公开(公告)号：US08316796B2

公开(公告)日：2012-11-27

申请号：US11954843

申请日：2007-12-12

申请人： Chi-Hung Liu ,  Chih-Ming Chen ,  Chun-Hsien Su ,  Chih-Wei Chen ,  Wen-Tung Hsu ,  Chun-Hung Lin

发明人： Chi-Hung Liu ,  Chih-Ming Chen ,  Chun-Hsien Su ,  Chih-Wei Chen ,  Wen-Tung Hsu ,  Chun-Hung Lin

IPC分类号： C23C16/00

CPC分类号： H01J37/32568 ,  H01J37/3244 ,  H01J37/32825 ,  H01J2237/20214

摘要： A film coating system for coating an object includes a working station and an isolating device. The object is disposed on the working station, and the isolating device is utilized to isolate the object. The isolating device includes a body generating a first power, a first working fluid, a second working fluid, a first guiding portion and a second guiding portion. The first guiding portion guides the first working fluid to pass through the body, thereby forming a first working region to coat the object thereon. The second guiding portion guides the second working fluid excited by the first power of the body to pass through the body, thereby forming a second working region to separate the first working region from the object.

摘要翻译： 用于涂覆物体的涂膜系统包括加工台和隔离装置。 物体设置在工作站上，隔离装置用于隔离物体。 隔离装置包括产生第一功率的主体，第一工作流体，第二工作流体，第一引导部分和第二引导部分。 第一引导部引导第一工作流体穿过主体，从而形成第一工作区域以在其上涂覆物体。 第二引导部分引导由身体的第一功率激发的第二工作流体穿过主体，从而形成第二工作区域以将第一工作区域与物体分开。

公开(公告)号：US08277616B2

公开(公告)日：2012-10-02

申请号：US11892853

申请日：2007-08-28

申请人： Chi-Hung Liu ,  Chun-Hung Lin ,  Chun-Hsien Su ,  Wen-Tung Hsu

发明人： Chi-Hung Liu ,  Chun-Hung Lin ,  Chun-Hsien Su ,  Wen-Tung Hsu

IPC分类号： B01J19/08

CPC分类号： A61B18/042 ,  A61C5/00 ,  A61C19/066

摘要： A surface treating method for treating a tooth surface and a surface treating device thereof are provided. First, a working gas is filled into a tube. Next, a voltage is provided to the working gas for exciting the working gas into plasma. After that, the plasma is discharged through an opening of the tube for contacting the tooth surface.

摘要翻译： 提供了一种用于处理牙齿表面的表面处理方法及其表面处理装置。 首先，将工作气体填充到管中。 接下来，向工作气体提供用于将工作气体激发成等离子体的电压。 之后，等离子体通过用于与齿面接触的管的开口排出。

公开(公告)号：US20090064933A1

公开(公告)日：2009-03-12

申请号：US11954843

申请日：2007-12-12

申请人： Chi-Hung Liu ,  Chih-Ming Chen ,  Chun-Hsien Su ,  Chih-Wei Chen ,  Wen-Tung Hsu ,  Chun-Hung Lin

发明人： Chi-Hung Liu ,  Chih-Ming Chen ,  Chun-Hsien Su ,  Chih-Wei Chen ,  Wen-Tung Hsu ,  Chun-Hung Lin

IPC分类号： C23C16/455

CPC分类号： H01J37/32568 ,  H01J37/3244 ,  H01J37/32825 ,  H01J2237/20214

摘要： A film coating system for coating an object includes a working station and an isolating device. The object is disposed on the working station, and the isolating device is utilized to isolate the object. The isolating device includes a body generating a first power, a first working fluid, a second working fluid, a first guiding portion and a second guiding portion. The first guiding portion guides the first working fluid to pass through the body, thereby forming a first working region to coat the object thereon. The second guiding portion guides the second working fluid excited by the first power of the body to pass through the body, thereby forming a second working region to separate the first working region from the object.

