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    Electron beam gun
    1.
    发明申请
    Electron beam gun 有权
    电子束枪

    公开(公告)号：US20070210691A1

    公开(公告)日：2007-09-13

    申请号：US11709534

    申请日：2007-02-22

    Applicant: Cris Kroneberger ,  Ping Chang

    Inventor： Cris Kroneberger ,  Ping Chang

    IPC: H01J29/46

    CPC classification number: H01J37/065 ,  H01J3/027 ,  H01J37/07 ,  H01J2237/06308 ,  H01J2237/3132

    Abstract: An electron beam gun with an arched shaped beam former as an integral part of a massive cathode block which conducts heat away from the beam former and with a filament mounted to the cathode block for improved alignment.

    Abstract translation: 一种具有拱形梁形成器的电子束枪，其作为大量阴极块的整体部分，其将热量从光束形成器传导出去，并将灯丝安装到阴极块，以改善对准。

    Guitar saddle structure
    3.
    发明申请
    Guitar saddle structure 审中-公开
    吉他马鞍结构

    公开(公告)号：US20060042449A1

    公开(公告)日：2006-03-02

    申请号：US10930828

    申请日：2004-09-01

    Applicant: Ping Chang

    Inventor： Ping Chang

    IPC: G10D3/04

    CPC classification number: G10D3/04

    Abstract: A guitar saddle structure includes a bridge base and a plurality of string decks. The bridge base has a plurality of housing compartments each has a ramp on the left side and the S right side. Each of the string decks has a bucking surface on the left side and the right side corresponding to the ramp. The string decks are held in the housing compartments with the bucking surface resting on and in contact with the ramp such that when the string is laid on the string deck and being played, a clear and crisp sound may be generated without the interference of vibration.

    Abstract translation: 吉他马鞍结构包括桥基座和多个绳甲板。 桥基具有多个壳体隔间，每个隔室具有在左侧和右侧的斜面。 每个绳甲板在左侧和右侧对应于斜坡的弯曲表面。 弦板被保持在壳体隔间中，抗弯表面搁置在斜坡上并与斜坡接触，使得当琴弦被放置在弦牌上并被播放时，可以产生清晰和清晰的声音而没有振动的干扰。

    Rod-fed electron beam evaporation system
    4.
    发明授权
    Rod-fed electron beam evaporation system 失效
    棒式电子束蒸发系统

    公开(公告)号：US5861599A

    公开(公告)日：1999-01-19

    申请号：US871083

    申请日：1997-06-09

    Applicant: P. A. Joel Smith ,  Ping Chang

    Inventor： P. A. Joel Smith ,  Ping Chang

    IPC: C23C14/24 ,  C23C14/30 ,  B23K15/00

    CPC classification number: C23C14/246 ,  C23C14/30

    Abstract: A rod-fed electron beam evaporation system having a rod-fed electron beam evaporation source for evaporating an ingot. The ingot is of rod-like configuration and has a peg-like element to self-engage a socket of a replacement ingot so that both ingot and replacement ingot are brought into alignment.

    Abstract translation: 一种具有用于蒸发锭的棒状电子束蒸发源的棒式电子束蒸发系统。 该锭具有棒状构造，并且具有钉状元件以自动接合替换锭的插座，使得铸锭和替换锭都对准。

    Lift-off deposition system featuring a density optimized HULA substrate holder in a conical deposition chamber
    5.
    发明申请
    Lift-off deposition system featuring a density optimized HULA substrate holder in a conical deposition chamber 有权
    剥离沉积系统，其特征是在锥形沉积室中具有密度优化的HULA衬底支架

    公开(公告)号：US20100272893A1

    公开(公告)日：2010-10-28

    申请号：US12765005

    申请日：2010-04-22

    Applicant: Ping Chang ,  Gregg Wallace

    Inventor： Ping Chang ,  Gregg Wallace

    IPC: C23C16/458 ,  C23C16/00

    CPC classification number: C23C14/24 ,  C23C14/044 ,  C23C14/505

    Abstract: A vapor deposition device using a lift-off process includes an evaporation source, a space frame mounted for rotation about a first axis that passes through the evaporation source, a central dome-shaped wafer holder mounted to the space frame wherein a centerpoint of the central dome-shaped wafer holder is aligned with the first axis, a orbital dome-shaped wafer holder mounted to the space frame in a position offset from the first axis and rotatable about a second axis that passes through a centerpoint of the orbital dome-shaped wafer holder and the evaporation source, and a plurality of wafer positions on the central dome-shaped wafer holder and the orbital dome-shaped wafer holder where each of the wafer positions are offset from the first axis and the second axis. Each of the plurality of wafer positions are configured to orient a substrate surface of a wafer mounted therein substantially orthogonal to a radial axis extending from the wafer position to the evaporation source during rotation about the first axis and the second axis.

