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公开(公告)号：US06910847B1
公开(公告)日：2005-06-28
申请号：US10199140
申请日：2002-07-19
CPC分类号： B25J9/042 , B25J15/0095 , H01L21/67742
摘要： A polar coordinate stage that may be used in a chamber includes a rotating chuck that moves in a linear direction and has the motors that drive the motion of the chuck outside the chamber. The stage can include a linkage of arms to support and drive the linear motion of the chuck. The chuck is coupled to a horizontal rail such that rotational motion of a first arm is translated into precise linear motion of the chuck along the horizontal rail through a second arm. In addition, a system of pulleys within the arms translates rotational (or linear) motion through the arms and rotates the chuck. Vertical motion may be provided by an actuator between the second arm and the chuck or by a motor under the stage. Because of the compact nature of the stage, it can be easily placed within a chamber.
摘要翻译： 可以在室中使用的极坐标台包括沿线性方向移动并具有驱动卡盘在室外的运动的马达的旋转卡盘。 舞台可以包括臂的连接以支撑和驱动卡盘的线性运动。 卡盘联接到水平轨道，使得第一臂的旋转运动通过第二臂被转换成沿着水平轨道的卡盘的精确的线性运动。 此外，臂内的滑轮系统使旋转（或线性）运动通过臂平移并旋转卡盘。 垂直运动可以由第二臂和卡盘之间的致动器或在该台下方的电动机提供。 由于舞台的紧凑性，它可以很容易地放置在一个室内。
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公开(公告)号：US06970255B1
公开(公告)日：2005-11-29
申请号：US10422232
申请日：2003-04-23
CPC分类号： G01D5/34707
摘要： An encoder includes a layer on the scale that has a thickness that varies as a function of position along the length of the scale. The position of the sensor head with respect to the scale may be determined by measuring the thickness of the layer or index of refraction, e.g., using a reflectometer, and converting the thickness to the lateral position. In one embodiment, the thickness of the layer is used to provide a rough position of the sensor head with respect to the scale and an alignment target that includes periodic patterns on both the sensor head and scale is used to provide a refined position.
摘要翻译： 编码器包括刻度上的层，其厚度随着刻度长度的位置而变化。 传感器头相对于刻度尺的位置可以通过测量层的厚度或折射率来确定，例如使用反射计，并将厚度转换成横向位置。 在一个实施例中，层的厚度用于提供传感器头相对于标尺的粗略位置，并且使用包括传感器头部和标尺上的周期性图案的对准目标来提供精细位置。
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公开(公告)号：US07289215B2
公开(公告)日：2007-10-30
申请号：US11624666
申请日：2007-01-18
CPC分类号： G02B7/00
摘要： A metrology system includes a positioning system that produces linear and rotational motion between an imaging system and the wafer. The imaging system produces signals representing the image of the wafer in the field of view of the imaging system. A control system receives and processes the image signals, and generates corrected signals that compensate for rotational movement between the imaging system and the wafer. In response to the corrected signals, a monitor displays an image with the orientation of features on the wafer within the field of view unaffected by the rotational movement.
摘要翻译： 计量系统包括在成像系统和晶片之间产生线性和旋转运动的定位系统。 成像系统在成像系统的视野中产生表示晶片的图像的信号。 控制系统接收和处理图像信号，并产生补偿成像系统和晶片之间的旋转运动的校正信号。 响应于校正的信号，监视器在不受旋转运动影响的视场内显示具有晶片上的特征的取向的图像。
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公开(公告)号：US07295314B1
公开(公告)日：2007-11-13
申请号：US09458123
申请日：1999-12-08
CPC分类号： G01N21/9501
摘要： A metrology/inspection system moves the imaging and/or measuring equipment of the system relative to a wafer. Accordingly, measurement or inspection of the wafer does not require that the wafer be mounted on a precision stage. This allows the wafer to be at rest on any structure native in a processing apparatus when the system measures or inspects the wafer. Accordingly, measurement does not require removing the wafer from the processing apparatus and does not delay processing since the wafer can be measured, for example, during a required cool down period of device fabrication process. Alignment of an optical system includes pre-alignment base on edge detection using the optical system and more precise alignment using image recognition. An R-θ stage can position the optical system at inspection areas on the wafer. Image rotation can provide a fixed orientation for all images at the various inspection areas and can maintain the fixed orientation when moving from one inspection area to the next.
