公开(公告)号：US06905941B2

公开(公告)日：2005-06-14

申请号：US10250069

申请日：2003-06-02

申请人： Bruce B. Doris ,  Thomas S. Kanarsky ,  Meikei Ieong ,  Wesley C. Natzle

发明人： Bruce B. Doris ,  Thomas S. Kanarsky ,  Meikei Ieong ,  Wesley C. Natzle

IPC分类号： H01L21/762 ,  H01L21/84 ,  H01L21/76

CPC分类号： H01L21/84 ,  H01L21/76283

摘要： A method for preventing polysilicon stringer formation under the active device area of an isolated ultra-thin Si channel device is provided. The method utilizes a chemical oxide removal (COR) processing step to prevent stinger formation, instead of a conventional wet etch process wherein a chemical etchant such as HF is employed. A silicon-on-insulator (SOI) structure is also provided. The structure includes at least a top Si-containing layer located on a buried insulating layer; and an oxide filled trench isolation region located in the top Si-containing layer and a portion of the buried insulating layer. No undercut regions are located beneath the top Si-containing layer.

摘要翻译： 提供了一种用于防止在隔离的超薄Si沟道器件的有源器件区域下形成多晶硅的方法。 该方法使用化学氧化物去除（COR）处理步骤来防止托管架形成，而不是采用诸如HF的化学蚀刻剂的常规湿法蚀刻工艺。 还提供了绝缘体上硅（SOI）结构。 该结构包括至少位于掩埋绝缘层上的顶部含Si层; 以及位于顶部含Si层和掩埋绝缘层的一部分中的氧化物填充沟槽隔离区。 顶部含Si层下方没有底切区域。

公开(公告)号：US06914303B2

公开(公告)日：2005-07-05

申请号：US10650229

申请日：2003-08-28

申请人： Bruce B. Doris ,  Thomas S. Kanarsky ,  Ying Zhang ,  Huilong Zhu ,  Meikei Ieong ,  Omer Dokumaci

发明人： Bruce B. Doris ,  Thomas S. Kanarsky ,  Ying Zhang ,  Huilong Zhu ,  Meikei Ieong ,  Omer Dokumaci

IPC分类号： H01L21/336 ,  H01L21/84 ,  H01L27/12 ,  H01L29/786 ,  H01L27/01

CPC分类号： H01L29/66772 ,  H01L21/84 ,  H01L27/1203 ,  H01L29/6656 ,  H01L29/78612 ,  H01L29/78621

摘要： Described is a method for making thin channel silicon-on-insulator structures. The inventive method comprises forming a set of thin spacer abutting a gate region in a first device and a second device region; forming a raised source/drain region on either side of the gate region in the first device region and the second device region, implanting dopants of a first conductivity type into the raised source drain region in the first device region to form a first dopant impurity region, where the second device region is protected by a second device region block mask; implanting dopants of a second conductivity type into the raised source/drain region in the second device region to form a second dopant impurity region, where the first device region is protected by a first device region block mask; and activating the first dopant impurity region and the second dopant impurity region to provide a thin channel MOSFET.

公开(公告)号：US07211490B2

公开(公告)日：2007-05-01

申请号：US11083743

申请日：2005-03-18

申请人： Bruce B. Doris ,  Thomas S. Kanarsky ,  Ying Zhang ,  Huilong Zhu ,  Meikei Ieong ,  Omer Dokumaci

发明人： Bruce B. Doris ,  Thomas S. Kanarsky ,  Ying Zhang ,  Huilong Zhu ,  Meikei Ieong ,  Omer Dokumaci

IPC分类号： H01L21/336 ,  H01L29/76

CPC分类号： H01L29/66772 ,  H01L21/84 ,  H01L27/1203 ,  H01L29/6656 ,  H01L29/78612 ,  H01L29/78621

摘要： Described is a method for making thin channel silicon-on-insulator structures. The inventive method comprises forming a set of thin spacer abutting a gate region in a first device and a second device region; forming a raised source/drain region on either side of the gate region in the first device region and the second device region, implanting dopants of a first conductivity type into the raised source drain region in the first device region to form a first dopant impurity region, where the second device region is protected by a second device region block mask; implanting dopants of a second conductivity type into the raised source/drain region in the second device region to form a second dopant impurity region, where the first device region is protected by a first device region block mask; and activating the first dopant impurity region and the second dopant impurity region to provide a thin channel MOSFET.