摘要翻译： 用于涂覆物体的涂膜系统包括加工台和隔离装置。 物体设置在工作站上，隔离装置用于隔离物体。 隔离装置包括产生第一功率的主体，第一工作流体，第二工作流体，第一引导部分和第二引导部分。 第一引导部引导第一工作流体穿过主体，从而形成第一工作区域以在其上涂覆物体。 第二引导部分引导由身体的第一功率激发的第二工作流体穿过主体，从而形成第二工作区域以将第一工作区域与物体分开。

公开(公告)号：US20100098600A1

公开(公告)日：2010-04-22

申请号：US12388552

申请日：2009-02-19

申请人： Chi-Hung Liu ,  Chen-Der Tsai ,  Chun-Hsien Su ,  Wen-Tung Hsu ,  Jen-Hui Tsai ,  Chun Huang

发明人： Chi-Hung Liu ,  Chen-Der Tsai ,  Chun-Hsien Su ,  Wen-Tung Hsu ,  Jen-Hui Tsai ,  Chun Huang

IPC分类号： B01J19/08

CPC分类号： H05H1/2406 ,  H05H2001/2456

摘要： A plasma system for generating a plasma is generated. The plasma system includes a tube, a positive electrode and a negative electrode. The tube has a plasma jet opening, a first end surface and a second end surface. The plasma jet opening penetrates the wall of the tube. The plasma passes through the plasma jet opening and is emitted to the outside of the tube. The positive electrode has a side surface facing and adjacent to the tube. The negative electrode is separated from the positive electrode by a first predetermined distance. The negative electrode has a negative electrode side surface facing and adjacent to the tube. The first positive electrode and the first negative electrode are disposed between the first end surface and the second end surface, and a portion of the plasma jet opening is disposed between the positive electrode and the negative electrode.

摘要翻译： 产生用于产生等离子体的等离子体系统。 等离子体系包括管，正极和负极。 管具有等离子体射流开口，第一端面和第二端面。 等离子体射流开口穿过管的壁。 等离子体通过等离子体射流开口并被发射到管的外部。 正极具有面向和邻近管的侧表面。 负极与正极分离第一预定距离。 负极具有面对并与管相邻的负极侧面。 第一正极和第一负极设置在第一端面和第二端面之间，等离子体喷射口的一部分配置在正极和负极之间。

公开(公告)号：US08092750B2

公开(公告)日：2012-01-10

申请号：US12388552

申请日：2009-02-19

申请人： Chi-Hung Liu ,  Chen-Der Tsai ,  Chun-Hsien Su ,  Wen-Tung Hsu ,  Jen-Hui Tsai ,  Chun Huang

发明人： Chi-Hung Liu ,  Chen-Der Tsai ,  Chun-Hsien Su ,  Wen-Tung Hsu ,  Jen-Hui Tsai ,  Chun Huang

IPC分类号： H05H1/24

CPC分类号： H05H1/2406 ,  H05H2001/2456

摘要： A plasma system for generating a plasma is generated. The plasma system includes a tube, a positive electrode and a negative electrode. The tube has a plasma jet opening, a first end surface and a second end surface. The plasma jet opening penetrates the wall of the tube. The plasma passes through the plasma jet opening and is emitted to the outside of the tube. The positive electrode has a side surface facing and adjacent to the tube. The negative electrode is separated from the positive electrode by a first predetermined distance. The negative electrode has a negative electrode side surface facing and adjacent to the tube. The first positive electrode and the first negative electrode are disposed between the first end surface and the second end surface, and a portion of the plasma jet opening is disposed between the positive electrode and the negative electrode.

