公开(公告)号：US20180271238A1

公开(公告)日：2018-09-27

申请号：US15464655

申请日：2017-03-21

申请人： Yen-Shuo Su

发明人： Yen-Shuo Su

IPC分类号： A45B25/22 ,  A45B25/06 ,  A45B25/02 ,  A45B19/00

CPC分类号： A45B25/22 ,  A45B19/00 ,  A45B25/02 ,  A45B25/06

摘要： An umbrella includes a shaft, a top cap and a runner. Multiple rib units and multiple stretchers are pivotably connected to the top cap and the runner. The rib units each have a first rib, a second rib and a third rib. The first, second and third ribs are pivotably connected in sequence. A canopy is mounted to the rib units. The second ribs each have a first connection portion on one end thereof, and the first connection portion has a seat which is connected to a link unit. The link unit has a joint which is connected to the third rib. The third rib has a positioning member to position the joint. The third rib and the joint are connected with each other to bear wind force applied to the second rib and the third rib, such that the second and third ribs do not deform.

公开(公告)号：US20130319612A1

公开(公告)日：2013-12-05

申请号：US13486374

申请日：2012-06-01

申请人： Yen-Shuo SU ,  Ying XIAO ,  Chin-Hsiang LIN

发明人： Yen-Shuo SU ,  Ying XIAO ,  Chin-Hsiang LIN

IPC分类号： H01L21/3065 ,  H05H1/24

CPC分类号： C23C16/50 ,  C23C16/45561 ,  C23C16/45563 ,  C23C16/45565 ,  C23C16/52 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32532 ,  H01J37/32899

摘要： This description relates to a plasma treatment apparatus including a vapor chamber, a gas supply and an upper electrode assembly. The upper electrode assembly includes a gas distribution plate having a plurality of holes in a bottom surface thereof and an upper electrode having at least one gas nozzle and at least one controllable valve connected to the at least one gas nozzle. The plasma treatment apparatus further includes a controller configured to generate a control signal. The at least one controllable valve is configured to be adjusted based on the control signal. A control system and a method of controlling a controllable valve are also described.

摘要翻译： 本说明书涉及包括蒸气室，气体供应和上部电极组件的等离子体处理装置。 上部电极组件包括在其底表面中具有多个孔的气体分布板和具有至少一个气体喷嘴的至少一个可控阀与至少一个气体喷嘴连接的上部电极。 等离子体处理装置还包括配置成产生控制信号的控制器。 至少一个可控阀被配置为基于控制信号进行调节。 还描述了控制系统和控制可控阀的方法。

公开(公告)号：US09887071B2

公开(公告)日：2018-02-06

申请号：US13328172

申请日：2011-12-16

申请人： Chien-An Chen ,  Yen-Shuo Su ,  Ying Xiao ,  Chin-Hsiang Lin

发明人： Chien-An Chen ,  Yen-Shuo Su ,  Ying Xiao ,  Chin-Hsiang Lin

IPC分类号： H01J37/32 ,  H01L21/311

CPC分类号： H01J37/32963 ,  H01J37/3299 ,  H01L21/31116

摘要： The present disclosure relates to a semiconductor body etching apparatus having a multi-zone end point detection system. In some embodiments, the multi-zone end point detection system has a processing chamber that houses a workpiece that is etched according to an etching process. A plurality of end point detector (EPD) probes are located within the processing chamber. Respective EPD probes are located within different zones in the processing chamber, thereby enabling the detection of end point signals from multiple zones within the processing chamber. The detected end point signals are provided from the plurality of EPD probes to an advanced process control (APC) unit. The APC unit is configured to make a tuning knob adjustment to etching process parameters based upon the detected end point signals and to thereby account for etching non-uniformities.

公开(公告)号：US20130157387A1

公开(公告)日：2013-06-20

申请号：US13328172

申请日：2011-12-16

申请人： Chien-An Chen ,  Yen-Shuo Su ,  Ying Xiao ,  Chin-Hsiang Lin

发明人： Chien-An Chen ,  Yen-Shuo Su ,  Ying Xiao ,  Chin-Hsiang Lin

IPC分类号： H01L21/66 ,  H01L21/306

CPC分类号： H01J37/32963 ,  H01J37/3299 ,  H01L21/31116

摘要： The present disclosure relates to a semiconductor body etching apparatus having a multi-zone end point detection system. In some embodiments, the multi-zone end point detection system has a processing chamber that houses a workpiece that is etched according to an etching process. A plurality of end point detector (EPD) probes are located within the processing chamber. Respective EPD probes are located within different zones in the processing chamber, thereby enabling the detection of end point signals from multiple zones within the processing chamber. The detected end point signals are provided from the plurality of EPD probes to an advanced process control (APC) unit. The APC unit is configured to make a tuning knob adjustment to etching process parameters based upon the detected end point signals and to thereby account for etching non-uniformities.