摘要翻译： 计量/检查系统相对于晶片移动系统的成像和/或测量设备。 因此，晶片的测量或检查不需要将晶片安装在精密平台上。 这允许当系统测量或检查晶片时，晶片在处理设备中本构的任何结构处于静止状态。 因此，测量不需要从处理设备中移除晶片，并且不延迟处理，因为可以例如在器件制造工艺的所需冷却时间期间测量晶片。 光学系统的对准包括基于使用光学系统的边缘检测的预对准和使用图像识别的更精确的对准。 R-θ级可以将光学系统定位在晶片上的检查区域。 图像旋转可以为各种检查区域的所有图像提供固定的方向，并且可以在从一个检查区域移动到下一个检查区域时保持固定的方向。
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5.发明授权Combination of normal and oblique incidence polarimetry for the characterization of gratings 有权用于表征光栅的正常和倾斜入射偏振方法的组合公开(公告)号：US06713753B1
公开(公告)日：2004-03-30
申请号：US09898641
申请日：2001-07-03
IPC分类号： G02F101
CPC分类号： G01N21/956 , G01B11/00
摘要： A normal incidence spectroscopic polarimeter is combined with an oblique incidence spectroscopic polarimeter to provide an accurate characterization of complex grating structures, e.g., structures with sloping sidewalls, with notches and with multiple underlying layers. The normal incidence spectroscopic polarimeter includes a polarizing element that is in the path of the normal incidence light beam such that the light beam is transmitted through the polarizing element before reaching the sample and after being reflected off the sample. The two systems may advantageously share a single light source and/or the spectrophotometer.
摘要翻译： 正常入射光谱偏振计与倾斜入射光谱旋光计结合，以提供复杂光栅结构的准确表征，例如具有倾斜侧壁的结构，具有凹口和多个下层。 正常入射光谱旋光计包括在法线入射光束的路径中的偏振元件，使得光束在到达样品之前并且被反射离开样品之后透射通过偏振元件。 两个系统可以有利地共享单个光源和/或分光光度计。
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公开(公告)号：US6108077A
公开(公告)日：2000-08-22
申请号：US209365
申请日：1998-12-08
申请人： John D. Heaton , Duane C. Holmes
发明人： John D. Heaton , Duane C. Holmes
CPC分类号： G01N21/01 , G01N21/9501
摘要： An optical measurement instrument that detects and analyzes reflected light includes a sample support, such as a wafer supporting chuck, with a sample bearing surface that is configured so as to not reflect light back to the optical measurement instrument. In one embodiment, the sample bearing surface of the sample support is a layer of material that absorbs light in the wavelength or wavelengths being used by the optical measurement instrument. For example, a hard plastic, such as poly-ether-ether-ketone (PEEK), may be used to absorb light in the infrared wavelengths. In another embodiment, the entire sample support may be manufactured from the light absorbing material. In yet another embodiment, the top surface of the sample support is configured with light scattering depressions, which prevent light that is incident on the sample bearing surface from being reflected back to the optical measurement instrument.
摘要翻译： 检测和分析反射光的光学测量仪器包括样品支撑件，例如晶片支撑卡盘，其具有被构造成不将光反射回到光学测量仪器的样品支承表面。 在一个实施例中，样品支架的样品承载表面是吸收由光学测量仪器使用的波长或波长的光的材料层。 例如，可以使用诸如聚醚醚酮（PEEK）的硬塑料来吸收红外波长的光。 在另一个实施例中，整个样品支架可以由光吸收材料制成。 在另一个实施例中，样品支架的顶表面配置有光散射凹陷，其阻止入射在样品支承表面上的光被反射回到光学测量仪器。
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公开(公告)号：US06992764B1
公开(公告)日：2006-01-31
申请号：US10261547
申请日：2002-09-30
IPC分类号： G01J4/00
CPC分类号： G03F7/70633 , B23K26/04 , B23K26/043 , B23K2101/40 , G01N21/21 , G01N2021/213 , G01N2021/4792 , G03F9/7065
摘要： An alignment target includes periodic patterns on two elements. The periodic patterns are aligned when the two elements are properly aligned. By measuring the two periodic patterns with an incident beam having a single polarization state and detecting the intensity of the resulting polarized light, it can be determined if the two elements are aligned. The same polarization state may be detected as is incident or different polarization states may be used. A reference measurement location may be used that includes a third periodic pattern on the first element and a fourth periodic pattern on the second element, which have a designed in offset, i.e., an offset when there is an offset of a known magnitude when the first and second element are properly aligned. The reference measurement location is similarly measured with a single polarization state.
摘要翻译： 对齐目标包括两个元素上的周期性图案。 当两个元件正确对齐时，周期性图案对准。 通过用具有单一偏振态的入射光束测量两个周期性图案并检测所得到的偏振光的强度，可以确定两个元件是否对齐。 可以像入射一样检测相同的偏振状态，也可以使用不同的偏振状态。 可以使用参考测量位置，其包括第一元件上的第三周期性图案和第二元件上的第四周期性图案，其具有被设计为偏移的偏移，即当第一元件具有已知幅度的偏移时的偏移 并且第二元件被正确对准。 参考测量位置类似地用单一偏振态测量。
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公开(公告)号：US07230705B1
公开(公告)日：2007-06-12
申请号：US11075228
申请日：2005-03-07
申请人： Weidong Yang , Roger R. Lowe-Webb , John D. Heaton , Guonguang Li
发明人： Weidong Yang , Roger R. Lowe-Webb , John D. Heaton , Guonguang Li
IPC分类号： G01B11/00 , G01B11/14 , H01L21/76 , H01L23/544
CPC分类号： G03F7/70633 , G03F9/7076
摘要： An alignment target includes periodic patterns on two elements. The alignment target includes two locations, at least one of which has a designed in offset. In one embodiment, both measurement locations have a designed in offset of the same magnitude but opposite directions. For example, two separate overlay patterns that are mirror images of each other may be used. Alternatively, the magnitudes and/or directions may vary between the measurement locations. The radiation that interacts with the measurement locations is compared. The calculated difference is extremely sensitive to any alignment error. If the difference between the patterns is approximately zero, the elements are properly aligned. When an alignment error is introduced, however, calculated difference can be used to determine the error. In one embodiment, the alignment target is modeled to determine the alignment error. In another embodiment, additional overlay patterns with additional reference offsets are used to determine the alignment error.
