METHOD OF MANUFACTURING MULTI-LAYER COIL AND MULTI-LAYER COIL DEVICE
    3.
    发明申请
    METHOD OF MANUFACTURING MULTI-LAYER COIL AND MULTI-LAYER COIL DEVICE 审中-公开
    制造多层线圈和多层线圈装置的方法

    公开(公告)号:US20150035640A1

    公开(公告)日:2015-02-05

    申请号:US14446340

    申请日:2014-07-30

    Abstract: A method of manufacturing a multi-layer coil includes steps of providing a substrate; forming a seed layer on the substrate; and plating the seed layer with N coil layers by N current densities according to N threshold ranges, so as to form the multi-layer coil on the substrate, wherein an i-th current density of the N current densities is lower than an (i+1)-th current density of the N current densities. A first coil layer of the N coil layers is plated on the seed layer by a first current density of the N current densities. When an aspect ratio of an i-th coil layer of the N coil layers is within an i-th threshold range of the N threshold ranges, an (i+1)-th coil layer of the N coil layers is plated on the i-th coil layer by the (i+1)-th current density.

    Abstract translation: 制造多层线圈的方法包括提供基板的步骤; 在所述基板上形成种子层; 并根据N个阈值范围用N个线圈层电镀N个电流密度,以在衬底上形成多层线圈,其中N个电流密度的第i个电流密度低于(i +1)电流密度的N电流密度。 通过N个电流密度的第一电流密度将N个线圈层的第一线圈层电镀在种子层上。 当N个线圈层的第i个线圈层的纵横比在N个阈值范围的第i个阈值范围内时,N个线圈层的第(i + 1)个线圈层被电镀在i 第(i + 1)个电流密度的线圈层。

    Method of manufacturing multi-layer coil and multi-layer coil device

    公开(公告)号:US10217563B2

    公开(公告)日:2019-02-26

    申请号:US14446340

    申请日:2014-07-30

    Abstract: A method of manufacturing a multi-layer coil includes steps of providing a substrate; forming a seed layer on the substrate; and plating the seed layer with N coil layers by N current densities according to N threshold ranges, so as to form the multi-layer coil on the substrate, wherein an i-th current density of the N current densities is lower than an (i+1)-th current density of the N current densities. A first coil layer of the N coil layers is plated on the seed layer by a first current density of the N current densities. When an aspect ratio of an i-th coil layer of the N coil layers is within an i-th threshold range of the N threshold ranges, an (i+1)-th coil layer of the N coil layers is plated on the i-th coil layer by the (i+1)-th current density.

    Protective device
    7.
    发明授权
    Protective device 有权
    保护装置

    公开(公告)号:US08675333B2

    公开(公告)日:2014-03-18

    申请号:US13894160

    申请日:2013-05-14

    Abstract: A protective device including a substrate, a conductive section and a first auxiliary medium is provided. The conductive section is supported by the substrate, wherein the conductive section comprises a metal element electrically connected between first and second electrodes. The metal element serves as a sacrificial structure having a melting point lower than that of the first and second electrodes. The first auxiliary medium is disposed between the metal element and the substrate, wherein the first auxiliary medium has a melting point lower than that of the metal element. The first auxiliary medium facilitates breaking of the metal element upon melting.

    Abstract translation: 提供了包括基板,导电部分和第一辅助介质的保护装置。 导电部分由衬底支撑,其中导电部分包括电连接在第一和第二电极之间的金属元件。 金属元件用作熔点低于第一和第二电极的熔点的牺牲结构。 第一辅助介质设置在金属元件和基板之间,其中第一辅助介质的熔点低于金属元件的熔点。 第一辅助介质有助于熔化时金属元件的断裂。

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