公开(公告)号：US09887071B2

公开(公告)日：2018-02-06

申请号：US13328172

申请日：2011-12-16

申请人： Chien-An Chen ,  Yen-Shuo Su ,  Ying Xiao ,  Chin-Hsiang Lin

发明人： Chien-An Chen ,  Yen-Shuo Su ,  Ying Xiao ,  Chin-Hsiang Lin

IPC分类号： H01J37/32 ,  H01L21/311

CPC分类号： H01J37/32963 ,  H01J37/3299 ,  H01L21/31116

摘要： The present disclosure relates to a semiconductor body etching apparatus having a multi-zone end point detection system. In some embodiments, the multi-zone end point detection system has a processing chamber that houses a workpiece that is etched according to an etching process. A plurality of end point detector (EPD) probes are located within the processing chamber. Respective EPD probes are located within different zones in the processing chamber, thereby enabling the detection of end point signals from multiple zones within the processing chamber. The detected end point signals are provided from the plurality of EPD probes to an advanced process control (APC) unit. The APC unit is configured to make a tuning knob adjustment to etching process parameters based upon the detected end point signals and to thereby account for etching non-uniformities.

公开(公告)号：US20130157387A1

公开(公告)日：2013-06-20

申请号：US13328172

申请日：2011-12-16

申请人： Chien-An Chen ,  Yen-Shuo Su ,  Ying Xiao ,  Chin-Hsiang Lin

发明人： Chien-An Chen ,  Yen-Shuo Su ,  Ying Xiao ,  Chin-Hsiang Lin

IPC分类号： H01L21/66 ,  H01L21/306

CPC分类号： H01J37/32963 ,  H01J37/3299 ,  H01L21/31116

摘要： The present disclosure relates to a semiconductor body etching apparatus having a multi-zone end point detection system. In some embodiments, the multi-zone end point detection system has a processing chamber that houses a workpiece that is etched according to an etching process. A plurality of end point detector (EPD) probes are located within the processing chamber. Respective EPD probes are located within different zones in the processing chamber, thereby enabling the detection of end point signals from multiple zones within the processing chamber. The detected end point signals are provided from the plurality of EPD probes to an advanced process control (APC) unit. The APC unit is configured to make a tuning knob adjustment to etching process parameters based upon the detected end point signals and to thereby account for etching non-uniformities.

摘要翻译： 本公开涉及具有多区域端点检测系统的半导体本体蚀刻装置。 在一些实施例中，多区域终点检测系统具有容纳根据蚀刻工艺被蚀刻的工件的处理室。 多个端点检测器（EPD）探针位于处理室内。 相应的EPD探针位于处理室中的不同区域内，从而能够检测来自处理室内的多个区域的终点信号。 检测到的终点信号从多个EPD探针提供给高级处理控制（APC）单元。 APC单元被配置为基于检测到的终点信号对调谐旋钮进行蚀刻工艺参数调整，从而考虑蚀刻非均匀性。

公开(公告)号：US20130072013A1

公开(公告)日：2013-03-21

申请号：US13234975

申请日：2011-09-16

申请人： Shih-Hung Chen ,  Chien-An Chen ,  Ying Xiao ,  Ying Zhang

发明人： Shih-Hung Chen ,  Chien-An Chen ,  Ying Xiao ,  Ying Zhang

IPC分类号： H01L21/768 ,  C23F1/08 ,  H01L21/3065

CPC分类号： H01L21/31138 ,  H01L21/31116 ,  H01L21/76802

摘要： An etching method comprises etching an oxide layer with a first dc bias of a plasma chamber, removing a photoresist layer with a second dc bias of the plasma chamber and etching through a liner film with a third dc bias of the plasma chamber. In order to reduce the copper deposition on the wall of the plasma chamber, the third dc bias is set to be less than the first and second dc bias.