摘要翻译： 描述了制造薄沟道硅绝缘体上结构的方法。 本发明的方法包括在第一装置和第二装置区域中形成邻接栅极区的一组薄间隔件; 在第一器件区域和第二器件区域中的栅极区域的任一侧上形成凸起的源极/漏极区域，将第一导电类型的掺杂剂注入到第一器件区域中的凸起的源极漏极区域中以形成第一掺杂剂杂质区域 ，其中所述第二设备区域被第二设备区域块掩码保护; 将第二导电类型的掺杂剂注入所述第二器件区域中的所述升高的源极/漏极区域中以形成第二掺杂剂杂质区域，其中所述第一器件区域被第一器件区域阻挡掩模保护; 以及激活第一掺杂杂质区和第二掺杂杂质区，以提供薄沟道MOSFET。

公开(公告)号：US06911383B2

公开(公告)日：2005-06-28

申请号：US10604097

申请日：2003-06-26

申请人： Bruce B. Doris ,  Diane C. Boyd ,  Meikei Ieong ,  Thomas S. Kanarsky ,  Jakub T. Kedzierski ,  Min Yang

发明人： Bruce B. Doris ,  Diane C. Boyd ,  Meikei Ieong ,  Thomas S. Kanarsky ,  Jakub T. Kedzierski ,  Min Yang

IPC分类号： H01L29/423 ,  H01L21/336 ,  H01L21/8234 ,  H01L21/84 ,  H01L27/08 ,  H01L27/088 ,  H01L27/12 ,  H01L29/49 ,  H01L29/786 ,  H01L21/3205

CPC分类号： H01L27/1211 ,  H01L21/845 ,  H01L29/66795 ,  H01L29/785

摘要： The present invention provides an integrated semiconductor circuit containing a planar single gated FET and a FinFET located on the same SOI substrate. Specifically, the integrated semiconductor circuit includes a FinFET and a planar single gated FET located atop a buried insulating layer of an silicon-on-insulator substrate, the planar single gated FET is located on a surface of a patterned top semiconductor layer of the silicon-on-insulator substrate and the FinFET has a vertical channel that is perpendicular to the planar single gated FET. A method of forming a method such an integrated circuit is also provided. In the method, resist imaging and a patterned hard mask are used in trimming the width of the FinFET active device region and subsequent resist imaging and etching are used in thinning the thickness of the FET device area. The trimmed active FinFET device region is formed such that it lies perpendicular to the thinned planar single gated FET device region.

摘要翻译： 本发明提供一种集成半导体电路，其包含位于同一SOI衬底上的平面单栅极FET和FinFET。 具体地，集成半导体电路包括FinFET和位于绝缘体上硅衬底的掩埋绝缘层顶上的平面单栅极FET，平面单门控FET位于硅 - 硅绝缘体的图案化顶部半导体层的表面上， 绝缘体上的衬底和FinFET具有垂直于平面单门控FET的垂直沟道。 还提供了一种形成集成电路的方法。 在该方法中，抗蚀剂成像和图案化的硬掩模用于修整FinFET有源器件区域的宽度，并且随后的抗蚀剂成像和蚀刻用于减薄FET器件区域的厚度。 经修整的有源FinFET器件区域形成为垂直于薄化的平面单栅极FET器件区域。

公开(公告)号：US06677646B2

公开(公告)日：2004-01-13

申请号：US10117959

申请日：2002-04-05

申请人： Meikei Ieong ,  Omer H. Dokumaci ,  Thomas S. Kanarsky ,  Victor Ku

发明人： Meikei Ieong ,  Omer H. Dokumaci ,  Thomas S. Kanarsky ,  Victor Ku

IPC分类号： H01L2701

CPC分类号： H01L29/78696 ,  H01L29/456 ,  H01L29/4908 ,  H01L29/66545 ,  H01L29/66772 ,  H01L29/78618 ,  H01L29/78621

摘要： A high-performance recessed channel CMOS device including an SOI layer having a recessed channel region and adjoining extension implant regions and optional halo implant regions; and at least one gate region present atop the SOI layer and a method for fabricating the same are provided. The adjoining extension and optional halo implant regions have an abrupt lateral profile and are located beneath said gate region.

