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    Aryl ureas a process for their preparation and agents containing them
    1.
    发明授权
    Aryl ureas a process for their preparation and agents containing them 失效
    ARYL UREAS一个包含它们的制剂和试剂的方法

    公开(公告)号：US3660484A

    公开(公告)日：1972-05-02

    申请号：US3660484D

    申请日：1969-10-02

    Applicant: CIBA LTD

    Inventor： MARTIN HENRY ,  DUERR DIETER ,  HITZ RUDOLF

    IPC: A01N47/30 ,  C07C67/00 ,  C07C239/00 ,  C07C275/28 ,  C07C275/30 ,  C07C325/00 ,  C07C335/16 ,  C07C157/00

    CPC classification number: C07C335/16 ,  C07C275/30 ,  Y10S516/07

    Abstract: UREAS OF THE FORMULA

    1-((R2,R4,R5-PHENYL)-R1-N(-R9)-C(=X)-N(-R10)-R2-),R6,R7,

    R8-BENZENE

    WHEREIN R1 AND R2 EACH REPRESENTS A LINEAR OR BRANCHED ALKYLENE RADICAL WHICH MAY BE HYDROXYLATED AND WHICH CONTAINS 1 TO 4 CARBON ATOMS, AND EITHER R1 OR R2 MAY BE A DIRECT N-PHENYL BOND; R3 TO R8 ARE IDENTICAL OR DIFFERENT AND REPRESENT HYDROGEN OR HALOGEN ATOMS, OR ALKYL, ALKOXY OR ALKYLTHIO GROUPS, OR THE GROUPS-CF3,-CN, NO2, SCN,

    -SO2-N(-A)-A'' OR -CO-N(-A)-A''

    (WHERE A AND A'' REPRESENT HYDROGEN ATOMS OR LOWER ALKYL GROUPS) WITH THE PROVISO THAT AT LEAST ONE OF THE SUBSTITUENTS R3 TO R8 IS A TRIFLUOROMETHYL GROUP, AND WHEREIN R9 AND R10 REPRESENT HYDROGEN ATOMS OR LOWER ALKYL GROUPS AND X STANDS FOR AN OXYGEN ATOM OR A SULPHUR ATOM. THESE UREAS ARE CAPABLE OF KILLING OF A VARIETY OF HARMFUL ORGANISMS; FOR EXAMPLE THEY HAVE AN INSECTICIDAL, ACARICIDAL, BACTERICIDAL, FUNGICIDAL, MOLLUSCIDIAL AND HERBICIDAL EFFECT.

    N n-dimethyl-n'-(2 5-dimethylbenzyl) formamidine
    9.
    发明授权
    N n-dimethyl-n'-(2 5-dimethylbenzyl) formamidine 失效
    N - 二甲基-N' - （2,5-二甲基苄基）甲酰胺

    公开(公告)号：US3657346A

    公开(公告)日：1972-04-18

    申请号：US3657346D

    申请日：1968-01-17

    Applicant: CIBA LTD

    Inventor： DUERR DIETER ,  SIEGLE HEINZ

    IPC: C07C23/00 ,  C07C257/12 ,  C07C257/14

    CPC classification number: C07C257/14 ,  C07C257/12

    Abstract: THE PRESENT INVENTION RELATES TO NEW AMIDINE OF THE FORMULA

    R1-N=CH-N(-R3)-R2

    OR AN ACID ADDITION SALT THEREOF, WHEREIN R1 REPRESENTS AN ALIPHATIC CYCLOALIPHATIC, CYCLOALOPHATIC-ALIPHATIC OR ARALIPHATIC RADICAL, R2 REPRESENTS A HYDROGEN ATOM OR A LOWER ALIPHATIC RADICAL AND R3 REPRESENTS A LOWER ALIPHATIC RADICAL, OR WHEREIN R2 AND R3 TOGETHER WITH THE NITROGEN ATOM TO WHICH THEY ARE BONDED REPRESENT A 5-MEMBERED TO 7MEMBERED HETEROCYCLIC STRUCTURE OPTIONALLY CONTAINING FURTHER HETERO-ATOMS AS WELL AS TO PESTICIDAL PREPARATIONS, WHICH CONTAIN, AS ACTIVE INGREDIENT, AN AMIDINE AS DEFINED ABOVE.

    N-methyl phenyl carbamates
    10.
    发明授权
    N-methyl phenyl carbamates 失效
    N-甲基苯基碳酸酯

    公开(公告)号：US3625992A

    公开(公告)日：1971-12-07

    申请号：US3625992D

    申请日：1967-11-28

    Applicant: CIBA LTD

    Inventor： DUERR DIETER ,  PINTER LADISLAUS

    IPC: C07C335/32 ,  C07C157/14

    CPC classification number: C07C335/32 ,  Y10S514/952

    Abstract: The present invention relates to carbamates of the general formula

    (IN WHICH A and A'' are identical or different and each represents a hydrogen atom or a lower alkyl radical and/or a carbalkoxy group), n represents an integer selected from 0, 1 and 2, R4 represents a substituent selected from the class consisting of a hydrogen atom, an aliphatic and an araliphatic radical, R5 represents a substituent selected from the class consisting of a hydrogen atom, an aliphatic and an aromatic radical, R6 represents a substituent selected from the class consisting of a hydrogen atom, an aliphatic radical, an aliphatic radical linked with the nitrogen atom through oxygen, with the proviso that when R4 represents a hydrogen atom, the phenolic group must be in pposition relatively to the nitrogen-containing group as well as to pesticidal preparations containing, as active ingredients, such carbamates as defined above.

    and the group

    IN WHICH R1 is a substituent selected from the group consisting of hydrogen and an aliphatic radical, R2 represents a substituent selected from the group consisting of an aliphatic, an araliphatic and an aromatic radical, R3 is a substituent selected from the class consisting of a halogen atom, a lower alkyl, a lower alkoxy, a lower alkylthio, a lower alkylsulfinyl, a lower alkylsulfonyl radical, the group -NO2, -CN, -SCN, -CHO,

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