摘要翻译： 本公开涉及具有多区域端点检测系统的半导体本体蚀刻装置。 在一些实施例中，多区域终点检测系统具有容纳根据蚀刻工艺被蚀刻的工件的处理室。 多个端点检测器（EPD）探针位于处理室内。 相应的EPD探针位于处理室中的不同区域内，从而能够检测来自处理室内的多个区域的终点信号。 检测到的终点信号从多个EPD探针提供给高级处理控制（APC）单元。 APC单元被配置为基于检测到的终点信号对调谐旋钮进行蚀刻工艺参数调整，从而考虑蚀刻非均匀性。

公开(公告)号：US10264861B2

公开(公告)日：2019-04-23

申请号：US15464655

申请日：2017-03-21

申请人： Yen-Shuo Su

发明人： Yen-Shuo Su

IPC分类号： A45B25/22 ,  A45B25/06 ,  A45B25/02 ,  A45B19/00

摘要： An umbrella includes a shaft, a top cap and a runner. Multiple rib units and multiple stretchers are pivotably connected to the top cap and the runner. The rib units each have a first rib, a second rib and a third rib. The first, second and third ribs are pivotably connected in sequence. A canopy is mounted to the rib units. The second ribs each have a first connection portion on one end thereof, and the first connection portion has a seat which is connected to a link unit. The link unit has a joint which is connected to the third rib. The third rib has a positioning member to position the joint. The third rib and the joint are connected with each other to bear wind force applied to the second rib and the third rib, such that the second and third ribs do not deform.

公开(公告)号：US20050073800A1

公开(公告)日：2005-04-07

申请号：US10678236

申请日：2003-10-03

申请人： You-Hua Chou ,  Yen-Shuo Su ,  Yen-Chang Chao ,  Jain-Shing Tsai ,  Yong-Ping Chan ,  Jung-Chen Yang

发明人： You-Hua Chou ,  Yen-Shuo Su ,  Yen-Chang Chao ,  Jain-Shing Tsai ,  Yong-Ping Chan ,  Jung-Chen Yang

IPC分类号： H01G4/005 ,  H01G4/06 ,  H01G4/228 ,  H01G4/232 ,  H01G4/30 ,  H01G4/33 ,  H01G4/38 ,  H01L21/02 ,  H01L23/522

CPC分类号： H01G4/33 ,  H01G4/005 ,  H01G4/232 ,  H01G4/30 ,  H01G4/38 ,  H01L23/5223 ,  H01L28/82 ,  H01L2924/0002 ,  Y10T29/435 ,  H01L2924/00

摘要： A capacitor having an electrically/conductive plate, an electrically conductive segmented plate defining a first plurality of electrically conductive plate segments and a second plurality of electrically conductive plate segments, a first capacitor dielectric disposed between the plate and the segmented plate, at least one electrically conductive interconnect coupling each of the plate segments of one of the first and second plurality of plate segments to the plate, and a second capacitor dielectric disposed between the plate segments.

摘要翻译： 具有电/导电板的电容器，限定第一多个导电板段和第二多个导电板段的导电分段板，设置在板和分段板之间的第一电容器电介质，至少一个电 所述导电互连将所述第一和第二多个板段中的一个的每个板段耦合到所述板，以及设置在所述板段之间的第二电容器电介质。

公开(公告)号：US11490750B1

公开(公告)日：2022-11-08

申请号：US17313035

申请日：2021-05-06

申请人： Yen-Shuo Su ,  Chunming Cheng

发明人： Yen-Shuo Su ,  Chunming Cheng

IPC分类号： A47G21/06

摘要： A tableware device includes a main body and multiple tableware members. The main body has a lower cover and an upper cover. The upper cover has a first fastener. A receiving space is formed between the upper cover and the lower cover. An end of the lower cover is rotatably connected to an end of the upper cover by a pivoting portion, and free ends thereof jointly form an opening. The lower cover is formed with a first connecting portion and a second fastener corresponding to the first fastener to fasten the upper and lower covers. The tableware members are removably disposed on the main body. Each is provided with a second connecting portion corresponding to the first connecting portion to connect the tableware member with the main body.

