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公开(公告)号：US08282383B2
公开(公告)日：2012-10-09
申请号：US12707345
申请日：2010-02-17
IPC分类号： B29D11/00
CPC分类号： G03F7/70875 , B29C33/20 , B29C43/003 , B29C43/021 , B29C43/36 , B29C43/58 , B29C2043/025 , B29C2043/3233 , B29C2043/3488 , B29C2043/5841 , B29D11/00365 , G03B27/62 , G03F7/707
摘要： The present invention is directed towards a system for expelling a gas positioned between a substrate and a mold, the substrate and the mold further having a liquid positioned therebetween.
摘要翻译： 本发明涉及一种用于排出位于基底和模具之间的气体的系统，所述基底和模具进一步具有位于其间的液体。
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公开(公告)号：US08021594B2
公开(公告)日：2011-09-20
申请号：US12488642
申请日：2009-06-22
申请人： Steven C. Shackleton , Pankaj B. Lad , Ian Matthew McMackin , Frank Y. Xu , Sidlgata V. Sreenivasan
发明人： Steven C. Shackleton , Pankaj B. Lad , Ian Matthew McMackin , Frank Y. Xu , Sidlgata V. Sreenivasan
CPC分类号： G03F7/0002 , B29C43/003 , B29C43/021 , B29C43/34 , B29C2043/025 , B29C2043/142 , B29C2043/3438 , B29K2105/0002 , B82Y10/00 , B82Y40/00
摘要： A method/process for curing imprint on a template prior to contact with a substrate. A curing process is used to adhere the imprint to a wafer or substrate. Monomer is deposited on a template and then partially cured using a UV exposure. The exposure is controlled so that the imprint is cured past the gel point, but still retains a thin liquid layer of uncured monomer at the surface that will bond with the wafer. Further, this partially cured layer enables the alignment adjustments between the template and the substrate to be performed after contact between the two without pulling any monomer out of the features.
摘要翻译： 在与基底接触之前在模板上固化印模的方法/方法。 使用固化过程将印记粘附到晶片或基板上。 将单体沉积在模板上，然后使用UV曝光部分固化。 控制曝光使得印迹经过凝胶点固化，但仍然保留在将与晶片结合的表面上的未固化单体的薄液体层。 此外，这种部分固化的层使得能够在两者之间接触之后进行模板和基板之间的对准调整，而不将任何单体拉出特征。
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公开(公告)号：US20100143521A1
公开(公告)日：2010-06-10
申请号：US12707345
申请日：2010-02-17
IPC分类号： B29C33/18
CPC分类号： G03F7/70875 , B29C33/20 , B29C43/003 , B29C43/021 , B29C43/36 , B29C43/58 , B29C2043/025 , B29C2043/3233 , B29C2043/3488 , B29C2043/5841 , B29D11/00365 , G03B27/62 , G03F7/707
摘要： The present invention is directed towards a system for expelling a gas positioned between a substrate and a mold, the substrate and the mold further having a liquid positioned therebetween.
摘要翻译： 本发明涉及一种用于排出位于基底和模具之间的气体的系统，所述基底和模具进一步具有位于其间的液体。
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公开(公告)号：US07691313B2
公开(公告)日：2010-04-06
申请号：US11565393
申请日：2006-11-30
IPC分类号： B29D11/00
CPC分类号： G03F7/70875 , B29C33/20 , B29C43/003 , B29C43/021 , B29C43/36 , B29C43/58 , B29C2043/025 , B29C2043/3233 , B29C2043/3488 , B29C2043/5841 , B29D11/00365 , G03B27/62 , G03F7/707
摘要： The present invention is directed towards a method and a system of expelling a gas positioned between a substrate and a mold, the substrate and the mold further having a liquid positioned therebetween.
摘要翻译： 本发明涉及排出位于基底和模具之间的气体的方法和系统，所述基底和模具进一步具有位于其间的液体。
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公开(公告)号：US20090214686A1
公开(公告)日：2009-08-27
申请号：US12434921
申请日：2009-05-04
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C03C17/3417 , C03C2217/77 , C03C2218/31 , C03C2218/328
摘要： The present invention is directed to a method forming conductive templates that includes providing a substrate; forming a mesa on the substrate; and forming a plurality of recessions and projections on the mesa with a nadir of the recessions comprising electrically conductive material and the projections comprising electrically insulative material. It is desired that the mesa be substantially transparent to a predetermined wavelength of radiation, for example ultraviolet radiation. As a result, it is desired to form the electrically conductive material from a material that allows ultraviolet radiation to propagate therethrough. In the present invention indium tin oxide is a suitable material from which to form the electrical conductive material.
