Substrate container with pressure equalization
    2.
    发明授权
    Substrate container with pressure equalization 失效
    具有压力均衡的基板容器

    公开(公告)号:US07528936B2

    公开(公告)日:2009-05-05

    申请号:US11364860

    申请日:2006-02-26

    IPC分类号: G03B27/58

    摘要: The present invention is a pod for containing a particulate sensitive substrate and for providing pressure equalization between the exterior and an interior environment of the pod and for minimizing gaseous fluid flow inside adjacent to the particulate sensitive substrate. The pod comprises a primary pod, a diaphragm positioned in a cover, the diaphragm having a normal undeflected position, the diaphragm deflectable from the normal undeflected position. Preferably, the pod comprises a secondary pod disposed in the primary pod defining a second enclosure for containing the particulate sensitive substrate. The pod may comprise a filter attached to the pod and providing gaseous fluid communication between the exterior of the pod and the interior of the pod. The diaphragm is responsive to rapid pressure changes and the filter is responsive to slower pressure changes and allows the diaphragm to return to its normal undeflected position.

    摘要翻译: 本发明是用于容纳微粒敏感基材并用于在容器的外部和内部环境之间提供压力平衡并且用于最小化与颗粒敏感基材相邻的气态流体流动的容器的容器。 所述荚包括主荚,位于盖中的隔膜,所述膈肌具有正常的未偏转位置,所述膈肌可偏离正常的未偏转位置。 优选地,荚包括设置在主荚中的次荚,限定用于容纳微粒敏感基质的第二外壳。 荚可以包括附接到荚果的过滤器,并且在荚的外部和荚的内部之间提供气态流体连通。 隔膜响应于快速的压力变化,过滤器响应于较慢的压力变化,并允许隔膜返回其正常的未偏转位置。

    300 mm microenvironment pod with door on side
    5.
    再颁专利
    300 mm microenvironment pod with door on side 失效
    300 mm微环境荚,侧面有门

    公开(公告)号:USRE41231E1

    公开(公告)日:2010-04-20

    申请号:US10310069

    申请日:1995-10-13

    IPC分类号: B65D85/90

    摘要: A container for creating a microenvironment is disclosed. The container includes a shell, a door and a plurality of supports having a unique design which are used to securely retain items, such as silicon wafers, in a spaced apart parallel relationship. The supports are removable. An electrical path is provided to ground the supports. Kinematic coupling structures are also provided for positioning the container on a surface so as to, for example, properly align the door with the port of a wafer processing tool.

    摘要翻译: 公开了一种用于创建微环境的容器。 容器包括壳体,门和具有独特设计的多个支撑件,其用于以间隔开的平行关系可靠地保持诸如硅晶片的物品。 支架是可移动的。 提供电路以使支撑件接地。 还提供运动耦合结构用于将容器定位在表面上,以便例如将门与晶片处理工具的端口正确对准。

    300 mm microenvironment pod with door on side
    7.
    发明授权
    300 mm microenvironment pod with door on side 失效
    300 mm微环境荚,侧面有门

    公开(公告)号:US5944194A

    公开(公告)日:1999-08-31

    申请号:US913260

    申请日:1997-09-10

    摘要: A container for creating a microenvironment is disclosed. The container includes a shell, a door and a plurality of supports having a unique design which are used to securely retain items, such as silicon wafers, in a spaced apart parallel relationship. The supports are removable. An electrical path is provided to ground the supports. Kinematic coupling structures are also provided for positioning the container on a surface so as to, for example, properly align the door with the port of a wafer processing tool.

    摘要翻译: PCT No.PCT / US95 / 12516 Sec。 371日期:1997年9月10日 102(e)1997年9月10日PCT PCT 1995年10月13日PCT公布。 公开号WO97 / 13710PC。 日期1997年04月17日公开了一种用于创建微环境的容器。 容器包括壳体,门和具有独特设计的多个支撑件,其用于以间隔开的平行关系可靠地保持诸如硅晶片的物品。 支架是可移动的。 提供电路以使支撑件接地。 还提供运动耦合结构用于将容器定位在表面上,以便例如将门与晶片处理工具的端口正确对准。

    Reticle carrier
    8.
    发明申请
    Reticle carrier 有权
    标线载体

    公开(公告)号:US20050134831A1

    公开(公告)日:2005-06-23

    申请号:US10999371

    申请日:2004-11-30

    摘要: A carrier for a reticle used in photolithographic semiconductor processing, having a base portion and a cover portion. The base portion has a plurality of reticle supports and a plurality of reticle positioning members. The cover portion is adapted to sealingly mate with the base portion, and has an inner surface with a plurality of spaced apart reticle restraints and a pair of reticle positioning tabs projecting inwardly therefrom. Each reticle positioning tab has a diagonal edge portion, and is oriented so that the diagonal edge portion urges a reticle resting on the reticle supports into engagement with the reticle restraints when the cover portion is mated with the base portion.

    摘要翻译: 用于光刻半导体处理中的掩模版载体,具有基部和覆盖部分。 基部具有多个掩模版支架和多个标线片定位构件。 盖部分适于与基部密封地配合,并且具有内表面,其具有多个间隔开的掩模版约束件和从其向内突出的一对光罩定位片。 每个标线片定位突片具有对角边缘部分,并且被定向成使得当盖部分与基部配合时,对角边缘部分将搁置在掩模版支架上的光罩推向与标线保护装置接合。

    Reticle carrier with positioning cover
    9.
    发明授权
    Reticle carrier with positioning cover 有权
    带有定位盖的标线架

    公开(公告)号:US06825916B2

    公开(公告)日:2004-11-30

    申请号:US10190347

    申请日:2002-07-05

    IPC分类号: G03B2762

    摘要: A carrier for a reticle used in photolithographic semiconductor processing, having a base portion and a cover portion. The base portion has a plurality of reticle supports and a plurality of reticle positioning members. The cover portion is adapted to sealingly mate with the base portion, and has an inner surface with a plurality of spaced apart reticle restraints and a pair of reticle positioning tabs projecting inwardly therefrom. Each reticle positioning tab has a diagonal edge portion, and is oriented so that the diagonal edge portion urges a reticle resting on the reticle supports into engagement with the reticle restraints when the cover portion is mated with the base portion.

    摘要翻译: 用于光刻半导体处理中的掩模版载体,具有基部和覆盖部分。 基部具有多个掩模版支架和多个标线片定位构件。 盖部分适于与基部密封地配合,并且具有内表面,其具有多个间隔开的掩模版约束件和从其向内突出的一对光罩定位片。 每个标线片定位突片具有对角边缘部分,并且被定向成使得当盖部分与基部配合时,对角边缘部分将搁置在掩模版支架上的光罩推向与标线保护装置接合。