摘要:
A method of protecting a video encoder while encoding video data corresponding to a first video signal includes receiving the first video signal; detecting a start of a first field in the first video signal; outputting information corresponding to the first field in the first video signal as a first field in a second video signal; and waiting at least a minimum field duration from a start of the first field in the second video signal before outputting information of a second field in the second video signal. The method increases the stability of the video encoder and also prevents erroneous data from being encoded by the video encoder during channel switches that cause sync signal timing differences in the first video signal.
摘要:
A method for video coding is provided. The method comprises retrieving a video frame and at least one reference frame, determining a search window size according to the number of the at least one reference frame, performing prediction encoding on the video frame according to the number of the at least one reference frame and the search window size to obtain coding information and determining another search window size and a number of reference frames according to the coding information.
摘要:
Method and memory circuits capable of allowing M memory addresses of an N-port memory to be accessed concurrently, wherein N and M both are a natural number, and M is larger than N. Accordingly, a higher-order multi-port memory can be replaced by a lower-order multi-port or single-port memory. Consequently, smaller chip area or higher data access rate can be achieved.
摘要:
A video encoder and a motion estimation method are provided. The video encoder comprises a storage unit and an integer motion estimation unit. The storage unit receives a current image block and a plurality of search windows from at least two reference frames. The integer motion estimation unit coupled to the storage unit computes a plurality of integer motion vectors according to the current image block and the plurality of search windows. A number of the reference frames and a size of the search windows are adaptively changed such that space requirement thereof is less than or equal to available space in the storage unit.
摘要:
Method and memory circuits capable of allowing M memory addresses of an N-port memory to be accessed concurrently, wherein N and M both are a natural number, and M is larger than N. Accordingly, a higher-order multi-port memory can be replaced by a lower-order multi-port or single-port memory. Consequently, smaller chip area or higher data access rate can be achieved.
摘要:
A planar antenna and a handheld device are provided. The handheld device includes the planar antenna and a system ground plane. The planar antenna has a first feed point, a first ground point, a second feed point, and a second ground point. The first ground point and the second ground point are located between the first feed point and the second feed point. The system ground plane is electrically connected to the first feed point, the first ground point, the second feed point, and the second ground point. Thereby, the performance in radio signal transceiving is improved.
摘要:
A slider has an upper sliding element, a lower sliding element and a resilient tab. The upper sliding element has two first engaging segments disposed on an inner side of the upper sliding element. The lower sliding element has two second engaging segments disposed on an outer side facing the inner side of the upper sliding element and engaging the first engaging segments. A tab holding base is formed on and protrudes from the outer side of the lower sliding element and has a chamber defined in the tab holding base. The resilient tab is held in the chamber in the lower sliding element and has two legs. Accordingly, a slider having a structure in a closed condition is provided to prevent objects from entering into the chamber to interfere the operation of the resilient tab and the operation of the slider is smooth.
摘要:
A method of optical proximity correction (OPC) convergence control that includes providing a lithography system having a photomask and an illuminator. The method further includes performing an exposure by the illuminator on the photomask. Also, the method includes optimizing an optical illuminator setting for the lithography system with a defined gate pitch in a first direction in a first template. Additionally, the method includes determining OPC correctors to converge the OPC results with a target edge placement error (EPE) to produce a first OPC setting for the first template. The first OPC setting targets a relatively small EPE and mask error enhancement factor (MEEF)of the defined gate pitch in the first template. In addition, the method includes checking the first OPC setting for a relatively small EPE, MEEF and DOM consistency with the first template of the defined gate pitch in a second, adjacent template.
摘要:
The present disclosure provides a semiconductor manufacturing method. The method includes providing product data of a product, the product data including a sensitive product parameter; searching existing products according to the sensitive product parameter to identify a relevant product from the existing products; determining an initial value of a processing model parameter to the product using corresponding data of the relevant product; assigning the initial value of the processing model parameter to a processing model associated with a manufacturing process; thereafter, tuning a processing recipe using the processing model; and performing the manufacturing process to a semiconductor wafer using the processing recipe.
摘要:
A method of semiconductor fabrication is provided. The method includes providing a model for a device parameter of a wafer as a function of first and second process parameters. The first and second process parameters correspond to different wafer characteristics, respectively. The method includes deriving target values of the first and second process parameters based on a specified target value of the device parameter. The method includes performing a first fabrication process in response to the target value of the first process parameter. The method includes measuring an actual value of the first process parameter thereafter. The method includes updating the model using the actual value of the first process parameter. The method includes deriving a revised target value of the second process parameter using the updated model. The method includes performing a second fabrication process in response to the revised target value of the second process parameter.