摘要翻译： 对齐目标包括两个元素上的周期性图案。 对准目标包括两个位置，其中至少一个具有偏移设计。 在一个实施例中，两个测量位置具有相同幅度但相反方向偏移的设计。 例如，可以使用作为彼此的镜像的两个单独的覆盖图案。 或者，幅度和/或方向可以在测量位置之间变化。 比较与测量位置相互作用的辐射。 计算的差异对任何对准误差都非常敏感。 如果图案之间的差异大约为零，则元素将被正确对齐。 然而，当引入对准误差时，可以使用计算出的差异来确定误差。 在一个实施例中，对准目标被建模以确定对准误差。 在另一个实施例中，使用具有附加参考偏移的附加覆盖图案来确定对准误差。
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9.发明授权公开(公告)号：US07046361B1
公开(公告)日：2006-05-16
申请号：US10116964
申请日：2002-04-04
申请人： Weidong Yang , Roger R. Lowe-Webb , John D. Heaton
发明人： Weidong Yang , Roger R. Lowe-Webb , John D. Heaton
IPC分类号： G01B11/00
CPC分类号： G03F9/7084 , G03F7/70633 , G03F9/7076
摘要： An alignment system for aligning two elements includes an alignment target with periodic patterns on each element. The alignment target includes two locations, at least one of which has a designed in offset. If desired, both locations may have designed in offsets of the same magnitude but in opposite directions. The diffraction patterns produced at the two locations are compared. If the difference between the patterns is at a minimum, the elements are properly aligned. When an alignment error is introduced, however, the calculated difference can be used to determine the error. In another embodiment, bands in the moiré fringes from the different locations may be compared to determine the alignment error. The two elements may then be moved relative to each other to minimize the alignment error. Thus, the alignment target may advantageously be used in any alignment system, such as an exposure tool.
摘要翻译： 用于对准两个元件的对准系统包括在每个元件上具有周期性图案的对准目标。 对准目标包括两个位置，其中至少一个具有偏移设计。 如果需要，两个位置可以设计成相同幅度的偏移但是在相反的方向上。 比较在两个位置产生的衍射图。 如果图案之间的差异最小，则元素将被正确对齐。 然而，当引入对准误差时，可以使用计算出的差异来确定误差。 在另一个实施例中，可以比较来自不同位置的莫尔条纹中的条带以确定对准误差。 然后可以相对于彼此移动两个元件以使对准误差最小化。 因此，对准目标可以有利地用于任何对准系统，例如曝光工具。
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10.发明授权公开(公告)号：US06982793B1
公开(公告)日：2006-01-03
申请号：US10116863
申请日：2002-04-04
申请人： Weidong Yang , Roger R. Lowe-Webb , John D. Heaton , Guoguang Li
发明人： Weidong Yang , Roger R. Lowe-Webb , John D. Heaton , Guoguang Li
IPC分类号： G01B11/27
CPC分类号： G03F7/70633 , G03F9/7076
摘要： An alignment target includes periodic patterns on two elements. The alignment target includes two locations, at least one of which has a designed in offset. In one embodiment, both measurement locations have a designed in offset of the same magnitude but opposite directions. For example, two separate overlay patterns that are mirror images of each other may be used. Alternatively, the magnitudes and/or directions may vary between the measurement locations. The radiation that interacts with the measurement locations is compared. The calculated difference is extremely sensitive to any alignment error. If the difference between the patterns is approximately zero, the elements are properly aligned. When an alignment error is introduced, however, calculated difference can be used to determine the error. In one embodiment, the alignment target is modeled to determine the alignment error. In another embodiment, additional overlay patterns with additional reference offsets are used to determine the alignment error.
摘要翻译： 对齐目标包括两个元素上的周期性图案。 对准目标包括两个位置，其中至少一个具有偏移设计。 在一个实施例中，两个测量位置具有相同幅度但相反方向偏移的设计。 例如，可以使用作为彼此的镜像的两个单独的覆盖图案。 或者，幅度和/或方向可以在测量位置之间变化。 比较与测量位置相互作用的辐射。 计算的差异对任何对准误差都非常敏感。 如果图案之间的差异大约为零，则元素将被正确对齐。 然而，当引入对准误差时，可以使用计算出的差异来确定误差。 在一个实施例中，对准目标被建模以确定对准误差。 在另一个实施例中，使用具有附加参考偏移的附加覆盖图案来确定对准误差。
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