摘要翻译： 蚀刻方法包括用等离子体室的第一直流偏压蚀刻氧化物层，用等离子体室的第二直流偏压去除光致抗蚀剂层，并通过具有等离子体室的第三直流偏压的衬垫膜进行蚀刻。 为了减少等离子体室壁上的铜沉积，将第三直流偏压设定为小于第一和第二直流偏压。

公开(公告)号：US09252023B2

公开(公告)日：2016-02-02

申请号：US13234975

申请日：2011-09-16

申请人： Shih-Hung Chen ,  Chien-An Chen ,  Ying Xiao ,  Ying Zhang

发明人： Shih-Hung Chen ,  Chien-An Chen ,  Ying Xiao ,  Ying Zhang

IPC分类号： H01L21/44 ,  H01L21/311 ,  H01L21/768

CPC分类号： H01L21/31138 ,  H01L21/31116 ,  H01L21/76802

摘要： An etching method comprises etching an oxide layer with a first dc bias of a plasma chamber, removing a photoresist layer with a second dc bias of the plasma chamber and etching through a liner film with a third dc bias of the plasma chamber. In order to reduce the copper deposition on the wall of the plasma chamber, the third dc bias is set to be less than the first and second dc bias.

摘要翻译： 蚀刻方法包括用等离子体室的第一直流偏压蚀刻氧化物层，用等离子体室的第二直流偏压去除光致抗蚀剂层，并通过具有等离子体室的第三直流偏压的衬垫膜进行蚀刻。 为了减少等离子体室壁上的铜沉积，将第三直流偏压设定为小于第一和第二直流偏压。

公开(公告)号：US08842434B2

公开(公告)日：2014-09-23

申请号：US13409965

申请日：2012-03-01

申请人： Chien-An Chen ,  Kai-Yang Tung

发明人： Chien-An Chen ,  Kai-Yang Tung

IPC分类号： H05K7/20 ,  F28D15/00 ,  F25D31/00 ,  F28D21/00 ,  F28D15/06

CPC分类号： F25D31/00 ,  F28D15/00 ,  F28D15/06 ,  F28D2021/0028

摘要： A server rack heat dissipation system for a server including an electronic component comprises a first and a second heat dissipation assembly. The first heat dissipation assembly includes a first heat exchanger and a first pipeline. The first heat exchanger is inside the server rack and in thermal contact with the electronic component. The first pipeline is in thermal contact with the first heat exchanger and has a first coolant. The second heat dissipation assembly includes a second heat exchanger. The second heat exchanger is inside the server rack and in thermal contact with the first pipeline. The second heat exchanger can remove the heat of the electronic component in the first coolant in advance. Accordingly, the time of the first coolant being maintained in a vapor phase can be shortened, so that a power the fluid driving device used for driving the first coolant is reduced.

摘要翻译： 一种用于包括电子部件的服务器的服务器机架散热系统包括第一和第二散热组件。 第一散热组件包括第一热交换器和第一管道。 第一个热交换器在服务器机架内部，并与电子元件热接触。 第一管道与第一热交换器热接触并具有第一冷却剂。 第二散热组件包括第二热交换器。 第二个热交换器在服务器机架内部，并与第一个管道热接触。 第二热交换器可以预先去除第一冷却剂中的电子部件的热量。 因此，可以缩短保持在蒸气相中的第一冷却剂的时间，从而减少用于驱动第一冷却剂的流体驱动装置的功率。

公开(公告)号：US08520387B2

公开(公告)日：2013-08-27

申请号：US13158598

申请日：2011-06-13

申请人： Chien-An Chen ,  Kai-Yang Tung ,  Ming-Hung Shih ,  Chun-Ying Yang ,  Yen-Cheng Lin

发明人： Chien-An Chen ,  Kai-Yang Tung ,  Ming-Hung Shih ,  Chun-Ying Yang ,  Yen-Cheng Lin

IPC分类号： H05K7/20

CPC分类号： H05K7/20736

摘要： A server cabinet includes a rack, at least one assembling frame, a radiator and at least one fan. The rack has a first frame and a second frame opposite to each other. The assembling frame and the radiator are mounted on the first frame in sequence. The radiator transfers a coolant to flow inside a plurality of heatsink fins thereof in a circulating manner. The fan is mounted in the assembling frame, and the fan guides an airflow to flow into the first frame from the radiator, and blows the airflow in the rack to the second frame, thus lowering the temperature inside the rack.