摘要翻译： 一种高性能凹陷沟道CMOS器件，包括具有凹陷沟道区域和相邻的延伸注入区域和可选的晕轮植入区域的SOI层; 并且提供存在于SOI层顶上的至少一个栅极区域及其制造方法。 邻接的延伸部分和可选的晕轮植入区域具有突然的侧向轮廓并且位于所述栅极区域下方。

公开(公告)号：US07041538B2

公开(公告)日：2006-05-09

申请号：US10713971

申请日：2003-11-14

申请人： Meikei Ieong ,  Omer H. Dokumaci ,  Thomas S. Kanarsky ,  Victor Ku

发明人： Meikei Ieong ,  Omer H. Dokumaci ,  Thomas S. Kanarsky ,  Victor Ku

IPC分类号： H01L21/00

CPC分类号： H01L29/78696 ,  H01L29/456 ,  H01L29/4908 ,  H01L29/66545 ,  H01L29/66772 ,  H01L29/78618 ,  H01L29/78621

摘要： A high-performance recessed channel CMOS device including an SOI layer having a recessed channel region and adjoining extension implant regions and optional halo implant regions; and at least one gate region present atop the SOI layer and a method for fabricating the same are provided. The adjoining extension and optional halo implant regions have an abrupt lateral profile and are located beneath said gate region.

摘要翻译： 一种高性能凹陷沟道CMOS器件，包括具有凹陷沟道区域和相邻的延伸注入区域和可选的晕轮植入区域的SOI层; 并且提供存在于SOI层顶上的至少一个栅极区域及其制造方法。 邻接的延伸部分和可选的晕轮植入区域具有突然的侧向轮廓并且位于所述栅极区域下方。

公开(公告)号：US07713807B2

公开(公告)日：2010-05-11

申请号：US11958877

申请日：2007-12-18

申请人： Bruce B. Doris ,  Kathryn W. Guarini ,  Meikei Ieong ,  Shreesh Narasimha ,  Kern Rim ,  Jeffrey W. Sleight ,  Min Yang

发明人： Bruce B. Doris ,  Kathryn W. Guarini ,  Meikei Ieong ,  Shreesh Narasimha ,  Kern Rim ,  Jeffrey W. Sleight ,  Min Yang

IPC分类号： H01L21/8238

CPC分类号： H01L21/76275 ,  H01L21/823807 ,  H01L21/84

摘要： An integrated semiconductor structure containing at least one device formed upon a first crystallographic surface that is optimal for that device, while another device is formed upon a second different crystallographic surface that is optimal for the other device is provided. The method of forming the integrated structure includes providing a bonded substrate including at least a first semiconductor layer of a first crystallographic orientation and a second semiconductor layer of a second different crystallographic orientation. A portion of the bonded substrate is protected to define a first device area, while another portion of the bonded substrate is unprotected. The unprotected portion of the bonded substrate is then etched to expose a surface of the second semiconductor layer and a semiconductor material is regrown on the exposed surface. Following planarization, a first semiconductor device is formed in the first device region and a second semiconductor device is formed on the regrown material.

摘要翻译： 提供包含至少一个器件的集成半导体结构，所述器件形成在对于该器件最佳的第一晶体表面上，而另一器件形成在对于另一器件最佳的第二不同晶体表面上。 形成集成结构的方法包括提供包括至少第一晶体取向的第一半导体层和第二不同晶体取向的第二半导体层的键合衬底。 键合衬底的一部分被保护以限定第一器件区域，而键合衬底的另一部分是未受保护的。 然后蚀刻键合衬底的未保护部分以暴露第二半导体层的表面，并将半导体材料重新生长在暴露表面上。 在平坦化之后，在第一器件区域中形成第一半导体器件，并且在再生长材料上形成第二半导体器件。

公开(公告)号：US07605447B2

公开(公告)日：2009-10-20

申请号：US11162780

申请日：2005-09-22

申请人： Bruce B. Doris ,  Gregory Costrini ,  Oleg Gluschenkov ,  Meikei Ieong ,  Nakgeuon Seong

发明人： Bruce B. Doris ,  Gregory Costrini ,  Oleg Gluschenkov ,  Meikei Ieong ,  Nakgeuon Seong

IPC分类号： H01L29/06 ,  H01L29/04 ,  H01L27/11

CPC分类号： H01L27/1104 ,  H01L27/11 ,  Y10S257/903 ,  Y10S438/973

摘要： The present invention relates to a semiconductor device structure that includes at least one SRAM cell formed in a substrate. Such SRAM cell comprises two pull-up transistors, two pull-down transistors, and two pass-gate transistors. The pull-down transistors and the pass-gate transistors are substantially similar in channel widths and have substantially similar source-drain doping concentrations, while the SRAM cell has a beta ratio of at least 1.5. The substrate preferably comprises a hybrid substrate with at two isolated sets of regions, while carrier mobility in these two sets of regions differentiates by a factor of at least about 1.5. More preferably, the pull-down transistors of the SRAM cell are formed in one set of regions, and the pass-gate transistors are formed in the other set of regions, so that current flow in the pull-down transistors is larger than that in the pass-gate transistors.