摘要翻译： 产生用于产生等离子体的等离子体系统。 等离子体系包括管，正极和负极。 管具有等离子体射流开口，第一端面和第二端面。 等离子体射流开口穿过管的壁。 等离子体通过等离子体射流开口并被发射到管的外部。 正极具有面向和邻近管的侧表面。 负极与正极分离第一预定距离。 负极具有面对并与管相邻的负极侧面。 第一正极和第一负极设置在第一端面和第二端面之间，等离子体喷射口的一部分配置在正极和负极之间。

公开(公告)号：US20110100556A1

公开(公告)日：2011-05-05

申请号：US12647041

申请日：2009-12-24

申请人： Chi-Hung Liu ,  Chen-Der Tsai ,  Wen-Tung Hsu ,  Chun-Hsien Su ,  Wen-Chin Cheng ,  Liang-Yi Chen

发明人： Chi-Hung Liu ,  Chen-Der Tsai ,  Wen-Tung Hsu ,  Chun-Hsien Su ,  Wen-Chin Cheng ,  Liang-Yi Chen

IPC分类号： C23F1/08 ,  C23C16/00

CPC分类号： H05H1/42 ,  C23C16/513 ,  H01J37/3244 ,  H05H2245/123

摘要： A plasma system with an injection device is provided. The plasma system comprises a plasma cavity and an injection device. The plasma cavity comprises a first electrode and a second for generating plasma. The injection device comprises a plasma injection tube and at least a reactant injection tube. The plasma injection tube is connected to the plasma cavity. The plasma injection tube comprises an inlet, an outlet and an outer sidewall. The plasma injection tube injects the plasma from the inlet and guides the plasma out through the outlet. The outer sidewall has a width decreasing from the inlet to the outlet. The reactant injection tube is disposed outside of the outer sidewall. The reactant injection tube injects a reactant to the outer sidewall so that the reactant flows along the outer sidewall toward the outlet and mixes with the plasma at the outlet.

摘要翻译： 提供了具有注射装置的等离子体系统。 等离子体系统包括等离子体腔和注射装置。 等离子体空腔包括用于产生等离子体的第一电极和第二电极。 注射装置包括等离子体注入管和至少反应物注射管。 等离子体注入管连接到等离子体腔。 等离子体注入管包括入口，出口和外侧壁。 等离子体注入管从入口注入等离子体并将等离子体引出通过出口。 外侧壁的宽度从入口到出口减小。 反应物注入管设置在外侧壁的外侧。 反应物注射管将反应物注射到外侧壁，使得反应物沿着外侧壁朝向出口流动并与出口处的等离子体混合。

公开(公告)号：US20080066679A1

公开(公告)日：2008-03-20

申请号：US11564826

申请日：2006-11-29

申请人： Chi-Hung Liu ,  Wen-Tzong Hsieh ,  Chen-Der Tsai ,  Chun-Hsien Su ,  Chih Wei Chen ,  Chun-Hung Lin

发明人： Chi-Hung Liu ,  Wen-Tzong Hsieh ,  Chen-Der Tsai ,  Chun-Hsien Su ,  Chih Wei Chen ,  Chun-Hung Lin

IPC分类号： C23F1/00 ,  C23C16/00

CPC分类号： H01J37/32366 ,  C23C16/513 ,  C23C16/54 ,  H01J37/32357 ,  H01J2237/032 ,  H05H1/2406 ,  H05H2001/2462

摘要： A processing system is used for processing an object by a first fluid. The processing system includes a base and a plasma generation device. The base supports the object and the plasma generation device ionizes the first fluid. The plasma generation device includes at least one guiding element comprising a path guiding the first fluid to sequentially flow through a first position and a second position and at least one electrode element including a first electrode corresponding to the first position and a second electrode corresponding to the second position. The first and second electrodes energize the first fluid located between the first and second electrodes to form a second fluid, to thereby utilize the second fluid to perform surfacing, activating, cleaning, photoresist ashing or etching process on the object supported by the base.

摘要翻译： 处理系统用于通过第一流体处理物体。 处理系统包括基座和等离子体产生装置。 基座支撑物体，等离子体发生装置离子化第一流体。 等离子体产生装置包括至少一个引导元件，该引导元件包括引导第一流体顺序地流过第一位置和第二位置的路径，以及包括对应于第一位置的第一电极和对应于第一位置的第二电极的至少一个电极元件 第二名 第一和第二电极激励位于第一和第二电极之间的第一流体以形成第二流体，从而利用第二流体对由基座支撑的物体进行表面，活化，清洁，光致抗蚀剂灰化或蚀刻过程。

