D7/0635 ,  Y10T137/7737 ,  Y10T137/776 ,  Y10T137/7761

    摘要： A pressure type flow rate control device provides flow rate control for gas at 100-500° C. with an error not more than 1.0% F.S. The pressure type flow rate control device includes a valve body with a fluid passage, a valve portion interposed in the passage, a valve drive unit driving the valve portion to open/close the passage, a restriction mechanism on the downstream side of the valve portion in the passage, a temperature detector detecting gas temperature between the valve portion and restriction mechanism, a pressure detector detecting gas pressure between the valve portion and restriction mechanism, and an arithmetic control device controlling flow rate of gas in the restriction mechanism based on values detected by the temperature detector and the pressure detector, wherein the temperature detector is inserted in an attachment hole of the valve body at a position just above an outlet side fluid passage.

    摘要翻译： 压力式流量控制装置为100-500℃的气体提供流量控制，误差不超过1.0％F.S. 压力式流量控制装置包括具有流体通道的阀体，插入通道中的阀部分，驱动阀部分以打开/关闭通道的阀驱动单元，在阀部分的下游侧的限制机构 在通道中，检测器检测阀部分和限制机构之间的气体温度，检测阀部分和限制机构之间的气体压力的压力检测器以及根据检测到的值控制限制机构中的气体流量的算术控制装置 通过温度检测器和压力检测器，其中温度检测器被插入在阀体的安装孔中，恰好在出口侧流体通道的正上方。

    VAPORIZER
    8.
    发明申请
    VAPORIZER 有权
    蒸气器

    公开(公告)号：US20130084059A1

    公开(公告)日：2013-04-04

    申请号：US13563983

    申请日：2012-08-01

    申请人： Tadahiro Ohmi ,  Yasuyuki Shirai ,  Masaaki Nagase ,  Satoru Yamashita ,  Atsushi Hidaka ,  Ryousuke Dohi ,  Kouji Nishino ,  Nobukazu Ikeda ,  Keiji Hirao

    发明人： Tadahiro Ohmi ,  Yasuyuki Shirai ,  Masaaki Nagase ,  Satoru Yamashita ,  Atsushi Hidaka ,  Ryousuke Dohi ,  Kouji Nishino ,  Nobukazu Ikeda ,  Keiji Hirao

    IPC分类号： C23C14/00 ,  F22B1/28

    CPC分类号： C23C16/4483 ,  F22B1/284

    摘要： A vaporizer, capable of stabilizing the behavior of pressure inside the vaporizer, includes a chamber having an inlet and an outlet, a heating device that heats the inside of the chamber, a partition wall structure 13 that is provided inside the vaporizer and partitions the liquid material inside the chamber into a plurality of sections, and liquid distribution portions 20 that are provided at the lower portion of the partition wall structure 13 and that allow liquid distribution among the sections partitioned by the partition wall structure 13, and the partition wall structure includes a grid-like, honeycomb-shaped, mesh-like, or pipe-shaped partition wall.

    摘要翻译： 能够稳定蒸发器内的压力行为的蒸发器包括具有入口和出口的室，加热室内的加热装置，设置在蒸发器内部并分隔液体的分隔壁结构13 室内的材料分成多个部分，分隔部分20设置在分隔壁结构13的下部并且允许在由分隔壁结构13分隔的部分之间进行液体分配，以及分隔壁结构包括 网状，蜂窝状，网状或管状隔壁。

    Vaporizer
    9.
    发明授权
    Vaporizer 有权
    汽化器

    公开(公告)号：US08724974B2

    公开(公告)日：2014-05-13

    申请号：US13563983

    申请日：2012-08-01

    申请人： Tadahiro Ohmi ,  Yasuyuki Shirai ,  Masaaki Nagase ,  Satoru Yamashita ,  Atsushi Hidaka ,  Ryousuke Dohi ,  Kouji Nishino ,  Nobukazu Ikeda ,  Keiji Hirao

    发明人： Tadahiro Ohmi ,  Yasuyuki Shirai ,  Masaaki Nagase ,  Satoru Yamashita ,  Atsushi Hidaka ,  Ryousuke Dohi ,  Kouji Nishino ,  Nobukazu Ikeda ,  Keiji Hirao

    IPC分类号： B01D7/00

    CPC分类号： C23C16/4483 ,  F22B1/284

    摘要： A vaporizer, capable of stabilizing the behavior of pressure inside the vaporizer, includes a chamber having an inlet and an outlet, a heating device that heats the inside of the chamber, a partition wall structure 13 that is provided inside the vaporizer and partitions the liquid material inside the chamber into a plurality of sections, and liquid distribution portions 20 that are provided at the lower portion of the partition wall structure 13 and that allow liquid distribution among the sections partitioned by the partition wall structure 13, and the partition wall structure includes a grid-like, honeycomb-shaped, mesh-like, or pipe-shaped partition wall.

    摘要翻译： 能够稳定蒸发器内的压力行为的蒸发器包括具有入口和出口的室，加热室内的加热装置，设置在蒸发器内部并分隔液体的分隔壁结构13 室内的材料分成多个部分，分隔部分20设置在分隔壁结构13的下部并且允许在由分隔壁结构13分隔的部分之间进行液体分配，以及分隔壁结构包括 网状，蜂窝状，网状或管状隔壁。