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公开(公告)号：US08282383B2
公开(公告)日：2012-10-09
申请号：US12707345
申请日：2010-02-17
IPC分类号： B29D11/00
CPC分类号： G03F7/70875 , B29C33/20 , B29C43/003 , B29C43/021 , B29C43/36 , B29C43/58 , B29C2043/025 , B29C2043/3233 , B29C2043/3488 , B29C2043/5841 , B29D11/00365 , G03B27/62 , G03F7/707
摘要： The present invention is directed towards a system for expelling a gas positioned between a substrate and a mold, the substrate and the mold further having a liquid positioned therebetween.
摘要翻译： 本发明涉及一种用于排出位于基底和模具之间的气体的系统，所述基底和模具进一步具有位于其间的液体。
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公开(公告)号：US08021594B2
公开(公告)日：2011-09-20
申请号：US12488642
申请日：2009-06-22
申请人： Steven C. Shackleton , Pankaj B. Lad , Ian Matthew McMackin , Frank Y. Xu , Sidlgata V. Sreenivasan
发明人： Steven C. Shackleton , Pankaj B. Lad , Ian Matthew McMackin , Frank Y. Xu , Sidlgata V. Sreenivasan
CPC分类号： G03F7/0002 , B29C43/003 , B29C43/021 , B29C43/34 , B29C2043/025 , B29C2043/142 , B29C2043/3438 , B29K2105/0002 , B82Y10/00 , B82Y40/00
摘要： A method/process for curing imprint on a template prior to contact with a substrate. A curing process is used to adhere the imprint to a wafer or substrate. Monomer is deposited on a template and then partially cured using a UV exposure. The exposure is controlled so that the imprint is cured past the gel point, but still retains a thin liquid layer of uncured monomer at the surface that will bond with the wafer. Further, this partially cured layer enables the alignment adjustments between the template and the substrate to be performed after contact between the two without pulling any monomer out of the features.
摘要翻译： 在与基底接触之前在模板上固化印模的方法/方法。 使用固化过程将印记粘附到晶片或基板上。 将单体沉积在模板上，然后使用UV曝光部分固化。 控制曝光使得印迹经过凝胶点固化，但仍然保留在将与晶片结合的表面上的未固化单体的薄液体层。 此外，这种部分固化的层使得能够在两者之间接触之后进行模板和基板之间的对准调整，而不将任何单体拉出特征。
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公开(公告)号：US08187515B2
公开(公告)日：2012-05-29
申请号：US12415563
申请日：2009-03-31
IPC分类号： B28B11/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： Droplets of polymerizable material may be patterned on a film sheet. The droplets of polymerizable material may be dispensed on the film sheet. A pre-determined force may be applied to an imprint lithography template such that localized trapping of the droplets of the polymerizable material on the film sheet is minimized and the droplets coalesce to form a continuous layer. The polymerizable material may be solidified to form a patterned layer having a residual layer and at least one feature.
摘要翻译： 可聚合材料的液滴可以在膜片上图案化。 可聚合材料的液滴可以分配在薄膜片上。 可以将预定的力施加到压印光刻模板，使得薄膜片上可聚合材料的液滴的局部捕获最小化，并且液滴聚结以形成连续层。 可聚合材料可以固化以形成具有残留层和至少一个特征的图案化层。
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公开(公告)号：US20090214686A1
公开(公告)日：2009-08-27
申请号：US12434921
申请日：2009-05-04
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C03C17/3417 , C03C2217/77 , C03C2218/31 , C03C2218/328
摘要： The present invention is directed to a method forming conductive templates that includes providing a substrate; forming a mesa on the substrate; and forming a plurality of recessions and projections on the mesa with a nadir of the recessions comprising electrically conductive material and the projections comprising electrically insulative material. It is desired that the mesa be substantially transparent to a predetermined wavelength of radiation, for example ultraviolet radiation. As a result, it is desired to form the electrically conductive material from a material that allows ultraviolet radiation to propagate therethrough. In the present invention indium tin oxide is a suitable material from which to form the electrical conductive material.
摘要翻译： 本发明涉及一种形成导电模板的方法，其包括提供衬底; 在基板上形成台面; 以及在所述台面上形成多个凹陷和突出部，其中所述凹陷的最低点包括导电材料，并且所述突起包括电绝缘材料。 希望台面对于预定波长的辐射例如紫外线辐射基本上是透明的。 结果，期望由允许紫外线辐射传播的材料形成导电材料。 在本发明中，氧化铟锡是形成导电材料的合适材料。
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公开(公告)号：US20090243153A1
公开(公告)日：2009-10-01
申请号：US12415563
申请日：2009-03-31
IPC分类号： B28B11/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： Droplets of polymerizable material may be patterned on a film sheet. The droplets of polymerizable material may be dispensed on the film sheet. A pre-determined force may be applied to an imprint lithography template such that localized trapping of the droplets of the polymerizable material on the film sheet is minimized and the droplets coalesce to form a continuous layer. The polymerizable material may be solidified to form a patterned layer having a residual layer and at least one feature.
