Metal-insulator-metal capacitor structure
    1.
    发明授权
    Metal-insulator-metal capacitor structure 有权
    金属 - 绝缘体 - 金属电容器结构

    公开(公告)号:US09337188B2

    公开(公告)日:2016-05-10

    申请号:US14072723

    申请日:2013-11-05

    Abstract: A capacitor structure in a semiconductor device includes a semiconductor substrate having a top surface and a bottom surface opposite the top surface, an isolation region having a top surface and a bottom surface, opposite the top surface, the bottom surface of the isolation region being disposed on the top surface of the semiconductor substrate. The capacitor structure also includes a gate terminal structure disposed on the top surface of the isolation region and a diffusion contact structure disposed on the top surface of the isolation region and arranged parallel to the gate terminal structure. In some aspects, the gate terminal structure is connected to a first contact node and the diffusion contact structure is connected to a second contact node, in which the first and second contact nodes form opposing nodes of the capacitor structure.

    Abstract translation: 半导体器件中的电容器结构包括具有顶表面和与顶表面相对的底表面的半导体衬底,隔离区域具有与顶表面相对的顶表面和底表面,隔离区域的底表面设置 在半导体衬底的顶表面上。 电容器结构还包括设置在隔离区域的顶表面上的栅极端子结构和设置在隔离区域的顶表面上且平行于栅极端子结构设置的扩散接触结构。 在一些方面,栅极端子结构连接到第一接触节点,并且扩散接触结构连接到第二接触节点,其中第一和第二接触节点形成电容器结构的相对节点。

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