摘要翻译： 服务器机柜包括机架，至少一个组装框架，散热器和至少一个风扇。 机架具有彼此相对的第一框架和第二框架。 组装框架和散热器依次安装在第一框架上。 散热器传送冷却剂以循环的方式在其多个散热片内流动。 风扇安装在组装框架中，风扇引导气流从散热器流入第一框架，并将机架中的气流吹送到第二框架，从而降低机架内的温度。

公开(公告)号：US08499790B2

公开(公告)日：2013-08-06

申请号：US13080797

申请日：2011-04-06

申请人： Chien-An Chen ,  Wei-Ta Shih

发明人： Chien-An Chen ,  Wei-Ta Shih

IPC分类号： F16L37/23

CPC分类号： H05K7/20272 ,  G06F2200/201 ,  Y10T137/598 ,  Y10T137/87153 ,  Y10T137/87925

摘要： An adjustable coolant quick coupler has a coolant supplier seat and a transmission seat that can be optionally connected or disconnected. The coolant supplier seat has a regulator assembly. The regulator assembly is able to adjust quantity of flow-in coolant and quantity of flow-out coolant. When the coolant supplier seat is connected to the transmission seat, the coolant can flow automatically from the coolant supplier seat to the transmission seat, so as to cool down electronic components inside a rack. When the coolant supplier seat is disconnected from the transmission seat, the coolant instantly stops flowing into the transmission seat. Because of the quick coupler, the rack installed inside a narrow space is convenient to set up or disassemble. Furthermore, by adjusting the quantity of flow-in coolant and the quantity of flow-out coolant, the electronic components can have a better effect of heat-dissipation.

摘要翻译： 可调冷却剂快速联接器具有冷却剂供应器座和可选地连接或断开的变速器座。 冷却剂供应商座椅具有调节器组件。 调节器组件能够调节流入冷却液的数量和流出的冷却剂的量。 当冷却剂供应者座椅连接到传动座时，冷却剂可以从冷却剂供应器座椅自动流动到变速器座椅，以冷却机架内的电子部件。 当冷却剂供应者座椅从传动座脱离时，冷却剂立即停止流入传动座。 由于快速耦合器，安装在狭窄空间内的机架方便设置或拆卸。 此外，通过调节流入冷却剂的量和流出冷却剂的量，电子部件可以具有更好的散热效果。

公开(公告)号：US20130146794A1

公开(公告)日：2013-06-13

申请号：US13404567

申请日：2012-02-24

申请人： Chien-An Chen ,  Chien-Wei Wu

发明人： Chien-An Chen ,  Chien-Wei Wu

IPC分类号： F16K31/06 ,  F16K11/07

CPC分类号： F16K31/088 ,  F16K3/26 ,  F16K5/0414 ,  F16K5/0442 ,  Y10T137/8671

摘要： A magnetic valve and a fluid supply system using the same are provided. The fluid supply system includes a flow channel and the magnetic valve. The magnetic valve penetrates through a pipe wall of the flow channel, and includes a driving unit, a first magnet and a second magnet, a cover plate, a first and second spools. A first leaning portion of the first spool is disposed at one end of a first sheath portion. The first sheath portion has a first outlet opening. The second magnet is disposed on a surface of the first leaning portion facing to the cover plate. The second spool sleeves the first spool and has a second outlet opening. The first spool rotates relative to the second spool through a magnetic force to control an overlapping area of the first and second outlet openings, so as to control a flow rate.

