Abstract:
The embodiments of the present invention provide an array substrate and a method for manufacturing the same. The method includes: forming an ITO film on a substrate; performing an annealing treatment on the substrate; forming a gate metal film on the ITO film; and processing the ITO film and the gate metal film to obtain a common electrode pattern and a gate pattern. In the embodiments of the present invention, after film formation of ITO, an annealing process is performed. Water vapor residue in the ITO film can thus be released, thereby avoiding bumps on the interface between the ITO and other layers, and improving the yield of ADS products.
Abstract:
A display substrate, display panel, and method of fabricating the display substrate. The display substrate includes: a first thin film transistor on a substrate; a second thin film transistor on the substrate and on the same side of the substrate as first thin film transistor; a light blocking structure between the substrate and an active region of first thin film transistor. The light blocking structure is configured to block at least a portion of light incident on the active region of first thin film transistor, such that a ratio of area of an illuminated portion of the active region of first thin film transistor to an area of the active region of first thin film transistor is less than a ratio of area of an illuminated portion of an active region of second thin film transistor to an area of the active region of second thin film transistor.
Abstract:
A display substrate, including: a base substrate; and a metal conductive layer, located at a side of the base substrate, and including a core conductive layer and a functional conductive layer laminated along a direction away from the base substrate; a material of the core conductive layer includes a conductive metal material; a material of the functional conductive layer includes a first diffusion barrier metal material and a first adhesion force enhancing metal material, wherein the first diffusion barrier metal material is configured to block diffusion of the conductive metal material, and the first adhesion force enhancing metal material is configured to enhance an adhesion force between the functional conductive layer and a photoresist used in a patterning process of the functional conductive layer; a surface energy of any of first adhesion force enhancing metal materials is less than or equal to 325 mJ/m2.
Abstract:
An array substrate includes sub-pixels arranged in an array, scan lines, and data lines on a base substrate, with any one of the sub-pixels including a pixel electrode and a switch transistor; wherein the pixel electrode is connected to a drain electrode of the switch transistor, a gate electrode of the switch transistor is connected to one of the scan lines, a source electrode of the switch transistor is connected to one of the data lines; and an active layer of the switch transistor of the sub-pixel is located between the pixel electrode of the sub-pixel and the data line connected to the sub-pixel.
Abstract:
A manufacturing method comprises steps of: forming a metal pattern having a thickness d on a substrate; forming an insulating film layer on the substrate on which the metal pattern is formed, so that the insulating film layer has an overlap region with the metal pattern, an absolute value of a height difference between the overlap region of the insulating film layer and other regions of the insulating film layer being less than the thickness d; and, forming a pattern of a semiconductor layer and a source/drain metal layer on the substrate on which the insulating film layer is formed.
Abstract:
An array substrate includes a base substrate, including a display area and a peripheral area; a driving circuit layer, located at one side of the base substrate and including a plurality of data lines and a plurality of scanning lines, where the plurality of data lines extend along a first direction and are arranged at intervals along a second direction, the plurality of scanning lines extend along the second direction and are arranged at intervals along the first direction, and the data line and the scanning line intersect with each other to define a plurality of sub-pixel areas; and a metal layer, located at one side of the driving circuit layer away from the base substrate, where the metal layer includes a plurality of metal blocks arranged at intervals, and the metal block is located at an intersection of the data line and the scanning line.
Abstract:
This disclosure provides a transparent conductive thin film, a substrate, a touch screen and a manufacturing method thereof, and a display device. The transparent conductive thin film comprises a first metal oxide layer, a metal layer and a second metal oxide layer arranged in a stacking manner.
Abstract:
The present invention relates to the field of display technology, and provides a display substrate, its manufacturing method, and a display device. The method comprises a step of forming a pattern of a barrier layer and a pattern of a first electrode. The step of forming the pattern of the barrier layer and the pattern of the first electrode comprises: forming a barrier layer film and a first electrode film sequentially; and forming the pattern of the barrier layer and the pattern of the first electrode by a single patterning process.
Abstract:
A preparation method of a conductive via hole structure, a preparation method of an array substrate and a preparation method of a display device, the preparation method of the array substrate includes: forming a first metal layer (01) including the first metal structure (01a), forming a non-metallic film including a first part corresponding to the first metal structure (01a) and an organic insulating film (40′) in sequence; patterning the organic insulating film (40′) to form a first organic insulating layer via hole (41) corresponding to the first part; then baking to form an organic insulating layer (40); and then, removing the first part of the non-metallic film to form a non-metallic layer and expose the part of the surface (011) of the first metal structure (01a). This method can avoid the metal structure from being seriously oxidized.
Abstract:
The invention relates to the field of display design, and discloses an array substrate, a manufacturing method thereof, a display panel and a display device. The array substrate comprises a base substrate, and a peripheral gate line, a gate insulation layer, a peripheral data line and a protection layer which are formed on the base substrate in turn, wherein surface height of the protection layer corresponding to position where the peripheral gate line is located is higher than that of the protection layer corresponding to position where the peripheral data line is located. As such, when in contact with a peripheral wiring area of the array substrate, a foreign material is first in contact with the protection layer corresponding to position where the peripheral gate line is located, thereby reducing probability of crushing or scratching the peripheral data line by the foreign material, improving the stability of product performance.