摘要翻译： 本发明涉及一种半导体器件结构，其包括在衬底中形成的至少一个SRAM单元。 这样的SRAM单元包括两个上拉晶体管，两个下拉晶体管和两个通过栅极晶体管。 下拉晶体管和栅极晶体管在沟道宽度上基本相似，并且具有基本相似的源极 - 漏极掺杂浓度，而SRAM单元的β比率至少为1.5。 衬底优选地包括具有两个分离的区域集合的混合衬底，而这两组区域中的载流子迁移率以至少约1.5的因子差分。 更优选地，SRAM单元的下拉晶体管形成在一组区域中，并且栅极晶体管形成在另一组区域中，使得下拉晶体管中的电流大于 传输栅晶体管。

公开(公告)号：US07494861B2

公开(公告)日：2009-02-24

申请号：US12013704

申请日：2008-01-14

申请人： Jack Oon Chu ,  Bruce B. Doris ,  Meikei Ieong ,  Jing Wang

发明人： Jack Oon Chu ,  Bruce B. Doris ,  Meikei Ieong ,  Jing Wang

IPC分类号： H01L21/8238

CPC分类号： H01L29/7838 ,  H01L21/28017 ,  H01L29/105

摘要： MOSFET devices suitable for operation at gate lengths less than about 40 nm, and methods of their fabrication is being presented. The MOSFET devices include a ground plane formed of a monocrystalline Si based material. A Si based body layer is epitaxially disposed over the ground plane. The body layer is doped with impurities of opposite type than the ground plane. The gate has a metal with a mid-gap workfunction directly contacting a gate insulator layer. The gate is patterned to a length of less than about 40 nm, and possibly less than 20 nm. The source and the drain of the MOSFET are doped with the same type of dopant as the body layer. In CMOS embodiments of the invention the metal in the gate of the NMOS and the PMOS devices may be the same metal.

摘要翻译： 适用于栅极长度小于约40nm的MOSFET器件及其制造方法。 MOSFET器件包括由单晶Si基材料形成的接地平面。 Si基体层外延地设置在接地平面上。 体层掺杂了与地平面相反的杂质。 栅极具有中间功能函数的金属，其直接接触栅极绝缘体层。 栅极被图案化成小于约40nm，并且可能小于20nm的长度。 MOSFET的源极和漏极掺杂有与体层相同类型的掺杂剂。 在本发明的CMOS实施例中，NMOS和PMOS器件的栅极中的金属可以是相同的金属。

公开(公告)号：US07678638B2

公开(公告)日：2010-03-16

申请号：US12198857

申请日：2008-08-26

申请人： Jack Oon Chu ,  Bruce B. Doris ,  Meikei Ieong ,  Jing Wang

发明人： Jack Oon Chu ,  Bruce B. Doris ,  Meikei Ieong ,  Jing Wang

IPC分类号： H01L21/8238

CPC分类号： H01L29/7838 ,  H01L21/28017 ,  H01L29/105

摘要： MOSFET devices suitable for operation at gate lengths less than about 40 nm, and methods of their fabrication is being presented. The MOSFET devices include a ground plane formed of a monocrystalline Si based material. A Si based body layer is epitaxially disposed over the ground plane. The body layer is doped with impurities of opposite type than the ground plane. The gate has a metal with a mid-gap workfunction directly contacting a gate insulator layer. The gate is patterned to a length of less than about 40 nm, and possibly less than 20 nm. The source and the drain of the MOSFET are doped with the same type of dopant as the body layer. In CMOS embodiments of the invention the metal in the gate of the NMOS and the PMOS devices may be the same metal.

摘要翻译： 适用于栅极长度小于约40nm的MOSFET器件及其制造方法。 MOSFET器件包括由单晶Si基材料形成的接地平面。 Si基体层外延地设置在接地平面上。 体层掺杂了与地平面相反的杂质。 栅极具有中间功能函数的金属，其直接接触栅极绝缘体层。 栅极被图案化成小于约40nm，并且可能小于20nm的长度。 MOSFET的源极和漏极掺杂有与体层相同类型的掺杂剂。 在本发明的CMOS实施例中，NMOS和PMOS器件的栅极中的金属可以是相同的金属。