摘要翻译： 提供一种电磁阀和使用其的流体供给系统。 流体供应系统包括流动通道和电磁阀。 磁阀穿过流道的管壁，并包括驱动单元，第一磁体和第二磁体，盖板，第一和第二线轴。 第一线轴的第一倾斜部分设置在第一护套部分的一端。 第一护套部分具有第一出口开口。 第二磁体设置在面向盖板的第一倾斜部分的表面上。 第二卷轴套在第一卷轴上并具有第二出口开口。 第一卷轴通过磁力相对于第二卷轴旋转，以控制第一和第二出口的重叠区域，以便控制流速。

公开(公告)号：US08406909B2

公开(公告)日：2013-03-26

申请号：US12923016

申请日：2010-08-30

申请人： Hong-Tzong Yau ,  Chuan-Chu Kuo ,  Jiun-Ren Chen ,  Chien-An Chen ,  Lee-Sen Tsou

发明人： Hong-Tzong Yau ,  Chuan-Chu Kuo ,  Jiun-Ren Chen ,  Chien-An Chen ,  Lee-Sen Tsou

IPC分类号： G06F19/00

CPC分类号： A61C13/0004 ,  A61C8/0001 ,  A61C8/005 ,  A61C8/006 ,  A61C8/0068 ,  A61C8/0077 ,  A61C8/0096 ,  A61C8/0098 ,  A61C9/0046

摘要： A method of designing a dental-implant prosthesis includes the steps of arranging a referential jig and combining the referential jig into a fixture installed in a patient's oral cavity, the referential jig having at least one feature point, the fixture having a connection interface, the referential jig having an opposite-joint interface; scanning the patient's oral cavity to acquire an oral digital data and a referential-jig digital data having at least one feature-point digital data; selecting one digital dental-implant prosthesis from a prosthetic database in a computer, a digital positioning jig overlapping the digital dental-implant prosthesis for combination with the connection interface, and proceeding with overlapping and localization of the digital positioning jig and the referential-jig digital data to combine the referential-jig digital data into the connection interface; and adjusting the position, size, and angle of the digital dental-implant prosthesis to acquire the digital dental-implant prosthesis which is most suitable to the patient.

摘要翻译： 设计牙种植体假体的方法包括以下步骤：布置参考夹具并将参考夹具组合到安装在患者口腔中的固定器中，所述参考夹具具有至少一个特征点，所述夹具具有连接界面， 参考夹具具有相对接口界面; 扫描患者的口腔以获得具有至少一个特征点数字数据的口头数字数据和参考夹具数字数据; 从计算机中的假肢数据库中选择一个数字牙植入假体，数字定位夹具与数字牙植入物假体重叠以与连接界面组合，并且进行数字定位夹具和参考夹具数字化的重叠和定位 将参考夹具数字数据组合到连接接口中的数据; 以及调整数字牙植入物假体的位置，大小和角度以获取最适合于患者的数字牙植入假体。

公开(公告)号：US20130043775A1

公开(公告)日：2013-02-21

申请号：US13297446

申请日：2011-11-16

申请人： Chien-An Chen ,  Wei-Ta Shih

发明人： Chien-An Chen ,  Wei-Ta Shih

IPC分类号： H05K7/20 ,  F28F13/00 ,  H05K5/02 ,  F28F1/00

CPC分类号： H05K7/20781 ,  F28F9/0246 ,  Y10T137/4456 ,  Y10T137/598 ,  Y10T137/87161 ,  Y10T137/87949

摘要： A cooling coolant pipe of a server cabinet includes multiple tube bodies interconnected in series and at least one adjustable valve. In each of the tube bodies a first chamber and a second chamber that are adjacent to and separated from each other, the second chambers of the two adjacent tube bodies are in communication with each other, and a wall surface of each of the tube bodies has at least one connection port in communication with the first chamber. The adjustable valve is disposed in one of the tube bodies. The first chamber in each of the tube bodies is in communication with the second chamber in the tube body through the adjustable valve. In this way, the adjustable valve adjusts the flow rate of a cooling fluid flowing from the second chamber to the first chamber.

摘要翻译： 服务器机柜的冷却冷却剂管包括串联连接的多个管体和至少一个可调节阀。 在每个管体中，彼此相邻并分离的第一腔室和第二腔室，两个相邻管体的第二腔室彼此连通，并且每个管体的壁表面具有 与第一室连通的至少一个连接端口。 可调节阀设置在管体之一中。 每个管体中的第一腔室通过可调节阀与管体中的第二腔室连通。 以这种方式，可调节阀调节从第二室流向第一室的冷却流体的流量。