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公开(公告)号：US20250040043A1
公开(公告)日：2025-01-30
申请号：US18906241
申请日：2024-10-04
Applicant: DAIKIN INDUSTRIES, LTD.
Inventor： Kyouhei SAWAKI , Shingo OKUNO , Yuki UEDA , Mayuko TATEMICHI
Abstract: Provided are a solid composition having a low linear expansion coefficient and good moldability, a circuit board, and a method for producing the solid composition. The solid composition contains: a perfluorinated fluororesin; and an anisotropic filler surface-treated with a silane coupling agent.
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公开(公告)号：US20180223059A1
公开(公告)日：2018-08-09
申请号：US15742971
申请日：2016-07-13
Applicant: DAIKIN INDUSTRIES, LTD.
Inventor： Takashi KANEMURA , Eri MUKAI , Takeshi HAZAMA , Tetsuhiro KODANI , Nobuyuki KOMATSU , Hisako NAKAMURA , Kouji YOKOTANI , Mayuko TATEMICHI , Akio HIGAKI
IPC: C08J5/18 , C08F214/26
Abstract: The present invention provides a film having excellent heat resistance and a small difference between the permittivity at low temperatures and the permittivity at high temperatures. The present invention provides a film having a relative permittivity of 8 or more at a frequency of 1 kHz at 30° C., wherein the rate of change is −8 to +8% as calculated from a relative permittivity A at a frequency of 1 kHz at 30° C. and a relative permittivity B at a frequency of 1 kHz at 150° C. according to the following formula: Rate of change (%)=(B−A)/A×100.
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公开(公告)号：US20250168974A1
公开(公告)日：2025-05-22
申请号：US19028921
申请日：2025-01-17
Applicant: DAIKIN INDUSTRIES, LTD.
Inventor： Kenzo TAKAHASHI , Nobuyuki KOMATSU , Tatsuya HIGUCHI , Takeshi HAZAMA , Mayuko TATEMICHI , Hirokazu KOMORI , Hideaki TENKAJI , Masahiko KAWAMURA
IPC: H05K1/03 , C08F214/26
Abstract: Provided is a fluororesin long film that has high uniformity and does not deform when bonded to metal foil. A fluororesin long film including a fluororesin in which the number of unstable functional groups is less than 350 per 1×106 carbon atoms, where a difference between each average film thickness in a travel direction at every 5 mm in a width direction and an average film thickness of entire surface is within 2 μm.
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公开(公告)号：US20240268020A1
公开(公告)日：2024-08-08
申请号：US18630293
申请日：2024-04-09
Applicant: DAIKIN INDUSTRIES, LTD.
Inventor： Kyouhei SAWAKI , Yuki UEDA , Shingo OKUNO , Mayuko TATEMICHI
CPC classification number: H05K1/0373 , H01B1/02 , H01B3/445 , H05K1/09
Abstract: The disclosure aims to provide a composition having excellent UV laser processibility and good electric properties, a circuit board, and a method for producing a composition. The composition contains a perfluorinated fluororesin and zinc oxide.
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公开(公告)号：US20210023818A1
公开(公告)日：2021-01-28
申请号：US17043343
申请日：2019-03-26
Applicant: DAIKIN INDUSTRIES, LTD.
Inventor： Takeshi HAZAMA , Nobuyuki KOMATSU , Kouji YOKOTANI , Mayuko TATEMICHI , Akio HIGAKI , Tomohiro TANAKA
IPC: B32B7/025 , B32B27/30 , C08F214/18
Abstract: A radio wave absorbing material including a fluoropolymer. The fluoropolymer contains a vinylidene fluoride unit, and the radio wave absorbing material absorbs a radio wave having a frequency in a range of 1 MHz to 100 MHz.
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Patent Agency Ranking
公开(公告)号：US20150368413A1
公开(公告)日：2015-12-24
申请号：US14433685
申请日：2013-10-16
Applicant: DAIKIN INDUSTRIES, LTD.
Inventor： Mayuko TATEMICHI , Miharu OTA , Kouji YOKOTANI , Nobuyuki KOMATSU , Hisako NAKAMURA , Fumiko SHIGENAI , Takeshi HAZAMA , Masakazu KINOSHITA , Meiten KOH , Takuji ISHIKAWA , Takashi IGUCHI , Kazunobu UCHIDA , Tomoyuki FUKATANI , Takahiro KITAHARA , Tetsuhiro KODANI
CPC classification number: C08J5/18 , C08J2327/16 , C08J2327/18 , C08K3/22 , C08K3/36 , C08K2003/2206 , C08K2003/222 , C08K2003/2227 , C08K2003/2237 , G02B3/14 , G02B26/005 , G02B26/02 , H01G4/1209 , H01G4/18 , H01G4/206
Abstract: The present invention aims to provide a film having a high dielectric constant and a low dissipation factor. The high dielectric film of the present invention includes a vinylidene fluoride/tetrafluoroethylene copolymer (A) with a mole ratio (vinylidene fluoride)/(tetrafluoroethylene) of 95/5 to 80/20. The film includes an β-crystal structure and a β-crystal structure. The ratio of the β-crystal structure is 50% or more.