摘要翻译： 本发明涉及一种形成导电模板的方法，其包括提供衬底; 在基板上形成台面; 以及在所述台面上形成多个凹陷和突出部，其中所述凹陷的最低点包括导电材料，并且所述突起包括电绝缘材料。 希望台面对于预定波长的辐射例如紫外线辐射基本上是透明的。 结果，期望由允许紫外线辐射传播的材料形成导电材料。 在本发明中，氧化铟锡是形成导电材料的合适材料。
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公开(公告)号：US20090243153A1
公开(公告)日：2009-10-01
申请号：US12415563
申请日：2009-03-31
IPC分类号： B28B11/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： Droplets of polymerizable material may be patterned on a film sheet. The droplets of polymerizable material may be dispensed on the film sheet. A pre-determined force may be applied to an imprint lithography template such that localized trapping of the droplets of the polymerizable material on the film sheet is minimized and the droplets coalesce to form a continuous layer. The polymerizable material may be solidified to form a patterned layer having a residual layer and at least one feature.
摘要翻译： 可聚合材料的液滴可以在膜片上图案化。 可聚合材料的液滴可以分配在薄膜片上。 可以将预定的力施加到压印光刻模板，使得薄膜片上可聚合材料的液滴的局部捕获最小化，并且液滴聚结以形成连续层。 可聚合材料可以固化以形成具有残留层和至少一个特征的图案化层。
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公开(公告)号：US08187515B2
公开(公告)日：2012-05-29
申请号：US12415563
申请日：2009-03-31
IPC分类号： B28B11/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： Droplets of polymerizable material may be patterned on a film sheet. The droplets of polymerizable material may be dispensed on the film sheet. A pre-determined force may be applied to an imprint lithography template such that localized trapping of the droplets of the polymerizable material on the film sheet is minimized and the droplets coalesce to form a continuous layer. The polymerizable material may be solidified to form a patterned layer having a residual layer and at least one feature.
摘要翻译： 可聚合材料的液滴可以在膜片上图案化。 可聚合材料的液滴可以分配在薄膜片上。 可以将预定的力施加到压印光刻模板，使得薄膜片上可聚合材料的液滴的局部捕获最小化，并且液滴聚结以形成连续层。 可聚合材料可以固化以形成具有残留层和至少一个特征的图案化层。
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公开(公告)号：US20090256289A1
公开(公告)日：2009-10-15
申请号：US12488642
申请日：2009-06-22
IPC分类号： B29C35/08
CPC分类号： G03F7/0002 , B29C43/003 , B29C43/021 , B29C43/34 , B29C2043/025 , B29C2043/142 , B29C2043/3438 , B29K2105/0002 , B82Y10/00 , B82Y40/00
摘要： A method/process for curing imprint on a template prior to contact with a substrate. A curing process is used to adhere the imprint to a wafer or substrate. Monomer is deposited on a template and then partially cured using a UV exposure. The exposure is controlled so that the imprint is cured past the gel point, but still retains a thin liquid layer of uncured monomer at the surface that will bond with the wafer. Further, this partially cured layer enables the alignment adjustments between the template and the substrate to be performed after contact between the two without pulling any monomer out of the features.
摘要翻译： 在与基底接触之前在模板上固化印模的方法/方法。 使用固化过程将印记粘附到晶片或基板上。 将单体沉积在模板上，然后使用UV曝光部分固化。 控制曝光使得印迹经过凝胶点固化，但仍然保留在将与晶片结合的表面上的未固化单体的薄液体层。 此外，这种部分固化的层使得能够在两者之间接触之后进行模板和基板之间的对准调整，而不将任何单体拉出特征。
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公开(公告)号：US20100078846A1
公开(公告)日：2010-04-01
申请号：US12568730
申请日：2009-09-29
申请人： Douglas J. Resnick , Ian Matthew McMackin , Gerard M. Schmid , Niyaz Khusnatdinov , Ecron D. Thompson , Sidlgata V. Sreenivasan
发明人： Douglas J. Resnick , Ian Matthew McMackin , Gerard M. Schmid , Niyaz Khusnatdinov , Ecron D. Thompson , Sidlgata V. Sreenivasan
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/0017
摘要： Particles may be present on substrates and/or templates during nano-lithographic imprinting. Particles may be mitigated and/or removed using localized removal techniques and/or imprinting techniques as described.
摘要翻译： 在纳米光刻印迹过程中，颗粒可能存在于底物和/或模板上。 可以使用如所述的局部去除技术和/或印记技术来减轻和/或去除颗粒。
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公开(公告)号：US08828297B2
公开(公告)日：2014-09-09
申请号：US13290770
申请日：2011-11-07
CPC分类号： B29C59/022 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L29/0673
摘要： Methods of making nano-scale structures with geometric cross-sections, including convex or non-convex cross-sections, are described. The approach may be used to directly pattern substrates and/or create imprint lithography templates or molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates, such as into a functional or sacrificial resist to form functional nanoparticles.
摘要翻译： 描述了制造具有几何横截面的纳米级结构的方法，包括凸形或非凸形横截面。 该方法可以用于直接图案化衬底和/或创建压印光刻模板或模具，其可以随后用于将纳米形图案直接复制到其它衬底中，例如形成功能性或牺牲抗蚀剂以形成功能纳米颗粒。
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