公开(公告)号：US20110059407A1

公开(公告)日：2011-03-10

申请号：US12871185

申请日：2010-08-30

申请人： Li-Te S. LIN ,  Yen-Shuo SU ,  Hsueh-Chang SUNG ,  Feng-Cheng HSU ,  Chun Hsiung TSAI ,  Shiang-Bau WANG ,  Chun-Kuang CHEN

发明人： Li-Te S. LIN ,  Yen-Shuo SU ,  Hsueh-Chang SUNG ,  Feng-Cheng HSU ,  Chun Hsiung TSAI ,  Shiang-Bau WANG ,  Chun-Kuang CHEN

IPC分类号： G03F7/20

CPC分类号： H01L21/0273 ,  G03F7/0035 ,  G03F7/2024 ,  G03F7/405 ,  H01L21/31144 ,  H01L21/32139

摘要： A method of lithography patterning includes forming a first resist pattern over a substrate, baking the first resist features, hardening the first resist features, forming a second resist layer within the hardened first resist features, and patterning the second resist layer to form at least one second resist feature between the hardened first features.

摘要翻译： 一种光刻图案化方法包括在衬底上形成第一抗蚀剂图案，烘烤第一抗蚀剂特征，硬化第一抗蚀剂特征，在硬化的第一抗蚀剂特征内形成第二抗蚀剂层，以及使第二抗蚀剂层图形化以形成至少一个 硬化的第一特征之间的第二抗蚀特征。

公开(公告)号：US06934143B2

公开(公告)日：2005-08-23

申请号：US10678236

申请日：2003-10-03

申请人： You-Hua Chou ,  Yen-Shuo Su ,  Yen-Chang Chao ,  Jain-Shing Tsai ,  Yong-Ping Chan ,  Jung-Chen Yang

发明人： You-Hua Chou ,  Yen-Shuo Su ,  Yen-Chang Chao ,  Jain-Shing Tsai ,  Yong-Ping Chan ,  Jung-Chen Yang

IPC分类号： H01G4/005 ,  H01G4/06 ,  H01G4/228 ,  H01G4/232 ,  H01G4/30 ,  H01G4/33 ,  H01G4/38 ,  H01L21/02 ,  H01L23/522

CPC分类号： H01G4/33 ,  H01G4/005 ,  H01G4/232 ,  H01G4/30 ,  H01G4/38 ,  H01L23/5223 ,  H01L28/82 ,  H01L2924/0002 ,  Y10T29/435 ,  H01L2924/00

摘要： A capacitor having an electrically/conductive plate, an electrically conductive segmented electrically conductive plate segments and a second plurality of electrically conductive plate segments, a first capacitor dielectric disposed between the plate and the segment plate, at least one electrically conductive interconnect coupling each of the plate segment of one of the first and second plurality of plate segments to the plate, and a second capacitor dieletric disposed between the plate segments.

摘要翻译： 具有电/导电板的电容器，导电分段的导电板段和第二多个导电板段，设置在板和段板之间的第一电容器电介质，至少一个导电互连， 所述第一和第二多个板段中的一个的板段到所述板，以及设置在所述板段之间的第二电容器。

公开(公告)号：US20220354286A1

公开(公告)日：2022-11-10

申请号：US17313035

申请日：2021-05-06

申请人： Yen-Shuo Su ,  Chunming Cheng

发明人： Yen-Shuo Su ,  Chunming Cheng

IPC分类号： A47G21/06

摘要： A tableware device includes a main body and multiple tableware members. The main body has a lower cover and an upper cover. The upper cover has a first fastener. A receiving space is formed between the upper cover and the lower cover. An end of the lower cover is rotatably connected to an end of the upper cover by a pivoting portion, and free ends thereof jointly form an opening. The lower cover is formed with a first connecting portion and a second fastener corresponding to the first fastener to fasten the upper and lower covers. The tableware members are removably disposed on the main body. Each is provided with a second connecting portion corresponding to the first connecting portion to connect the tableware member with the main body.