公开(公告)号：US20080030673A1

公开(公告)日：2008-02-07

申请号：US11882652

申请日：2007-08-03

申请人： Chin-Yang Lee ,  Huang-Chin Tang ,  Kei-Hsiung Yang ,  Chih-Wei Chen ,  Chi-Hung Liu ,  Yu-Jung Shih

发明人： Chin-Yang Lee ,  Huang-Chin Tang ,  Kei-Hsiung Yang ,  Chih-Wei Chen ,  Chi-Hung Liu ,  Yu-Jung Shih

IPC分类号： G02F1/1337

CPC分类号： G02F1/1337

摘要： A method for fabricating liquid crystal (LC) alignment includes the steps of processing an alignment film having a plurality of liquid crystal molecules with a single or plurality of plasma generating devices, such that the liquid crystal molecules are aligned at a high pretilt angle. Compared with the prior art, the present invention is suitable for modifying the alignment film surface adjustablely in directions and angles, and can attain the effect of alignment stability with a high pretilt angle in a single process, thus overcoming the drawbacks of the prior art.

摘要翻译： 制造液晶（LC）取向的方法包括以下步骤：利用单个或多个等离子体产生装置处理具有多个液晶分子的取向膜，使得液晶分子以高预倾角对准。 与现有技术相比，本发明适用于在方向和角度上可调整的取向膜表面，并且可以在单一工艺中以高预倾角获得对准稳定性的效果，从而克服了现有技术的缺点。

公开(公告)号：US08426547B2

公开(公告)日：2013-04-23

申请号：US12748458

申请日：2010-03-29

申请人： Fang-Hsien Su ,  Chi-Hung Liu ,  Chun-Hsiung Kao ,  An-Pang Tu ,  Kuen-Yuan Hwang

发明人： Fang-Hsien Su ,  Chi-Hung Liu ,  Chun-Hsiung Kao ,  An-Pang Tu ,  Kuen-Yuan Hwang

IPC分类号： C08G79/04 ,  C08G65/10

CPC分类号： C08G59/304 ,  C08G59/1488

摘要： A phosphorus-containing epoxy resin and a method for synthesizing the same are disclosed. The method includes the step of catalytically reacting compound (i) with compound (ii) to synthesize the phosphorus-containing epoxy resin having the structure of compound (I). R is methyl or phenyl, and n is the integer from 1 to 9.

摘要翻译： 公开了含磷环氧树脂及其合成方法。 该方法包括使化合物（i）与化合物（ⅱ）催化反应合成具有化合物（I）结构的含磷环氧树脂的步骤。 R为甲基或苯基，n为1至9的整数。

公开(公告)号：US20120315724A1

公开(公告)日：2012-12-13

申请号：US13230788

申请日：2011-09-12

申请人： Chi-Hung Liu ,  Kuo-Hui Yang ,  Chen-Der Tsai ,  Ying-Fang Chang ,  Ta-Hsin Chou

发明人： Chi-Hung Liu ,  Kuo-Hui Yang ,  Chen-Der Tsai ,  Ying-Fang Chang ,  Ta-Hsin Chou

IPC分类号： H01L21/06 ,  C23C16/50

CPC分类号： C23C14/06 ,  C23C14/228 ,  C23C14/32

摘要： A method for deposition of a selenium thin-film includes the following steps. First, a plasma head is provided. Then, a substrate is supported in an atmospheric pressure. Next, a solid-state selenium source is dissociated by the plasma head to deposit the selenium thin-film on the substrate. The plasma head includes a chamber, a housing and the solid-state selenium source. Plasma is produced in the chamber. The chamber is surrounded by the housing. The solid-state selenium source is supported by the housing.

摘要翻译： 一种沉积硒薄膜的方法包括以下步骤。 首先，提供等离子体头。 然后，在大气压下负载基板。 接下来，固体硒源通过等离子体头解离，以将硒薄膜沉积在基底上。 等离子体头包括腔室，壳体和固态硒源。 等离子体在室内产生。 房间被房屋包围。 固态硒源由壳体支撑。