    Abstract translation: 使用剥离工艺的气相沉积装置包括蒸发源，安装用于围绕通过蒸发源的第一轴线旋转的空间框架，安装到空间框架的中心圆顶状晶片保持架，其中中心点 圆顶形晶片保持器与第一轴线对准，轨道圆顶状晶片保持器安装在空间框架上，位于偏离第一轴线的位置，并可围绕穿过轨道圆顶状晶片的中心点的第二轴线旋转 保持器和蒸发源，以及在中心圆顶状晶片保持器和轨道圆顶状晶片保持器上的多个晶片位置，其中每个晶片位置偏离第一轴和第二轴。 所述多个晶片位置中的每一个被配置为在围绕第一轴线和第二轴线旋转的过程中将安装在其中的晶片的衬底表面定向成基本上垂直于从晶片位置延伸到蒸发源的径向轴。

    Electron beam evaporation source
    7.
    发明授权
    Electron beam evaporation source 失效
    电子束蒸发源

    公开(公告)号：US5012064A

    公开(公告)日：1991-04-30

    申请号：US546269

    申请日：1990-06-29

    Applicant: Ping Chang ,  P. A. Joel Smith

    Inventor： Ping Chang ,  P. A. Joel Smith

    IPC: C23C14/24 ,  C23C14/30 ,  H01J37/147 ,  H01J37/30 ,  H01J37/305

    CPC classification number: H01J37/1475 ,  C23C14/30 ,  H01J37/3053

    Abstract: The present invention provides an electron beam evaporation source designed so that the size of the impact area of the electron beam on an evaporant will remain essentially constant in any position of the impact area on the evaporant; and thus, the rate of evaporation will remain essentially constant. To this end, a quadrapole comprising a set of two pairs of electromagnets is used to deflect the electron beam. The quadrapoles provide a uniform magnetic deflection field to prevent distortion of the impact area. A pair of pole pieces, used in deflecting the electron beam through an arc of 270 degrees, are provided with a predetermined thickness and spacing to prevent lengthening of the impact area parallel to the pole pieces as the electron beam is deflected parallel to the pole pieces. The pole pieces, however, produce the formation of tail regions in the impact area when the impact area is positioned near the pole pieces. In order to eliminate such tail regions, a pair of surface dipoles are connected to the pole pieces at an angle of 45 degrees such that the electron beam passes between the ends of the dipoles at a near vertical location of the arc of the electron beam. The maintenance of the impact area essentially free of distortion, tail region formation, and lengthening, ensures essential consistency in the size of the impact areas.

    Lift-off deposition system featuring a density optimized HULA substrate holder in a conical deposition chamber
    8.
    发明授权
    Lift-off deposition system featuring a density optimized HULA substrate holder in a conical deposition chamber 有权
    剥离沉积系统，其特征是在锥形沉积室中具有密度优化的HULA衬底支架

    公开(公告)号：US08926755B2

    公开(公告)日：2015-01-06

    申请号：US12765005

    申请日：2010-04-22

    Applicant: Ping Chang ,  Gregg Wallace

    Inventor： Ping Chang ,  Gregg Wallace

    IPC: C23C16/00 ,  C23C14/24 ,  C23C14/04 ,  C23C14/50

    CPC classification number: C23C14/24 ,  C23C14/044 ,  C23C14/505

    Abstract: A vapor deposition device using a lift-off process includes an evaporation source, a support frame mounted for rotation about a first axis that passes through the evaporation source, a central dome-shaped wafer holder mounted to the support frame wherein a centerpoint of the central dome-shaped wafer holder is aligned with the first axis, an orbital dome-shaped wafer holder mounted to the support frame in a position offset from the first axis and rotatable about a second axis that passes through a centerpoint of the orbital dome-shaped wafer holder and the evaporation source, and a plurality of wafer positions on the central dome-shaped wafer holder and the orbital dome-shaped wafer holder where each of the wafer positions are offset from the first axis and the second axis.

    Abstract translation: 使用剥离工艺的气相沉积装置包括蒸发源，安装用于围绕穿过蒸发源的第一轴旋转的支撑框架，安装到支撑框架的中心圆顶状晶片保持架，其中中心点 圆顶状晶片保持器与第一轴线对准，轨道圆顶状晶片保持器安装在支撑框架上，位于偏离第一轴线的位置，并可围绕穿过轨道圆顶状晶片的中心点的第二轴线旋转 保持器和蒸发源，以及在中心圆顶状晶片保持器和轨道圆顶状晶片保持器上的多个晶片位置，其中每个晶片位置偏离第一轴和第二轴。

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