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    MULTI-BEAM PARTICLE BEAM SYSTEM
    1.
    发明申请
    MULTI-BEAM PARTICLE BEAM SYSTEM 审中-公开

    公开(公告)号：US20190259575A1

    公开(公告)日：2019-08-22

    申请号：US16277572

    申请日：2019-02-15

    申请人： Carl Zeiss Microscopy GmbH ,  Carl Zeiss SMT GmbH

    发明人： Yanko Sarov ,  Jan Horn ,  Ulrich Bihr ,  Christof Riedesel ,  Erik Essers

    IPC分类号： H01J37/317 ,  H01J37/24 ,  H01J37/34 ,  H01J37/305

    摘要： A multi-beam particle beam system includes a multi-aperture plate having a multiplicity of apertures. During operation, one particle beam of the plurality of particle beams passes through each of the apertures. A multiplicity of electrodes are insulated from the second multi-aperture plate to influence the particle beam passing through the aperture. A voltage supply system for the electrodes includes: a signal a generator to generate a serial sequence of digital signals; a D/A converter to convert the digital signals into a sequence of voltages between an output of the D/A converter and the multi-aperture plate; and a controllable changeover system, which feeds the sequence of voltages successively to different electrodes.

    Device for transmitting electrical signals, and lithography apparatus
    2.
    发明授权
    Device for transmitting electrical signals, and lithography apparatus 有权

    公开(公告)号：US10459351B2

    公开(公告)日：2019-10-29

    申请号：US16291836

    申请日：2019-03-04

    申请人： Carl Zeiss SMT GmbH

    发明人： Jan Horn ,  Sascha Bleidistel ,  Florian Bart ,  Markus Hauf

    IPC分类号： G03F7/20

    摘要： The disclosure relates to a device for transmitting electrical signals between a first interface element, arranged at a first structure of a lithography system, and a second interface element, arranged at a second structure of the lithography system. An electrical conductor connects the first interface element and the second interface element. The device has a hollow body which surrounds at least sections of the electrical conductor and which is designed to electromagnetically shield the electrical conductor. A gap is provided in the hollow body or between the hollow body and one of the structures and allows a relative movement of the first structure and the second structure to mechanically decouple the first structure from the second structure.

    METHOD FOR REGULATING THE TILTING OF A MIRROR ELEMENT
    3.
    发明申请
    METHOD FOR REGULATING THE TILTING OF A MIRROR ELEMENT 审中-公开
    调节镜面元件倾斜的方法

    公开(公告)号：US20150185469A1

    公开(公告)日：2015-07-02

    申请号：US14643786

    申请日：2015-03-10

    申请人： Carl Zeiss SMT GmbH

    发明人： Jan Horn ,  Lars Berger ,  Matthias Hartmann ,  Benedikt Knauf ,  Matthias Orth ,  Severin Waldis

    IPC分类号： G02B26/08 ,  G03F7/20

    CPC分类号： G02B26/0841 ,  G01D5/2417 ,  G03F7/70075 ,  G03F7/70116 ,  G03F7/702

    摘要： An optical component comprises a carrying structure, at least one mirror element which is mounted in a tiltable manner relative to the carrying structure by an actuator system and which comprises at least one mirror electrode, at least one local regulating device for regulating the tilting of the mirror element, having at least one capacitive sensor and at least one actuator electrode for tilting the mirror element, and a signal generator for generating a modulation signal, having a frequency above a resonant frequency of the mirror element, wherein the signal generator is connected in a signal-transmitting manner to the at least one mirror electrode.

    摘要翻译： 光学部件包括承载结构，至少一个镜元件，其通过致动器系统相对于承载结构以可倾斜的方式安装，并且包括至少一个镜电极，至少一个局部调节装置，用于调节 具有至少一个电容传感器和至少一个用于倾斜镜子元件的致动器电极的反射镜元件，以及用于产生具有高于镜子元件的谐振频率的频率的调制信号的信号发生器，其中信号发生器连接在 信号传输方式到所述至少一个镜电极。

    Methods and devices for driving micromirrors
    7.
    发明授权
    Methods and devices for driving micromirrors 有权

    公开(公告)号：US10061202B2

    公开(公告)日：2018-08-28

    申请号：US13687887

    申请日：2012-11-28

    申请人： Carl Zeiss SMT GmbH

    发明人： Jan Horn ,  Christian Kempter

    IPC分类号： G03B27/54 ,  G03F7/20 ,  G02B26/08 ,  G02B27/00 ,  G03B27/72

    CPC分类号： G03F7/70116 ,  G02B26/0841 ,  G02B27/0043 ,  G03B27/72 ,  G03F7/70075 ,  G03F7/702 ,  G03F7/70525

    摘要： A micromirror of a micromirror array in an illumination system of a microlithographic projection exposure apparatus can be tilted through a respective tilt angle about two tilt axes. The micromirror is assigned three actuators which can respectively be driven by control signals in order to tilt the micromirror about the two tilt axes. Two control variables are specified, each of which is assigned to one tilt axis and which are both assigned to unperturbed tilt angles. For any desired combinations of the two control variables, as a function of the two control variables, one of the three actuators is selected and its control signal is set to a constant value, in particular zero. The control signals are determined so that, when the control signals are applied to the other two actuators, the micromirror adopts the unperturbed tilt angles as a function of the two control variables.