摘要翻译： 可聚合材料的液滴可以在膜片上图案化。 可聚合材料的液滴可以分配在薄膜片上。 可以将预定的力施加到压印光刻模板，使得薄膜片上可聚合材料的液滴的局部捕获最小化，并且液滴聚结以形成连续层。 可聚合材料可以固化以形成具有残留层和至少一个特征的图案化层。
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公开(公告)号：US20100078846A1
公开(公告)日：2010-04-01
申请号：US12568730
申请日：2009-09-29
申请人： Douglas J. Resnick , Ian Matthew McMackin , Gerard M. Schmid , Niyaz Khusnatdinov , Ecron D. Thompson , Sidlgata V. Sreenivasan
发明人： Douglas J. Resnick , Ian Matthew McMackin , Gerard M. Schmid , Niyaz Khusnatdinov , Ecron D. Thompson , Sidlgata V. Sreenivasan
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/0017
摘要： Particles may be present on substrates and/or templates during nano-lithographic imprinting. Particles may be mitigated and/or removed using localized removal techniques and/or imprinting techniques as described.
摘要翻译： 在纳米光刻印迹过程中，颗粒可能存在于底物和/或模板上。 可以使用如所述的局部去除技术和/或印记技术来减轻和/或去除颗粒。
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公开(公告)号：US20090136654A1
公开(公告)日：2009-05-28
申请号：US12336821
申请日：2008-12-17
申请人： Frank Y. Xu , Ian Matthew McMackin , Pankaj B. Lad
发明人： Frank Y. Xu , Ian Matthew McMackin , Pankaj B. Lad
IPC分类号： C23C22/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y30/00 , B82Y40/00
摘要： A template is treated to provide a surfactant rich region and a surfactant depleted region. A contact angle at the surfactant rich region may be greater than, less than, or substantially similar to a contact angle of the surfactant depleted region.
摘要翻译： 处理模板以提供表面活性剂富集区域和表面活性剂贫化区域。 表面活性剂富集区域处的接触角可以大于，小于或基本上类似于表面活性剂贫化区域的接触角。
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公开(公告)号：US08268220B2
公开(公告)日：2012-09-18
申请号：US12905192
申请日：2010-10-15
申请人： Frank Y. Xu , Pankaj B. Lad , Ian Matthew McMackin , Van Nguyen Truskett , Edward Brian Fletcher
发明人： Frank Y. Xu , Pankaj B. Lad , Ian Matthew McMackin , Van Nguyen Truskett , Edward Brian Fletcher
CPC分类号： G03F7/0002 , B41C1/10 , B41M7/0072 , B41M7/0081 , B82Y10/00 , B82Y30/00 , B82Y40/00 , Y10S977/887
摘要： Improved wetting characteristics together with improved release characteristics with respect to a substrate and an imprint lithography mold having imprinting material disposed therebetween.
摘要翻译： 改进的润湿特性以及相对于基底的改进的剥离特性和其间设置有压印材料的压印光刻模具。
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公开(公告)号：US08142703B2
公开(公告)日：2012-03-27
申请号：US12336821
申请日：2008-12-17
申请人： Frank Y. Xu , Ian Matthew McMackin , Pankaj B. Lad
发明人： Frank Y. Xu , Ian Matthew McMackin , Pankaj B. Lad
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y30/00 , B82Y40/00
摘要： A template is treated to provide a surfactant rich region and a surfactant depleted region. A contact angle at the surfactant rich region may be greater than, less than, or substantially similar to a contact angle of the surfactant depleted region.
摘要翻译： 处理模板以提供表面活性剂富集区域和表面活性剂贫化区域。 表面活性剂富集区域处的接触角可以大于，小于或基本上类似于表面活性剂贫化区域的接触角。
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公开(公告)号：US08012395B2
公开(公告)日：2011-09-06
申请号：US12464487
申请日：2009-05-12
申请人： Kosta S. Selinidis , Byung-Jin Choi , Gerard M. Schmid , Ecron D. Thompson , Ian Matthew McMackin
发明人： Kosta S. Selinidis , Byung-Jin Choi , Gerard M. Schmid , Ecron D. Thompson , Ian Matthew McMackin
IPC分类号： B28B11/08
CPC分类号： G03F9/7042 , B82Y10/00 , B82Y20/00 , B82Y40/00 , G02B5/1838 , G03F7/0002 , G03F9/7076 , G03F9/708 , G03F9/7084
摘要： Imprint lithography substrates may include alignment marks formed of high contrast material. Exemplary methods for forming alignment marks having high contrast material are described.
摘要翻译： 压印光刻基板可以包括由高对比度材料形成的对准标记。 描述用于形成具有高对比度材料的对准标记的示例性方法。
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