Multi-zone EPD detectors
    1.
    发明授权

    公开(公告)号:US09887071B2

    公开(公告)日:2018-02-06

    申请号:US13328172

    申请日:2011-12-16

    IPC分类号: H01J37/32 H01L21/311

    摘要: The present disclosure relates to a semiconductor body etching apparatus having a multi-zone end point detection system. In some embodiments, the multi-zone end point detection system has a processing chamber that houses a workpiece that is etched according to an etching process. A plurality of end point detector (EPD) probes are located within the processing chamber. Respective EPD probes are located within different zones in the processing chamber, thereby enabling the detection of end point signals from multiple zones within the processing chamber. The detected end point signals are provided from the plurality of EPD probes to an advanced process control (APC) unit. The APC unit is configured to make a tuning knob adjustment to etching process parameters based upon the detected end point signals and to thereby account for etching non-uniformities.

    Multi-zone EPD Detectors
    2.
    发明申请
    Multi-zone EPD Detectors 有权
    多区域EPD探测器

    公开(公告)号:US20130157387A1

    公开(公告)日:2013-06-20

    申请号:US13328172

    申请日:2011-12-16

    IPC分类号: H01L21/66 H01L21/306

    摘要: The present disclosure relates to a semiconductor body etching apparatus having a multi-zone end point detection system. In some embodiments, the multi-zone end point detection system has a processing chamber that houses a workpiece that is etched according to an etching process. A plurality of end point detector (EPD) probes are located within the processing chamber. Respective EPD probes are located within different zones in the processing chamber, thereby enabling the detection of end point signals from multiple zones within the processing chamber. The detected end point signals are provided from the plurality of EPD probes to an advanced process control (APC) unit. The APC unit is configured to make a tuning knob adjustment to etching process parameters based upon the detected end point signals and to thereby account for etching non-uniformities.

    摘要翻译: 本公开涉及具有多区域端点检测系统的半导体本体蚀刻装置。 在一些实施例中,多区域终点检测系统具有容纳根据蚀刻工艺被蚀刻的工件的处理室。 多个端点检测器(EPD)探针位于处理室内。 相应的EPD探针位于处理室中的不同区域内,从而能够检测来自处理室内的多个区域的终点信号。 检测到的终点信号从多个EPD探针提供给高级处理控制(APC)单元。 APC单元被配置为基于检测到的终点信号对调谐旋钮进行蚀刻工艺参数调整,从而考虑蚀刻非均匀性。

    Versatile tableware device
    4.
    发明授权

    公开(公告)号:US11490750B1

    公开(公告)日:2022-11-08

    申请号:US17313035

    申请日:2021-05-06

    IPC分类号: A47G21/06

    摘要: A tableware device includes a main body and multiple tableware members. The main body has a lower cover and an upper cover. The upper cover has a first fastener. A receiving space is formed between the upper cover and the lower cover. An end of the lower cover is rotatably connected to an end of the upper cover by a pivoting portion, and free ends thereof jointly form an opening. The lower cover is formed with a first connecting portion and a second fastener corresponding to the first fastener to fasten the upper and lower covers. The tableware members are removably disposed on the main body. Each is provided with a second connecting portion corresponding to the first connecting portion to connect the tableware member with the main body.

    VERSATILE TABLEWARE DEVICE
    6.
    发明申请

    公开(公告)号:US20220354286A1

    公开(公告)日:2022-11-10

    申请号:US17313035

    申请日:2021-05-06

    IPC分类号: A47G21/06

    摘要: A tableware device includes a main body and multiple tableware members. The main body has a lower cover and an upper cover. The upper cover has a first fastener. A receiving space is formed between the upper cover and the lower cover. An end of the lower cover is rotatably connected to an end of the upper cover by a pivoting portion, and free ends thereof jointly form an opening. The lower cover is formed with a first connecting portion and a second fastener corresponding to the first fastener to fasten the upper and lower covers. The tableware members are removably disposed on the main body. Each is provided with a second connecting portion corresponding to the first connecting portion to connect the tableware member with the main body.

    Wind-proof umbrella
    7.
    发明授权

    公开(公告)号:US10264861B2

    公开(公告)日:2019-04-23

    申请号:US15464655

    申请日:2017-03-21

    申请人: Yen-Shuo Su

    发明人: Yen-Shuo Su

    摘要: An umbrella includes a shaft, a top cap and a runner. Multiple rib units and multiple stretchers are pivotably connected to the top cap and the runner. The rib units each have a first rib, a second rib and a third rib. The first, second and third ribs are pivotably connected in sequence. A canopy is mounted to the rib units. The second ribs each have a first connection portion on one end thereof, and the first connection portion has a seat which is connected to a link unit. The link unit has a joint which is connected to the third rib. The third rib has a positioning member to position the joint. The third rib and the joint are connected with each other to bear wind force applied to the second rib and the third rib, such that the second and third ribs do not deform.

    WIND-PROOF UMBRELLA
    9.
    发明申请
    WIND-PROOF UMBRELLA 审中-公开

    公开(公告)号:US20180271238A1

    公开(公告)日:2018-09-27

    申请号:US15464655

    申请日:2017-03-21

    申请人: Yen-Shuo Su

    发明人: Yen-Shuo Su

    摘要: An umbrella includes a shaft, a top cap and a runner. Multiple rib units and multiple stretchers are pivotably connected to the top cap and the runner. The rib units each have a first rib, a second rib and a third rib. The first, second and third ribs are pivotably connected in sequence. A canopy is mounted to the rib units. The second ribs each have a first connection portion on one end thereof, and the first connection portion has a seat which is connected to a link unit. The link unit has a joint which is connected to the third rib. The third rib has a positioning member to position the joint. The third rib and the joint are connected with each other to bear wind force applied to the second rib and the third rib, such that the second and third ribs do not deform.