Abstract translation: 本发明的目的在于提供一种具有高介电常数和低耗散因子的膜。 本发明的高介电膜包括摩尔比（偏二氟乙烯）/（四氟乙烯）为95/5〜80/20的偏氟乙烯/四氟乙烯共聚物（A）。 该膜包括一个结晶结构和一个结晶结构。 结晶结构的比例为50％以上。
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公开(公告)号：US20240262984A1
公开(公告)日：2024-08-08
申请号：US18627638
申请日：2024-04-05
Applicant: DAIKIN INDUSTRIES, LTD.
Inventor： Kyouhei SAWAKI , Yuki UEDA , Shingo OKUNO , Mayuko TATEMICHI
IPC: C08K5/3492 , C08J3/20 , C08K3/36 , C08K5/3475 , H05K1/03
CPC classification number: C08K5/3492 , C08J3/201 , C08K3/36 , C08K5/3475 , H05K1/0346 , C08J2327/18
Abstract: The disclosure aims to provide a composition having excellent UV laser processibility, a circuit board, and a method for producing a composition. The composition contains a fluororesin and a nitrogen-containing heterocyclic compound having a 18 by mass reduction temperature during pyrolysis of 330° C. or higher, and has an absorbance of light with a wavelength of 355 nm of 0.6 or higher.
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公开(公告)号：US20200032014A1
公开(公告)日：2020-01-30
申请号：US16337186
申请日：2017-09-27
Applicant: DAIKIN INDUSTRIES, LTD.
Inventor： Takeshi HAZAMA , Nobuyuki KOMATSU , Kouji YOKOTANI , Mayuko TATEMICHI , Tatsuya HIGUCHI , Keiko KOGA
IPC: C08J5/18 , G02B26/00 , H01G4/18 , H01G4/33 , H01L41/193
Abstract: The invention provides a film having a high relative permittivity, a high volume resistivity, and a high breakdown strength. The film has a relative permittivity of 9 or higher at a frequency of 1 kHz and 30° C., a volume resistivity of 5E+15 Ω·cm or higher at 30° C., and a breakdown strength of 500 V/μm or higher.
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公开(公告)号：US20190382544A1
公开(公告)日：2019-12-19
申请号：US16480132
申请日：2018-01-17
Applicant: DAIKIN INDUSTRIES, LTD.
Inventor： Kouji YOKOTANI , Nobuyuki KOMATSU , Takeshi HAZAMA , Mayuko TATEMICHI , Akio HIGAKI , Tatsuya HIGUCHI , Keiko YAMAZAKI
Abstract: A fluororesin film containing a fluororesin. The fluororesin film has on at least one surface thereof a ten-point average roughness of 0.100 to 1.200 μm and an arithmetic average roughness of 0.010 to 0.050 μm. Further, the fluororesin film has a breakdown strength of 400 V/μm or higher.
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公开(公告)号：US20150332855A1
公开(公告)日：2015-11-19
申请号：US14432514
申请日：2013-11-14
Applicant: DAIKIN INDUSTRIES, LTD.
Inventor： Meiten KOH , Nobuyuki KOMATSU , Takeshi HAZAMA , Hisako NAKAMURA , Kouji YOKOTANI , Miharu OTA , Fumiko SHIGENAI , Mayuko TATEMICHI , Masakazu KINOSHITA
CPC classification number: H01G4/306 , B32B27/08 , B32B27/281 , B32B27/286 , B32B27/32 , B32B27/322 , B32B27/36 , B32B27/365 , B32B2307/204 , B32B2457/16 , H01G4/01 , H01G4/08 , H01G4/18 , H01G4/33
Abstract: The present invention aims to provide a multilayer film which can increase the capacitance. The present invention relates to a multilayer film including a first electrode layer, a resin substrate, a second electrode layer, and a dielectric layer stacked in the order set forth. The dielectric layer includes a vinylidene fluoride/tetrafluoroethylene copolymer (A). The copolymer (A) satisfies a mole ratio (vinylidene fluoride)/(tetrafluoroethylene) of 97/3 to 60/40.
Abstract translation: 本发明的目的在于提供一种可以增加电容的多层膜。 本发明涉及一种多层膜，其包括按顺序堆叠的第一电极层，树脂基板，第二电极层和电介质层。 介电层包括偏二氟乙烯/四氟乙烯共聚物（A）。 共聚物（A）满足97/3〜60/40的摩尔比（偏二氟乙烯）/（四氟乙烯）。
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